Christopher G. Young

Array ( [id] => 4320143 [patent_doc_number] => 06331369 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-12-18 [patent_title] => 'Exposure methods for overlaying one mask pattern on another' [patent_app_type] => 1 [patent_app_number] => 9/415500 [patent_app_country] => US [patent_app_date] => 1999-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 28 [patent_figures_cnt] => 79 [patent_no_of_words] => 38484 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/331/06331369.pdf [firstpage_image] =>[orig_patent_app_number] => 415500 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4406724 [patent_doc_number] => 06228554 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-08 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => 1 [patent_app_number] => 9/414724 [patent_app_country] => US [patent_app_date] => 1999-10-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6427 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/228/06228554.pdf [firstpage_image] =>[orig_patent_app_number] => 414724 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1435745 [patent_doc_number] => 06355388 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-03-12 [patent_title] => 'Method for controlling photoresist strip processes' [patent_app_type] => B1 [patent_app_number] => 09/414274 [patent_app_country] => US [patent_app_date] => 1999-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 2334 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/355/06355388.pdf [firstpage_image] =>[orig_patent_app_number] => 09414274 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4316400 [patent_doc_number] => 06248486 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-19 [patent_title] => 'Method of detecting aberrations of an optical imaging system' [patent_app_type] => 1 [patent_app_number] => 9/407532 [patent_app_country] => US [patent_app_date] => 1999-09-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 28 [patent_no_of_words] => 11062 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/248/06248486.pdf [firstpage_image] =>[orig_patent_app_number] => 407532 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1458507 [patent_doc_number] => 06391502 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-05-21 [patent_title] => 'Photolithographic process for producing etched patterns on the surface of fine tubes, wires or other three dimensional structures' [patent_app_type] => B1 [patent_app_number] => 09/401634 [patent_app_country] => US [patent_app_date] => 1999-09-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 29 [patent_no_of_words] => 4894 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/391/06391502.pdf [firstpage_image] =>[orig_patent_app_number] => 09401634 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 1535684 [patent_doc_number] => 06337163 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-08 [patent_title] => 'Method of forming a pattern by making use of hybrid exposure' [patent_app_type] => B1 [patent_app_number] => 09/400280 [patent_app_country] => US [patent_app_date] => 1999-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 27 [patent_no_of_words] => 12679 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/337/06337163.pdf [firstpage_image] =>[orig_patent_app_number] => 09400280 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4406033 [patent_doc_number] => 06300018 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-09 [patent_title] => 'Photolithography mask having a subresolution alignment mark window' [patent_app_type] => 1 [patent_app_number] => 9/399884 [patent_app_country] => US [patent_app_date] => 1999-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 1888 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/300/06300018.pdf [firstpage_image] =>[orig_patent_app_number] => 399884 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4092200 [patent_doc_number] => 06096462 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-01 [patent_title] => 'Charged-particle-beam-projection-microlithography transfer methods with coulomb effect correction' [patent_app_type] => 1 [patent_app_number] => 9/394854 [patent_app_country] => US [patent_app_date] => 1999-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 4674 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 283 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/096/06096462.pdf [firstpage_image] =>[orig_patent_app_number] => 394854 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4256229 [patent_doc_number] => 06258495 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-07-10 [patent_title] => 'Process for aligning work and mask' [patent_app_type] => 1 [patent_app_number] => 9/394041 [patent_app_country] => US [patent_app_date] => 1999-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 36 [patent_no_of_words] => 12023 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 199 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/258/06258495.pdf [firstpage_image] =>[orig_patent_app_number] => 394041 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4212812 [patent_doc_number] => 06087071 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-07-11 [patent_title] => 'Process for increasing thermostability of a resist through electron beam exposure' [patent_app_type] => 1 [patent_app_number] => 9/394346 [patent_app_country] => US [patent_app_date] => 1999-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 4703 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 106 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/087/06087071.pdf [firstpage_image] =>[orig_patent_app_number] => 394346 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4406602 [patent_doc_number] => 06228544 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-08 [patent_title] => 'Exposure method utilizing pre-exposure reduction of substrate temperature' [patent_app_type] => 1 [patent_app_number] => 9/388607 [patent_app_country] => US [patent_app_date] => 1999-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 5381 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 85 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/228/06228544.pdf [firstpage_image] =>[orig_patent_app_number] => 388607 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4151090 [patent_doc_number] => 06107011 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-22 [patent_title] => 'Method of high resolution optical scanning utilizing primary and secondary masks' [patent_app_type] => 1 [patent_app_number] => 9/390582 [patent_app_country] => US [patent_app_date] => 1999-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 7797 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/107/06107011.pdf [firstpage_image] =>[orig_patent_app_number] => 390582 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4100456 [patent_doc_number] => 06051349 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-04-18 [patent_title] => 'Apparatus for coating resist and developing the coated resist' [patent_app_type] => 1 [patent_app_number] => 9/386459 [patent_app_country] => US [patent_app_date] => 1999-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 21 [patent_no_of_words] => 9632 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 251 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/051/06051349.pdf [firstpage_image] =>[orig_patent_app_number] => 386459 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4100442 [patent_doc_number] => 06051348 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-04-18 [patent_title] => 'Method for detecting malfunction in photolithographic fabrication track' [patent_app_type] => 1 [patent_app_number] => 9/375793 [patent_app_country] => US [patent_app_date] => 1999-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2781 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/051/06051348.pdf [firstpage_image] =>[orig_patent_app_number] => 375793 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4283301 [patent_doc_number] => 06210846 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-03 [patent_title] => 'Exposure during rework for enhanced resist removal' [patent_app_type] => 1 [patent_app_number] => 9/373571 [patent_app_country] => US [patent_app_date] => 1999-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 2867 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/210/06210846.pdf [firstpage_image] =>[orig_patent_app_number] => 373571 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4082029 [patent_doc_number] => 06162567 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-19 [patent_title] => 'Process for producing halftone mask' [patent_app_type] => 1 [patent_app_number] => 9/372089 [patent_app_country] => US [patent_app_date] => 1999-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 14 [patent_no_of_words] => 3648 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/162/06162567.pdf [firstpage_image] =>[orig_patent_app_number] => 372089 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4374441 [patent_doc_number] => 06303251 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Mask pattern correction process, photomask and semiconductor integrated circuit device' [patent_app_type] => 1 [patent_app_number] => 9/360989 [patent_app_country] => US [patent_app_date] => 1999-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 30 [patent_no_of_words] => 8777 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 192 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303251.pdf [firstpage_image] =>[orig_patent_app_number] => 360989 [rel_patent_id] =>[rel_patent_doc_number] =>)