Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4127806 [patent_doc_number] => 06033814 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-03-07 [patent_title] => 'Method for multiple process parameter matching' [patent_app_type] => 1 [patent_app_number] => 9/031397 [patent_app_country] => US [patent_app_date] => 1998-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 2632 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 164 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/033/06033814.pdf [firstpage_image] =>[orig_patent_app_number] => 031397 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/031397
Method for multiple process parameter matching Feb 25, 1998 Issued
Array ( [id] => 4049210 [patent_doc_number] => 05932379 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-03 [patent_title] => 'Repairing fractured wafers in semiconductor manufacturing' [patent_app_type] => 1 [patent_app_number] => 9/028966 [patent_app_country] => US [patent_app_date] => 1998-02-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 3212 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 193 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/932/05932379.pdf [firstpage_image] =>[orig_patent_app_number] => 028966 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/028966
Repairing fractured wafers in semiconductor manufacturing Feb 23, 1998 Issued
Array ( [id] => 4045248 [patent_doc_number] => 05968710 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-19 [patent_title] => 'Controlled removal of electron beam curable coatings and articles formed thereby' [patent_app_type] => 1 [patent_app_number] => 9/026542 [patent_app_country] => US [patent_app_date] => 1998-02-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 9 [patent_no_of_words] => 5359 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 12 [patent_words_short_claim] => 74 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/968/05968710.pdf [firstpage_image] =>[orig_patent_app_number] => 026542 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/026542
Controlled removal of electron beam curable coatings and articles formed thereby Feb 18, 1998 Issued
Array ( [id] => 4114816 [patent_doc_number] => 06071658 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-06-06 [patent_title] => 'Proximity effect correction method for mask production' [patent_app_type] => 1 [patent_app_number] => 9/024911 [patent_app_country] => US [patent_app_date] => 1998-02-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 7 [patent_no_of_words] => 2276 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 142 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/071/06071658.pdf [firstpage_image] =>[orig_patent_app_number] => 024911 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/024911
Proximity effect correction method for mask production Feb 16, 1998 Issued
Array ( [id] => 4150306 [patent_doc_number] => 06124064 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-26 [patent_title] => 'Light exposure controlling method' [patent_app_type] => 1 [patent_app_number] => 9/023202 [patent_app_country] => US [patent_app_date] => 1998-02-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 10 [patent_no_of_words] => 10782 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/124/06124064.pdf [firstpage_image] =>[orig_patent_app_number] => 023202 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/023202
Light exposure controlling method Feb 12, 1998 Issued
Array ( [id] => 4064606 [patent_doc_number] => 05895737 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-04-20 [patent_title] => 'Method for adjusting an illumination field based on selected reticle feature' [patent_app_type] => 1 [patent_app_number] => 9/023407 [patent_app_country] => US [patent_app_date] => 1998-02-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 5379 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/895/05895737.pdf [firstpage_image] =>[orig_patent_app_number] => 023407 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/023407
Method for adjusting an illumination field based on selected reticle feature Feb 11, 1998 Issued
09/021186 RESIST PATTERN FORMING METHOD USING ANTI-REFLECTIVE LAYER, RESIST PATTERN FORMED, AND METHOD OF ETCHING USING RESIST PATTERN AND PRODUCT FORMED Feb 9, 1998 Issued
Array ( [id] => 3921968 [patent_doc_number] => 05945238 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-31 [patent_title] => 'Method of making a reusable photolithography mask' [patent_app_type] => 1 [patent_app_number] => 9/020080 [patent_app_country] => US [patent_app_date] => 1998-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 28 [patent_no_of_words] => 3376 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/945/05945238.pdf [firstpage_image] =>[orig_patent_app_number] => 020080 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/020080
Method of making a reusable photolithography mask Feb 5, 1998 Issued
Array ( [id] => 3990223 [patent_doc_number] => 05985497 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-11-16 [patent_title] => 'Method for reducing defects in a semiconductor lithographic process' [patent_app_type] => 1 [patent_app_number] => 9/017678 [patent_app_country] => US [patent_app_date] => 1998-02-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 24 [patent_no_of_words] => 5082 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/985/05985497.pdf [firstpage_image] =>[orig_patent_app_number] => 017678 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/017678
Method for reducing defects in a semiconductor lithographic process Feb 2, 1998 Issued
Array ( [id] => 4403542 [patent_doc_number] => 06171737 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-01-09 [patent_title] => 'Low cost application of oxide test wafer for defect monitor in photolithography process' [patent_app_type] => 1 [patent_app_number] => 9/017695 [patent_app_country] => US [patent_app_date] => 1998-02-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 17 [patent_no_of_words] => 5098 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 211 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/171/06171737.pdf [firstpage_image] =>[orig_patent_app_number] => 017695 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/017695
Low cost application of oxide test wafer for defect monitor in photolithography process Feb 2, 1998 Issued
09/017407 OPTICAL PROXIMITY CORRECTION DURING WAFER PROCESSING THROUGH SUBFILE BIAS MODIFICATION WITH SUBSEQUENT SUBFILE MERGING Feb 1, 1998 Issued
Array ( [id] => 4044966 [patent_doc_number] => 05968691 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-10-19 [patent_title] => 'Method and apparatus for coating resist and developing the coated resist' [patent_app_type] => 1 [patent_app_number] => 9/016728 [patent_app_country] => US [patent_app_date] => 1998-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 21 [patent_no_of_words] => 9634 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 343 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/968/05968691.pdf [firstpage_image] =>[orig_patent_app_number] => 016728 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/016728
Method and apparatus for coating resist and developing the coated resist Jan 29, 1998 Issued
Array ( [id] => 4374874 [patent_doc_number] => 06303278 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-10-16 [patent_title] => 'Method of applying metal layers in distinct patterns' [patent_app_type] => 1 [patent_app_number] => 9/015943 [patent_app_country] => US [patent_app_date] => 1998-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3723 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/303/06303278.pdf [firstpage_image] =>[orig_patent_app_number] => 015943 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/015943
Method of applying metal layers in distinct patterns Jan 29, 1998 Issued
09/014993 EXPOSURE APPARATUS AND METHOD Jan 27, 1998 Abandoned
Array ( [id] => 4032152 [patent_doc_number] => 05942373 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-24 [patent_title] => 'Pattern or via structure formed through supplemental electron beam exposure and development to remove image residue' [patent_app_type] => 1 [patent_app_number] => 9/013000 [patent_app_country] => US [patent_app_date] => 1998-01-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 6 [patent_no_of_words] => 2577 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 152 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/942/05942373.pdf [firstpage_image] =>[orig_patent_app_number] => 013000 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/013000
Pattern or via structure formed through supplemental electron beam exposure and development to remove image residue Jan 25, 1998 Issued
09/007362 METHOD OF REDUCING REGISTRATION ERROR IN EXPOSURE STEP OF SEMICONDUCTOR DEVICE Jan 14, 1998 Issued
Array ( [id] => 4018034 [patent_doc_number] => 05906903 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-05-25 [patent_title] => 'Process tolerance calculating method relating exposure amount and focal point position to allowable dimension value' [patent_app_type] => 1 [patent_app_number] => 9/003128 [patent_app_country] => US [patent_app_date] => 1998-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 6 [patent_no_of_words] => 3193 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 213 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/906/05906903.pdf [firstpage_image] =>[orig_patent_app_number] => 003128 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/003128
Process tolerance calculating method relating exposure amount and focal point position to allowable dimension value Jan 5, 1998 Issued
Array ( [id] => 4231009 [patent_doc_number] => 06117619 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2000-09-12 [patent_title] => 'Low temperature anti-reflective coating for IC lithography' [patent_app_type] => 1 [patent_app_number] => 9/002732 [patent_app_country] => US [patent_app_date] => 1998-01-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 4996 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 121 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/117/06117619.pdf [firstpage_image] =>[orig_patent_app_number] => 002732 [rel_patent_id] =>[rel_patent_doc_number] =>)
09/002732
Low temperature anti-reflective coating for IC lithography Jan 4, 1998 Issued
Array ( [id] => 4061604 [patent_doc_number] => 06007951 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-12-28 [patent_title] => 'Method for precise crystallographic semiconductor wafer alignment orientation' [patent_app_type] => 1 [patent_app_number] => 8/995087 [patent_app_country] => US [patent_app_date] => 1997-12-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 14 [patent_no_of_words] => 2482 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/007/06007951.pdf [firstpage_image] =>[orig_patent_app_number] => 995087 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/995087
Method for precise crystallographic semiconductor wafer alignment orientation Dec 18, 1997 Issued
08/990580 EXPOSURE METHOD UTILIZING POST IMAGING EXPOSURE APPARATUS MOVEMENT THAT TRACES ACTUAL IMAGE PROCESS Dec 14, 1997 Abandoned
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