Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4287360 [patent_doc_number] => 06235437 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-22 [patent_title] => 'Multi-segment global alignment mark' [patent_app_type] => 1 [patent_app_number] => 9/458731 [patent_app_country] => US [patent_app_date] => 1999-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1481 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/235/06235437.pdf [firstpage_image] =>[orig_patent_app_number] => 458731 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/458731
Multi-segment global alignment mark Dec 12, 1999 Issued
Array ( [id] => 4212494 [patent_doc_number] => 06087049 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-07-11 [patent_title] => 'Mixed mode photomask for optical proximity correction in a lithographic process' [patent_app_type] => 1 [patent_app_number] => 9/457119 [patent_app_country] => US [patent_app_date] => 1999-12-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1826 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/087/06087049.pdf [firstpage_image] =>[orig_patent_app_number] => 457119 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/457119
Mixed mode photomask for optical proximity correction in a lithographic process Dec 6, 1999 Issued
Array ( [id] => 4357257 [patent_doc_number] => 06168891 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-02 [patent_title] => 'Method for correcting mask pattern for use in manufacturing of semiconductor integrated circuit' [patent_app_type] => 1 [patent_app_number] => 9/449569 [patent_app_country] => US [patent_app_date] => 1999-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 8477 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/168/06168891.pdf [firstpage_image] =>[orig_patent_app_number] => 449569 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/449569
Method for correcting mask pattern for use in manufacturing of semiconductor integrated circuit Nov 28, 1999 Issued
09/447542 METHOD OF DETECTING ABERRATIONS OF AN OPTICAL IMAGING SYSTEM Nov 22, 1999 Abandoned
Array ( [id] => 4236519 [patent_doc_number] => 06080527 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-06-27 [patent_title] => 'Optical proximity correction of L and T shaped patterns on negative photoresist' [patent_app_type] => 1 [patent_app_number] => 9/442861 [patent_app_country] => US [patent_app_date] => 1999-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3490 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/080/06080527.pdf [firstpage_image] =>[orig_patent_app_number] => 442861 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/442861
Optical proximity correction of L and T shaped patterns on negative photoresist Nov 17, 1999 Issued
Array ( [id] => 4354846 [patent_doc_number] => 06174633 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Method for correcting photocontiguous effect during manufacture of semiconductor device' [patent_app_type] => 1 [patent_app_number] => 9/441487 [patent_app_country] => US [patent_app_date] => 1999-11-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2728 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174633.pdf [firstpage_image] =>[orig_patent_app_number] => 441487 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/441487
Method for correcting photocontiguous effect during manufacture of semiconductor device Nov 16, 1999 Issued
Array ( [id] => 4082340 [patent_doc_number] => 06162588 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Resist pattern forming method using anti-reflective layer and method of etching using resist pattern' [patent_app_type] => 1 [patent_app_number] => 9/440111 [patent_app_country] => US [patent_app_date] => 1999-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18946 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162588.pdf [firstpage_image] =>[orig_patent_app_number] => 440111 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/440111
Resist pattern forming method using anti-reflective layer and method of etching using resist pattern Nov 14, 1999 Issued
Array ( [id] => 4272666 [patent_doc_number] => 06280906 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-28 [patent_title] => 'Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method' [patent_app_type] => 1 [patent_app_number] => 9/440593 [patent_app_country] => US [patent_app_date] => 1999-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 4716 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/280/06280906.pdf [firstpage_image] =>[orig_patent_app_number] => 440593 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/440593
Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method Nov 14, 1999 Issued
Array ( [id] => 4287415 [patent_doc_number] => 06235440 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-22 [patent_title] => 'Method to control gate CD' [patent_app_type] => 1 [patent_app_number] => 9/434563 [patent_app_country] => US [patent_app_date] => 1999-11-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 2649 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/235/06235440.pdf [firstpage_image] =>[orig_patent_app_number] => 434563 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/434563
Method to control gate CD Nov 11, 1999 Issued
Array ( [id] => 4415264 [patent_doc_number] => 06194105 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-27 [patent_title] => 'Method of forming reticle from larger size reticle information' [patent_app_type] => 1 [patent_app_number] => 9/434543 [patent_app_country] => US [patent_app_date] => 1999-11-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 47 [patent_no_of_words] => 11442 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/194/06194105.pdf [firstpage_image] =>[orig_patent_app_number] => 434543 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/434543
Method of forming reticle from larger size reticle information Nov 4, 1999 Issued
Array ( [id] => 4289368 [patent_doc_number] => 06180296 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-30 [patent_title] => 'Focused particle beam processing for use in electronic apparatus manufacturing' [patent_app_type] => 1 [patent_app_number] => 9/429060 [patent_app_country] => US [patent_app_date] => 1999-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 3357 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/180/06180296.pdf [firstpage_image] =>[orig_patent_app_number] => 429060 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/429060
Focused particle beam processing for use in electronic apparatus manufacturing Oct 28, 1999 Issued
Array ( [id] => 4405404 [patent_doc_number] => 06238830 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-29 [patent_title] => 'Active control of temperature in scanning probe lithography and maskless lithograpy' [patent_app_type] => 1 [patent_app_number] => 9/429994 [patent_app_country] => US [patent_app_date] => 1999-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 6273 [patent_no_of_claims] => 37 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/238/06238830.pdf [firstpage_image] =>[orig_patent_app_number] => 429994 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/429994
Active control of temperature in scanning probe lithography and maskless lithograpy Oct 28, 1999 Issued
Array ( [id] => 4234815 [patent_doc_number] => 06090528 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-07-18 [patent_title] => 'Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge' [patent_app_type] => 1 [patent_app_number] => 9/428601 [patent_app_country] => US [patent_app_date] => 1999-10-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 2929 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 76 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/090/06090528.pdf [firstpage_image] =>[orig_patent_app_number] => 428601 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/428601
Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge Oct 26, 1999 Issued
Array ( [id] => 4392686 [patent_doc_number] => 06296975 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-02 [patent_title] => 'Photo mask of semiconductor device and method for manufacturing the same' [patent_app_type] => 1 [patent_app_number] => 9/426762 [patent_app_country] => US [patent_app_date] => 1999-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 4735 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/296/06296975.pdf [firstpage_image] =>[orig_patent_app_number] => 426762 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/426762
Photo mask of semiconductor device and method for manufacturing the same Oct 25, 1999 Issued
Array ( [id] => 4378523 [patent_doc_number] => 06277532 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Charged-particle-beam microlithographic methods for correction of reticle distortions' [patent_app_type] => 1 [patent_app_number] => 9/418117 [patent_app_country] => US [patent_app_date] => 1999-10-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 6909 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 283 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277532.pdf [firstpage_image] =>[orig_patent_app_number] => 418117 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/418117
Charged-particle-beam microlithographic methods for correction of reticle distortions Oct 13, 1999 Issued
Array ( [id] => 4256449 [patent_doc_number] => 06258511 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Charged particle beam exposure method utilizing partial exposure stitch area' [patent_app_type] => 1 [patent_app_number] => 9/417856 [patent_app_country] => US [patent_app_date] => 1999-10-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 4158 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258511.pdf [firstpage_image] =>[orig_patent_app_number] => 417856 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/417856
Charged particle beam exposure method utilizing partial exposure stitch area Oct 13, 1999 Issued
Array ( [id] => 4284081 [patent_doc_number] => 06268093 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-31 [patent_title] => 'Method for reticle inspection using aerial imaging' [patent_app_type] => 1 [patent_app_number] => 9/417518 [patent_app_country] => US [patent_app_date] => 1999-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 6852 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/268/06268093.pdf [firstpage_image] =>[orig_patent_app_number] => 417518 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/417518
Method for reticle inspection using aerial imaging Oct 12, 1999 Issued
Array ( [id] => 4406042 [patent_doc_number] => 06300019 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-09 [patent_title] => 'Pellicle' [patent_app_type] => 1 [patent_app_number] => 9/417692 [patent_app_country] => US [patent_app_date] => 1999-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 26 [patent_no_of_words] => 5708 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/300/06300019.pdf [firstpage_image] =>[orig_patent_app_number] => 417692 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/417692
Pellicle Oct 12, 1999 Issued
Array ( [id] => 4378511 [patent_doc_number] => 06277531 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Charged-particle-beam microlithography apparatus and methods including focal-point correction' [patent_app_type] => 1 [patent_app_number] => 9/417965 [patent_app_country] => US [patent_app_date] => 1999-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 5394 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 171 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277531.pdf [firstpage_image] =>[orig_patent_app_number] => 417965 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/417965
Charged-particle-beam microlithography apparatus and methods including focal-point correction Oct 12, 1999 Issued
Array ( [id] => 4378497 [patent_doc_number] => 06277530 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Method for making partial full-wafer pattern for charged particle beam lithography' [patent_app_type] => 1 [patent_app_number] => 9/417099 [patent_app_country] => US [patent_app_date] => 1999-10-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 10 [patent_no_of_words] => 4360 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277530.pdf [firstpage_image] =>[orig_patent_app_number] => 417099 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/417099
Method for making partial full-wafer pattern for charged particle beam lithography Oct 12, 1999 Issued
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