Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4287563 [patent_doc_number] => 06235450 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-22 [patent_title] => 'Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same' [patent_app_type] => 1 [patent_app_number] => 9/327402 [patent_app_country] => US [patent_app_date] => 1999-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 2376 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 77 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/235/06235450.pdf [firstpage_image] =>[orig_patent_app_number] => 327402 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/327402
Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same Jun 6, 1999 Issued
Array ( [id] => 4204471 [patent_doc_number] => 06027843 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-22 [patent_title] => 'Charged-particle-beam microlithography methods including correction of imaging faults' [patent_app_type] => 1 [patent_app_number] => 9/325103 [patent_app_country] => US [patent_app_date] => 1999-06-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 6922 [patent_no_of_claims] => 33 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 184 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/027/06027843.pdf [firstpage_image] =>[orig_patent_app_number] => 325103 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/325103
Charged-particle-beam microlithography methods including correction of imaging faults Jun 2, 1999 Issued
Array ( [id] => 4186129 [patent_doc_number] => 06153340 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-11-28 [patent_title] => 'Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects' [patent_app_type] => 1 [patent_app_number] => 9/322204 [patent_app_country] => US [patent_app_date] => 1999-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 7 [patent_no_of_words] => 6646 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/153/06153340.pdf [firstpage_image] =>[orig_patent_app_number] => 322204 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/322204
Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects May 27, 1999 Issued
Array ( [id] => 4127783 [patent_doc_number] => 06033812 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-03-07 [patent_title] => 'Mask manufacturing method for forming an electron beam drawing pattern' [patent_app_type] => 1 [patent_app_number] => 9/321019 [patent_app_country] => US [patent_app_date] => 1999-05-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 12 [patent_no_of_words] => 4995 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/033/06033812.pdf [firstpage_image] =>[orig_patent_app_number] => 321019 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/321019
Mask manufacturing method for forming an electron beam drawing pattern May 26, 1999 Issued
Array ( [id] => 4135010 [patent_doc_number] => 06015643 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-01-18 [patent_title] => 'Mask used in charged particle beam projecting apparatus' [patent_app_type] => 1 [patent_app_number] => 9/318727 [patent_app_country] => US [patent_app_date] => 1999-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 14 [patent_no_of_words] => 3925 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 113 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/015/06015643.pdf [firstpage_image] =>[orig_patent_app_number] => 318727 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/318727
Mask used in charged particle beam projecting apparatus May 25, 1999 Issued
Array ( [id] => 4000918 [patent_doc_number] => 06004726 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-21 [patent_title] => 'Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev' [patent_app_type] => 1 [patent_app_number] => 9/316533 [patent_app_country] => US [patent_app_date] => 1999-05-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2351 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/004/06004726.pdf [firstpage_image] =>[orig_patent_app_number] => 316533 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/316533
Method of forming a lithographic pattern utilizing charged beam particles between 0.1 and 5.0 ev May 20, 1999 Issued
Array ( [id] => 4418421 [patent_doc_number] => 06225013 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-01 [patent_title] => 'Stitching design rules for forming interconnect layers' [patent_app_type] => 1 [patent_app_number] => 9/315895 [patent_app_country] => US [patent_app_date] => 1999-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 38 [patent_no_of_words] => 8848 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/225/06225013.pdf [firstpage_image] =>[orig_patent_app_number] => 315895 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/315895
Stitching design rules for forming interconnect layers May 19, 1999 Issued
09/314624 YIELD OF DIES BY ADDING DUMMY PATTERN ON OPEN AREA OF MULTI-PROJECT MASK May 18, 1999 Abandoned
Array ( [id] => 4287403 [patent_doc_number] => 06235439 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-22 [patent_title] => 'Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers' [patent_app_type] => 1 [patent_app_number] => 9/314368 [patent_app_country] => US [patent_app_date] => 1999-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2639 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/235/06235439.pdf [firstpage_image] =>[orig_patent_app_number] => 314368 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/314368
Method for controlling image size of integrated circuits on wafers supported on hot plates during post exposure baking of the wafers May 18, 1999 Issued
Array ( [id] => 4000613 [patent_doc_number] => 06004706 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-21 [patent_title] => 'Etching parameter control system process' [patent_app_type] => 1 [patent_app_number] => 9/311815 [patent_app_country] => US [patent_app_date] => 1999-05-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 43 [patent_no_of_words] => 16549 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 320 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/004/06004706.pdf [firstpage_image] =>[orig_patent_app_number] => 311815 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/311815
Etching parameter control system process May 12, 1999 Issued
Array ( [id] => 4211970 [patent_doc_number] => 06110627 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-29 [patent_title] => 'Charged-particle-beam transfer methods exhibiting reduced resist-heating effects' [patent_app_type] => 1 [patent_app_number] => 9/309314 [patent_app_country] => US [patent_app_date] => 1999-05-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 5071 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/110/06110627.pdf [firstpage_image] =>[orig_patent_app_number] => 309314 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/309314
Charged-particle-beam transfer methods exhibiting reduced resist-heating effects May 10, 1999 Issued
Array ( [id] => 4230691 [patent_doc_number] => 06117599 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-12 [patent_title] => 'Alignment and exposure process utilizing split beam for exposure and alignment' [patent_app_type] => 1 [patent_app_number] => 9/307045 [patent_app_country] => US [patent_app_date] => 1999-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 1434 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/117/06117599.pdf [firstpage_image] =>[orig_patent_app_number] => 307045 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/307045
Alignment and exposure process utilizing split beam for exposure and alignment May 6, 1999 Issued
Array ( [id] => 4166390 [patent_doc_number] => 06140021 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-31 [patent_title] => 'Charged particle beam transfer method' [patent_app_type] => 1 [patent_app_number] => 9/307204 [patent_app_country] => US [patent_app_date] => 1999-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5536 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 200 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/140/06140021.pdf [firstpage_image] =>[orig_patent_app_number] => 307204 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/307204
Charged particle beam transfer method May 6, 1999 Issued
Array ( [id] => 4403519 [patent_doc_number] => 06232040 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-15 [patent_title] => 'Method of electron beam exposure utilizing emitter with conductive mesh grid' [patent_app_type] => 1 [patent_app_number] => 9/306287 [patent_app_country] => US [patent_app_date] => 1999-05-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 6 [patent_no_of_words] => 2677 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 156 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/232/06232040.pdf [firstpage_image] =>[orig_patent_app_number] => 306287 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/306287
Method of electron beam exposure utilizing emitter with conductive mesh grid May 5, 1999 Issued
Array ( [id] => 4204445 [patent_doc_number] => 06027842 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-22 [patent_title] => 'Process for controlling etching parameters' [patent_app_type] => 1 [patent_app_number] => 9/299477 [patent_app_country] => US [patent_app_date] => 1999-04-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 43 [patent_no_of_words] => 16773 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 179 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/027/06027842.pdf [firstpage_image] =>[orig_patent_app_number] => 299477 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/299477
Process for controlling etching parameters Apr 25, 1999 Issued
Array ( [id] => 4128841 [patent_doc_number] => 06120953 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-19 [patent_title] => 'Method of optical proximity correction' [patent_app_type] => 1 [patent_app_number] => 9/298324 [patent_app_country] => US [patent_app_date] => 1999-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 1902 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/120/06120953.pdf [firstpage_image] =>[orig_patent_app_number] => 298324 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/298324
Method of optical proximity correction Apr 22, 1999 Issued
Array ( [id] => 4418398 [patent_doc_number] => 06225011 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-01 [patent_title] => 'Method for manufacturing semiconductor devices utilizing plurality of exposure systems' [patent_app_type] => 1 [patent_app_number] => 9/294428 [patent_app_country] => US [patent_app_date] => 1999-04-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 26 [patent_no_of_words] => 5655 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 78 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/225/06225011.pdf [firstpage_image] =>[orig_patent_app_number] => 294428 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/294428
Method for manufacturing semiconductor devices utilizing plurality of exposure systems Apr 19, 1999 Issued
Array ( [id] => 4232186 [patent_doc_number] => 06165656 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-26 [patent_title] => 'Overlay error determination mark considering influence of aberration' [patent_app_type] => 1 [patent_app_number] => 9/293783 [patent_app_country] => US [patent_app_date] => 1999-04-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 38 [patent_no_of_words] => 9238 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 238 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/165/06165656.pdf [firstpage_image] =>[orig_patent_app_number] => 293783 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/293783
Overlay error determination mark considering influence of aberration Apr 19, 1999 Issued
Array ( [id] => 4220419 [patent_doc_number] => 06010827 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-01-04 [patent_title] => 'Electron beam exposure utilizing pre-processed mask pattern' [patent_app_type] => 1 [patent_app_number] => 9/291979 [patent_app_country] => US [patent_app_date] => 1999-04-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 1977 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 259 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/010/06010827.pdf [firstpage_image] =>[orig_patent_app_number] => 291979 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/291979
Electron beam exposure utilizing pre-processed mask pattern Apr 14, 1999 Issued
Array ( [id] => 4189490 [patent_doc_number] => 06130016 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-10 [patent_title] => 'Method for forming semiconductor structures using a calibrating reticle' [patent_app_type] => 1 [patent_app_number] => 9/288688 [patent_app_country] => US [patent_app_date] => 1999-04-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 8 [patent_no_of_words] => 4574 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/130/06130016.pdf [firstpage_image] =>[orig_patent_app_number] => 288688 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/288688
Method for forming semiconductor structures using a calibrating reticle Apr 8, 1999 Issued
Menu