| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3880289
[patent_doc_number] => 05798196
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-25
[patent_title] => 'Pattern transfer method utilizing distribution condition evaluation by charged particle beam'
[patent_app_type] => 1
[patent_app_number] => 8/673561
[patent_app_country] => US
[patent_app_date] => 1996-07-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 5487
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/798/05798196.pdf
[firstpage_image] =>[orig_patent_app_number] => 673561
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/673561 | Pattern transfer method utilizing distribution condition evaluation by charged particle beam | Jun 30, 1996 | Issued |
Array
(
[id] => 3738437
[patent_doc_number] => 05786113
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-07-28
[patent_title] => 'Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof'
[patent_app_type] => 1
[patent_app_number] => 8/670768
[patent_app_country] => US
[patent_app_date] => 1996-06-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 25
[patent_no_of_words] => 7909
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 162
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/786/05786113.pdf
[firstpage_image] =>[orig_patent_app_number] => 670768
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/670768 | Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof | Jun 23, 1996 | Issued |
Array
(
[id] => 3765778
[patent_doc_number] => 05773180
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-30
[patent_title] => 'Measuring method of a relative positional deviation of reticle pattern'
[patent_app_type] => 1
[patent_app_number] => 8/663812
[patent_app_country] => US
[patent_app_date] => 1996-06-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 10
[patent_no_of_words] => 5642
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/773/05773180.pdf
[firstpage_image] =>[orig_patent_app_number] => 663812
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/663812 | Measuring method of a relative positional deviation of reticle pattern | Jun 13, 1996 | Issued |
Array
(
[id] => 3783495
[patent_doc_number] => 05736281
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-07
[patent_title] => 'Dose modification proximity effect compensation (PEC) technique for electron beam lithography'
[patent_app_type] => 1
[patent_app_number] => 8/660632
[patent_app_country] => US
[patent_app_date] => 1996-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 8
[patent_no_of_words] => 5944
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 129
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/736/05736281.pdf
[firstpage_image] =>[orig_patent_app_number] => 660632
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/660632 | Dose modification proximity effect compensation (PEC) technique for electron beam lithography | Jun 6, 1996 | Issued |
Array
(
[id] => 4032042
[patent_doc_number] => 05856058
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-01-05
[patent_title] => 'Chemical-sensitization positive-working photoresist composition'
[patent_app_type] => 1
[patent_app_number] => 8/660378
[patent_app_country] => US
[patent_app_date] => 1996-06-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5424
[patent_no_of_claims] => 48
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 122
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/856/05856058.pdf
[firstpage_image] =>[orig_patent_app_number] => 660378
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/660378 | Chemical-sensitization positive-working photoresist composition | Jun 6, 1996 | Issued |
Array
(
[id] => 3854189
[patent_doc_number] => 05705319
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-06
[patent_title] => 'Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers'
[patent_app_type] => 1
[patent_app_number] => 8/656972
[patent_app_country] => US
[patent_app_date] => 1996-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 26
[patent_no_of_words] => 5682
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 222
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/705/05705319.pdf
[firstpage_image] =>[orig_patent_app_number] => 656972
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/656972 | Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers | Jun 5, 1996 | Issued |
Array
(
[id] => 3758806
[patent_doc_number] => 05741625
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-04-21
[patent_title] => 'Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material'
[patent_app_type] => 1
[patent_app_number] => 8/659741
[patent_app_country] => US
[patent_app_date] => 1996-06-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 26
[patent_no_of_words] => 5683
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 291
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/741/05741625.pdf
[firstpage_image] =>[orig_patent_app_number] => 659741
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/659741 | Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material | Jun 5, 1996 | Issued |
Array
(
[id] => 3728777
[patent_doc_number] => 05635336
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-06-03
[patent_title] => 'Method for the preparation of a pattern overlay accuracy-measuring mark'
[patent_app_type] => 1
[patent_app_number] => 8/654579
[patent_app_country] => US
[patent_app_date] => 1996-05-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 2128
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 182
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/635/05635336.pdf
[firstpage_image] =>[orig_patent_app_number] => 654579
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/654579 | Method for the preparation of a pattern overlay accuracy-measuring mark | May 28, 1996 | Issued |
Array
(
[id] => 3737123
[patent_doc_number] => 05753407
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-05-19
[patent_title] => 'Polyamic acid composition'
[patent_app_type] => 1
[patent_app_number] => 8/653319
[patent_app_country] => US
[patent_app_date] => 1996-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 18232
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 179
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/753/05753407.pdf
[firstpage_image] =>[orig_patent_app_number] => 653319
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/653319 | Polyamic acid composition | May 23, 1996 | Issued |
Array
(
[id] => 3822695
[patent_doc_number] => 05731113
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-24
[patent_title] => 'Method of reducing registration error in exposure step of semiconductor device'
[patent_app_type] => 1
[patent_app_number] => 8/653146
[patent_app_country] => US
[patent_app_date] => 1996-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 7
[patent_no_of_words] => 4031
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 204
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/731/05731113.pdf
[firstpage_image] =>[orig_patent_app_number] => 653146
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/653146 | Method of reducing registration error in exposure step of semiconductor device | May 23, 1996 | Issued |
Array
(
[id] => 3661734
[patent_doc_number] => 05667930
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-09-16
[patent_title] => 'Photoresist composition containing 4,6-(bis)chloromethyl-5-triazine initiator'
[patent_app_type] => 1
[patent_app_number] => 8/650380
[patent_app_country] => US
[patent_app_date] => 1996-05-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2094
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 99
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/667/05667930.pdf
[firstpage_image] =>[orig_patent_app_number] => 650380
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/650380 | Photoresist composition containing 4,6-(bis)chloromethyl-5-triazine initiator | May 19, 1996 | Issued |
Array
(
[id] => 3684950
[patent_doc_number] => 05695905
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-12-09
[patent_title] => 'Photosensitive compositions and lithographic printing plates utilizing oxazoline modified acid polymers'
[patent_app_type] => 1
[patent_app_number] => 8/649350
[patent_app_country] => US
[patent_app_date] => 1996-05-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7995
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 195
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/695/05695905.pdf
[firstpage_image] =>[orig_patent_app_number] => 649350
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/649350 | Photosensitive compositions and lithographic printing plates utilizing oxazoline modified acid polymers | May 16, 1996 | Issued |
Array
(
[id] => 3883577
[patent_doc_number] => 05723256
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-03-03
[patent_title] => 'Color image forming process through transfer of image portion to receiving material, via cushion layer'
[patent_app_type] => 1
[patent_app_number] => 8/665005
[patent_app_country] => US
[patent_app_date] => 1996-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7715
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 109
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/723/05723256.pdf
[firstpage_image] =>[orig_patent_app_number] => 665005
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/665005 | Color image forming process through transfer of image portion to receiving material, via cushion layer | May 14, 1996 | Issued |
Array
(
[id] => 3699521
[patent_doc_number] => 05674662
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-10-07
[patent_title] => 'Process for removing metal ions from organic photoresist solutions'
[patent_app_type] => 1
[patent_app_number] => 8/648408
[patent_app_country] => US
[patent_app_date] => 1996-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1912
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 94
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/674/05674662.pdf
[firstpage_image] =>[orig_patent_app_number] => 648408
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/648408 | Process for removing metal ions from organic photoresist solutions | May 14, 1996 | Issued |
Array
(
[id] => 3810991
[patent_doc_number] => 05709970
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-20
[patent_title] => 'Mask having a pattern for detecting illuminance nonuniformity'
[patent_app_type] => 1
[patent_app_number] => 8/647705
[patent_app_country] => US
[patent_app_date] => 1996-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 6
[patent_no_of_words] => 2948
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 71
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/709/05709970.pdf
[firstpage_image] =>[orig_patent_app_number] => 647705
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/647705 | Mask having a pattern for detecting illuminance nonuniformity | May 13, 1996 | Issued |
| 08/647106 | POSITIVE-WORKING RESIST COMPOSITION | May 8, 1996 | Abandoned |
Array
(
[id] => 3765924
[patent_doc_number] => 05773187
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-30
[patent_title] => 'Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates'
[patent_app_type] => 1
[patent_app_number] => 8/640702
[patent_app_country] => US
[patent_app_date] => 1996-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6204
[patent_no_of_claims] => 26
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/773/05773187.pdf
[firstpage_image] =>[orig_patent_app_number] => 640702
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/640702 | Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates | Apr 30, 1996 | Issued |
Array
(
[id] => 3854123
[patent_doc_number] => 05705315
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-01-06
[patent_title] => 'Image-receiving material for production of a color image utilizing a transferred white pigment layer'
[patent_app_type] => 1
[patent_app_number] => 8/641263
[patent_app_country] => US
[patent_app_date] => 1996-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6389
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 103
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/705/05705315.pdf
[firstpage_image] =>[orig_patent_app_number] => 641263
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/641263 | Image-receiving material for production of a color image utilizing a transferred white pigment layer | Apr 29, 1996 | Issued |
Array
(
[id] => 3811098
[patent_doc_number] => 05789140
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-08-04
[patent_title] => 'Method of forming a pattern or via structure utilizing supplemental electron beam exposure and development to remove image residue'
[patent_app_type] => 1
[patent_app_number] => 8/639283
[patent_app_country] => US
[patent_app_date] => 1996-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 6
[patent_no_of_words] => 2577
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/789/05789140.pdf
[firstpage_image] =>[orig_patent_app_number] => 639283
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/639283 | Method of forming a pattern or via structure utilizing supplemental electron beam exposure and development to remove image residue | Apr 24, 1996 | Issued |
Array
(
[id] => 3846319
[patent_doc_number] => 05766807
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-06-16
[patent_title] => 'Halftone screen and methods for making and using the same'
[patent_app_type] => 1
[patent_app_number] => 8/637110
[patent_app_country] => US
[patent_app_date] => 1996-04-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 8
[patent_no_of_words] => 7460
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/766/05766807.pdf
[firstpage_image] =>[orig_patent_app_number] => 637110
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/637110 | Halftone screen and methods for making and using the same | Apr 23, 1996 | Issued |