| Application number | Title of the application | Filing Date | Status |
|---|
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Array
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[patent_issue_date] => 1998-12-01
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Array
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[patent_doc_number] => 05795688
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-18
[patent_title] => 'Process for detecting defects in photomasks through aerial image comparisons'
[patent_app_type] => 1
[patent_app_number] => 8/696652
[patent_app_country] => US
[patent_app_date] => 1996-08-14
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Array
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[patent_doc_number] => 05817442
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[patent_kind] => NA
[patent_issue_date] => 1998-10-06
[patent_title] => 'Pattern projection method with charged particle beam utilizing continuous movement to perform projection'
[patent_app_type] => 1
[patent_app_number] => 8/696050
[patent_app_country] => US
[patent_app_date] => 1996-08-13
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Array
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Array
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[patent_issue_date] => 1998-03-10
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Array
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Array
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[id] => 3892440
[patent_doc_number] => 05750294
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-12
[patent_title] => 'Best focus determining method'
[patent_app_type] => 1
[patent_app_number] => 8/685464
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[firstpage_image] =>[orig_patent_app_number] => 685464
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/685464 | Best focus determining method | Jul 23, 1996 | Issued |
Array
(
[id] => 3857030
[patent_doc_number] => 05792581
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-11
[patent_title] => 'Method of correcting pattern data for drawing photomask to overcome proximity effects'
[patent_app_type] => 1
[patent_app_number] => 8/681524
[patent_app_country] => US
[patent_app_date] => 1996-07-23
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/681524 | Method of correcting pattern data for drawing photomask to overcome proximity effects | Jul 22, 1996 | Issued |
| 08/679280 | METHOD OF SEQUENTIAL EXPOSURE WITH ALIGNMENT TO CORRECT FOCUS OFFSET | Jul 11, 1996 | Abandoned |
| 08/678788 | METHOD FOR POSITIONING SUBSTRATE | Jul 10, 1996 | Abandoned |
Array
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[id] => 3905879
[patent_doc_number] => 05897980
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[patent_issue_date] => 1999-04-27
[patent_title] => 'Method of imparting contrast enhancement properties to diffusing, depixelating or projection screens'
[patent_app_type] => 1
[patent_app_number] => 8/680319
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Array
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[patent_doc_number] => 05700620
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-23
[patent_title] => 'Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound'
[patent_app_type] => 1
[patent_app_number] => 8/676917
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Array
(
[id] => 3737095
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Array
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[id] => 3733136
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[patent_issue_date] => 1997-12-16
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[id] => 3661840
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[patent_issue_date] => 1997-09-16
[patent_title] => 'Method of solid imaging a photohardenable composition utilizing argon laser at 351 nm and 364 nm'
[patent_app_type] => 1
[patent_app_number] => 8/674413
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/674413 | Method of solid imaging a photohardenable composition utilizing argon laser at 351 nm and 364 nm | Jul 1, 1996 | Issued |
| 08/674378 | PROCESS FOR PRODUCING A LITHOGRAPHIC RETICLE AND FABRICATING SEMICONDUCTOR DEVICES USING SAME | Jul 1, 1996 | Abandoned |
Array
(
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