| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3453269
[patent_doc_number] => 05451548
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-09-19
[patent_title] => 'Electron beam deposition of gallium oxide thin films using a single high purity crystal source'
[patent_app_type] => 1
[patent_app_number] => 8/217296
[patent_app_country] => US
[patent_app_date] => 1994-03-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2893
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/451/05451548.pdf
[firstpage_image] =>[orig_patent_app_number] => 217296
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/217296 | Electron beam deposition of gallium oxide thin films using a single high purity crystal source | Mar 22, 1994 | Issued |
Array
(
[id] => 3085708
[patent_doc_number] => 05368647
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-11-29
[patent_title] => 'Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface'
[patent_app_type] => 1
[patent_app_number] => 8/208903
[patent_app_country] => US
[patent_app_date] => 1994-03-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 5
[patent_no_of_words] => 2435
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/368/05368647.pdf
[firstpage_image] =>[orig_patent_app_number] => 208903
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/208903 | Photo-excited processing apparatus for manufacturing a semiconductor device that uses a cylindrical reflecting surface | Mar 10, 1994 | Issued |
Array
(
[id] => 2989347
[patent_doc_number] => 05346853
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-09-13
[patent_title] => 'Microwave energized deposition process with substrate temperature control for the fabrication of P-I-N photovoltaic devices'
[patent_app_type] => 1
[patent_app_number] => 8/185309
[patent_app_country] => US
[patent_app_date] => 1994-01-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 4216
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/346/05346853.pdf
[firstpage_image] =>[orig_patent_app_number] => 185309
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/185309 | Microwave energized deposition process with substrate temperature control for the fabrication of P-I-N photovoltaic devices | Jan 20, 1994 | Issued |
| 08/177030 | PLASMA ETCH SYSTEM | Jan 3, 1994 | Abandoned |
Array
(
[id] => 3415717
[patent_doc_number] => 05393710
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-02-28
[patent_title] => 'Method for manufacturing a micro light valve'
[patent_app_type] => 1
[patent_app_number] => 8/149653
[patent_app_country] => US
[patent_app_date] => 1993-11-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 35
[patent_no_of_words] => 5881
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 28
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/393/05393710.pdf
[firstpage_image] =>[orig_patent_app_number] => 149653
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/149653 | Method for manufacturing a micro light valve | Nov 8, 1993 | Issued |
Array
(
[id] => 3117583
[patent_doc_number] => 05380682
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-01-10
[patent_title] => 'Wafer processing cluster tool batch preheating and degassing method'
[patent_app_type] => 1
[patent_app_number] => 8/147666
[patent_app_country] => US
[patent_app_date] => 1993-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 5233
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 330
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/380/05380682.pdf
[firstpage_image] =>[orig_patent_app_number] => 147666
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/147666 | Wafer processing cluster tool batch preheating and degassing method | Nov 2, 1993 | Issued |
Array
(
[id] => 3487137
[patent_doc_number] => 05426073
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-06-20
[patent_title] => 'Method of fabricating semiconductor devices using an intermediate grinding step'
[patent_app_type] => 1
[patent_app_number] => 8/135577
[patent_app_country] => US
[patent_app_date] => 1993-10-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 4821
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 124
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/426/05426073.pdf
[firstpage_image] =>[orig_patent_app_number] => 135577
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/135577 | Method of fabricating semiconductor devices using an intermediate grinding step | Oct 12, 1993 | Issued |
Array
(
[id] => 3065310
[patent_doc_number] => 05336363
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-08-09
[patent_title] => 'Low temperature dry etch of copper'
[patent_app_type] => 1
[patent_app_number] => 8/126470
[patent_app_country] => US
[patent_app_date] => 1993-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1342
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 40
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/336/05336363.pdf
[firstpage_image] =>[orig_patent_app_number] => 126470
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/126470 | Low temperature dry etch of copper | Sep 23, 1993 | Issued |
| 08/121196 | PROCESS FOR PREPARING A FUNCTIONAL THIN FILM BY WAY OF THE CHEMICAL REACTION AMONG ACTIVE SPECIES AND APPARATUS THEREFOR | Sep 14, 1993 | Abandoned |
Array
(
[id] => 3450320
[patent_doc_number] => 05385862
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-01-31
[patent_title] => 'Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films'
[patent_app_type] => 1
[patent_app_number] => 8/113964
[patent_app_country] => US
[patent_app_date] => 1993-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 2559
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 13
[patent_words_short_claim] => 22
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/385/05385862.pdf
[firstpage_image] =>[orig_patent_app_number] => 113964
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/113964 | Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films | Aug 29, 1993 | Issued |
| 08/080672 | LOW TEMPERATURE SEEDIND PROCESS FOR FERROELECTRIC MEMORY DEVICE | Jun 21, 1993 | Pending |
| 08/072858 | PHOTO-EXCITED PROCESSING APPARATUS AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE BY USING THE SAME | Jun 6, 1993 | Pending |
| 08/057415 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING A HALOGEN PLASMA TREATMENT STEP | May 5, 1993 | Pending |
Array
(
[id] => 3094095
[patent_doc_number] => 05298465
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-03-29
[patent_title] => 'Plasma etching system'
[patent_app_type] => 1
[patent_app_number] => 8/056981
[patent_app_country] => US
[patent_app_date] => 1993-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 3463
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/298/05298465.pdf
[firstpage_image] =>[orig_patent_app_number] => 056981
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/056981 | Plasma etching system | May 2, 1993 | Issued |
Array
(
[id] => 3009584
[patent_doc_number] => 05281557
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-25
[patent_title] => 'Soluble oxides for integrated circuit fabrication formed by the incomplete dissociation of the precursor gas'
[patent_app_type] => 1
[patent_app_number] => 8/052803
[patent_app_country] => US
[patent_app_date] => 1993-04-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 2209
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/281/05281557.pdf
[firstpage_image] =>[orig_patent_app_number] => 052803
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/052803 | Soluble oxides for integrated circuit fabrication formed by the incomplete dissociation of the precursor gas | Apr 21, 1993 | Issued |
Array
(
[id] => 3013238
[patent_doc_number] => 05308788
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-05-03
[patent_title] => 'Temperature controlled process for the epitaxial growth of a film of material'
[patent_app_type] => 1
[patent_app_number] => 8/049645
[patent_app_country] => US
[patent_app_date] => 1993-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 4771
[patent_no_of_claims] => 30
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 155
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/308/05308788.pdf
[firstpage_image] =>[orig_patent_app_number] => 049645
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/049645 | Temperature controlled process for the epitaxial growth of a film of material | Apr 18, 1993 | Issued |
Array
(
[id] => 3065453
[patent_doc_number] => 05336371
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-08-09
[patent_title] => 'Semiconductor wafer cleaning and rinsing techniques using re-ionized water and tank overflow'
[patent_app_type] => 1
[patent_app_number] => 8/034938
[patent_app_country] => US
[patent_app_date] => 1993-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 1874
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 107
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/336/05336371.pdf
[firstpage_image] =>[orig_patent_app_number] => 034938
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/034938 | Semiconductor wafer cleaning and rinsing techniques using re-ionized water and tank overflow | Mar 17, 1993 | Issued |
Array
(
[id] => 3034055
[patent_doc_number] => 05300460
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-04-05
[patent_title] => 'UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers'
[patent_app_type] => 1
[patent_app_number] => 8/032744
[patent_app_country] => US
[patent_app_date] => 1993-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 7578
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 167
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/300/05300460.pdf
[firstpage_image] =>[orig_patent_app_number] => 032744
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/032744 | UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers | Mar 15, 1993 | Issued |
Array
(
[id] => 3449371
[patent_doc_number] => 05451293
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-09-19
[patent_title] => 'Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma'
[patent_app_type] => 1
[patent_app_number] => 8/033178
[patent_app_country] => US
[patent_app_date] => 1993-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 3237
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/451/05451293.pdf
[firstpage_image] =>[orig_patent_app_number] => 033178
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/033178 | Method of making a wiring layer wherein the masking material is ashed using an alcohol containing plasma | Mar 15, 1993 | Issued |
| 08/025533 | WAFER-LIKE PROCESSING AFTER SAWING DMDS | Mar 2, 1993 | Abandoned |