Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
09/570743 OPTICAL PROXIMITY CORRECTION OF ANGLED PATTERN ON NEGATIVE PHOTORESIST May 12, 2000 Abandoned
09/570744 Method of optical proximity correction May 12, 2000 Abandoned
Array ( [id] => 1446274 [patent_doc_number] => 06368761 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-09 [patent_title] => 'Procedure of alignment for optimal wafer exposure pattern' [patent_app_type] => B1 [patent_app_number] => 09/568323 [patent_app_country] => US [patent_app_date] => 2000-05-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 15 [patent_no_of_words] => 6426 [patent_no_of_claims] => 47 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/368/06368761.pdf [firstpage_image] =>[orig_patent_app_number] => 09568323 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/568323
Procedure of alignment for optimal wafer exposure pattern May 8, 2000 Issued
09/564296 Method of reducing proximity effects in lithographic processes May 2, 2000 Abandoned
Array ( [id] => 1535688 [patent_doc_number] => 06337164 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-08 [patent_title] => 'Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same' [patent_app_type] => B1 [patent_app_number] => 09/559904 [patent_app_country] => US [patent_app_date] => 2000-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 5963 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/337/06337164.pdf [firstpage_image] =>[orig_patent_app_number] => 09559904 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/559904
Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same Apr 25, 2000 Issued
Array ( [id] => 1484456 [patent_doc_number] => 06365302 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-04-02 [patent_title] => 'Pattern for measuring focus of light exposing apparatus and method thereof' [patent_app_type] => B1 [patent_app_number] => 09/551594 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 4068 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/365/06365302.pdf [firstpage_image] =>[orig_patent_app_number] => 09551594 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/551594
Pattern for measuring focus of light exposing apparatus and method thereof Apr 16, 2000 Issued
Array ( [id] => 1560671 [patent_doc_number] => 06361911 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-26 [patent_title] => 'Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system' [patent_app_type] => B1 [patent_app_number] => 09/550268 [patent_app_country] => US [patent_app_date] => 2000-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 4596 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/361/06361911.pdf [firstpage_image] =>[orig_patent_app_number] => 09550268 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/550268
Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure system Apr 16, 2000 Issued
Array ( [id] => 1560651 [patent_doc_number] => 06361903 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-26 [patent_title] => 'Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough' [patent_app_type] => B1 [patent_app_number] => 09/549913 [patent_app_country] => US [patent_app_date] => 2000-04-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 12 [patent_no_of_words] => 3919 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/361/06361903.pdf [firstpage_image] =>[orig_patent_app_number] => 09549913 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/549913
Method for predicting pattern width on semiconductor wafer and method for correcting mask pattern therethrough Apr 13, 2000 Issued
Array ( [id] => 4324559 [patent_doc_number] => 06319638 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-20 [patent_title] => 'Semiconductor device manufacturing method of accurately performing alignment of patterning, mask for exposure' [patent_app_type] => 1 [patent_app_number] => 9/538477 [patent_app_country] => US [patent_app_date] => 2000-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 24 [patent_no_of_words] => 9503 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/319/06319638.pdf [firstpage_image] =>[orig_patent_app_number] => 538477 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/538477
Semiconductor device manufacturing method of accurately performing alignment of patterning, mask for exposure Mar 29, 2000 Issued
Array ( [id] => 1549482 [patent_doc_number] => 06399260 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-04 [patent_title] => 'Pattern exposure method having no uniformity in pattern density or configuration' [patent_app_type] => B1 [patent_app_number] => 09/533821 [patent_app_country] => US [patent_app_date] => 2000-03-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 3414 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 137 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/399/06399260.pdf [firstpage_image] =>[orig_patent_app_number] => 09533821 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/533821
Pattern exposure method having no uniformity in pattern density or configuration Mar 23, 2000 Issued
Array ( [id] => 1549144 [patent_doc_number] => 06346354 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-12 [patent_title] => 'Pattern writing method' [patent_app_type] => B1 [patent_app_number] => 09/533265 [patent_app_country] => US [patent_app_date] => 2000-03-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 31 [patent_no_of_words] => 6824 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/346/06346354.pdf [firstpage_image] =>[orig_patent_app_number] => 09533265 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/533265
Pattern writing method Mar 19, 2000 Issued
Array ( [id] => 4300365 [patent_doc_number] => 06187488 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-13 [patent_title] => 'Pattern estimating method and pattern forming method' [patent_app_type] => 1 [patent_app_number] => 9/527526 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 31 [patent_figures_cnt] => 71 [patent_no_of_words] => 16726 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 183 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/187/06187488.pdf [firstpage_image] =>[orig_patent_app_number] => 527526 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/527526
Pattern estimating method and pattern forming method Mar 15, 2000 Issued
Array ( [id] => 4307813 [patent_doc_number] => 06316164 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-13 [patent_title] => 'Proximity effect correction method through uniform removal of fraction of interior pixels' [patent_app_type] => 1 [patent_app_number] => 9/527062 [patent_app_country] => US [patent_app_date] => 2000-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1738 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/316/06316164.pdf [firstpage_image] =>[orig_patent_app_number] => 527062 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/527062
Proximity effect correction method through uniform removal of fraction of interior pixels Mar 15, 2000 Issued
Array ( [id] => 1462032 [patent_doc_number] => 06350548 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-02-26 [patent_title] => 'Nested overlay measurement target' [patent_app_type] => B1 [patent_app_number] => 09/526661 [patent_app_country] => US [patent_app_date] => 2000-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 14 [patent_no_of_words] => 2316 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/350/06350548.pdf [firstpage_image] =>[orig_patent_app_number] => 09526661 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/526661
Nested overlay measurement target Mar 14, 2000 Issued
Array ( [id] => 1493736 [patent_doc_number] => 06342323 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-29 [patent_title] => 'Alignment methodology for lithography' [patent_app_type] => B1 [patent_app_number] => 09/523796 [patent_app_country] => US [patent_app_date] => 2000-03-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 2117 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/342/06342323.pdf [firstpage_image] =>[orig_patent_app_number] => 09523796 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/523796
Alignment methodology for lithography Mar 12, 2000 Issued
Array ( [id] => 1449435 [patent_doc_number] => 06455214 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-09-24 [patent_title] => 'Scanning exposure method detecting focus during relative movement between energy beam and substrate' [patent_app_type] => B1 [patent_app_number] => 09/523293 [patent_app_country] => US [patent_app_date] => 2000-03-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 30 [patent_no_of_words] => 22436 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/455/06455214.pdf [firstpage_image] =>[orig_patent_app_number] => 09523293 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/523293
Scanning exposure method detecting focus during relative movement between energy beam and substrate Mar 9, 2000 Issued
Array ( [id] => 4165999 [patent_doc_number] => 06139995 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-31 [patent_title] => 'Method of manufacturing schottky gate transistor utilizing alignment techniques with multiple photoresist layers' [patent_app_type] => 1 [patent_app_number] => 9/523210 [patent_app_country] => US [patent_app_date] => 2000-03-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 3622 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 313 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/139/06139995.pdf [firstpage_image] =>[orig_patent_app_number] => 523210 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/523210
Method of manufacturing schottky gate transistor utilizing alignment techniques with multiple photoresist layers Mar 9, 2000 Issued
Array ( [id] => 4334858 [patent_doc_number] => 06333138 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-25 [patent_title] => 'Exposure method utilizing partial exposure stitch area' [patent_app_type] => 1 [patent_app_number] => 9/520631 [patent_app_country] => US [patent_app_date] => 2000-03-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 30 [patent_no_of_words] => 9822 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 212 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/333/06333138.pdf [firstpage_image] =>[orig_patent_app_number] => 520631 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/520631
Exposure method utilizing partial exposure stitch area Mar 6, 2000 Issued
Array ( [id] => 1523407 [patent_doc_number] => 06352799 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-05 [patent_title] => 'Charged-particle-beam pattern-transfer methods and apparatus including beam-drift measurement and correction, and device manufacturing methods comprising same' [patent_app_type] => B1 [patent_app_number] => 09/515988 [patent_app_country] => US [patent_app_date] => 2000-03-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 8 [patent_no_of_words] => 7251 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/352/06352799.pdf [firstpage_image] =>[orig_patent_app_number] => 09515988 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/515988
Charged-particle-beam pattern-transfer methods and apparatus including beam-drift measurement and correction, and device manufacturing methods comprising same Feb 29, 2000 Issued
Array ( [id] => 1593598 [patent_doc_number] => 06383697 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-07 [patent_title] => 'Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction' [patent_app_type] => B1 [patent_app_number] => 09/514304 [patent_app_country] => US [patent_app_date] => 2000-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 3035 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/383/06383697.pdf [firstpage_image] =>[orig_patent_app_number] => 09514304 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/514304
Ultra high resolution lithographic imaging and printing and defect reduction by exposure near the critical condition utilizing fresnel diffraction Feb 27, 2000 Issued
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