Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3990555 [patent_doc_number] => 05985517 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-16 [patent_title] => 'Resist pattern forming method using anti-reflective layer resist' [patent_app_type] => 1 [patent_app_number] => 9/285010 [patent_app_country] => US [patent_app_date] => 1999-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18957 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/985/05985517.pdf [firstpage_image] =>[orig_patent_app_number] => 285010 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/285010
Resist pattern forming method using anti-reflective layer resist Mar 31, 1999 Issued
Array ( [id] => 4083484 [patent_doc_number] => 06017663 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-01-25 [patent_title] => 'Method of processing resist utilizing alkaline component monitoring' [patent_app_type] => 1 [patent_app_number] => 9/277735 [patent_app_country] => US [patent_app_date] => 1999-03-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 10 [patent_no_of_words] => 6998 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 242 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/017/06017663.pdf [firstpage_image] =>[orig_patent_app_number] => 277735 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/277735
Method of processing resist utilizing alkaline component monitoring Mar 28, 1999 Issued
Array ( [id] => 4069367 [patent_doc_number] => 06068955 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-05-30 [patent_title] => 'Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks' [patent_app_type] => 1 [patent_app_number] => 9/273077 [patent_app_country] => US [patent_app_date] => 1999-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2884 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/068/06068955.pdf [firstpage_image] =>[orig_patent_app_number] => 273077 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/273077
Methods of inspecting for mask-defined, feature dimensional conformity between multiple masks Mar 18, 1999 Issued
Array ( [id] => 4352272 [patent_doc_number] => 06200710 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-03-13 [patent_title] => 'Methods for producing segmented reticles' [patent_app_type] => 1 [patent_app_number] => 9/272930 [patent_app_country] => US [patent_app_date] => 1999-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 4336 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/200/06200710.pdf [firstpage_image] =>[orig_patent_app_number] => 272930 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/272930
Methods for producing segmented reticles Mar 17, 1999 Issued
Array ( [id] => 4100427 [patent_doc_number] => 06051347 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-04-18 [patent_title] => 'Application of e-beam proximity over-correction to compensate optical proximity effect in optical lithography process' [patent_app_type] => 1 [patent_app_number] => 9/270595 [patent_app_country] => US [patent_app_date] => 1999-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 21 [patent_no_of_words] => 4743 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 206 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/051/06051347.pdf [firstpage_image] =>[orig_patent_app_number] => 270595 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/270595
Application of e-beam proximity over-correction to compensate optical proximity effect in optical lithography process Mar 17, 1999 Issued
Array ( [id] => 4179927 [patent_doc_number] => 06150070 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-11-21 [patent_title] => 'Method of creating optimal profile in single layer photoresist' [patent_app_type] => 1 [patent_app_number] => 9/270534 [patent_app_country] => US [patent_app_date] => 1999-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 5299 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 205 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/150/06150070.pdf [firstpage_image] =>[orig_patent_app_number] => 270534 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/270534
Method of creating optimal profile in single layer photoresist Mar 16, 1999 Issued
Array ( [id] => 4098073 [patent_doc_number] => 06066419 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-05-23 [patent_title] => 'Method for monitoring dosage/focus/leveling' [patent_app_type] => 1 [patent_app_number] => 9/270278 [patent_app_country] => US [patent_app_date] => 1999-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 8 [patent_no_of_words] => 2159 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 73 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/066/06066419.pdf [firstpage_image] =>[orig_patent_app_number] => 270278 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/270278
Method for monitoring dosage/focus/leveling Mar 15, 1999 Issued
Array ( [id] => 4418339 [patent_doc_number] => 06177218 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-23 [patent_title] => 'Lithographic process for device fabrication using electron beam imaging' [patent_app_type] => 1 [patent_app_number] => 9/270487 [patent_app_country] => US [patent_app_date] => 1999-03-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 9 [patent_no_of_words] => 6315 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/177/06177218.pdf [firstpage_image] =>[orig_patent_app_number] => 270487 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/270487
Lithographic process for device fabrication using electron beam imaging Mar 14, 1999 Issued
Array ( [id] => 4326830 [patent_doc_number] => 06312859 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-11-06 [patent_title] => 'Projection exposure method with corrections for image displacement' [patent_app_type] => 1 [patent_app_number] => 9/263803 [patent_app_country] => US [patent_app_date] => 1999-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 11 [patent_no_of_words] => 15979 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/312/06312859.pdf [firstpage_image] =>[orig_patent_app_number] => 263803 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/263803
Projection exposure method with corrections for image displacement Mar 7, 1999 Issued
Array ( [id] => 4354834 [patent_doc_number] => 06174632 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Wafer defect detection method utilizing wafer with development residue attracting area' [patent_app_type] => 1 [patent_app_number] => 9/262812 [patent_app_country] => US [patent_app_date] => 1999-03-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 1477 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174632.pdf [firstpage_image] =>[orig_patent_app_number] => 262812 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/262812
Wafer defect detection method utilizing wafer with development residue attracting area Mar 4, 1999 Issued
Array ( [id] => 4153516 [patent_doc_number] => 06156464 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-05 [patent_title] => 'Scanning-type charged-particle beam exposure methods including scan-velocity error detection and correction' [patent_app_type] => 1 [patent_app_number] => 9/261059 [patent_app_country] => US [patent_app_date] => 1999-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 6 [patent_no_of_words] => 6307 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/156/06156464.pdf [firstpage_image] =>[orig_patent_app_number] => 261059 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/261059
Scanning-type charged-particle beam exposure methods including scan-velocity error detection and correction Mar 1, 1999 Issued
Array ( [id] => 3990237 [patent_doc_number] => 05985498 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-16 [patent_title] => 'Method of characterizing linewidth errors in a scanning lithography system' [patent_app_type] => 1 [patent_app_number] => 9/259928 [patent_app_country] => US [patent_app_date] => 1999-03-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 22 [patent_no_of_words] => 3493 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 198 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/985/05985498.pdf [firstpage_image] =>[orig_patent_app_number] => 259928 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/259928
Method of characterizing linewidth errors in a scanning lithography system Feb 28, 1999 Issued
Array ( [id] => 4233373 [patent_doc_number] => 06143473 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-11-07 [patent_title] => 'Film patterning method utilizing post-development residue remover' [patent_app_type] => 1 [patent_app_number] => 9/258130 [patent_app_country] => US [patent_app_date] => 1999-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 33 [patent_no_of_words] => 5801 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 130 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/143/06143473.pdf [firstpage_image] =>[orig_patent_app_number] => 258130 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/258130
Film patterning method utilizing post-development residue remover Feb 25, 1999 Issued
09/255330 EXPOSURE METHOD AND EXPOSURE APPARATUS Feb 22, 1999 Abandoned
Array ( [id] => 4379061 [patent_doc_number] => 06294297 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-09-25 [patent_title] => 'Computer program product for calculating a process tolerance relating exposure amount and focal point position' [patent_app_type] => 1 [patent_app_number] => 9/255860 [patent_app_country] => US [patent_app_date] => 1999-02-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 3193 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 251 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/294/06294297.pdf [firstpage_image] =>[orig_patent_app_number] => 255860 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/255860
Computer program product for calculating a process tolerance relating exposure amount and focal point position Feb 22, 1999 Issued
90/005263 HALFTONE IMAGE SCREENING ARRAY OF PARALLEL LINES WITH EFFECTIVE MAXIMUM AND MINIMUM OPTICAL DENSITY AND METHOD OF GENERATING A HALFTONE IMAGE UTILIZING THE SCREENING ARRAY Feb 21, 1999 Issued
Array ( [id] => 4153503 [patent_doc_number] => 06156463 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-12-05 [patent_title] => 'Method of determining the amount of projection exposure' [patent_app_type] => 1 [patent_app_number] => 9/251843 [patent_app_country] => US [patent_app_date] => 1999-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 4323 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/156/06156463.pdf [firstpage_image] =>[orig_patent_app_number] => 251843 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/251843
Method of determining the amount of projection exposure Feb 16, 1999 Issued
Array ( [id] => 4300338 [patent_doc_number] => 06187486 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-02-13 [patent_title] => 'Method of multi-exposure for improving photolithography resolution' [patent_app_type] => 1 [patent_app_number] => 9/250766 [patent_app_country] => US [patent_app_date] => 1999-02-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 2689 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/187/06187486.pdf [firstpage_image] =>[orig_patent_app_number] => 250766 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/250766
Method of multi-exposure for improving photolithography resolution Feb 15, 1999 Issued
09/890452 DETECTION METHOD FOR MARK FOR POSITIONAL ALIGNMENT UTILIZED IN CHARGED PARTICLE BEAM EXPOSURE APPARATUS Feb 11, 1999 Abandoned
Array ( [id] => 4044992 [patent_doc_number] => 05968693 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-19 [patent_title] => 'Lithography tool adjustment utilizing latent imagery' [patent_app_type] => 1 [patent_app_number] => 9/246512 [patent_app_country] => US [patent_app_date] => 1999-02-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 14 [patent_no_of_words] => 10611 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/968/05968693.pdf [firstpage_image] =>[orig_patent_app_number] => 246512 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/246512
Lithography tool adjustment utilizing latent imagery Feb 8, 1999 Issued
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