| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2909776
[patent_doc_number] => 05227340
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-13
[patent_title] => 'Process for fabricating semiconductor devices using a solid reactant source'
[patent_app_type] => 1
[patent_app_number] => 7/807665
[patent_app_country] => US
[patent_app_date] => 1991-12-16
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[pdf_file] => patents/05/227/05227340.pdf
[firstpage_image] =>[orig_patent_app_number] => 807665
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/807665 | Process for fabricating semiconductor devices using a solid reactant source | Dec 15, 1991 | Issued |
Array
(
[id] => 2932687
[patent_doc_number] => 05229303
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-20
[patent_title] => 'Device processing involving an optical interferometric thermometry using the change in refractive index to measure semiconductor wafer temperature'
[patent_app_type] => 1
[patent_app_number] => 7/808949
[patent_app_country] => US
[patent_app_date] => 1991-12-13
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[pdf_file] => patents/05/229/05229303.pdf
[firstpage_image] =>[orig_patent_app_number] => 808949
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/808949 | Device processing involving an optical interferometric thermometry using the change in refractive index to measure semiconductor wafer temperature | Dec 12, 1991 | Issued |
Array
(
[id] => 2967555
[patent_doc_number] => 05256204
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-26
[patent_title] => 'Single semiconductor water transfer method and manufacturing system'
[patent_app_type] => 1
[patent_app_number] => 7/806632
[patent_app_country] => US
[patent_app_date] => 1991-12-13
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/256/05256204.pdf
[firstpage_image] =>[orig_patent_app_number] => 806632
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/806632 | Single semiconductor water transfer method and manufacturing system | Dec 12, 1991 | Issued |
Array
(
[id] => 2967019
[patent_doc_number] => 05202290
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-04-13
[patent_title] => 'Process for manufacture of quantum dot and quantum wire semiconductors'
[patent_app_type] => 1
[patent_app_number] => 7/801404
[patent_app_country] => US
[patent_app_date] => 1991-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/202/05202290.pdf
[firstpage_image] =>[orig_patent_app_number] => 801404
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/801404 | Process for manufacture of quantum dot and quantum wire semiconductors | Dec 1, 1991 | Issued |
Array
(
[id] => 2921256
[patent_doc_number] => 05192717
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-03-09
[patent_title] => 'Process for the formation of a polycrystalline semiconductor film by microwave plasma chemical vapor deposition method'
[patent_app_type] => 1
[patent_app_number] => 7/799900
[patent_app_country] => US
[patent_app_date] => 1991-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
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[pdf_file] => patents/05/192/05192717.pdf
[firstpage_image] =>[orig_patent_app_number] => 799900
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/799900 | Process for the formation of a polycrystalline semiconductor film by microwave plasma chemical vapor deposition method | Dec 1, 1991 | Issued |
Array
(
[id] => 2974885
[patent_doc_number] => 05256582
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-26
[patent_title] => 'Method of forming complementary bipolar and MOS transistor having power and logic structures on the same integrated circuit substrate'
[patent_app_type] => 1
[patent_app_number] => 7/800869
[patent_app_country] => US
[patent_app_date] => 1991-11-27
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/256/05256582.pdf
[firstpage_image] =>[orig_patent_app_number] => 800869
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/800869 | Method of forming complementary bipolar and MOS transistor having power and logic structures on the same integrated circuit substrate | Nov 26, 1991 | Issued |
| 07/799238 | METHOD FOR SELECTIVELY GROWING ALUMINUM-CONTAINING LAYERS | Nov 26, 1991 | Abandoned |
Array
(
[id] => 2986258
[patent_doc_number] => 05212119
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-05-18
[patent_title] => 'Method for maintaining the resistance of a high resistive polysilicon layer for a semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 7/797994
[patent_app_country] => US
[patent_app_date] => 1991-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/212/05212119.pdf
[firstpage_image] =>[orig_patent_app_number] => 797994
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/797994 | Method for maintaining the resistance of a high resistive polysilicon layer for a semiconductor device | Nov 25, 1991 | Issued |
Array
(
[id] => 2948665
[patent_doc_number] => 05262357
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-11-16
[patent_title] => 'Low temperature thin films formed from nanocrystal precursors'
[patent_app_type] => 1
[patent_app_number] => 7/796242
[patent_app_country] => US
[patent_app_date] => 1991-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 3824
[patent_no_of_claims] => 7
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[pdf_file] => patents/05/262/05262357.pdf
[firstpage_image] =>[orig_patent_app_number] => 796242
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/796242 | Low temperature thin films formed from nanocrystal precursors | Nov 21, 1991 | Issued |
| 07/796245 | SEMICONDUCTOR NANOCRYSTALS COVALENTLY BOUND TO SOLID INORGANIC SURFACES USING SELF-ASSEMBLED MONOLAYERS | Nov 21, 1991 | Abandoned |
| 07/798355 | LOW TEMPERATURE DEPOSITION OF SILICON OXIDES FOR DEVICE FABRICATION | Nov 20, 1991 | Abandoned |
| 07/795311 | PROCESSING METHOD AND APPARATUS USING FOCUSED ENERGY BEAM | Nov 19, 1991 | Abandoned |
Array
(
[id] => 2890995
[patent_doc_number] => 05270267
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-12-14
[patent_title] => 'Curing and passivation of spin on glasses by a plasma process wherein an external polarization field is applied to the substrate'
[patent_app_type] => 1
[patent_app_number] => 7/794789
[patent_app_country] => US
[patent_app_date] => 1991-11-19
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/270/05270267.pdf
[firstpage_image] =>[orig_patent_app_number] => 794789
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/794789 | Curing and passivation of spin on glasses by a plasma process wherein an external polarization field is applied to the substrate | Nov 18, 1991 | Issued |
Array
(
[id] => 3091227
[patent_doc_number] => 05312781
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-05-17
[patent_title] => 'Flash EEPROM fabrication process that uses a selective wet chemical etch'
[patent_app_type] => 1
[patent_app_number] => 7/792496
[patent_app_country] => US
[patent_app_date] => 1991-11-12
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/312/05312781.pdf
[firstpage_image] =>[orig_patent_app_number] => 792496
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/792496 | Flash EEPROM fabrication process that uses a selective wet chemical etch | Nov 11, 1991 | Issued |
| 07/789396 | METHOD FOR COOLING SEMICONDUCTOR WAFERS USING A PORTION OF THE FLUORINATED HYDROCARBON COMPONENT OF THE PROCESS GAS | Nov 6, 1991 | Abandoned |
Array
(
[id] => 2976549
[patent_doc_number] => 05252520
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-12
[patent_title] => 'Integrated circuit interlevel dielectric wherein the first and second dielectric layers are formed with different densities'
[patent_app_type] => 1
[patent_app_number] => 7/786230
[patent_app_country] => US
[patent_app_date] => 1991-10-31
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[pdf_file] => patents/05/252/05252520.pdf
[firstpage_image] =>[orig_patent_app_number] => 786230
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/786230 | Integrated circuit interlevel dielectric wherein the first and second dielectric layers are formed with different densities | Oct 30, 1991 | Issued |
Array
(
[id] => 3007573
[patent_doc_number] => 05332441
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-07-26
[patent_title] => 'Apparatus for gettering of particles during plasma processing'
[patent_app_type] => 1
[patent_app_number] => 7/785628
[patent_app_country] => US
[patent_app_date] => 1991-10-31
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[pdf_file] => patents/05/332/05332441.pdf
[firstpage_image] =>[orig_patent_app_number] => 785628
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/785628 | Apparatus for gettering of particles during plasma processing | Oct 30, 1991 | Issued |
Array
(
[id] => 2946432
[patent_doc_number] => 05180692
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-01-19
[patent_title] => 'Method for the manufacture of boron-containing films by CVD or epitaxial techniques using boron trifluoride'
[patent_app_type] => 1
[patent_app_number] => 7/781669
[patent_app_country] => US
[patent_app_date] => 1991-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/180/05180692.pdf
[firstpage_image] =>[orig_patent_app_number] => 781669
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/781669 | Method for the manufacture of boron-containing films by CVD or epitaxial techniques using boron trifluoride | Oct 23, 1991 | Issued |
| 07/781077 | SEMICONDUCTOR APPARATUS | Oct 20, 1991 | Abandoned |
Array
(
[id] => 3084785
[patent_doc_number] => 05284802
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-02-08
[patent_title] => 'Container for semiconductor wafer sample and method of preparing sample'
[patent_app_type] => 1
[patent_app_number] => 7/768190
[patent_app_country] => US
[patent_app_date] => 1991-10-16
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[pdf_file] => patents/05/284/05284802.pdf
[firstpage_image] =>[orig_patent_app_number] => 768190
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/768190 | Container for semiconductor wafer sample and method of preparing sample | Oct 15, 1991 | Issued |