
Chia How Michael Liu
Examiner (ID: 7313, Phone: (571)272-9019 , Office: P/2882 )
| Most Active Art Unit | 2882 |
| Art Unit(s) | 2851, 2882 |
| Total Applications | 473 |
| Issued Applications | 284 |
| Pending Applications | 0 |
| Abandoned Applications | 189 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 5136134
[patent_doc_number] => 20070077763
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-04-05
[patent_title] => 'Deposition technique to planarize a multi-layer structure'
[patent_app_type] => utility
[patent_app_number] => 11/240707
[patent_app_country] => US
[patent_app_date] => 2005-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5516
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0077/20070077763.pdf
[firstpage_image] =>[orig_patent_app_number] => 11240707
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/240707 | Deposition technique to planarize a multi-layer structure | Sep 29, 2005 | Abandoned |
Array
(
[id] => 319546
[patent_doc_number] => 07522260
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2009-04-21
[patent_title] => 'Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components'
[patent_app_type] => utility
[patent_app_number] => 11/239266
[patent_app_country] => US
[patent_app_date] => 2005-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 15
[patent_no_of_words] => 6394
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/522/07522260.pdf
[firstpage_image] =>[orig_patent_app_number] => 11239266
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/239266 | Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components | Sep 28, 2005 | Issued |
Array
(
[id] => 901920
[patent_doc_number] => 07339650
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-03-04
[patent_title] => 'Immersion lithography fluid control system that applies force to confine the immersion liquid'
[patent_app_type] => utility
[patent_app_number] => 11/237650
[patent_app_country] => US
[patent_app_date] => 2005-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 4163
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/339/07339650.pdf
[firstpage_image] =>[orig_patent_app_number] => 11237650
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/237650 | Immersion lithography fluid control system that applies force to confine the immersion liquid | Sep 28, 2005 | Issued |
Array
(
[id] => 5818872
[patent_doc_number] => 20060023185
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-02
[patent_title] => 'Cleanup method for optics in immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 11/237651
[patent_app_country] => US
[patent_app_date] => 2005-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3961
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0023/20060023185.pdf
[firstpage_image] =>[orig_patent_app_number] => 11237651
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/237651 | Cleanup method for optics in immersion lithography | Sep 28, 2005 | Issued |
Array
(
[id] => 834367
[patent_doc_number] => 07397532
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-08
[patent_title] => 'Run-off path to collect liquid for an immersion lithography apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/235323
[patent_app_country] => US
[patent_app_date] => 2005-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 11
[patent_no_of_words] => 7724
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/397/07397532.pdf
[firstpage_image] =>[orig_patent_app_number] => 11235323
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/235323 | Run-off path to collect liquid for an immersion lithography apparatus | Sep 26, 2005 | Issued |
Array
(
[id] => 5223693
[patent_doc_number] => 20070252959
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-01
[patent_title] => 'Device for Controlling the Temperature of Elements'
[patent_app_type] => utility
[patent_app_number] => 11/576349
[patent_app_country] => US
[patent_app_date] => 2005-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3541
[patent_no_of_claims] => 38
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0252/20070252959.pdf
[firstpage_image] =>[orig_patent_app_number] => 11576349
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/576349 | Device for Controlling the Temperature of Elements | Sep 23, 2005 | Abandoned |
Array
(
[id] => 5055230
[patent_doc_number] => 20070058151
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-15
[patent_title] => 'Optical element for use in lithography apparatus and method of conditioning radiation beam'
[patent_app_type] => utility
[patent_app_number] => 11/224319
[patent_app_country] => US
[patent_app_date] => 2005-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 7522
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20070058151.pdf
[firstpage_image] =>[orig_patent_app_number] => 11224319
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/224319 | Optical element for use in lithography apparatus and method of conditioning radiation beam | Sep 12, 2005 | Abandoned |
Array
(
[id] => 5055342
[patent_doc_number] => 20070058263
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-15
[patent_title] => 'Apparatus and methods for immersion lithography'
[patent_app_type] => utility
[patent_app_number] => 11/225268
[patent_app_country] => US
[patent_app_date] => 2005-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 3408
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0058/20070058263.pdf
[firstpage_image] =>[orig_patent_app_number] => 11225268
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/225268 | Apparatus and methods for immersion lithography | Sep 12, 2005 | Abandoned |
Array
(
[id] => 5879407
[patent_doc_number] => 20060028628
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-09
[patent_title] => 'Lens cleaning module'
[patent_app_type] => utility
[patent_app_number] => 11/222319
[patent_app_country] => US
[patent_app_date] => 2005-09-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 6886
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20060028628.pdf
[firstpage_image] =>[orig_patent_app_number] => 11222319
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/222319 | Lens cleaning module for immersion lithography apparatus | Sep 6, 2005 | Issued |
Array
(
[id] => 5899992
[patent_doc_number] => 20060044540
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-03-02
[patent_title] => 'Projection lens unit with focus and level control, related exposure apparatus and method'
[patent_app_type] => utility
[patent_app_number] => 11/216176
[patent_app_country] => US
[patent_app_date] => 2005-09-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4261
[patent_no_of_claims] => 35
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0044/20060044540.pdf
[firstpage_image] =>[orig_patent_app_number] => 11216176
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/216176 | Projection lens unit with focus and level control, related exposure apparatus and method | Aug 31, 2005 | Issued |
Array
(
[id] => 5146863
[patent_doc_number] => 20070046917
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-03-01
[patent_title] => 'Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU'
[patent_app_type] => utility
[patent_app_number] => 11/215123
[patent_app_country] => US
[patent_app_date] => 2005-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 11521
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0046/20070046917.pdf
[firstpage_image] =>[orig_patent_app_number] => 11215123
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/215123 | Lithographic apparatus and device manufacturing method that compensates for reticle induced CDU | Aug 30, 2005 | Abandoned |
Array
(
[id] => 5223704
[patent_doc_number] => 20070252970
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2007-11-01
[patent_title] => 'Substrate Holder, Stage Apparatus, and Exposure Apparatus'
[patent_app_type] => utility
[patent_app_number] => 11/661372
[patent_app_country] => US
[patent_app_date] => 2005-08-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 9542
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0252/20070252970.pdf
[firstpage_image] =>[orig_patent_app_number] => 11661372
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/661372 | Substrate Holder, Stage Apparatus, and Exposure Apparatus | Aug 28, 2005 | Abandoned |
Array
(
[id] => 5767348
[patent_doc_number] => 20060019184
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-26
[patent_title] => 'Multi-exposure lithography method and system providing increased overlay accuracy'
[patent_app_type] => utility
[patent_app_number] => 11/207367
[patent_app_country] => US
[patent_app_date] => 2005-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 3941
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0019/20060019184.pdf
[firstpage_image] =>[orig_patent_app_number] => 11207367
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/207367 | Multi-exposure lithography system providing increased overlay accuracy | Aug 18, 2005 | Issued |
Array
(
[id] => 15418
[patent_doc_number] => 07804575
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-09-28
[patent_title] => 'Lithographic apparatus and device manufacturing method having liquid evaporation control'
[patent_app_type] => utility
[patent_app_number] => 11/205325
[patent_app_country] => US
[patent_app_date] => 2005-08-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 29
[patent_no_of_words] => 17196
[patent_no_of_claims] => 44
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 83
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/804/07804575.pdf
[firstpage_image] =>[orig_patent_app_number] => 11205325
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/205325 | Lithographic apparatus and device manufacturing method having liquid evaporation control | Aug 16, 2005 | Issued |
Array
(
[id] => 866434
[patent_doc_number] => 07369214
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-05-06
[patent_title] => 'Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors'
[patent_app_type] => utility
[patent_app_number] => 11/201162
[patent_app_country] => US
[patent_app_date] => 2005-08-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 7651
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/369/07369214.pdf
[firstpage_image] =>[orig_patent_app_number] => 11201162
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/201162 | Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors | Aug 10, 2005 | Issued |
Array
(
[id] => 454954
[patent_doc_number] => 07248333
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-24
[patent_title] => 'Apparatus with light-modulating unit for forming pattern'
[patent_app_type] => utility
[patent_app_number] => 11/200200
[patent_app_country] => US
[patent_app_date] => 2005-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 5008
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 143
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/248/07248333.pdf
[firstpage_image] =>[orig_patent_app_number] => 11200200
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/200200 | Apparatus with light-modulating unit for forming pattern | Aug 9, 2005 | Issued |
Array
(
[id] => 5879410
[patent_doc_number] => 20060028630
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-09
[patent_title] => 'Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/196348
[patent_app_country] => US
[patent_app_date] => 2005-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4971
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0028/20060028630.pdf
[firstpage_image] =>[orig_patent_app_number] => 11196348
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/196348 | Liquid immersion exposure apparatus, method of controlling the same, and device manufacturing method | Aug 3, 2005 | Issued |
Array
(
[id] => 450908
[patent_doc_number] => 07251016
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-31
[patent_title] => 'Method for correcting structure-size-dependent positioning errors in photolithography'
[patent_app_type] => utility
[patent_app_number] => 11/190056
[patent_app_country] => US
[patent_app_date] => 2005-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 9367
[patent_no_of_claims] => 40
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 258
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/251/07251016.pdf
[firstpage_image] =>[orig_patent_app_number] => 11190056
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/190056 | Method for correcting structure-size-dependent positioning errors in photolithography | Jul 26, 2005 | Issued |
Array
(
[id] => 5676334
[patent_doc_number] => 20060181689
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-08-17
[patent_title] => 'Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same'
[patent_app_type] => utility
[patent_app_number] => 11/190119
[patent_app_country] => US
[patent_app_date] => 2005-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 8954
[patent_no_of_claims] => 41
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0181/20060181689.pdf
[firstpage_image] =>[orig_patent_app_number] => 11190119
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/190119 | Lithographic-optical systems including isolatable vacuum chambers, and lithography apparatus comprising same | Jul 24, 2005 | Abandoned |
Array
(
[id] => 591477
[patent_doc_number] => 07446855
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-11-04
[patent_title] => 'Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure'
[patent_app_type] => utility
[patent_app_number] => 11/189383
[patent_app_country] => US
[patent_app_date] => 2005-07-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 9
[patent_no_of_words] => 5142
[patent_no_of_claims] => 53
[patent_no_of_ind_claims] => 12
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/446/07446855.pdf
[firstpage_image] =>[orig_patent_app_number] => 11189383
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/189383 | Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure | Jul 24, 2005 | Issued |