Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3573517 [patent_doc_number] => 05523191 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-06-04 [patent_title] => 'Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product' [patent_app_type] => 1 [patent_app_number] => 8/379190 [patent_app_country] => US [patent_app_date] => 1995-01-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3133 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 146 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/523/05523191.pdf [firstpage_image] =>[orig_patent_app_number] => 379190 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/379190
Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product Jan 26, 1995 Issued
08/379188 POSITIVE PHOTORESIST COMPOSITION Jan 26, 1995 Abandoned
08/377730 ANTIREFLECTIVE LAYER FOR A SEMICONDUCTOR Jan 24, 1995 Abandoned
08/374906 POSITIVE-WORKING RECORDING MATERIAL DEVELOPABLE IN WEAKLY ALKALINE DEVELOPERS Jan 18, 1995 Abandoned
Array ( [id] => 3864750 [patent_doc_number] => 05837417 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1998-11-17 [patent_title] => 'Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition' [patent_app_type] => 1 [patent_app_number] => 8/366635 [patent_app_country] => US [patent_app_date] => 1994-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4901 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 212 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/837/05837417.pdf [firstpage_image] =>[orig_patent_app_number] => 366635 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/366635
Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition Dec 29, 1994 Issued
Array ( [id] => 3728736 [patent_doc_number] => 05635333 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-06-03 [patent_title] => 'Antireflective coating process' [patent_app_type] => 1 [patent_app_number] => 8/365198 [patent_app_country] => US [patent_app_date] => 1994-12-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4321 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/635/05635333.pdf [firstpage_image] =>[orig_patent_app_number] => 365198 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/365198
Antireflective coating process Dec 27, 1994 Issued
Array ( [id] => 3555625 [patent_doc_number] => 05501936 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-03-26 [patent_title] => 'Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound' [patent_app_type] => 1 [patent_app_number] => 8/362857 [patent_app_country] => US [patent_app_date] => 1994-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5576 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/501/05501936.pdf [firstpage_image] =>[orig_patent_app_number] => 362857 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/362857
Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound Dec 22, 1994 Issued
08/373121 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES Dec 22, 1994 Abandoned
08/362924 RADIATION RAY SENSITIVE RESIN COMPOSITION Dec 22, 1994 Abandoned
Array ( [id] => 3548401 [patent_doc_number] => 05547806 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-08-20 [patent_title] => 'Process for producing microcapsule containing diazonium salt compound and photo- and heat-sensitive recording material produced using the same' [patent_app_type] => 1 [patent_app_number] => 8/360263 [patent_app_country] => US [patent_app_date] => 1994-12-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4344 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 89 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/547/05547806.pdf [firstpage_image] =>[orig_patent_app_number] => 360263 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/360263
Process for producing microcapsule containing diazonium salt compound and photo- and heat-sensitive recording material produced using the same Dec 20, 1994 Issued
Array ( [id] => 3537137 [patent_doc_number] => 05494784 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-02-27 [patent_title] => 'Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent' [patent_app_type] => 1 [patent_app_number] => 8/357400 [patent_app_country] => US [patent_app_date] => 1994-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6413 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 225 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/494/05494784.pdf [firstpage_image] =>[orig_patent_app_number] => 357400 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/357400
Method of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solvent Dec 15, 1994 Issued
Array ( [id] => 4418687 [patent_doc_number] => 06225040 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 2001-05-01 [patent_title] => 'Permanent antistatic primer layer' [patent_app_type] => 1 [patent_app_number] => 8/356573 [patent_app_country] => US [patent_app_date] => 1994-12-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7941 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/225/06225040.pdf [firstpage_image] =>[orig_patent_app_number] => 356573 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/356573
Permanent antistatic primer layer Dec 14, 1994 Issued
Array ( [id] => 3728763 [patent_doc_number] => 05635335 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-06-03 [patent_title] => 'Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask' [patent_app_type] => 1 [patent_app_number] => 8/353921 [patent_app_country] => US [patent_app_date] => 1994-12-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 8 [patent_no_of_words] => 1960 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/635/05635335.pdf [firstpage_image] =>[orig_patent_app_number] => 353921 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/353921
Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask Dec 11, 1994 Issued
Array ( [id] => 3560094 [patent_doc_number] => 05525457 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-06-11 [patent_title] => 'Reflection preventing film and process for forming resist pattern using the same' [patent_app_type] => 1 [patent_app_number] => 8/354847 [patent_app_country] => US [patent_app_date] => 1994-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8073 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 229 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/525/05525457.pdf [firstpage_image] =>[orig_patent_app_number] => 354847 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/354847
Reflection preventing film and process for forming resist pattern using the same Dec 8, 1994 Issued
08/349712 METHOD FOR FABRICATING A PLANAR THIN FILM STRUCTURE Dec 4, 1994 Abandoned
Array ( [id] => 3522971 [patent_doc_number] => 05527660 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-06-18 [patent_title] => 'Laminar imaging medium utilizing hydrophobic cycloaliphatic polyepoxide in the fracturable layers' [patent_app_type] => 1 [patent_app_number] => 8/347269 [patent_app_country] => US [patent_app_date] => 1994-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 11039 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 216 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/527/05527660.pdf [firstpage_image] =>[orig_patent_app_number] => 347269 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/347269
Laminar imaging medium utilizing hydrophobic cycloaliphatic polyepoxide in the fracturable layers Nov 29, 1994 Issued
Array ( [id] => 3418195 [patent_doc_number] => 05478692 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-12-26 [patent_title] => 'Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4\'-bis(dialkylamino)benzophenone' [patent_app_type] => 1 [patent_app_number] => 8/350128 [patent_app_country] => US [patent_app_date] => 1994-11-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5671 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/478/05478692.pdf [firstpage_image] =>[orig_patent_app_number] => 350128 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/350128
Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone Nov 28, 1994 Issued
Array ( [id] => 3611533 [patent_doc_number] => 05534380 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-07-09 [patent_title] => 'Process of forming a colored image utilizing aqueous-processable imaging element tonable at room temperature before and after exposure to actinic radiation' [patent_app_type] => 1 [patent_app_number] => 8/345175 [patent_app_country] => US [patent_app_date] => 1994-11-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8098 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 163 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/534/05534380.pdf [firstpage_image] =>[orig_patent_app_number] => 345175 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/345175
Process of forming a colored image utilizing aqueous-processable imaging element tonable at room temperature before and after exposure to actinic radiation Nov 27, 1994 Issued
Array ( [id] => 3644677 [patent_doc_number] => 05637438 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-06-10 [patent_title] => 'Photosensitive material and production of metal-colored images utilizing pearl luster pigment' [patent_app_type] => 1 [patent_app_number] => 8/344427 [patent_app_country] => US [patent_app_date] => 1994-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5500 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 52 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/637/05637438.pdf [firstpage_image] =>[orig_patent_app_number] => 344427 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/344427
Photosensitive material and production of metal-colored images utilizing pearl luster pigment Nov 22, 1994 Issued
Array ( [id] => 3584747 [patent_doc_number] => 05552255 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1996-09-03 [patent_title] => 'Article utilizing quinone diazide resist layer on tantalum substrate surface' [patent_app_type] => 1 [patent_app_number] => 8/344342 [patent_app_country] => US [patent_app_date] => 1994-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3473 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 177 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/552/05552255.pdf [firstpage_image] =>[orig_patent_app_number] => 344342 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/344342
Article utilizing quinone diazide resist layer on tantalum substrate surface Nov 21, 1994 Issued
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