| Application number | Title of the application | Filing Date | Status |
|---|
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Array
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/023407 | Method for adjusting an illumination field based on selected reticle feature | Feb 11, 1998 | Issued |
| 09/021186 | RESIST PATTERN FORMING METHOD USING ANTI-REFLECTIVE LAYER, RESIST PATTERN FORMED, AND METHOD OF ETCHING USING RESIST PATTERN AND PRODUCT FORMED | Feb 9, 1998 | Issued |
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/020080 | Method of making a reusable photolithography mask | Feb 5, 1998 | Issued |
Array
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[patent_title] => 'Method for reducing defects in a semiconductor lithographic process'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/017678 | Method for reducing defects in a semiconductor lithographic process | Feb 2, 1998 | Issued |
Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/017695 | Low cost application of oxide test wafer for defect monitor in photolithography process | Feb 2, 1998 | Issued |
| 09/017407 | OPTICAL PROXIMITY CORRECTION DURING WAFER PROCESSING THROUGH SUBFILE BIAS MODIFICATION WITH SUBSEQUENT SUBFILE MERGING | Feb 1, 1998 | Issued |
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 09/015943 | Method of applying metal layers in distinct patterns | Jan 29, 1998 | Issued |
| 09/014993 | EXPOSURE APPARATUS AND METHOD | Jan 27, 1998 | Abandoned |
Array
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| 09/007362 | METHOD OF REDUCING REGISTRATION ERROR IN EXPOSURE STEP OF SEMICONDUCTOR DEVICE | Jan 14, 1998 | Issued |
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| 08/990580 | EXPOSURE METHOD UTILIZING POST IMAGING EXPOSURE APPARATUS MOVEMENT THAT TRACES ACTUAL IMAGE PROCESS | Dec 14, 1997 | Abandoned |