
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4287360
[patent_doc_number] => 06235437
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-22
[patent_title] => 'Multi-segment global alignment mark'
[patent_app_type] => 1
[patent_app_number] => 9/458731
[patent_app_country] => US
[patent_app_date] => 1999-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 1481
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[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/235/06235437.pdf
[firstpage_image] =>[orig_patent_app_number] => 458731
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/458731 | Multi-segment global alignment mark | Dec 12, 1999 | Issued |
Array
(
[id] => 4212494
[patent_doc_number] => 06087049
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-07-11
[patent_title] => 'Mixed mode photomask for optical proximity correction in a lithographic process'
[patent_app_type] => 1
[patent_app_number] => 9/457119
[patent_app_country] => US
[patent_app_date] => 1999-12-07
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/087/06087049.pdf
[firstpage_image] =>[orig_patent_app_number] => 457119
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/457119 | Mixed mode photomask for optical proximity correction in a lithographic process | Dec 6, 1999 | Issued |
Array
(
[id] => 4357257
[patent_doc_number] => 06168891
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-02
[patent_title] => 'Method for correcting mask pattern for use in manufacturing of semiconductor integrated circuit'
[patent_app_type] => 1
[patent_app_number] => 9/449569
[patent_app_country] => US
[patent_app_date] => 1999-11-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
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[pdf_file] => patents/06/168/06168891.pdf
[firstpage_image] =>[orig_patent_app_number] => 449569
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/449569 | Method for correcting mask pattern for use in manufacturing of semiconductor integrated circuit | Nov 28, 1999 | Issued |
| 09/447542 | METHOD OF DETECTING ABERRATIONS OF AN OPTICAL IMAGING SYSTEM | Nov 22, 1999 | Abandoned |
Array
(
[id] => 4236519
[patent_doc_number] => 06080527
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-27
[patent_title] => 'Optical proximity correction of L and T shaped patterns on negative photoresist'
[patent_app_type] => 1
[patent_app_number] => 9/442861
[patent_app_country] => US
[patent_app_date] => 1999-11-18
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 442861
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/442861 | Optical proximity correction of L and T shaped patterns on negative photoresist | Nov 17, 1999 | Issued |
Array
(
[id] => 4354846
[patent_doc_number] => 06174633
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[patent_kind] => NA
[patent_issue_date] => 2001-01-16
[patent_title] => 'Method for correcting photocontiguous effect during manufacture of semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 9/441487
[patent_app_country] => US
[patent_app_date] => 1999-11-17
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/441487 | Method for correcting photocontiguous effect during manufacture of semiconductor device | Nov 16, 1999 | Issued |
Array
(
[id] => 4082340
[patent_doc_number] => 06162588
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-19
[patent_title] => 'Resist pattern forming method using anti-reflective layer and method of etching using resist pattern'
[patent_app_type] => 1
[patent_app_number] => 9/440111
[patent_app_country] => US
[patent_app_date] => 1999-11-15
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/06/162/06162588.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/440111 | Resist pattern forming method using anti-reflective layer and method of etching using resist pattern | Nov 14, 1999 | Issued |
Array
(
[id] => 4272666
[patent_doc_number] => 06280906
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-28
[patent_title] => 'Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method'
[patent_app_type] => 1
[patent_app_number] => 9/440593
[patent_app_country] => US
[patent_app_date] => 1999-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 4716
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[pdf_file] => patents/06/280/06280906.pdf
[firstpage_image] =>[orig_patent_app_number] => 440593
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/440593 | Method of imaging a mask pattern on a substrate by means of EUV radiation, and apparatus and mask for performing the method | Nov 14, 1999 | Issued |
Array
(
[id] => 4287415
[patent_doc_number] => 06235440
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-22
[patent_title] => 'Method to control gate CD'
[patent_app_type] => 1
[patent_app_number] => 9/434563
[patent_app_country] => US
[patent_app_date] => 1999-11-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
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[patent_no_of_words] => 2649
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[firstpage_image] =>[orig_patent_app_number] => 434563
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/434563 | Method to control gate CD | Nov 11, 1999 | Issued |
Array
(
[id] => 4415264
[patent_doc_number] => 06194105
[patent_country] => US
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[patent_issue_date] => 2001-02-27
[patent_title] => 'Method of forming reticle from larger size reticle information'
[patent_app_type] => 1
[patent_app_number] => 9/434543
[patent_app_country] => US
[patent_app_date] => 1999-11-05
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[firstpage_image] =>[orig_patent_app_number] => 434543
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/434543 | Method of forming reticle from larger size reticle information | Nov 4, 1999 | Issued |
Array
(
[id] => 4289368
[patent_doc_number] => 06180296
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[patent_kind] => NA
[patent_issue_date] => 2001-01-30
[patent_title] => 'Focused particle beam processing for use in electronic apparatus manufacturing'
[patent_app_type] => 1
[patent_app_number] => 9/429060
[patent_app_country] => US
[patent_app_date] => 1999-10-29
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Array
(
[id] => 4405404
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[patent_kind] => NA
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[patent_title] => 'Active control of temperature in scanning probe lithography and maskless lithograpy'
[patent_app_type] => 1
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[patent_app_date] => 1999-10-29
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Array
(
[id] => 4234815
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[patent_title] => 'Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge'
[patent_app_type] => 1
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/428601 | Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge | Oct 26, 1999 | Issued |
Array
(
[id] => 4392686
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[patent_title] => 'Photo mask of semiconductor device and method for manufacturing the same'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/426762 | Photo mask of semiconductor device and method for manufacturing the same | Oct 25, 1999 | Issued |
Array
(
[id] => 4378523
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[patent_issue_date] => 2001-08-21
[patent_title] => 'Charged-particle-beam microlithographic methods for correction of reticle distortions'
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Array
(
[id] => 4256449
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[patent_title] => 'Charged particle beam exposure method utilizing partial exposure stitch area'
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Array
(
[id] => 4284081
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[patent_title] => 'Method for reticle inspection using aerial imaging'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/417518 | Method for reticle inspection using aerial imaging | Oct 12, 1999 | Issued |
Array
(
[id] => 4406042
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Array
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Array
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