Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 1593586 [patent_doc_number] => 06383693 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern' [patent_app_type] => B1 [patent_app_number] => 09/645082 [patent_app_country] => US [patent_app_date] => 2000-08-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 8 [patent_no_of_words] => 5579 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 242 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383693.pdf [firstpage_image] =>[orig_patent_app_number] => 09645082 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/645082
Method of forming a photomask utilizing electron beam dosage compensation method employing dummy pattern Aug 23, 2000 Issued
Array ( [id] => 4378782 [patent_doc_number] => 06261751 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-17 [patent_title] => 'Low temperature anti-reflective coating for IC lithography' [patent_app_type] => 1 [patent_app_number] => 9/642956 [patent_app_country] => US [patent_app_date] => 2000-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4996 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/261/06261751.pdf [firstpage_image] =>[orig_patent_app_number] => 642956 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/642956
Low temperature anti-reflective coating for IC lithography Aug 20, 2000 Issued
Array ( [id] => 4402600 [patent_doc_number] => 06270939 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-07 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => 1 [patent_app_number] => 9/638955 [patent_app_country] => US [patent_app_date] => 2000-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6396 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/270/06270939.pdf [firstpage_image] =>[orig_patent_app_number] => 638955 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/638955
Radiation-sensitive resin composition Aug 15, 2000 Issued
Array ( [id] => 1458316 [patent_doc_number] => 06426168 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-07-30 [patent_title] => 'Method of inspecting photo masks' [patent_app_type] => B1 [patent_app_number] => 09/638583 [patent_app_country] => US [patent_app_date] => 2000-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 2515 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/426/06426168.pdf [firstpage_image] =>[orig_patent_app_number] => 09638583 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/638583
Method of inspecting photo masks Aug 14, 2000 Issued
Array ( [id] => 1390534 [patent_doc_number] => 06541169 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-04-01 [patent_title] => 'Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same' [patent_app_type] => B1 [patent_app_number] => 09/638200 [patent_app_country] => US [patent_app_date] => 2000-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 11526 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/541/06541169.pdf [firstpage_image] =>[orig_patent_app_number] => 09638200 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/638200
Methods for charged-particle-beam microlithography including correction of deflection aberrations, and device-manufacturing methods comprising same Aug 10, 2000 Issued
Array ( [id] => 7636804 [patent_doc_number] => 06379851 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-30 [patent_title] => 'Methods to predict and correct resist heating during lithography' [patent_app_type] => B1 [patent_app_number] => 09/629078 [patent_app_country] => US [patent_app_date] => 2000-07-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 12511 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 11 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/379/06379851.pdf [firstpage_image] =>[orig_patent_app_number] => 09629078 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/629078
Methods to predict and correct resist heating during lithography Jul 30, 2000 Issued
Array ( [id] => 1406543 [patent_doc_number] => 06528219 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2003-03-04 [patent_title] => 'Dynamic alignment scheme for a photolithography system' [patent_app_type] => B1 [patent_app_number] => 09/627205 [patent_app_country] => US [patent_app_date] => 2000-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 13 [patent_no_of_words] => 4398 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/528/06528219.pdf [firstpage_image] =>[orig_patent_app_number] => 09627205 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/627205
Dynamic alignment scheme for a photolithography system Jul 26, 2000 Issued
Array ( [id] => 4406394 [patent_doc_number] => 06265121 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-24 [patent_title] => 'Method of optical proximity correction' [patent_app_type] => 1 [patent_app_number] => 9/619966 [patent_app_country] => US [patent_app_date] => 2000-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 1904 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/265/06265121.pdf [firstpage_image] =>[orig_patent_app_number] => 619966 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/619966
Method of optical proximity correction Jul 19, 2000 Issued
Array ( [id] => 1564606 [patent_doc_number] => 06338925 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-15 [patent_title] => 'Photolithography processing based on fresh calibration parameter values' [patent_app_type] => B1 [patent_app_number] => 09/617819 [patent_app_country] => US [patent_app_date] => 2000-07-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 5241 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 196 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/338/06338925.pdf [firstpage_image] =>[orig_patent_app_number] => 09617819 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/617819
Photolithography processing based on fresh calibration parameter values Jul 16, 2000 Issued
09/612495 Method and apparatus for exposure, and device manufacturing method Jul 6, 2000 Abandoned
Array ( [id] => 4341128 [patent_doc_number] => 06284415 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-04 [patent_title] => 'Charged-particle-beam transfer masks and methods of making' [patent_app_type] => 1 [patent_app_number] => 9/611202 [patent_app_country] => US [patent_app_date] => 2000-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 16 [patent_no_of_words] => 4947 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/284/06284415.pdf [firstpage_image] =>[orig_patent_app_number] => 611202 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/611202
Charged-particle-beam transfer masks and methods of making Jul 5, 2000 Issued
Array ( [id] => 1506736 [patent_doc_number] => 06440637 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Electron beam lithography method forming nanocrystal shadowmasks and nanometer etch masks' [patent_app_type] => B1 [patent_app_number] => 09/613051 [patent_app_country] => US [patent_app_date] => 2000-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 4532 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 191 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440637.pdf [firstpage_image] =>[orig_patent_app_number] => 09613051 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/613051
Electron beam lithography method forming nanocrystal shadowmasks and nanometer etch masks Jun 27, 2000 Issued
Array ( [id] => 4378541 [patent_doc_number] => 06277533 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Scanning exposure method' [patent_app_type] => 1 [patent_app_number] => 9/599493 [patent_app_country] => US [patent_app_date] => 2000-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 39 [patent_no_of_words] => 26623 [patent_no_of_claims] => 83 [patent_no_of_ind_claims] => 23 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277533.pdf [firstpage_image] =>[orig_patent_app_number] => 599493 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/599493
Scanning exposure method Jun 21, 2000 Issued
Array ( [id] => 1569919 [patent_doc_number] => 06497982 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-12-24 [patent_title] => 'Method for suppressing optical proximity effect bias within a wafer' [patent_app_type] => B1 [patent_app_number] => 09/598828 [patent_app_country] => US [patent_app_date] => 2000-06-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1287 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/497/06497982.pdf [firstpage_image] =>[orig_patent_app_number] => 09598828 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/598828
Method for suppressing optical proximity effect bias within a wafer Jun 20, 2000 Issued
Array ( [id] => 4324629 [patent_doc_number] => 06319643 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Conductive photoresist pattern for long term calibration of scanning electron microscope' [patent_app_type] => 1 [patent_app_number] => 9/596680 [patent_app_country] => US [patent_app_date] => 2000-06-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 3966 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319643.pdf [firstpage_image] =>[orig_patent_app_number] => 596680 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/596680
Conductive photoresist pattern for long term calibration of scanning electron microscope Jun 18, 2000 Issued
Array ( [id] => 1564798 [patent_doc_number] => 06376137 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-23 [patent_title] => 'Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector' [patent_app_type] => B1 [patent_app_number] => 09/595552 [patent_app_country] => US [patent_app_date] => 2000-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 7143 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 309 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/376/06376137.pdf [firstpage_image] =>[orig_patent_app_number] => 09595552 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/595552
Charged-particle-beam microlithography apparatus and methods including correction of stage-positioning errors using a deflector Jun 14, 2000 Issued
Array ( [id] => 1433266 [patent_doc_number] => 06340556 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-22 [patent_title] => 'Tailoring of linewidth through electron beam post exposure' [patent_app_type] => B1 [patent_app_number] => 09/590065 [patent_app_country] => US [patent_app_date] => 2000-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4896 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 224 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/340/06340556.pdf [firstpage_image] =>[orig_patent_app_number] => 09590065 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/590065
Tailoring of linewidth through electron beam post exposure Jun 7, 2000 Issued
Array ( [id] => 1506658 [patent_doc_number] => 06440619 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-08-27 [patent_title] => 'Method of distortion compensation by irradiation of adaptive lithography membrane masks' [patent_app_type] => B1 [patent_app_number] => 09/578572 [patent_app_country] => US [patent_app_date] => 2000-05-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 10 [patent_no_of_words] => 4562 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/440/06440619.pdf [firstpage_image] =>[orig_patent_app_number] => 09578572 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/578572
Method of distortion compensation by irradiation of adaptive lithography membrane masks May 24, 2000 Issued
Array ( [id] => 1560666 [patent_doc_number] => 06361908 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-26 [patent_title] => 'Layout designing method of a display device' [patent_app_type] => B1 [patent_app_number] => 09/572945 [patent_app_country] => US [patent_app_date] => 2000-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 37 [patent_no_of_words] => 4411 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/361/06361908.pdf [firstpage_image] =>[orig_patent_app_number] => 09572945 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/572945
Layout designing method of a display device May 17, 2000 Issued
Array ( [id] => 4244093 [patent_doc_number] => 06221541 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-24 [patent_title] => 'Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask' [patent_app_type] => 1 [patent_app_number] => 9/570936 [patent_app_country] => US [patent_app_date] => 2000-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 8 [patent_no_of_words] => 3592 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/221/06221541.pdf [firstpage_image] =>[orig_patent_app_number] => 570936 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/570936
Device manufacturing method and apparatus utilizing concentric fan-shaped pattern mask May 14, 2000 Issued
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