
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4287563
[patent_doc_number] => 06235450
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-22
[patent_title] => 'Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same'
[patent_app_type] => 1
[patent_app_number] => 9/327402
[patent_app_country] => US
[patent_app_date] => 1999-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 2376
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 77
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/235/06235450.pdf
[firstpage_image] =>[orig_patent_app_number] => 327402
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/327402 | Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same | Jun 6, 1999 | Issued |
Array
(
[id] => 4204471
[patent_doc_number] => 06027843
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-22
[patent_title] => 'Charged-particle-beam microlithography methods including correction of imaging faults'
[patent_app_type] => 1
[patent_app_number] => 9/325103
[patent_app_country] => US
[patent_app_date] => 1999-06-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 6922
[patent_no_of_claims] => 33
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 184
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/027/06027843.pdf
[firstpage_image] =>[orig_patent_app_number] => 325103
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/325103 | Charged-particle-beam microlithography methods including correction of imaging faults | Jun 2, 1999 | Issued |
Array
(
[id] => 4186129
[patent_doc_number] => 06153340
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-11-28
[patent_title] => 'Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects'
[patent_app_type] => 1
[patent_app_number] => 9/322204
[patent_app_country] => US
[patent_app_date] => 1999-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 6646
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 110
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/153/06153340.pdf
[firstpage_image] =>[orig_patent_app_number] => 322204
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/322204 | Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects | May 27, 1999 | Issued |
Array
(
[id] => 4127783
[patent_doc_number] => 06033812
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-03-07
[patent_title] => 'Mask manufacturing method for forming an electron beam drawing pattern'
[patent_app_type] => 1
[patent_app_number] => 9/321019
[patent_app_country] => US
[patent_app_date] => 1999-05-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 12
[patent_no_of_words] => 4995
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/033/06033812.pdf
[firstpage_image] =>[orig_patent_app_number] => 321019
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/321019 | Mask manufacturing method for forming an electron beam drawing pattern | May 26, 1999 | Issued |
Array
(
[id] => 4135010
[patent_doc_number] => 06015643
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-18
[patent_title] => 'Mask used in charged particle beam projecting apparatus'
[patent_app_type] => 1
[patent_app_number] => 9/318727
[patent_app_country] => US
[patent_app_date] => 1999-05-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 14
[patent_no_of_words] => 3925
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/015/06015643.pdf
[firstpage_image] =>[orig_patent_app_number] => 318727
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/318727 | Mask used in charged particle beam projecting apparatus | May 25, 1999 | Issued |
Array
(
[id] => 4000918
[patent_doc_number] => 06004726
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-21
[patent_title] => 'Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev'
[patent_app_type] => 1
[patent_app_number] => 9/316533
[patent_app_country] => US
[patent_app_date] => 1999-05-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 2351
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 153
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/004/06004726.pdf
[firstpage_image] =>[orig_patent_app_number] => 316533
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/316533 | Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev | May 20, 1999 | Issued |
Array
(
[id] => 4418421
[patent_doc_number] => 06225013
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-01
[patent_title] => 'Stitching design rules for forming interconnect layers'
[patent_app_type] => 1
[patent_app_number] => 9/315895
[patent_app_country] => US
[patent_app_date] => 1999-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 38
[patent_no_of_words] => 8848
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/225/06225013.pdf
[firstpage_image] =>[orig_patent_app_number] => 315895
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/315895 | Stitching design rules for forming interconnect layers | May 19, 1999 | Issued |
| 09/314624 | YIELD OF DIES BY ADDING DUMMY PATTERN ON OPEN AREA OF MULTI-PROJECT MASK | May 18, 1999 | Abandoned |
Array
(
[id] => 4287403
[patent_doc_number] => 06235439
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-22
[patent_title] => 'Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers'
[patent_app_type] => 1
[patent_app_number] => 9/314368
[patent_app_country] => US
[patent_app_date] => 1999-05-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 2639
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/235/06235439.pdf
[firstpage_image] =>[orig_patent_app_number] => 314368
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/314368 | Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers | May 18, 1999 | Issued |
Array
(
[id] => 4000613
[patent_doc_number] => 06004706
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-12-21
[patent_title] => 'Etching parameter control system process'
[patent_app_type] => 1
[patent_app_number] => 9/311815
[patent_app_country] => US
[patent_app_date] => 1999-05-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 43
[patent_no_of_words] => 16549
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 320
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/004/06004706.pdf
[firstpage_image] =>[orig_patent_app_number] => 311815
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/311815 | Etching parameter control system process | May 12, 1999 | Issued |
Array
(
[id] => 4211970
[patent_doc_number] => 06110627
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-29
[patent_title] => 'Charged-particle-beam transfer methods exhibiting reduced resist-heating effects'
[patent_app_type] => 1
[patent_app_number] => 9/309314
[patent_app_country] => US
[patent_app_date] => 1999-05-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 5071
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 160
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/110/06110627.pdf
[firstpage_image] =>[orig_patent_app_number] => 309314
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/309314 | Charged-particle-beam transfer methods exhibiting reduced resist-heating effects | May 10, 1999 | Issued |
Array
(
[id] => 4230691
[patent_doc_number] => 06117599
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-12
[patent_title] => 'Alignment and exposure process utilizing split beam for exposure and alignment'
[patent_app_type] => 1
[patent_app_number] => 9/307045
[patent_app_country] => US
[patent_app_date] => 1999-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 2
[patent_no_of_words] => 1434
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/117/06117599.pdf
[firstpage_image] =>[orig_patent_app_number] => 307045
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/307045 | Alignment and exposure process utilizing split beam for exposure and alignment | May 6, 1999 | Issued |
Array
(
[id] => 4166390
[patent_doc_number] => 06140021
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-31
[patent_title] => 'Charged particle beam transfer method'
[patent_app_type] => 1
[patent_app_number] => 9/307204
[patent_app_country] => US
[patent_app_date] => 1999-05-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5536
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 200
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/140/06140021.pdf
[firstpage_image] =>[orig_patent_app_number] => 307204
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/307204 | Charged particle beam transfer method | May 6, 1999 | Issued |
Array
(
[id] => 4403519
[patent_doc_number] => 06232040
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-15
[patent_title] => 'Method of electron beam exposure utilizing emitter with conductive mesh grid'
[patent_app_type] => 1
[patent_app_number] => 9/306287
[patent_app_country] => US
[patent_app_date] => 1999-05-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 6
[patent_no_of_words] => 2677
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 156
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/232/06232040.pdf
[firstpage_image] =>[orig_patent_app_number] => 306287
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/306287 | Method of electron beam exposure utilizing emitter with conductive mesh grid | May 5, 1999 | Issued |
Array
(
[id] => 4204445
[patent_doc_number] => 06027842
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-22
[patent_title] => 'Process for controlling etching parameters'
[patent_app_type] => 1
[patent_app_number] => 9/299477
[patent_app_country] => US
[patent_app_date] => 1999-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 43
[patent_no_of_words] => 16773
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 179
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/027/06027842.pdf
[firstpage_image] =>[orig_patent_app_number] => 299477
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/299477 | Process for controlling etching parameters | Apr 25, 1999 | Issued |
Array
(
[id] => 4128841
[patent_doc_number] => 06120953
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-09-19
[patent_title] => 'Method of optical proximity correction'
[patent_app_type] => 1
[patent_app_number] => 9/298324
[patent_app_country] => US
[patent_app_date] => 1999-04-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 1902
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 74
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/120/06120953.pdf
[firstpage_image] =>[orig_patent_app_number] => 298324
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/298324 | Method of optical proximity correction | Apr 22, 1999 | Issued |
Array
(
[id] => 4418398
[patent_doc_number] => 06225011
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-01
[patent_title] => 'Method for manufacturing semiconductor devices utilizing plurality of exposure systems'
[patent_app_type] => 1
[patent_app_number] => 9/294428
[patent_app_country] => US
[patent_app_date] => 1999-04-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 26
[patent_no_of_words] => 5655
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 78
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/225/06225011.pdf
[firstpage_image] =>[orig_patent_app_number] => 294428
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/294428 | Method for manufacturing semiconductor devices utilizing plurality of exposure systems | Apr 19, 1999 | Issued |
Array
(
[id] => 4232186
[patent_doc_number] => 06165656
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-12-26
[patent_title] => 'Overlay error determination mark considering influence of aberration'
[patent_app_type] => 1
[patent_app_number] => 9/293783
[patent_app_country] => US
[patent_app_date] => 1999-04-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 38
[patent_no_of_words] => 9238
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 238
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/165/06165656.pdf
[firstpage_image] =>[orig_patent_app_number] => 293783
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/293783 | Overlay error determination mark considering influence of aberration | Apr 19, 1999 | Issued |
Array
(
[id] => 4220419
[patent_doc_number] => 06010827
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-01-04
[patent_title] => 'Electron beam exposure utilizing pre-processed mask pattern'
[patent_app_type] => 1
[patent_app_number] => 9/291979
[patent_app_country] => US
[patent_app_date] => 1999-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 15
[patent_no_of_words] => 1977
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 259
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/010/06010827.pdf
[firstpage_image] =>[orig_patent_app_number] => 291979
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/291979 | Electron beam exposure utilizing pre-processed mask pattern | Apr 14, 1999 | Issued |
Array
(
[id] => 4189490
[patent_doc_number] => 06130016
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-10-10
[patent_title] => 'Method for forming semiconductor structures using a calibrating reticle'
[patent_app_type] => 1
[patent_app_number] => 9/288688
[patent_app_country] => US
[patent_app_date] => 1999-04-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 8
[patent_no_of_words] => 4574
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 130
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/130/06130016.pdf
[firstpage_image] =>[orig_patent_app_number] => 288688
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/288688 | Method for forming semiconductor structures using a calibrating reticle | Apr 8, 1999 | Issued |