| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3618725
[patent_doc_number] => 05688628
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-18
[patent_title] => 'Resist composition'
[patent_app_type] => 1
[patent_app_number] => 8/339203
[patent_app_country] => US
[patent_app_date] => 1994-11-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 4
[patent_no_of_words] => 8033
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 753
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/688/05688628.pdf
[firstpage_image] =>[orig_patent_app_number] => 339203
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/339203 | Resist composition | Nov 9, 1994 | Issued |
| 08/337281 | PROCESS FOR FORMING FINE PATTERN OF SEMICONDUCTOR DEVICE | Nov 9, 1994 | Abandoned |
Array
(
[id] => 3553432
[patent_doc_number] => 05543260
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-08-06
[patent_title] => 'Diazo heat-sensitive recording material'
[patent_app_type] => 1
[patent_app_number] => 8/337470
[patent_app_country] => US
[patent_app_date] => 1994-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8673
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 294
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/543/05543260.pdf
[firstpage_image] =>[orig_patent_app_number] => 337470
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/337470 | Diazo heat-sensitive recording material | Nov 7, 1994 | Issued |
Array
(
[id] => 3542871
[patent_doc_number] => 05554495
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-09-10
[patent_title] => 'Silver halide photographic light sensitive material containing antistatic layer'
[patent_app_type] => 1
[patent_app_number] => 8/333141
[patent_app_country] => US
[patent_app_date] => 1994-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 6317
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 137
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/554/05554495.pdf
[firstpage_image] =>[orig_patent_app_number] => 333141
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/333141 | Silver halide photographic light sensitive material containing antistatic layer | Oct 31, 1994 | Issued |
| 08/331793 | COLOR IMAGE-FORMABLE MATERIAL AND PROCESS FOR PREPARING THE SAME | Oct 30, 1994 | Abandoned |
Array
(
[id] => 3522957
[patent_doc_number] => 05527659
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-06-18
[patent_title] => 'Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound'
[patent_app_type] => 1
[patent_app_number] => 8/331147
[patent_app_country] => US
[patent_app_date] => 1994-10-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5612
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/527/05527659.pdf
[firstpage_image] =>[orig_patent_app_number] => 331147
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/331147 | Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound | Oct 27, 1994 | Issued |
Array
(
[id] => 4143865
[patent_doc_number] => 06063556
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 2000-05-16
[patent_title] => 'Radiographic material with improved antistatic properties utilizing colloidal vanadium oxide'
[patent_app_type] => 1
[patent_app_number] => 8/330349
[patent_app_country] => US
[patent_app_date] => 1994-10-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 14576
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/06/063/06063556.pdf
[firstpage_image] =>[orig_patent_app_number] => 330349
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/330349 | Radiographic material with improved antistatic properties utilizing colloidal vanadium oxide | Oct 26, 1994 | Issued |
| 08/329748 | METHOD OF FORMING A RESIST PATTERN AND AN ACID WATER-SOLUBLE MATERIAL COMPOSITION USED THEREIN | Oct 25, 1994 | Abandoned |
| 08/327758 | POSITIVE PHOTOSENSITIVE COMPOSITION | Oct 23, 1994 | Abandoned |
Array
(
[id] => 3471324
[patent_doc_number] => 05476751
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-19
[patent_title] => 'Phenylacetates and their use in radiation sensitive compositions'
[patent_app_type] => 1
[patent_app_number] => 8/323482
[patent_app_country] => US
[patent_app_date] => 1994-10-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4193
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 162
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/476/05476751.pdf
[firstpage_image] =>[orig_patent_app_number] => 323482
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/323482 | Phenylacetates and their use in radiation sensitive compositions | Oct 13, 1994 | Issued |
Array
(
[id] => 3600165
[patent_doc_number] => 05578423
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-11-26
[patent_title] => 'Method for the preparation of a pattern overlay accuracy-measuring mark'
[patent_app_type] => 1
[patent_app_number] => 8/321448
[patent_app_country] => US
[patent_app_date] => 1994-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 9
[patent_no_of_words] => 2127
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 116
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/578/05578423.pdf
[firstpage_image] =>[orig_patent_app_number] => 321448
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/321448 | Method for the preparation of a pattern overlay accuracy-measuring mark | Oct 11, 1994 | Issued |
| 08/321353 | THERMAL PROCESS MODULE FOR SUBSTRATE COAT/DEVELOP SYSTEM | Oct 10, 1994 | Abandoned |
Array
(
[id] => 3456264
[patent_doc_number] => 05472829
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-12-05
[patent_title] => 'Method of forming a resist pattern by using an anti-reflective layer'
[patent_app_type] => 1
[patent_app_number] => 8/320119
[patent_app_country] => US
[patent_app_date] => 1994-10-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 57
[patent_figures_cnt] => 57
[patent_no_of_words] => 23468
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/472/05472829.pdf
[firstpage_image] =>[orig_patent_app_number] => 320119
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/320119 | Method of forming a resist pattern by using an anti-reflective layer | Oct 10, 1994 | Issued |
Array
(
[id] => 3680597
[patent_doc_number] => 05633112
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-05-27
[patent_title] => 'Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine'
[patent_app_type] => 1
[patent_app_number] => 8/319788
[patent_app_country] => US
[patent_app_date] => 1994-10-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5713
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 45
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/633/05633112.pdf
[firstpage_image] =>[orig_patent_app_number] => 319788
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/319788 | Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine | Oct 6, 1994 | Issued |
Array
(
[id] => 3685595
[patent_doc_number] => 05691106
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1997-11-25
[patent_title] => 'Photosensitive material for the production of lithographic printing plates utilizing peel development'
[patent_app_type] => 1
[patent_app_number] => 8/318542
[patent_app_country] => US
[patent_app_date] => 1994-10-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5943
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 111
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/691/05691106.pdf
[firstpage_image] =>[orig_patent_app_number] => 318542
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/318542 | Photosensitive material for the production of lithographic printing plates utilizing peel development | Oct 4, 1994 | Issued |
Array
(
[id] => 3503549
[patent_doc_number] => 05514518
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-05-07
[patent_title] => 'Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups'
[patent_app_type] => 1
[patent_app_number] => 8/315574
[patent_app_country] => US
[patent_app_date] => 1994-09-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7849
[patent_no_of_claims] => 1
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 190
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/514/05514518.pdf
[firstpage_image] =>[orig_patent_app_number] => 315574
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/315574 | Method of improving delamination in an image forming material utilizing 2-diazo-1,2-quinone compounds having fluorine containing substituent groups | Sep 29, 1994 | Issued |
Array
(
[id] => 3584761
[patent_doc_number] => 05552256
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-09-03
[patent_title] => 'Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring'
[patent_app_type] => 1
[patent_app_number] => 8/314975
[patent_app_country] => US
[patent_app_date] => 1994-09-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 2809
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 41
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/552/05552256.pdf
[firstpage_image] =>[orig_patent_app_number] => 314975
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/314975 | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring | Sep 28, 1994 | Issued |
Array
(
[id] => 3488429
[patent_doc_number] => 05439774
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-08-08
[patent_title] => 'Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit'
[patent_app_type] => 1
[patent_app_number] => 8/314438
[patent_app_country] => US
[patent_app_date] => 1994-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 10107
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 219
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/439/05439774.pdf
[firstpage_image] =>[orig_patent_app_number] => 314438
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/314438 | Positive-type photosensitive electrodeposition coating composition containing resin having ionic group and modified quinonediazidesulfone unit | Sep 27, 1994 | Issued |
Array
(
[id] => 3523624
[patent_doc_number] => 05503968
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-04-02
[patent_title] => 'Flame treatment and corona discharge treatment of photographic paper for improved bond with ozone treated polyolefin resin coating'
[patent_app_type] => 1
[patent_app_number] => 8/313636
[patent_app_country] => US
[patent_app_date] => 1994-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 3205
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/503/05503968.pdf
[firstpage_image] =>[orig_patent_app_number] => 313636
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/313636 | Flame treatment and corona discharge treatment of photographic paper for improved bond with ozone treated polyolefin resin coating | Sep 26, 1994 | Issued |
Array
(
[id] => 3491085
[patent_doc_number] => 05536616
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1996-07-16
[patent_title] => 'Photoresists containing water soluble sugar crosslinking agents'
[patent_app_type] => 1
[patent_app_number] => 8/309864
[patent_app_country] => US
[patent_app_date] => 1994-09-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3214
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/536/05536616.pdf
[firstpage_image] =>[orig_patent_app_number] => 309864
[rel_patent_id] =>[rel_patent_doc_number] =>) 08/309864 | Photoresists containing water soluble sugar crosslinking agents | Sep 20, 1994 | Issued |