| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2931590
[patent_doc_number] => 05188987
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-02-23
[patent_title] => 'Method of manufacturing a semiconductor device using a polishing step prior to a selective vapor growth step'
[patent_app_type] => 1
[patent_app_number] => 7/714348
[patent_app_country] => US
[patent_app_date] => 1991-06-12
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[pdf_file] => patents/05/188/05188987.pdf
[firstpage_image] =>[orig_patent_app_number] => 714348
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/714348 | Method of manufacturing a semiconductor device using a polishing step prior to a selective vapor growth step | Jun 11, 1991 | Issued |
Array
(
[id] => 2804605
[patent_doc_number] => 05147823
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-09-15
[patent_title] => 'Method for forming an ultrafine metal pattern using an electron beam'
[patent_app_type] => 1
[patent_app_number] => 7/707236
[patent_app_country] => US
[patent_app_date] => 1991-05-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/05/147/05147823.pdf
[firstpage_image] =>[orig_patent_app_number] => 707236
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/707236 | Method for forming an ultrafine metal pattern using an electron beam | May 21, 1991 | Issued |
Array
(
[id] => 2881888
[patent_doc_number] => 05108936
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-04-28
[patent_title] => 'Method of producing a bipolar transistor having an amorphous emitter formed by plasma CVD'
[patent_app_type] => 1
[patent_app_number] => 7/704674
[patent_app_country] => US
[patent_app_date] => 1991-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/108/05108936.pdf
[firstpage_image] =>[orig_patent_app_number] => 704674
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/704674 | Method of producing a bipolar transistor having an amorphous emitter formed by plasma CVD | May 20, 1991 | Issued |
Array
(
[id] => 3122625
[patent_doc_number] => 05436172
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-07-25
[patent_title] => 'Real-time multi-zone semiconductor wafer temperature and process uniformity control system'
[patent_app_type] => 1
[patent_app_number] => 7/703078
[patent_app_country] => US
[patent_app_date] => 1991-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
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[pdf_file] => patents/05/436/05436172.pdf
[firstpage_image] =>[orig_patent_app_number] => 703078
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/703078 | Real-time multi-zone semiconductor wafer temperature and process uniformity control system | May 19, 1991 | Issued |
Array
(
[id] => 2928553
[patent_doc_number] => 05259881
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-11-09
[patent_title] => 'Wafer processing cluster tool batch preheating and degassing apparatus'
[patent_app_type] => 1
[patent_app_number] => 7/701800
[patent_app_country] => US
[patent_app_date] => 1991-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[pdf_file] => patents/05/259/05259881.pdf
[firstpage_image] =>[orig_patent_app_number] => 701800
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/701800 | Wafer processing cluster tool batch preheating and degassing apparatus | May 16, 1991 | Issued |
| 07/691852 | METHOD FOR PRODUCING SYNTHETIC DIAMOND THIN FILM, THE THIN FILM AND DEVICE USING IT | Apr 25, 1991 | Abandoned |
Array
(
[id] => 3084538
[patent_doc_number] => 05284789
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-02-08
[patent_title] => 'Method of forming silicon-based thin film and method of manufacturing thin film transistor using silicon-based thin film'
[patent_app_type] => 1
[patent_app_number] => 7/690816
[patent_app_country] => US
[patent_app_date] => 1991-04-23
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[pdf_file] => patents/05/284/05284789.pdf
[firstpage_image] =>[orig_patent_app_number] => 690816
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/690816 | Method of forming silicon-based thin film and method of manufacturing thin film transistor using silicon-based thin film | Apr 22, 1991 | Issued |
Array
(
[id] => 3045771
[patent_doc_number] => 05304514
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-04-19
[patent_title] => 'Dry etching method'
[patent_app_type] => 1
[patent_app_number] => 7/687569
[patent_app_country] => US
[patent_app_date] => 1991-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
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[pdf_file] => patents/05/304/05304514.pdf
[firstpage_image] =>[orig_patent_app_number] => 687569
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/687569 | Dry etching method | Apr 18, 1991 | Issued |
Array
(
[id] => 2948647
[patent_doc_number] => 05262356
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-11-16
[patent_title] => 'Method of treating a substrate wherein the flow rates of the treatment gases are equal'
[patent_app_type] => 1
[patent_app_number] => 7/674978
[patent_app_country] => US
[patent_app_date] => 1991-03-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 5094
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/262/05262356.pdf
[firstpage_image] =>[orig_patent_app_number] => 674978
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/674978 | Method of treating a substrate wherein the flow rates of the treatment gases are equal | Mar 25, 1991 | Issued |
| 07/679163 | TRENCH ETCHING IN AN INTEGRATED-CIRCUIT SEMICONDUCTOR DEVICE | Mar 25, 1991 | Abandoned |
Array
(
[id] => 2932025
[patent_doc_number] => 05196378
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-03-23
[patent_title] => 'Method of fabricating an integrated circuit having active regions near a die edge'
[patent_app_type] => 1
[patent_app_number] => 7/679122
[patent_app_country] => US
[patent_app_date] => 1991-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[pdf_file] => patents/05/196/05196378.pdf
[firstpage_image] =>[orig_patent_app_number] => 679122
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/679122 | Method of fabricating an integrated circuit having active regions near a die edge | Mar 24, 1991 | Issued |
| 07/671625 | FORMING COMPLEMENTARY BIPOLAR AND MOS TRANSISTOR HAVING POWER AND LOGIC STRUCTURES ON THE SAME INTEGRATED CIRCUIT SUBSTRATE | Mar 18, 1991 | Abandoned |
| 07/670692 | METHOD FOR THE PREPARATION AND DOPING OF HIGHLY INSULATING MONOCRYSTALLINE GALLIUM NITRIDE THIN FILMS | Mar 17, 1991 | Abandoned |
Array
(
[id] => 3007555
[patent_doc_number] => 05275977
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-04
[patent_title] => 'Insulating film forming method for semiconductor device interconnection'
[patent_app_type] => 1
[patent_app_number] => 7/669526
[patent_app_country] => US
[patent_app_date] => 1991-03-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/05/275/05275977.pdf
[firstpage_image] =>[orig_patent_app_number] => 669526
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/669526 | Insulating film forming method for semiconductor device interconnection | Mar 13, 1991 | Issued |
Array
(
[id] => 2926843
[patent_doc_number] => 05187115
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-02-16
[patent_title] => 'Method of forming semiconducting materials and barriers using a dual enclosure apparatus'
[patent_app_type] => 1
[patent_app_number] => 7/639197
[patent_app_country] => US
[patent_app_date] => 1991-03-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/187/05187115.pdf
[firstpage_image] =>[orig_patent_app_number] => 639197
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/639197 | Method of forming semiconducting materials and barriers using a dual enclosure apparatus | Mar 10, 1991 | Issued |
Array
(
[id] => 2890829
[patent_doc_number] => 05270259
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-12-14
[patent_title] => 'Method for fabricating an insulating film from a silicone resin using O.sub .'
[patent_app_type] => 1
[patent_app_number] => 7/667364
[patent_app_country] => US
[patent_app_date] => 1991-03-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/270/05270259.pdf
[firstpage_image] =>[orig_patent_app_number] => 667364
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/667364 | Method for fabricating an insulating film from a silicone resin using O.sub . | Mar 10, 1991 | Issued |
| 07/665935 | AMORPHOUS SEMICONDUCTOR, AMORPHOUS SEMICONDUCTOR DEVICE AND METHOD OF PRODUCING THE SAME | Mar 4, 1991 | Abandoned |
Array
(
[id] => 2671468
[patent_doc_number] => 05073507
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-12-17
[patent_title] => 'Producing a plasma containing beryllium and beryllium fluoride'
[patent_app_type] => 1
[patent_app_number] => 7/664142
[patent_app_country] => US
[patent_app_date] => 1991-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/073/05073507.pdf
[firstpage_image] =>[orig_patent_app_number] => 664142
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/664142 | Producing a plasma containing beryllium and beryllium fluoride | Mar 3, 1991 | Issued |
Array
(
[id] => 2950755
[patent_doc_number] => 05221643
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-22
[patent_title] => 'Method for producing polycrystalline semiconductor material by plasma-induced vapor phase deposition using activated hydrogen'
[patent_app_type] => 1
[patent_app_number] => 7/664481
[patent_app_country] => US
[patent_app_date] => 1991-03-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/221/05221643.pdf
[firstpage_image] =>[orig_patent_app_number] => 664481
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/664481 | Method for producing polycrystalline semiconductor material by plasma-induced vapor phase deposition using activated hydrogen | Mar 3, 1991 | Issued |
| 07/664437 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | Mar 3, 1991 | Abandoned |