| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_doc_number] => 05523191
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-06-04
[patent_title] => 'Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product'
[patent_app_type] => 1
[patent_app_number] => 8/379190
[patent_app_country] => US
[patent_app_date] => 1995-01-27
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[firstpage_image] =>[orig_patent_app_number] => 379190
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/379190 | Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product | Jan 26, 1995 | Issued |
| 08/379188 | POSITIVE PHOTORESIST COMPOSITION | Jan 26, 1995 | Abandoned |
| 08/377730 | ANTIREFLECTIVE LAYER FOR A SEMICONDUCTOR | Jan 24, 1995 | Abandoned |
| 08/374906 | POSITIVE-WORKING RECORDING MATERIAL DEVELOPABLE IN WEAKLY ALKALINE DEVELOPERS | Jan 18, 1995 | Abandoned |
Array
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[patent_doc_number] => 05837417
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1998-11-17
[patent_title] => 'Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition'
[patent_app_type] => 1
[patent_app_number] => 8/366635
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[firstpage_image] =>[orig_patent_app_number] => 366635
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/366635 | Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition | Dec 29, 1994 | Issued |
Array
(
[id] => 3728736
[patent_doc_number] => 05635333
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-06-03
[patent_title] => 'Antireflective coating process'
[patent_app_type] => 1
[patent_app_number] => 8/365198
[patent_app_country] => US
[patent_app_date] => 1994-12-28
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[firstpage_image] =>[orig_patent_app_number] => 365198
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/365198 | Antireflective coating process | Dec 27, 1994 | Issued |
Array
(
[id] => 3555625
[patent_doc_number] => 05501936
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-03-26
[patent_title] => 'Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound'
[patent_app_type] => 1
[patent_app_number] => 8/362857
[patent_app_country] => US
[patent_app_date] => 1994-12-23
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[pdf_file] => patents/05/501/05501936.pdf
[firstpage_image] =>[orig_patent_app_number] => 362857
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/362857 | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Dec 22, 1994 | Issued |
| 08/373121 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES | Dec 22, 1994 | Abandoned |
| 08/362924 | RADIATION RAY SENSITIVE RESIN COMPOSITION | Dec 22, 1994 | Abandoned |
Array
(
[id] => 3548401
[patent_doc_number] => 05547806
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-08-20
[patent_title] => 'Process for producing microcapsule containing diazonium salt compound and photo- and heat-sensitive recording material produced using the same'
[patent_app_type] => 1
[patent_app_number] => 8/360263
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[firstpage_image] =>[orig_patent_app_number] => 360263
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Array
(
[id] => 3537137
[patent_doc_number] => 05494784
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[patent_kind] => NA
[patent_issue_date] => 1996-02-27
[patent_title] => 'Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent'
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[firstpage_image] =>[orig_patent_app_number] => 357400
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/357400 | Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent | Dec 15, 1994 | Issued |
Array
(
[id] => 4418687
[patent_doc_number] => 06225040
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2001-05-01
[patent_title] => 'Permanent antistatic primer layer'
[patent_app_type] => 1
[patent_app_number] => 8/356573
[patent_app_country] => US
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[firstpage_image] =>[orig_patent_app_number] => 356573
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/356573 | Permanent antistatic primer layer | Dec 14, 1994 | Issued |
Array
(
[id] => 3728763
[patent_doc_number] => 05635335
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-06-03
[patent_title] => 'Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask'
[patent_app_type] => 1
[patent_app_number] => 8/353921
[patent_app_country] => US
[patent_app_date] => 1994-12-12
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[firstpage_image] =>[orig_patent_app_number] => 353921
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/353921 | Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask | Dec 11, 1994 | Issued |
Array
(
[id] => 3560094
[patent_doc_number] => 05525457
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-06-11
[patent_title] => 'Reflection preventing film and process for forming resist pattern using the same'
[patent_app_type] => 1
[patent_app_number] => 8/354847
[patent_app_country] => US
[patent_app_date] => 1994-12-09
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[firstpage_image] =>[orig_patent_app_number] => 354847
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/354847 | Reflection preventing film and process for forming resist pattern using the same | Dec 8, 1994 | Issued |
| 08/349712 | METHOD FOR FABRICATING A PLANAR THIN FILM STRUCTURE | Dec 4, 1994 | Abandoned |
Array
(
[id] => 3522971
[patent_doc_number] => 05527660
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[patent_kind] => NA
[patent_issue_date] => 1996-06-18
[patent_title] => 'Laminar imaging medium utilizing hydrophobic cycloaliphatic polyepoxide in the fracturable layers'
[patent_app_type] => 1
[patent_app_number] => 8/347269
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[firstpage_image] =>[orig_patent_app_number] => 347269
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/347269 | Laminar imaging medium utilizing hydrophobic cycloaliphatic polyepoxide in the fracturable layers | Nov 29, 1994 | Issued |
Array
(
[id] => 3418195
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-26
[patent_title] => 'Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4\'-bis(dialkylamino)benzophenone'
[patent_app_type] => 1
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Array
(
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[patent_issue_date] => 1996-07-09
[patent_title] => 'Process of forming a colored image utilizing aqueous-processable imaging element tonable at room temperature before and after exposure to actinic radiation'
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Array
(
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[patent_kind] => NA
[patent_issue_date] => 1997-06-10
[patent_title] => 'Photosensitive material and production of metal-colored images utilizing pearl luster pigment'
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Array
(
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[patent_issue_date] => 1996-09-03
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[rel_patent_id] =>[rel_patent_doc_number] =>) 08/344342 | Article utilizing quinone diazide resist layer on tantalum substrate surface | Nov 21, 1994 | Issued |