| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 4316387
[patent_doc_number] => 06248485
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-19
[patent_title] => 'Method for controlling a process for patterning a feature in a photoresist'
[patent_app_type] => 1
[patent_app_number] => 9/356638
[patent_app_country] => US
[patent_app_date] => 1999-07-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 5274
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/248/06248485.pdf
[firstpage_image] =>[orig_patent_app_number] => 356638
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/356638 | Method for controlling a process for patterning a feature in a photoresist | Jul 18, 1999 | Issued |
Array
(
[id] => 4291407
[patent_doc_number] => 06183920
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-06
[patent_title] => 'Semiconductor device geometrical pattern correction process and geometrical pattern extraction process'
[patent_app_type] => 1
[patent_app_number] => 9/348316
[patent_app_country] => US
[patent_app_date] => 1999-07-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 24
[patent_no_of_words] => 4508
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 69
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/183/06183920.pdf
[firstpage_image] =>[orig_patent_app_number] => 348316
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/348316 | Semiconductor device geometrical pattern correction process and geometrical pattern extraction process | Jul 6, 1999 | Issued |
Array
(
[id] => 4114789
[patent_doc_number] => 06071656
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-06-06
[patent_title] => 'Photolithography technique utilizing alignment marks at scribe line intersections'
[patent_app_type] => 1
[patent_app_number] => 9/349209
[patent_app_country] => US
[patent_app_date] => 1999-07-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 3357
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 149
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/071/06071656.pdf
[firstpage_image] =>[orig_patent_app_number] => 349209
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/349209 | Photolithography technique utilizing alignment marks at scribe line intersections | Jul 6, 1999 | Issued |
Array
(
[id] => 4232222
[patent_doc_number] => 06165658
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Nonlinear image distortion correction in printed circuit board manufacturing'
[patent_app_type] => 1
[patent_app_number] => 9/347775
[patent_app_country] => US
[patent_app_date] => 1999-07-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 10988
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 217
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/165/06165658.pdf
[firstpage_image] =>[orig_patent_app_number] => 347775
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/347775 | Nonlinear image distortion correction in printed circuit board manufacturing | Jul 5, 1999 | Issued |
Array
(
[id] => 4403850
[patent_doc_number] => 06171760
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-09
[patent_title] => 'Lithographic method utilizing charged particle beam exposure and fluorescent film'
[patent_app_type] => 1
[patent_app_number] => 9/345447
[patent_app_country] => US
[patent_app_date] => 1999-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 7
[patent_no_of_words] => 4905
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/171/06171760.pdf
[firstpage_image] =>[orig_patent_app_number] => 345447
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/345447 | Lithographic method utilizing charged particle beam exposure and fluorescent film | Jun 30, 1999 | Issued |
Array
(
[id] => 4406086
[patent_doc_number] => 06300023
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-09
[patent_title] => 'Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same'
[patent_app_type] => 1
[patent_app_number] => 9/346259
[patent_app_country] => US
[patent_app_date] => 1999-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 6
[patent_no_of_words] => 6121
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/300/06300023.pdf
[firstpage_image] =>[orig_patent_app_number] => 346259
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/346259 | Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same | Jun 30, 1999 | Issued |
| 09/345779 | EXPOSURE APPARATUS AND METHOD | Jun 30, 1999 | Abandoned |
Array
(
[id] => 4143431
[patent_doc_number] => 06063529
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-16
[patent_title] => 'Overlay accuracy measurement mark'
[patent_app_type] => 1
[patent_app_number] => 9/346209
[patent_app_country] => US
[patent_app_date] => 1999-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 11
[patent_no_of_words] => 4596
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/063/06063529.pdf
[firstpage_image] =>[orig_patent_app_number] => 346209
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/346209 | Overlay accuracy measurement mark | Jun 30, 1999 | Issued |
Array
(
[id] => 4289292
[patent_doc_number] => 06180293
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-01-30
[patent_title] => 'Mask pattern preparing method and photomask'
[patent_app_type] => 1
[patent_app_number] => 9/340148
[patent_app_country] => US
[patent_app_date] => 1999-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 3736
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 142
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/180/06180293.pdf
[firstpage_image] =>[orig_patent_app_number] => 340148
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/340148 | Mask pattern preparing method and photomask | Jun 27, 1999 | Issued |
Array
(
[id] => 4316372
[patent_doc_number] => 06248484
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-19
[patent_title] => 'Hybrid alignment marks for optimal alignment of three-dimensional layers'
[patent_app_type] => 1
[patent_app_number] => 9/344401
[patent_app_country] => US
[patent_app_date] => 1999-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 10
[patent_no_of_words] => 3226
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/248/06248484.pdf
[firstpage_image] =>[orig_patent_app_number] => 344401
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/344401 | Hybrid alignment marks for optimal alignment of three-dimensional layers | Jun 24, 1999 | Issued |
Array
(
[id] => 1440742
[patent_doc_number] => 06335127
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2002-01-01
[patent_title] => 'Charged beam mask having strut wider than charged beam, with shape that matches charged beam'
[patent_app_type] => B1
[patent_app_number] => 09/339940
[patent_app_country] => US
[patent_app_date] => 1999-06-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 26
[patent_no_of_words] => 6702
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/335/06335127.pdf
[firstpage_image] =>[orig_patent_app_number] => 09339940
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/339940 | Charged beam mask having strut wider than charged beam, with shape that matches charged beam | Jun 24, 1999 | Issued |
Array
(
[id] => 4122433
[patent_doc_number] => 06127071
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-03
[patent_title] => 'Serif mask design for correcting severe corner rounding and line end shortening in lithography'
[patent_app_type] => 1
[patent_app_number] => 9/338244
[patent_app_country] => US
[patent_app_date] => 1999-06-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 17
[patent_no_of_words] => 5353
[patent_no_of_claims] => 27
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/127/06127071.pdf
[firstpage_image] =>[orig_patent_app_number] => 338244
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/338244 | Serif mask design for correcting severe corner rounding and line end shortening in lithography | Jun 21, 1999 | Issued |
Array
(
[id] => 4298917
[patent_doc_number] => 06251544
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-26
[patent_title] => 'Exposure dose measuring method and exposure dose measuring mask'
[patent_app_type] => 1
[patent_app_number] => 9/334941
[patent_app_country] => US
[patent_app_date] => 1999-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 48
[patent_no_of_words] => 7666
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 166
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/251/06251544.pdf
[firstpage_image] =>[orig_patent_app_number] => 334941
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/334941 | Exposure dose measuring method and exposure dose measuring mask | Jun 16, 1999 | Issued |
Array
(
[id] => 4153393
[patent_doc_number] => 06114093
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-05
[patent_title] => 'Method of drawing a pattern by direct writing with charged particle beam utilizing resist containing metal powder'
[patent_app_type] => 1
[patent_app_number] => 9/335343
[patent_app_country] => US
[patent_app_date] => 1999-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 8
[patent_no_of_words] => 2600
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 63
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/114/06114093.pdf
[firstpage_image] =>[orig_patent_app_number] => 335343
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/335343 | Method of drawing a pattern by direct writing with charged particle beam utilizing resist containing metal powder | Jun 16, 1999 | Issued |
Array
(
[id] => 4392700
[patent_doc_number] => 06296976
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-10-02
[patent_title] => 'Compensation of within-subfield linewidth variation in e-beam projection lithography'
[patent_app_type] => 1
[patent_app_number] => 9/333931
[patent_app_country] => US
[patent_app_date] => 1999-06-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 5540
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 53
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/296/06296976.pdf
[firstpage_image] =>[orig_patent_app_number] => 333931
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/333931 | Compensation of within-subfield linewidth variation in e-beam projection lithography | Jun 15, 1999 | Issued |
| 09/333985 | EXPOSURE METHOD UTILIZING ALIGNMENT AND OFFSET COMPENSATION | Jun 15, 1999 | Abandoned |
Array
(
[id] => 4298902
[patent_doc_number] => 06251543
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-06-26
[patent_title] => 'Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein'
[patent_app_type] => 1
[patent_app_number] => 9/332061
[patent_app_country] => US
[patent_app_date] => 1999-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 2859
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/251/06251543.pdf
[firstpage_image] =>[orig_patent_app_number] => 332061
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/332061 | Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein | Jun 13, 1999 | Issued |
Array
(
[id] => 4291395
[patent_doc_number] => 06183919
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-02-06
[patent_title] => 'Darkfield imaging for enhancing optical detection of edges and minimum features'
[patent_app_type] => 1
[patent_app_number] => 9/330656
[patent_app_country] => US
[patent_app_date] => 1999-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 11
[patent_no_of_words] => 4755
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/183/06183919.pdf
[firstpage_image] =>[orig_patent_app_number] => 330656
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/330656 | Darkfield imaging for enhancing optical detection of edges and minimum features | Jun 10, 1999 | Issued |
Array
(
[id] => 4230718
[patent_doc_number] => 06117601
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-12
[patent_title] => 'Method of determining and correcting processing state of photosensitive material based on mahalanobis calculation'
[patent_app_type] => 1
[patent_app_number] => 9/328592
[patent_app_country] => US
[patent_app_date] => 1999-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 18
[patent_no_of_words] => 16451
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 56
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/117/06117601.pdf
[firstpage_image] =>[orig_patent_app_number] => 328592
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/328592 | Method of determining and correcting processing state of photosensitive material based on mahalanobis calculation | Jun 9, 1999 | Issued |
Array
(
[id] => 4378682
[patent_doc_number] => 06277542
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-08-21
[patent_title] => 'Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density'
[patent_app_type] => 1
[patent_app_number] => 9/327403
[patent_app_country] => US
[patent_app_date] => 1999-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 5869
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 186
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/277/06277542.pdf
[firstpage_image] =>[orig_patent_app_number] => 327403
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/327403 | Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density | Jun 6, 1999 | Issued |