Search

Chia How Michael Liu

Examiner (ID: 7313, Phone: (571)272-9019 , Office: P/2882 )

Most Active Art Unit
2882
Art Unit(s)
2851, 2882
Total Applications
473
Issued Applications
284
Pending Applications
0
Abandoned Applications
189

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5136134 [patent_doc_number] => 20070077763 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-04-05 [patent_title] => 'Deposition technique to planarize a multi-layer structure' [patent_app_type] => utility [patent_app_number] => 11/240707 [patent_app_country] => US [patent_app_date] => 2005-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5516 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0077/20070077763.pdf [firstpage_image] =>[orig_patent_app_number] => 11240707 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/240707
Deposition technique to planarize a multi-layer structure Sep 29, 2005 Abandoned
Array ( [id] => 319546 [patent_doc_number] => 07522260 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2009-04-21 [patent_title] => 'Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components' [patent_app_type] => utility [patent_app_number] => 11/239266 [patent_app_country] => US [patent_app_date] => 2005-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 6394 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 132 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/522/07522260.pdf [firstpage_image] =>[orig_patent_app_number] => 11239266 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/239266
Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components Sep 28, 2005 Issued
Array ( [id] => 901920 [patent_doc_number] => 07339650 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-04 [patent_title] => 'Immersion lithography fluid control system that applies force to confine the immersion liquid' [patent_app_type] => utility [patent_app_number] => 11/237650 [patent_app_country] => US [patent_app_date] => 2005-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 4163 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/339/07339650.pdf [firstpage_image] =>[orig_patent_app_number] => 11237650 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/237650
Immersion lithography fluid control system that applies force to confine the immersion liquid Sep 28, 2005 Issued
Array ( [id] => 5818872 [patent_doc_number] => 20060023185 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-02-02 [patent_title] => 'Cleanup method for optics in immersion lithography' [patent_app_type] => utility [patent_app_number] => 11/237651 [patent_app_country] => US [patent_app_date] => 2005-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3961 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0023/20060023185.pdf [firstpage_image] =>[orig_patent_app_number] => 11237651 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/237651
Cleanup method for optics in immersion lithography Sep 28, 2005 Issued
Array ( [id] => 834367 [patent_doc_number] => 07397532 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-07-08 [patent_title] => 'Run-off path to collect liquid for an immersion lithography apparatus' [patent_app_type] => utility [patent_app_number] => 11/235323 [patent_app_country] => US [patent_app_date] => 2005-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 11 [patent_no_of_words] => 7724 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 100 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/397/07397532.pdf [firstpage_image] =>[orig_patent_app_number] => 11235323 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/235323
Run-off path to collect liquid for an immersion lithography apparatus Sep 26, 2005 Issued
Array ( [id] => 5223693 [patent_doc_number] => 20070252959 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-11-01 [patent_title] => 'Device for Controlling the Temperature of Elements' [patent_app_type] => utility [patent_app_number] => 11/576349 [patent_app_country] => US [patent_app_date] => 2005-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3541 [patent_no_of_claims] => 38 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0252/20070252959.pdf [firstpage_image] =>[orig_patent_app_number] => 11576349 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/576349
Device for Controlling the Temperature of Elements Sep 23, 2005 Abandoned
Array ( [id] => 5055230 [patent_doc_number] => 20070058151 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-15 [patent_title] => 'Optical element for use in lithography apparatus and method of conditioning radiation beam' [patent_app_type] => utility [patent_app_number] => 11/224319 [patent_app_country] => US [patent_app_date] => 2005-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7522 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20070058151.pdf [firstpage_image] =>[orig_patent_app_number] => 11224319 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/224319
Optical element for use in lithography apparatus and method of conditioning radiation beam Sep 12, 2005 Abandoned
Array ( [id] => 5055342 [patent_doc_number] => 20070058263 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-15 [patent_title] => 'Apparatus and methods for immersion lithography' [patent_app_type] => utility [patent_app_number] => 11/225268 [patent_app_country] => US [patent_app_date] => 2005-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3408 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20070058263.pdf [firstpage_image] =>[orig_patent_app_number] => 11225268 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/225268
Apparatus and methods for immersion lithography Sep 12, 2005 Abandoned
Array ( [id] => 5879407 [patent_doc_number] => 20060028628 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-02-09 [patent_title] => 'Lens cleaning module' [patent_app_type] => utility [patent_app_number] => 11/222319 [patent_app_country] => US [patent_app_date] => 2005-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 6886 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20060028628.pdf [firstpage_image] =>[orig_patent_app_number] => 11222319 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/222319
Lens cleaning module for immersion lithography apparatus Sep 6, 2005 Issued
Array ( [id] => 5899992 [patent_doc_number] => 20060044540 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-02 [patent_title] => 'Projection lens unit with focus and level control, related exposure apparatus and method' [patent_app_type] => utility [patent_app_number] => 11/216176 [patent_app_country] => US [patent_app_date] => 2005-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4261 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20060044540.pdf [firstpage_image] =>[orig_patent_app_number] => 11216176 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/216176
Projection lens unit with focus and level control, related exposure apparatus and method Aug 31, 2005 Issued
Array ( [id] => 5146863 [patent_doc_number] => 20070046917 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-01 [patent_title] => 'Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU' [patent_app_type] => utility [patent_app_number] => 11/215123 [patent_app_country] => US [patent_app_date] => 2005-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 11521 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0046/20070046917.pdf [firstpage_image] =>[orig_patent_app_number] => 11215123 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/215123
Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU Aug 30, 2005 Abandoned
Array ( [id] => 5223704 [patent_doc_number] => 20070252970 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-11-01 [patent_title] => 'Substrate Holder, Stage Apparatus, and Exposure Apparatus' [patent_app_type] => utility [patent_app_number] => 11/661372 [patent_app_country] => US [patent_app_date] => 2005-08-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 9542 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0252/20070252970.pdf [firstpage_image] =>[orig_patent_app_number] => 11661372 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/661372
Substrate Holder, Stage Apparatus, and Exposure Apparatus Aug 28, 2005 Abandoned
Array ( [id] => 5767348 [patent_doc_number] => 20060019184 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-01-26 [patent_title] => 'Multi-exposure lithography method and system providing increased overlay accuracy' [patent_app_type] => utility [patent_app_number] => 11/207367 [patent_app_country] => US [patent_app_date] => 2005-08-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 3941 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20060019184.pdf [firstpage_image] =>[orig_patent_app_number] => 11207367 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/207367
Multi-exposure lithography system providing increased overlay accuracy Aug 18, 2005 Issued
Array ( [id] => 15418 [patent_doc_number] => 07804575 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-09-28 [patent_title] => 'Lithographic apparatus and device manufacturing method having liquid evaporation control' [patent_app_type] => utility [patent_app_number] => 11/205325 [patent_app_country] => US [patent_app_date] => 2005-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 29 [patent_no_of_words] => 17196 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/804/07804575.pdf [firstpage_image] =>[orig_patent_app_number] => 11205325 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/205325
Lithographic apparatus and device manufacturing method having liquid evaporation control Aug 16, 2005 Issued
Array ( [id] => 866434 [patent_doc_number] => 07369214 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-05-06 [patent_title] => 'Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors' [patent_app_type] => utility [patent_app_number] => 11/201162 [patent_app_country] => US [patent_app_date] => 2005-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7651 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/369/07369214.pdf [firstpage_image] =>[orig_patent_app_number] => 11201162 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/201162
Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors Aug 10, 2005 Issued
Array ( [id] => 454954 [patent_doc_number] => 07248333 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-07-24 [patent_title] => 'Apparatus with light-modulating unit for forming pattern' [patent_app_type] => utility [patent_app_number] => 11/200200 [patent_app_country] => US [patent_app_date] => 2005-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5008 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/248/07248333.pdf [firstpage_image] =>[orig_patent_app_number] => 11200200 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/200200
Apparatus with light-modulating unit for forming pattern Aug 9, 2005 Issued
Array ( [id] => 5879410 [patent_doc_number] => 20060028630 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-02-09 [patent_title] => 'Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 11/196348 [patent_app_country] => US [patent_app_date] => 2005-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 4971 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0028/20060028630.pdf [firstpage_image] =>[orig_patent_app_number] => 11196348 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/196348
Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method Aug 3, 2005 Issued
Array ( [id] => 450908 [patent_doc_number] => 07251016 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-07-31 [patent_title] => 'Method for correcting structure-size-dependent positioning errors in photolithography' [patent_app_type] => utility [patent_app_number] => 11/190056 [patent_app_country] => US [patent_app_date] => 2005-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 12 [patent_no_of_words] => 9367 [patent_no_of_claims] => 40 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 258 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/251/07251016.pdf [firstpage_image] =>[orig_patent_app_number] => 11190056 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/190056
Method for correcting structure-size-dependent positioning errors in photolithography Jul 26, 2005 Issued
Array ( [id] => 5676334 [patent_doc_number] => 20060181689 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-08-17 [patent_title] => 'Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same' [patent_app_type] => utility [patent_app_number] => 11/190119 [patent_app_country] => US [patent_app_date] => 2005-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 8954 [patent_no_of_claims] => 41 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0181/20060181689.pdf [firstpage_image] =>[orig_patent_app_number] => 11190119 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/190119
Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same Jul 24, 2005 Abandoned
Array ( [id] => 591477 [patent_doc_number] => 07446855 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-11-04 [patent_title] => 'Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure' [patent_app_type] => utility [patent_app_number] => 11/189383 [patent_app_country] => US [patent_app_date] => 2005-07-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 5142 [patent_no_of_claims] => 53 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 128 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/446/07446855.pdf [firstpage_image] =>[orig_patent_app_number] => 11189383 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/189383
Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure Jul 24, 2005 Issued
Menu