Christopher G. Young

Array ( [id] => 4234542 [patent_doc_number] => 06090510 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-07-18 [patent_title] => 'Method for scanning exposure' [patent_app_type] => 1 [patent_app_number] => 9/047476 [patent_app_country] => US [patent_app_date] => 1998-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 28 [patent_no_of_words] => 17622 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/090/06090510.pdf [firstpage_image] =>[orig_patent_app_number] => 047476 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3972987 [patent_doc_number] => 05916717 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-06-29 [patent_title] => 'Process utilizing relationship between reflectivity and resist thickness for inhibition of side effect caused by halftone phase shift masks' [patent_app_type] => 1 [patent_app_number] => 9/044058 [patent_app_country] => US [patent_app_date] => 1998-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 24 [patent_no_of_words] => 3474 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/916/05916717.pdf [firstpage_image] =>[orig_patent_app_number] => 044058 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4043086 [patent_doc_number] => 05912096 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-06-15 [patent_title] => 'Charged-particle-beam exposure method with temperature-compensated exposure to offset expansion and contraction of substrate' [patent_app_type] => 1 [patent_app_number] => 9/044395 [patent_app_country] => US [patent_app_date] => 1998-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 4575 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 133 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/912/05912096.pdf [firstpage_image] =>[orig_patent_app_number] => 044395 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3938467 [patent_doc_number] => 05989760 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-23 [patent_title] => 'Method of processing a substrate utilizing specific chuck' [patent_app_type] => 1 [patent_app_number] => 9/040471 [patent_app_country] => US [patent_app_date] => 1998-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 2942 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 126 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/989/05989760.pdf [firstpage_image] =>[orig_patent_app_number] => 040471 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4104484 [patent_doc_number] => 06022644 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-02-08 [patent_title] => 'Mask containing subresolution line to minimize proximity effect of contact hole' [patent_app_type] => 1 [patent_app_number] => 9/040335 [patent_app_country] => US [patent_app_date] => 1998-03-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 3120 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/022/06022644.pdf [firstpage_image] =>[orig_patent_app_number] => 040335 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4151933 [patent_doc_number] => 06103428 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-15 [patent_title] => 'Photomask utilizing auxiliary pattern that is not transferred with the resist pattern' [patent_app_type] => 1 [patent_app_number] => 9/042711 [patent_app_country] => US [patent_app_date] => 1998-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 15 [patent_no_of_words] => 7086 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/103/06103428.pdf [firstpage_image] =>[orig_patent_app_number] => 042711 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3952802 [patent_doc_number] => 05935739 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-10 [patent_title] => 'Manufacturing method for membrane lithography mask with mask fields' [patent_app_type] => 1 [patent_app_number] => 9/040100 [patent_app_country] => US [patent_app_date] => 1998-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 10 [patent_no_of_words] => 2540 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 147 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/935/05935739.pdf [firstpage_image] =>[orig_patent_app_number] => 040100 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4000524 [patent_doc_number] => 06004700 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-21 [patent_title] => 'Membrane mask for electron beam lithography' [patent_app_type] => 1 [patent_app_number] => 9/040099 [patent_app_country] => US [patent_app_date] => 1998-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 12 [patent_no_of_words] => 3305 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/004/06004700.pdf [firstpage_image] =>[orig_patent_app_number] => 040099 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3933938 [patent_doc_number] => 05981118 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-09 [patent_title] => 'Method for charged particle beam exposure with fixed barycenter through balancing stage scan' [patent_app_type] => 1 [patent_app_number] => 9/042747 [patent_app_country] => US [patent_app_date] => 1998-03-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 15 [patent_no_of_words] => 9723 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/981/05981118.pdf [firstpage_image] =>[orig_patent_app_number] => 042747 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4152007 [patent_doc_number] => 06103433 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-08-15 [patent_title] => 'Exposure method using reticle remount for temperature influence correction' [patent_app_type] => 1 [patent_app_number] => 9/039316 [patent_app_country] => US [patent_app_date] => 1998-03-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 2422 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 71 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/103/06103433.pdf [firstpage_image] =>[orig_patent_app_number] => 039316 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4044978 [patent_doc_number] => 05968692 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-19 [patent_title] => 'Integrated circuit pattern lithography method capable of reducing the number of shots in partial batch exposure' [patent_app_type] => 1 [patent_app_number] => 9/039003 [patent_app_country] => US [patent_app_date] => 1998-03-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 8331 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 174 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/968/05968692.pdf [firstpage_image] =>[orig_patent_app_number] => 039003 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4289759 [patent_doc_number] => 06180319 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-30 [patent_title] => 'Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues' [patent_app_type] => 1 [patent_app_number] => 9/038584 [patent_app_country] => US [patent_app_date] => 1998-03-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8002 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/180/06180319.pdf [firstpage_image] =>[orig_patent_app_number] => 038584 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3931629 [patent_doc_number] => 05972541 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-26 [patent_title] => 'Reticle and method of design to correct pattern for depth of focus problems' [patent_app_type] => 1 [patent_app_number] => 9/035110 [patent_app_country] => US [patent_app_date] => 1998-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 27 [patent_no_of_words] => 11630 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/972/05972541.pdf [firstpage_image] =>[orig_patent_app_number] => 035110 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4354806 [patent_doc_number] => 06174630 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-16 [patent_title] => 'Method of proximity correction with relative segmentation' [patent_app_type] => 1 [patent_app_number] => 9/034550 [patent_app_country] => US [patent_app_date] => 1998-03-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 29 [patent_no_of_words] => 5944 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 144 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/174/06174630.pdf [firstpage_image] =>[orig_patent_app_number] => 034550 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4244034 [patent_doc_number] => 06221538 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-04-24 [patent_title] => 'Method for automating manufacture of photomask' [patent_app_type] => 1 [patent_app_number] => 9/033049 [patent_app_country] => US [patent_app_date] => 1998-03-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 3005 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 72 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/221/06221538.pdf [firstpage_image] =>[orig_patent_app_number] => 033049 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4026972 [patent_doc_number] => 05994030 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-30 [patent_title] => 'Pattern-forming method and lithographic system' [patent_app_type] => 1 [patent_app_number] => 9/030888 [patent_app_country] => US [patent_app_date] => 1998-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 13 [patent_no_of_words] => 5608 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/994/05994030.pdf [firstpage_image] =>[orig_patent_app_number] => 030888 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 3938453 [patent_doc_number] => 05989759 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-23 [patent_title] => 'Pattern forming method using alignment from latent image or base pattern on substrate' [patent_app_type] => 1 [patent_app_number] => 9/030886 [patent_app_country] => US [patent_app_date] => 1998-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 23 [patent_figures_cnt] => 38 [patent_no_of_words] => 12466 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 58 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/989/05989759.pdf [firstpage_image] =>[orig_patent_app_number] => 030886 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4070435 [patent_doc_number] => 05965303 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-12 [patent_title] => 'Method of fabricating a phase shift mask utilizing a defect repair machine' [patent_app_type] => 1 [patent_app_number] => 9/030810 [patent_app_country] => US [patent_app_date] => 1998-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 10 [patent_no_of_words] => 1639 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/965/05965303.pdf [firstpage_image] =>[orig_patent_app_number] => 030810 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 4000509 [patent_doc_number] => 06004699 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-21 [patent_title] => 'Photomask used for projection exposure with phase shifted auxiliary pattern' [patent_app_type] => 1 [patent_app_number] => 9/031107 [patent_app_country] => US [patent_app_date] => 1998-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 46 [patent_no_of_words] => 12764 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 116 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/004/06004699.pdf [firstpage_image] =>[orig_patent_app_number] => 031107 [rel_patent_id] =>[rel_patent_doc_number] =>)