Christopher C. Harris

Array ( [id] => 20283686 [patent_doc_number] => 20250308928 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-10-02 [patent_title] => CHEMICAL MECHANICAL POLISHING METHOD [patent_app_type] => utility [patent_app_number] => 19/177677 [patent_app_country] => US [patent_app_date] => 2025-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1107 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 136 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 19177677 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20414069 [patent_doc_number] => 12497339 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2025-12-16 [patent_title] => Sliding member and method of manufacturing sliding member [patent_app_type] => utility [patent_app_number] => 18/972622 [patent_app_country] => US [patent_app_date] => 2024-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 0 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18972622 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20462141 [patent_doc_number] => 20260011570 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2026-01-08 [patent_title] => CHEMICAL ETCH USING SELECTIVE ION IMPLANTATION [patent_app_type] => utility [patent_app_number] => 18/766272 [patent_app_country] => US [patent_app_date] => 2024-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4501 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18766272 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19727092 [patent_doc_number] => 20250029843 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-01-23 [patent_title] => SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 18/764779 [patent_app_country] => US [patent_app_date] => 2024-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5842 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -15 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18764779 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20367307 [patent_doc_number] => 20250357119 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-11-20 [patent_title] => Semiconductor stitching structure and manufacturing method thereof [patent_app_type] => utility [patent_app_number] => 18/744715 [patent_app_country] => US [patent_app_date] => 2024-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2373 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 120 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18744715 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19619165 [patent_doc_number] => 20240404845 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-12-05 [patent_title] => SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD [patent_app_type] => utility [patent_app_number] => 18/670732 [patent_app_country] => US [patent_app_date] => 2024-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6661 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -5 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18670732 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19601311 [patent_doc_number] => 20240392191 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-11-28 [patent_title] => ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME [patent_app_type] => utility [patent_app_number] => 18/670706 [patent_app_country] => US [patent_app_date] => 2024-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6870 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 13 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18670706 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20378103 [patent_doc_number] => 20250360596 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-11-27 [patent_title] => CHEMICAL MECHANICAL POLISHING METHOD USING FOAMED SLURRY AND APPARATUS FOR FOAMED SLURRY GENERATION [patent_app_type] => utility [patent_app_number] => 18/669659 [patent_app_country] => US [patent_app_date] => 2024-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2367 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18669659 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20367319 [patent_doc_number] => 20250357131 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-11-20 [patent_title] => Ionic Slurry for Electrochemical Mechanical Polishing [patent_app_type] => utility [patent_app_number] => 18/663911 [patent_app_country] => US [patent_app_date] => 2024-05-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15943 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18663911 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19601313 [patent_doc_number] => 20240392193 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-11-28 [patent_title] => ETCHING COMPOSITION FOR SILICON NITRIDE LAYER AND METHOD FOR ETCHING SILICON NITRIDE LAYER USING THE SAME [patent_app_type] => utility [patent_app_number] => 18/657598 [patent_app_country] => US [patent_app_date] => 2024-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5359 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -12 [patent_words_short_claim] => 325 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18657598 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19866183 [patent_doc_number] => 20250104969 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-03-27 [patent_title] => SUBSTRATE PROCESSING APPARATUS AND A SUBSTRATE PROCESSING METHOD USING THE SAME [patent_app_type] => utility [patent_app_number] => 18/640332 [patent_app_country] => US [patent_app_date] => 2024-04-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4944 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18640332 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20297810 [patent_doc_number] => 20250323053 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-10-16 [patent_title] => CONTROLLED ETCH OF SILICON NITRIDE MATERIAL [patent_app_type] => utility [patent_app_number] => 18/636684 [patent_app_country] => US [patent_app_date] => 2024-04-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3765 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18636684 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20291249 [patent_doc_number] => 20250316492 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-10-09 [patent_title] => METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE [patent_app_type] => utility [patent_app_number] => 18/626373 [patent_app_country] => US [patent_app_date] => 2024-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 0 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18626373 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19479633 [patent_doc_number] => 20240327675 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-10-03 [patent_title] => POLISHING COMPOSITIONS AND METHODS OF USE THEREOF [patent_app_type] => utility [patent_app_number] => 18/616347 [patent_app_country] => US [patent_app_date] => 2024-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7778 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -23 [patent_words_short_claim] => 44 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18616347 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19631608 [patent_doc_number] => 20240410057 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-12-12 [patent_title] => SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 18/615556 [patent_app_country] => US [patent_app_date] => 2024-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5397 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18615556 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19467886 [patent_doc_number] => 20240321556 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-09-26 [patent_title] => ETCHING METHOD AND PLASMA PROCESSING APPARATUS [patent_app_type] => utility [patent_app_number] => 18/611755 [patent_app_country] => US [patent_app_date] => 2024-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10486 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 138 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18611755 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19464369 [patent_doc_number] => 20240318038 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-09-26 [patent_title] => METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME [patent_app_type] => utility [patent_app_number] => 18/610982 [patent_app_country] => US [patent_app_date] => 2024-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6685 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18610982 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 20251058 [patent_doc_number] => 20250299927 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2025-09-25 [patent_title] => PLASMA ETCH-DEPOSITION PROCESSES AND SYSTEMS [patent_app_type] => utility [patent_app_number] => 18/611370 [patent_app_country] => US [patent_app_date] => 2024-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4535 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18611370 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19449142 [patent_doc_number] => 20240309272 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-09-19 [patent_title] => COMPOSITION AND METHOD FOR SELECTIVELY ETCHING SILICON NITRIDE [patent_app_type] => utility [patent_app_number] => 18/607272 [patent_app_country] => US [patent_app_date] => 2024-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5198 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18607272 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 19464367 [patent_doc_number] => 20240318036 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2024-09-26 [patent_title] => POLISHING COMPOSITION, POLISHING METHOD AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE [patent_app_type] => utility [patent_app_number] => 18/605224 [patent_app_country] => US [patent_app_date] => 2024-03-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9444 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -10 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 18605224 [rel_patent_id] =>[rel_patent_doc_number] =>)