| Application number | Title of the application | Filing Date | Status |
|---|
| 07/662538 | METHOD TO PRODUCE MASKING | Feb 27, 1991 | Abandoned |
Array
(
[id] => 3009512
[patent_doc_number] => 05281553
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-25
[patent_title] => 'Method for controlling the state of conduction of an MOS transistor of an integrated circuit'
[patent_app_type] => 1
[patent_app_number] => 7/658465
[patent_app_country] => US
[patent_app_date] => 1991-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 3209
[patent_no_of_claims] => 36
[patent_no_of_ind_claims] => 10
[patent_words_short_claim] => 106
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/281/05281553.pdf
[firstpage_image] =>[orig_patent_app_number] => 658465
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/658465 | Method for controlling the state of conduction of an MOS transistor of an integrated circuit | Feb 21, 1991 | Issued |
| 07/656316 | METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR DEVICES | Feb 18, 1991 | Abandoned |
Array
(
[id] => 2805119
[patent_doc_number] => 05157000
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-10-20
[patent_title] => 'Method for dry etching openings in integrated circuit layers'
[patent_app_type] => 1
[patent_app_number] => 7/652506
[patent_app_country] => US
[patent_app_date] => 1991-02-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 3606
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/157/05157000.pdf
[firstpage_image] =>[orig_patent_app_number] => 652506
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/652506 | Method for dry etching openings in integrated circuit layers | Feb 7, 1991 | Issued |
Array
(
[id] => 2931537
[patent_doc_number] => 05188984
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-02-23
[patent_title] => 'Semiconductor device and production method thereof'
[patent_app_type] => 1
[patent_app_number] => 7/649183
[patent_app_country] => US
[patent_app_date] => 1991-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 2418
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 247
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/188/05188984.pdf
[firstpage_image] =>[orig_patent_app_number] => 649183
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/649183 | Semiconductor device and production method thereof | Feb 3, 1991 | Issued |
Array
(
[id] => 2855004
[patent_doc_number] => 05166101
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-11-24
[patent_title] => 'Method for forming a boron phosphorus silicate glass composite layer on a semiconductor wafer'
[patent_app_type] => 1
[patent_app_number] => 7/649172
[patent_app_country] => US
[patent_app_date] => 1991-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 3253
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 175
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/166/05166101.pdf
[firstpage_image] =>[orig_patent_app_number] => 649172
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/649172 | Method for forming a boron phosphorus silicate glass composite layer on a semiconductor wafer | Jan 31, 1991 | Issued |
| 07/648325 | DEPOSITION METHOD FOR HIGH ASPECT RATIO FEATURES | Jan 28, 1991 | Abandoned |
Array
(
[id] => 2875869
[patent_doc_number] => 05118642
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-06-02
[patent_title] => 'Method for producing semiconductors'
[patent_app_type] => 1
[patent_app_number] => 7/645441
[patent_app_country] => US
[patent_app_date] => 1991-01-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 10
[patent_no_of_words] => 4172
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 177
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/118/05118642.pdf
[firstpage_image] =>[orig_patent_app_number] => 645441
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/645441 | Method for producing semiconductors | Jan 23, 1991 | Issued |
Array
(
[id] => 2915275
[patent_doc_number] => 05179029
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-01-12
[patent_title] => 'Hydrogen plasma passivation of GaAs'
[patent_app_type] => 1
[patent_app_number] => 7/643688
[patent_app_country] => US
[patent_app_date] => 1991-01-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 2297
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/179/05179029.pdf
[firstpage_image] =>[orig_patent_app_number] => 643688
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/643688 | Hydrogen plasma passivation of GaAs | Jan 17, 1991 | Issued |
Array
(
[id] => 2793274
[patent_doc_number] => 05143866
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-09-01
[patent_title] => 'Dry etching method for refractory metals, refractory metal silicides, and other refractory metal compounds'
[patent_app_type] => 1
[patent_app_number] => 7/642167
[patent_app_country] => US
[patent_app_date] => 1991-01-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 3
[patent_no_of_words] => 3099
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 149
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/143/05143866.pdf
[firstpage_image] =>[orig_patent_app_number] => 642167
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/642167 | Dry etching method for refractory metals, refractory metal silicides, and other refractory metal compounds | Jan 16, 1991 | Issued |
Array
(
[id] => 2822640
[patent_doc_number] => 05173449
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-12-22
[patent_title] => 'Metallization process'
[patent_app_type] => 1
[patent_app_number] => 7/634969
[patent_app_country] => US
[patent_app_date] => 1991-01-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 4114
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 145
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/173/05173449.pdf
[firstpage_image] =>[orig_patent_app_number] => 634969
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/634969 | Metallization process | Jan 6, 1991 | Issued |
Array
(
[id] => 2822699
[patent_doc_number] => 05173452
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-12-22
[patent_title] => 'Process for the vapor deposition of polysilanes photoresists'
[patent_app_type] => 1
[patent_app_number] => 7/635819
[patent_app_country] => US
[patent_app_date] => 1991-01-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1930
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 62
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/173/05173452.pdf
[firstpage_image] =>[orig_patent_app_number] => 635819
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/635819 | Process for the vapor deposition of polysilanes photoresists | Jan 1, 1991 | Issued |
Array
(
[id] => 2800624
[patent_doc_number] => 05124269
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-06-23
[patent_title] => 'Method of producing a semiconductor device using a wire mask having a specified diameter'
[patent_app_type] => 1
[patent_app_number] => 7/633192
[patent_app_country] => US
[patent_app_date] => 1990-12-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 5398
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 158
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/124/05124269.pdf
[firstpage_image] =>[orig_patent_app_number] => 633192
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/633192 | Method of producing a semiconductor device using a wire mask having a specified diameter | Dec 27, 1990 | Issued |
Array
(
[id] => 3007536
[patent_doc_number] => 05275976
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-04
[patent_title] => 'Process chamber purge module for semiconductor processing equipment'
[patent_app_type] => 1
[patent_app_number] => 7/634676
[patent_app_country] => US
[patent_app_date] => 1990-12-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 5731
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 124
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/275/05275976.pdf
[firstpage_image] =>[orig_patent_app_number] => 634676
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/634676 | Process chamber purge module for semiconductor processing equipment | Dec 26, 1990 | Issued |
| 07/632636 | LOW TEMPERATURE DEPOSITION OF SILICON OXIDES FOR DEVICE FABRICATION | Dec 25, 1990 | Abandoned |
| 07/629174 | METHOD OF FORMING SHALLOW JUNCTION AND SEMICONDUCTOR DEVICE HAVING SAID SHALLOW JUNCTION | Dec 18, 1990 | Abandoned |
| 07/629316 | SEMICONDUCTOR DEVICES AND METHOD OF MANUFACTURE | Dec 17, 1990 | Abandoned |
| 07/626050 | PLASMA REACTOR USING UHF/VHF RESONANT ANTENNA SOURCE, AND PROCESSES | Dec 6, 1990 | Abandoned |
Array
(
[id] => 2932978
[patent_doc_number] => 05229319
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-20
[patent_title] => 'Method for producing compound semiconductors and apparatus therefor'
[patent_app_type] => 1
[patent_app_number] => 7/618928
[patent_app_country] => US
[patent_app_date] => 1990-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 12
[patent_no_of_words] => 6174
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 468
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/229/05229319.pdf
[firstpage_image] =>[orig_patent_app_number] => 618928
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/618928 | Method for producing compound semiconductors and apparatus therefor | Nov 27, 1990 | Issued |
Array
(
[id] => 2931608
[patent_doc_number] => 05188988
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-02-23
[patent_title] => 'Passivation oxide conversion wherein an anodically grown oxide is converted to the sulfide'
[patent_app_type] => 1
[patent_app_number] => 7/618150
[patent_app_country] => US
[patent_app_date] => 1990-11-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 2424
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/188/05188988.pdf
[firstpage_image] =>[orig_patent_app_number] => 618150
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/618150 | Passivation oxide conversion wherein an anodically grown oxide is converted to the sulfide | Nov 25, 1990 | Issued |