
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4139360
[patent_doc_number] => 06030732
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-02-29
[patent_title] => 'In-situ etch process control monitor'
[patent_app_type] => 1
[patent_app_number] => 9/226276
[patent_app_country] => US
[patent_app_date] => 1999-01-07
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[patent_no_of_words] => 1991
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Array
(
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[patent_kind] => NA
[patent_issue_date] => 2000-08-01
[patent_title] => 'Laser exposure utilizing secondary mask capable of concentrating exposure light onto primary mask'
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[patent_app_date] => 1999-01-06
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Array
(
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[patent_kind] => NA
[patent_issue_date] => 2000-07-25
[patent_title] => 'Dual damascene structure formed in a single photoresist film'
[patent_app_type] => 1
[patent_app_number] => 9/226765
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[patent_app_date] => 1999-01-06
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Array
(
[id] => 4152017
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-08-15
[patent_title] => 'Electron beam direct drawing method, system and recording medium'
[patent_app_type] => 1
[patent_app_number] => 9/222526
[patent_app_country] => US
[patent_app_date] => 1998-12-28
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 222526
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/222526 | Electron beam direct drawing method, system and recording medium | Dec 27, 1998 | Issued |
Array
(
[id] => 4009545
[patent_doc_number] => 05986765
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[patent_kind] => NA
[patent_issue_date] => 1999-11-16
[patent_title] => 'Apparatus including compensation mask to correct particle beam proximity-effect'
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[patent_app_number] => 9/218003
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[patent_app_date] => 1998-12-22
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Array
(
[id] => 4166431
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[patent_issue_date] => 2000-10-31
[patent_title] => 'Remote plasma nitridation for contact etch stop'
[patent_app_type] => 1
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[firstpage_image] =>[orig_patent_app_number] => 216145
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Array
(
[id] => 4026583
[patent_doc_number] => 05994007
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[patent_issue_date] => 1999-11-30
[patent_title] => 'Pattern forming method utilizing first insulative and then conductive overlayer and underlayer'
[patent_app_type] => 1
[patent_app_number] => 9/213373
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[patent_app_date] => 1998-12-17
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[firstpage_image] =>[orig_patent_app_number] => 213373
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/213373 | Pattern forming method utilizing first insulative and then conductive overlayer and underlayer | Dec 16, 1998 | Issued |
Array
(
[id] => 4096157
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-04-11
[patent_title] => 'Antireflective coatings comprising poly(oxyalkylene) colorants'
[patent_app_type] => 1
[patent_app_number] => 9/211355
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 211355
[rel_patent_id] =>[rel_patent_doc_number] =>) 09/211355 | Antireflective coatings comprising poly(oxyalkylene) colorants | Dec 14, 1998 | Issued |
Array
(
[id] => 4204432
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[patent_issue_date] => 2000-02-22
[patent_title] => 'Charged-particle-beam projection-exposure method exhibiting aberration reduction through multiple deflector use'
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Array
(
[id] => 4287643
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[patent_title] => 'Graded anti-reflective barrier films for ultra-fine lithography'
[patent_app_type] => 1
[patent_app_number] => 9/208350
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Array
(
[id] => 4105381
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[patent_title] => 'Method for determining the efficiency of a planarization process'
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Array
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Array
(
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Array
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Array
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Array
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Array
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Array
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Array
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Array
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