Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3930827 [patent_doc_number] => 05939226 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-17 [patent_title] => 'Aberration estimation reticle for determining overlay error' [patent_app_type] => 1 [patent_app_number] => 8/780265 [patent_app_country] => US [patent_app_date] => 1997-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 38 [patent_no_of_words] => 9238 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/939/05939226.pdf [firstpage_image] =>[orig_patent_app_number] => 780265 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/780265
Aberration estimation reticle for determining overlay error Jan 7, 1997 Issued
Array ( [id] => 4004208 [patent_doc_number] => 05888703 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-03-30 [patent_title] => 'Method of forming resist pattern utilizing antireflective layer containing rosin or hydrogenated rosin' [patent_app_type] => 1 [patent_app_number] => 8/775194 [patent_app_country] => US [patent_app_date] => 1996-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2424 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 93 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/888/05888703.pdf [firstpage_image] =>[orig_patent_app_number] => 775194 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/775194
Method of forming resist pattern utilizing antireflective layer containing rosin or hydrogenated rosin Dec 29, 1996 Issued
Array ( [id] => 4003913 [patent_doc_number] => 05888682 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-03-30 [patent_title] => 'Method of using a compensation mask to correct particle beam proximity-effect' [patent_app_type] => 1 [patent_app_number] => 8/774902 [patent_app_country] => US [patent_app_date] => 1996-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 5274 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 161 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/888/05888682.pdf [firstpage_image] =>[orig_patent_app_number] => 774902 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/774902
Method of using a compensation mask to correct particle beam proximity-effect Dec 26, 1996 Issued
Array ( [id] => 3812982 [patent_doc_number] => 05770338 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-06-23 [patent_title] => 'Phase shifting overlay mark that measures exposure energy and focus' [patent_app_type] => 1 [patent_app_number] => 8/774845 [patent_app_country] => US [patent_app_date] => 1996-12-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 1902 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 69 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/770/05770338.pdf [firstpage_image] =>[orig_patent_app_number] => 774845 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/774845
Phase shifting overlay mark that measures exposure energy and focus Dec 26, 1996 Issued
Array ( [id] => 4010061 [patent_doc_number] => 05879844 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-03-09 [patent_title] => 'Optical proximity correction method' [patent_app_type] => 1 [patent_app_number] => 8/771252 [patent_app_country] => US [patent_app_date] => 1996-12-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 38 [patent_figures_cnt] => 6 [patent_no_of_words] => 18576 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/879/05879844.pdf [firstpage_image] =>[orig_patent_app_number] => 771252 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/771252
Optical proximity correction method Dec 19, 1996 Issued
Array ( [id] => 3922193 [patent_doc_number] => 05945254 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-08-31 [patent_title] => 'Fabrication process for multichip modules using low temperature bake and cure' [patent_app_type] => 1 [patent_app_number] => 8/768599 [patent_app_country] => US [patent_app_date] => 1996-12-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3004 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/945/05945254.pdf [firstpage_image] =>[orig_patent_app_number] => 768599 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/768599
Fabrication process for multichip modules using low temperature bake and cure Dec 17, 1996 Issued
Array ( [id] => 3881989 [patent_doc_number] => 05776659 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-07-07 [patent_title] => 'Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer' [patent_app_type] => 1 [patent_app_number] => 8/762877 [patent_app_country] => US [patent_app_date] => 1996-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 64 [patent_no_of_words] => 12822 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 208 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/776/05776659.pdf [firstpage_image] =>[orig_patent_app_number] => 762877 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/762877
Ionizing radiation exposure method utilizing water soluble aniline antistatic polymer layer Dec 11, 1996 Issued
Array ( [id] => 3685689 [patent_doc_number] => 05691112 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-11-25 [patent_title] => 'Sulfonium salt and chemically amplified positive resist composition' [patent_app_type] => 1 [patent_app_number] => 8/762861 [patent_app_country] => US [patent_app_date] => 1996-12-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8306 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/691/05691112.pdf [firstpage_image] =>[orig_patent_app_number] => 762861 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/762861
Sulfonium salt and chemically amplified positive resist composition Dec 9, 1996 Issued
Array ( [id] => 3884107 [patent_doc_number] => 05714286 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-02-03 [patent_title] => 'Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof' [patent_app_type] => 1 [patent_app_number] => 8/759716 [patent_app_country] => US [patent_app_date] => 1996-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5152 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 54 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/714/05714286.pdf [firstpage_image] =>[orig_patent_app_number] => 759716 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/759716
Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof Dec 5, 1996 Issued
08/761830 SCANNING EXPOSURE APPARATUS AND SCANNING EXPOSURE METHOD Dec 5, 1996 Abandoned
Array ( [id] => 3783512 [patent_doc_number] => 05840451 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-11-24 [patent_title] => 'Individually controllable radiation sources for providing an image pattern in a photolithographic system' [patent_app_type] => 1 [patent_app_number] => 8/760029 [patent_app_country] => US [patent_app_date] => 1996-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 5443 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/840/05840451.pdf [firstpage_image] =>[orig_patent_app_number] => 760029 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/760029
Individually controllable radiation sources for providing an image pattern in a photolithographic system Dec 3, 1996 Issued
Array ( [id] => 4003819 [patent_doc_number] => 05888675 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-03-30 [patent_title] => 'Reticle that compensates for radiation-induced lens error in a photolithographic system' [patent_app_type] => 1 [patent_app_number] => 8/760031 [patent_app_country] => US [patent_app_date] => 1996-12-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 13 [patent_no_of_words] => 5054 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/888/05888675.pdf [firstpage_image] =>[orig_patent_app_number] => 760031 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/760031
Reticle that compensates for radiation-induced lens error in a photolithographic system Dec 3, 1996 Issued
Array ( [id] => 3871005 [patent_doc_number] => 05824441 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-10-20 [patent_title] => 'Lithographic process for device fabrication utilizing back-scattered electron beam signal intensity for alignment' [patent_app_type] => 1 [patent_app_number] => 8/753855 [patent_app_country] => US [patent_app_date] => 1996-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 6131 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 201 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/824/05824441.pdf [firstpage_image] =>[orig_patent_app_number] => 753855 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/753855
Lithographic process for device fabrication utilizing back-scattered electron beam signal intensity for alignment Dec 2, 1996 Issued
Array ( [id] => 3755967 [patent_doc_number] => 05721078 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-02-24 [patent_title] => 'Magnetoresistance thin film element formed through use of a resist pattern of T-shaped cross section' [patent_app_type] => 1 [patent_app_number] => 8/757629 [patent_app_country] => US [patent_app_date] => 1996-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 37 [patent_no_of_words] => 10105 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 301 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/721/05721078.pdf [firstpage_image] =>[orig_patent_app_number] => 757629 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/757629
Magnetoresistance thin film element formed through use of a resist pattern of T-shaped cross section Dec 1, 1996 Issued
Array ( [id] => 3872571 [patent_doc_number] => 05747198 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-05-05 [patent_title] => 'Resist pattern of T-shaped cross section' [patent_app_type] => 1 [patent_app_number] => 8/758676 [patent_app_country] => US [patent_app_date] => 1996-12-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 37 [patent_no_of_words] => 10105 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 263 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/747/05747198.pdf [firstpage_image] =>[orig_patent_app_number] => 758676 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/758676
Resist pattern of T-shaped cross section Dec 1, 1996 Issued
Array ( [id] => 4059945 [patent_doc_number] => 05866281 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-02-02 [patent_title] => 'Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts' [patent_app_type] => 1 [patent_app_number] => 8/753645 [patent_app_country] => US [patent_app_date] => 1996-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 36 [patent_no_of_words] => 16034 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/866/05866281.pdf [firstpage_image] =>[orig_patent_app_number] => 753645 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/753645
Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts Nov 26, 1996 Issued
Array ( [id] => 3846508 [patent_doc_number] => 05766819 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-06-16 [patent_title] => 'Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer' [patent_app_type] => 1 [patent_app_number] => 8/757717 [patent_app_country] => US [patent_app_date] => 1996-11-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 10 [patent_no_of_words] => 22415 [patent_no_of_claims] => 39 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/766/05766819.pdf [firstpage_image] =>[orig_patent_app_number] => 757717 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/757717
Donor elements, assemblages, and associated processes with flexible ejection layer(s) for laser-induced thermal transfer Nov 25, 1996 Issued
Array ( [id] => 3857014 [patent_doc_number] => 05792580 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-08-11 [patent_title] => 'Method of aligning reticle pattern' [patent_app_type] => 1 [patent_app_number] => 8/746952 [patent_app_country] => US [patent_app_date] => 1996-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 10 [patent_no_of_words] => 3632 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 131 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/792/05792580.pdf [firstpage_image] =>[orig_patent_app_number] => 746952 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/746952
Method of aligning reticle pattern Nov 17, 1996 Issued
08/747908 POSITIVE ELECTRON BEAM RESIST COMPOSITION, AND A DEVELOPER FOR THE POSITIVE ELECTRON BEAM RESIST Nov 11, 1996 Abandoned
Array ( [id] => 3661883 [patent_doc_number] => 05667940 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-09-16 [patent_title] => 'Process for creating high density integrated circuits utilizing double coating photoresist mask' [patent_app_type] => 1 [patent_app_number] => 8/746147 [patent_app_country] => US [patent_app_date] => 1996-11-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 9 [patent_no_of_words] => 1619 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 216 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/667/05667940.pdf [firstpage_image] =>[orig_patent_app_number] => 746147 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/746147
Process for creating high density integrated circuits utilizing double coating photoresist mask Nov 5, 1996 Issued
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