| Application number | Title of the application | Filing Date | Status |
|---|
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[patent_issue_date] => 1999-03-30
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[patent_app_number] => 8/775194
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Array
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[patent_doc_number] => 05888682
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[patent_issue_date] => 1999-03-30
[patent_title] => 'Method of using a compensation mask to correct particle beam proximity-effect'
[patent_app_type] => 1
[patent_app_number] => 8/774902
[patent_app_country] => US
[patent_app_date] => 1996-12-27
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Array
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[patent_doc_number] => 05770338
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[patent_kind] => NA
[patent_issue_date] => 1998-06-23
[patent_title] => 'Phase shifting overlay mark that measures exposure energy and focus'
[patent_app_type] => 1
[patent_app_number] => 8/774845
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[patent_app_date] => 1996-12-27
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Array
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[id] => 4010061
[patent_doc_number] => 05879844
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[patent_issue_date] => 1999-03-09
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/762877 | Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer | Dec 11, 1996 | Issued |
Array
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[id] => 3685689
[patent_doc_number] => 05691112
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[patent_kind] => NA
[patent_issue_date] => 1997-11-25
[patent_title] => 'Sulfonium salt and chemically amplified positive resist composition'
[patent_app_type] => 1
[patent_app_number] => 8/762861
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[patent_app_date] => 1996-12-10
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[pdf_file] => patents/05/691/05691112.pdf
[firstpage_image] =>[orig_patent_app_number] => 762861
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/762861 | Sulfonium salt and chemically amplified positive resist composition | Dec 9, 1996 | Issued |
Array
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[id] => 3884107
[patent_doc_number] => 05714286
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-02-03
[patent_title] => 'Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof'
[patent_app_type] => 1
[patent_app_number] => 8/759716
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 759716
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/759716 | Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof | Dec 5, 1996 | Issued |
| 08/761830 | SCANNING EXPOSURE APPARATUS AND SCANNING EXPOSURE METHOD | Dec 5, 1996 | Abandoned |
Array
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[id] => 3783512
[patent_doc_number] => 05840451
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[patent_issue_date] => 1998-11-24
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[patent_app_number] => 8/760029
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Array
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[id] => 4003819
[patent_doc_number] => 05888675
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[patent_issue_date] => 1999-03-30
[patent_title] => 'Reticle that compensates for radiation-induced lens error in a photolithographic system'
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Array
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Array
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[patent_title] => 'Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer'
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[id] => 3857014
[patent_doc_number] => 05792580
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[patent_kind] => NA
[patent_issue_date] => 1998-08-11
[patent_title] => 'Method of aligning reticle pattern'
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| 08/747908 | POSITIVE ELECTRON BEAM RESIST COMPOSITION, AND A DEVELOPER FOR THE POSITIVE ELECTRON BEAM RESIST | Nov 11, 1996 | Abandoned |
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