Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4316387 [patent_doc_number] => 06248485 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-19 [patent_title] => 'Method for controlling a process for patterning a feature in a photoresist' [patent_app_type] => 1 [patent_app_number] => 9/356638 [patent_app_country] => US [patent_app_date] => 1999-07-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 5274 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 94 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/248/06248485.pdf [firstpage_image] =>[orig_patent_app_number] => 356638 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/356638
Method for controlling a process for patterning a feature in a photoresist Jul 18, 1999 Issued
Array ( [id] => 4291407 [patent_doc_number] => 06183920 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-06 [patent_title] => 'Semiconductor device geometrical pattern correction process and geometrical pattern extraction process' [patent_app_type] => 1 [patent_app_number] => 9/348316 [patent_app_country] => US [patent_app_date] => 1999-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 24 [patent_no_of_words] => 4508 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/183/06183920.pdf [firstpage_image] =>[orig_patent_app_number] => 348316 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/348316
Semiconductor device geometrical pattern correction process and geometrical pattern extraction process Jul 6, 1999 Issued
Array ( [id] => 4114789 [patent_doc_number] => 06071656 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-06-06 [patent_title] => 'Photolithography technique utilizing alignment marks at scribe line intersections' [patent_app_type] => 1 [patent_app_number] => 9/349209 [patent_app_country] => US [patent_app_date] => 1999-07-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3357 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 149 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/071/06071656.pdf [firstpage_image] =>[orig_patent_app_number] => 349209 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/349209
Photolithography technique utilizing alignment marks at scribe line intersections Jul 6, 1999 Issued
Array ( [id] => 4232222 [patent_doc_number] => 06165658 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-26 [patent_title] => 'Nonlinear image distortion correction in printed circuit board manufacturing' [patent_app_type] => 1 [patent_app_number] => 9/347775 [patent_app_country] => US [patent_app_date] => 1999-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 10988 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/165/06165658.pdf [firstpage_image] =>[orig_patent_app_number] => 347775 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/347775
Nonlinear image distortion correction in printed circuit board manufacturing Jul 5, 1999 Issued
Array ( [id] => 4403850 [patent_doc_number] => 06171760 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-09 [patent_title] => 'Lithographic method utilizing charged particle beam exposure and fluorescent film' [patent_app_type] => 1 [patent_app_number] => 9/345447 [patent_app_country] => US [patent_app_date] => 1999-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 4905 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/171/06171760.pdf [firstpage_image] =>[orig_patent_app_number] => 345447 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/345447
Lithographic method utilizing charged particle beam exposure and fluorescent film Jun 30, 1999 Issued
Array ( [id] => 4406086 [patent_doc_number] => 06300023 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-09 [patent_title] => 'Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same' [patent_app_type] => 1 [patent_app_number] => 9/346259 [patent_app_country] => US [patent_app_date] => 1999-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 6 [patent_no_of_words] => 6121 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/300/06300023.pdf [firstpage_image] =>[orig_patent_app_number] => 346259 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/346259
Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same Jun 30, 1999 Issued
09/345779 EXPOSURE APPARATUS AND METHOD Jun 30, 1999 Abandoned
Array ( [id] => 4143431 [patent_doc_number] => 06063529 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-05-16 [patent_title] => 'Overlay accuracy measurement mark' [patent_app_type] => 1 [patent_app_number] => 9/346209 [patent_app_country] => US [patent_app_date] => 1999-07-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 4596 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 159 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/063/06063529.pdf [firstpage_image] =>[orig_patent_app_number] => 346209 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/346209
Overlay accuracy measurement mark Jun 30, 1999 Issued
Array ( [id] => 4289292 [patent_doc_number] => 06180293 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-30 [patent_title] => 'Mask pattern preparing method and photomask' [patent_app_type] => 1 [patent_app_number] => 9/340148 [patent_app_country] => US [patent_app_date] => 1999-06-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 3736 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 142 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/180/06180293.pdf [firstpage_image] =>[orig_patent_app_number] => 340148 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/340148
Mask pattern preparing method and photomask Jun 27, 1999 Issued
Array ( [id] => 4316372 [patent_doc_number] => 06248484 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-19 [patent_title] => 'Hybrid alignment marks for optimal alignment of three-dimensional layers' [patent_app_type] => 1 [patent_app_number] => 9/344401 [patent_app_country] => US [patent_app_date] => 1999-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 3226 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/248/06248484.pdf [firstpage_image] =>[orig_patent_app_number] => 344401 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/344401
Hybrid alignment marks for optimal alignment of three-dimensional layers Jun 24, 1999 Issued
Array ( [id] => 1440742 [patent_doc_number] => 06335127 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-01-01 [patent_title] => 'Charged beam mask having strut wider than charged beam, with shape that matches charged beam' [patent_app_type] => B1 [patent_app_number] => 09/339940 [patent_app_country] => US [patent_app_date] => 1999-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 26 [patent_no_of_words] => 6702 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/335/06335127.pdf [firstpage_image] =>[orig_patent_app_number] => 09339940 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/339940
Charged beam mask having strut wider than charged beam, with shape that matches charged beam Jun 24, 1999 Issued
Array ( [id] => 4122433 [patent_doc_number] => 06127071 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-03 [patent_title] => 'Serif mask design for correcting severe corner rounding and line end shortening in lithography' [patent_app_type] => 1 [patent_app_number] => 9/338244 [patent_app_country] => US [patent_app_date] => 1999-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 17 [patent_no_of_words] => 5353 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/127/06127071.pdf [firstpage_image] =>[orig_patent_app_number] => 338244 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/338244
Serif mask design for correcting severe corner rounding and line end shortening in lithography Jun 21, 1999 Issued
Array ( [id] => 4298917 [patent_doc_number] => 06251544 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-26 [patent_title] => 'Exposure dose measuring method and exposure dose measuring mask' [patent_app_type] => 1 [patent_app_number] => 9/334941 [patent_app_country] => US [patent_app_date] => 1999-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 48 [patent_no_of_words] => 7666 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/251/06251544.pdf [firstpage_image] =>[orig_patent_app_number] => 334941 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/334941
Exposure dose measuring method and exposure dose measuring mask Jun 16, 1999 Issued
Array ( [id] => 4153393 [patent_doc_number] => 06114093 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-05 [patent_title] => 'Method of drawing a pattern by direct writing with charged particle beam utilizing resist containing metal powder' [patent_app_type] => 1 [patent_app_number] => 9/335343 [patent_app_country] => US [patent_app_date] => 1999-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 8 [patent_no_of_words] => 2600 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/114/06114093.pdf [firstpage_image] =>[orig_patent_app_number] => 335343 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/335343
Method of drawing a pattern by direct writing with charged particle beam utilizing resist containing metal powder Jun 16, 1999 Issued
Array ( [id] => 4392700 [patent_doc_number] => 06296976 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-02 [patent_title] => 'Compensation of within-subfield linewidth variation in e-beam projection lithography' [patent_app_type] => 1 [patent_app_number] => 9/333931 [patent_app_country] => US [patent_app_date] => 1999-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 11 [patent_no_of_words] => 5540 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/296/06296976.pdf [firstpage_image] =>[orig_patent_app_number] => 333931 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/333931
Compensation of within-subfield linewidth variation in e-beam projection lithography Jun 15, 1999 Issued
09/333985 EXPOSURE METHOD UTILIZING ALIGNMENT AND OFFSET COMPENSATION Jun 15, 1999 Abandoned
Array ( [id] => 4298902 [patent_doc_number] => 06251543 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-06-26 [patent_title] => 'Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein' [patent_app_type] => 1 [patent_app_number] => 9/332061 [patent_app_country] => US [patent_app_date] => 1999-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 2859 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/251/06251543.pdf [firstpage_image] =>[orig_patent_app_number] => 332061 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/332061
Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein Jun 13, 1999 Issued
Array ( [id] => 4291395 [patent_doc_number] => 06183919 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-06 [patent_title] => 'Darkfield imaging for enhancing optical detection of edges and minimum features' [patent_app_type] => 1 [patent_app_number] => 9/330656 [patent_app_country] => US [patent_app_date] => 1999-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 4755 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/183/06183919.pdf [firstpage_image] =>[orig_patent_app_number] => 330656 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/330656
Darkfield imaging for enhancing optical detection of edges and minimum features Jun 10, 1999 Issued
Array ( [id] => 4230718 [patent_doc_number] => 06117601 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-12 [patent_title] => 'Method of determining and correcting processing state of photosensitive material based on mahalanobis calculation' [patent_app_type] => 1 [patent_app_number] => 9/328592 [patent_app_country] => US [patent_app_date] => 1999-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 18 [patent_no_of_words] => 16451 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/117/06117601.pdf [firstpage_image] =>[orig_patent_app_number] => 328592 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/328592
Method of determining and correcting processing state of photosensitive material based on mahalanobis calculation Jun 9, 1999 Issued
Array ( [id] => 4378682 [patent_doc_number] => 06277542 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-21 [patent_title] => 'Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density' [patent_app_type] => 1 [patent_app_number] => 9/327403 [patent_app_country] => US [patent_app_date] => 1999-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 5869 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/277/06277542.pdf [firstpage_image] =>[orig_patent_app_number] => 327403 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/327403
Charged-particle-beam projection-exposure methods exhibiting more uniform beam-current density Jun 6, 1999 Issued
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