Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4230993 [patent_doc_number] => 06117618 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-12 [patent_title] => 'Carbonized antireflective coating produced by spin-on polymer material' [patent_app_type] => 1 [patent_app_number] => 9/185683 [patent_app_country] => US [patent_app_date] => 1998-11-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 11 [patent_no_of_words] => 4222 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/117/06117618.pdf [firstpage_image] =>[orig_patent_app_number] => 185683 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/185683
Carbonized antireflective coating produced by spin-on polymer material Nov 3, 1998 Issued
90/005128 LOW OPTICAL DOT GAIN PRE-PRESS PROOFS WHEREIN THE FIRST DOWN ADHESIVE LAYER THICKNESS IS AT LEAST TWICE THAT OF ANY ADDITIONAL THIN ADHESIVE LAYER Oct 29, 1998 Issued
Array ( [id] => 4083474 [patent_doc_number] => 06017662 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-01-25 [patent_title] => 'Method of reducing laser mark peeling' [patent_app_type] => 1 [patent_app_number] => 9/181298 [patent_app_country] => US [patent_app_date] => 1998-10-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 1759 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/017/06017662.pdf [firstpage_image] =>[orig_patent_app_number] => 181298 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/181298
Method of reducing laser mark peeling Oct 27, 1998 Issued
09/179883 METHOD OF SEQUENTIAL EXPOSURE WITH ALIGNMENT TO CORRECT FOCUS OFFSET Oct 27, 1998 Abandoned
Array ( [id] => 4363792 [patent_doc_number] => 06274290 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-08-14 [patent_title] => 'Raster scan gaussian beam writing strategy and method for pattern generation' [patent_app_type] => 1 [patent_app_number] => 9/179361 [patent_app_country] => US [patent_app_date] => 1998-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 15 [patent_no_of_words] => 8256 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 49 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/274/06274290.pdf [firstpage_image] =>[orig_patent_app_number] => 179361 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/179361
Raster scan gaussian beam writing strategy and method for pattern generation Oct 25, 1998 Issued
Array ( [id] => 4104570 [patent_doc_number] => 06022650 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-08 [patent_title] => 'Overlay target for precise positional determination' [patent_app_type] => 1 [patent_app_number] => 9/175244 [patent_app_country] => US [patent_app_date] => 1998-10-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 6 [patent_no_of_words] => 3300 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/022/06022650.pdf [firstpage_image] =>[orig_patent_app_number] => 175244 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/175244
Overlay target for precise positional determination Oct 19, 1998 Issued
Array ( [id] => 4345056 [patent_doc_number] => 06214494 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-10 [patent_title] => 'Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability' [patent_app_type] => 1 [patent_app_number] => 9/167948 [patent_app_country] => US [patent_app_date] => 1998-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 17 [patent_no_of_words] => 4448 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/214/06214494.pdf [firstpage_image] =>[orig_patent_app_number] => 167948 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/167948
Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability Oct 6, 1998 Issued
09/167550 SCANNING EXPOSURE METHOD DETECTING FOCUS DURING RELATIVE MOVEMENT BETWEEN ENERGY BEAM AND SUSTRATE Oct 6, 1998 Abandoned
Array ( [id] => 4287374 [patent_doc_number] => 06235438 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-22 [patent_title] => 'Projection exposure method and apparatus' [patent_app_type] => 1 [patent_app_number] => 9/166884 [patent_app_country] => US [patent_app_date] => 1998-10-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 21 [patent_figures_cnt] => 55 [patent_no_of_words] => 36476 [patent_no_of_claims] => 91 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/235/06235438.pdf [firstpage_image] =>[orig_patent_app_number] => 166884 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/166884
Projection exposure method and apparatus Oct 5, 1998 Issued
Array ( [id] => 4143464 [patent_doc_number] => 06063531 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-05-16 [patent_title] => 'Focus monitor structure and method for lithography process' [patent_app_type] => 1 [patent_app_number] => 9/167417 [patent_app_country] => US [patent_app_date] => 1998-10-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 15 [patent_no_of_words] => 3995 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/063/06063531.pdf [firstpage_image] =>[orig_patent_app_number] => 167417 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/167417
Focus monitor structure and method for lithography process Oct 5, 1998 Issued
Array ( [id] => 4128828 [patent_doc_number] => 06120952 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-19 [patent_title] => 'Methods of reducing proximity effects in lithographic processes' [patent_app_type] => 1 [patent_app_number] => 9/164786 [patent_app_country] => US [patent_app_date] => 1998-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 2301 [patent_no_of_claims] => 35 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 101 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/120/06120952.pdf [firstpage_image] =>[orig_patent_app_number] => 164786 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/164786
Methods of reducing proximity effects in lithographic processes Sep 30, 1998 Issued
Array ( [id] => 4122519 [patent_doc_number] => 06127075 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-10-03 [patent_title] => 'Method for checking accuracy of a measuring instrument for overlay registration' [patent_app_type] => 1 [patent_app_number] => 9/164043 [patent_app_country] => US [patent_app_date] => 1998-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2505 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 155 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/127/06127075.pdf [firstpage_image] =>[orig_patent_app_number] => 164043 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/164043
Method for checking accuracy of a measuring instrument for overlay registration Sep 30, 1998 Issued
Array ( [id] => 4216875 [patent_doc_number] => 06040095 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-03-21 [patent_title] => 'Measurement marks for e-beam projection mask and method of using' [patent_app_type] => 1 [patent_app_number] => 9/163406 [patent_app_country] => US [patent_app_date] => 1998-09-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 3211 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/040/06040095.pdf [firstpage_image] =>[orig_patent_app_number] => 163406 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/163406
Measurement marks for e-beam projection mask and method of using Sep 29, 1998 Issued
Array ( [id] => 4179160 [patent_doc_number] => 06020107 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-01 [patent_title] => 'Pattern forming method through combined electron beam and light exposure utilizing multiple heat steps' [patent_app_type] => 1 [patent_app_number] => 9/159644 [patent_app_country] => US [patent_app_date] => 1998-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 20 [patent_no_of_words] => 6427 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/020/06020107.pdf [firstpage_image] =>[orig_patent_app_number] => 159644 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/159644
Pattern forming method through combined electron beam and light exposure utilizing multiple heat steps Sep 23, 1998 Issued
Array ( [id] => 3953196 [patent_doc_number] => 05935765 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-10 [patent_title] => 'Resist pattern forming method using anti-reflective layer with variable extinction coefficient' [patent_app_type] => 1 [patent_app_number] => 9/159786 [patent_app_country] => US [patent_app_date] => 1998-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 22 [patent_figures_cnt] => 92 [patent_no_of_words] => 18987 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/935/05935765.pdf [firstpage_image] =>[orig_patent_app_number] => 159786 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/159786
Resist pattern forming method using anti-reflective layer with variable extinction coefficient Sep 23, 1998 Issued
Array ( [id] => 4104554 [patent_doc_number] => 06022649 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-08 [patent_title] => 'Wafer stepper method utilizing a multi-segment global alignment mark' [patent_app_type] => 1 [patent_app_number] => 9/157674 [patent_app_country] => US [patent_app_date] => 1998-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 1481 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/022/06022649.pdf [firstpage_image] =>[orig_patent_app_number] => 157674 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/157674
Wafer stepper method utilizing a multi-segment global alignment mark Sep 20, 1998 Issued
Array ( [id] => 4230981 [patent_doc_number] => 06117617 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-12 [patent_title] => 'Patterning method utilizing electron beam resist containing methanofullerene compound' [patent_app_type] => 1 [patent_app_number] => 9/157103 [patent_app_country] => US [patent_app_date] => 1998-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 4608 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/117/06117617.pdf [firstpage_image] =>[orig_patent_app_number] => 157103 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/157103
Patterning method utilizing electron beam resist containing methanofullerene compound Sep 17, 1998 Issued
09/152928 SCANNING EXPOSURE METHOD Sep 14, 1998 Abandoned
Array ( [id] => 1531683 [patent_doc_number] => 06410209 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2002-06-25 [patent_title] => 'Methods utilizing antireflective coating compositions with exposure under 200 nm' [patent_app_type] => B1 [patent_app_number] => 09/153575 [patent_app_country] => US [patent_app_date] => 1998-09-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10200 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 141 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/410/06410209.pdf [firstpage_image] =>[orig_patent_app_number] => 09153575 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/153575
Methods utilizing antireflective coating compositions with exposure under 200 nm Sep 14, 1998 Issued
Array ( [id] => 4044073 [patent_doc_number] => 05908719 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-06-01 [patent_title] => 'Radiation mask adapted to be aligned with a photoresist layer and method of making the same' [patent_app_type] => 1 [patent_app_number] => 9/151922 [patent_app_country] => US [patent_app_date] => 1998-09-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 36 [patent_no_of_words] => 16034 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/908/05908719.pdf [firstpage_image] =>[orig_patent_app_number] => 151922 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/151922
Radiation mask adapted to be aligned with a photoresist layer and method of making the same Sep 10, 1998 Issued
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