Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
08/052999 CHEMICAL AMPLIFICATION RESIST COMPOSITION Apr 26, 1993 Pending
Array ( [id] => 3121275 [patent_doc_number] => 05436105 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-07-25 [patent_title] => 'Method of making subtractive offset printing plate' [patent_app_type] => 1 [patent_app_number] => 7/988940 [patent_app_country] => US [patent_app_date] => 1993-04-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 5362 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/436/05436105.pdf [firstpage_image] =>[orig_patent_app_number] => 988940 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/988940
Method of making subtractive offset printing plate Apr 22, 1993 Issued
08/046239 METHOD FOR FORMING PATTERNED RESIST LAYER ON METALLIC SUBSTRATE SURFACE Apr 12, 1993 Pending
08/044190 POSITIVE-TYPE PHOTOSENSITIVE ELECTRODEPOSITION COATING COMPOSITION AND PROCESS FOR PRODUCING CIRCUIT PLATE Apr 7, 1993 Pending
Array ( [id] => 3084713 [patent_doc_number] => 05278021 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-11 [patent_title] => 'O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles' [patent_app_type] => 1 [patent_app_number] => 8/045022 [patent_app_country] => US [patent_app_date] => 1993-04-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6477 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/278/05278021.pdf [firstpage_image] =>[orig_patent_app_number] => 045022 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/045022
O-naphthoquinone diazide sulfonyl esters of 4-(4-hydroxyphenyl)cyclohexanone phenolic derivatives with associated radiation sensitive mixtures and articles Apr 4, 1993 Issued
Array ( [id] => 3025760 [patent_doc_number] => 05348842 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-20 [patent_title] => 'Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride' [patent_app_type] => 1 [patent_app_number] => 8/042362 [patent_app_country] => US [patent_app_date] => 1993-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5189 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 205 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/348/05348842.pdf [firstpage_image] =>[orig_patent_app_number] => 042362 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/042362
Method for producing positive photoresist image utilizing diazo ester of benzolactone ring compound and diazo sulfonyl chloride Apr 1, 1993 Issued
Array ( [id] => 3013350 [patent_doc_number] => 05340685 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-23 [patent_title] => 'Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant' [patent_app_type] => 1 [patent_app_number] => 8/040615 [patent_app_country] => US [patent_app_date] => 1993-03-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10730 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 278 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/340/05340685.pdf [firstpage_image] =>[orig_patent_app_number] => 040615 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/040615
Light-sensitive composition containing diazo resin, polyurethane resin and fluorine atom-containing copolymer surfactant Mar 30, 1993 Issued
Array ( [id] => 3042042 [patent_doc_number] => 05286595 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-02-15 [patent_title] => 'Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation' [patent_app_type] => 1 [patent_app_number] => 8/052424 [patent_app_country] => US [patent_app_date] => 1993-03-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5390 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 194 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/286/05286595.pdf [firstpage_image] =>[orig_patent_app_number] => 052424 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/052424
Process for creating a tacky tonable image surface through exposure of a substrate coated with a polymer blend, including a photo-acid generator, to actinic radiation Mar 29, 1993 Issued
Array ( [id] => 3091835 [patent_doc_number] => 05368975 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-11-29 [patent_title] => 'Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility' [patent_app_type] => 1 [patent_app_number] => 8/039554 [patent_app_country] => US [patent_app_date] => 1993-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4585 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 231 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/368/05368975.pdf [firstpage_image] =>[orig_patent_app_number] => 039554 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/039554
Positive-working 1,2-quinone diazide radiation-sensitive mixture and recording material containing urethane compound to diminish developer solubility Mar 25, 1993 Issued
Array ( [id] => 3091867 [patent_doc_number] => 05368977 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-11-29 [patent_title] => 'Positive type photosensitive quinone diazide phenolic resin composition' [patent_app_type] => 1 [patent_app_number] => 8/034357 [patent_app_country] => US [patent_app_date] => 1993-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8292 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/368/05368977.pdf [firstpage_image] =>[orig_patent_app_number] => 034357 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/034357
Positive type photosensitive quinone diazide phenolic resin composition Mar 18, 1993 Issued
Array ( [id] => 3446888 [patent_doc_number] => 05424167 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-06-13 [patent_title] => 'Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive' [patent_app_type] => 1 [patent_app_number] => 8/022488 [patent_app_country] => US [patent_app_date] => 1993-02-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2966 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 231 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/424/05424167.pdf [firstpage_image] =>[orig_patent_app_number] => 022488 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/022488
Positive type quinonediazide resist composition containing alkali-soluble novolac resin and aromatic hydroxy compound additive Feb 24, 1993 Issued
08/019667 PRIMED RESIN FILM Feb 18, 1993 Abandoned
Array ( [id] => 3094359 [patent_doc_number] => 05318875 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-06-07 [patent_title] => 'Positive quinonediazide photoresist composition containing select hydroxyphenol additive' [patent_app_type] => 1 [patent_app_number] => 8/015921 [patent_app_country] => US [patent_app_date] => 1993-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8644 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 441 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/318/05318875.pdf [firstpage_image] =>[orig_patent_app_number] => 015921 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/015921
Positive quinonediazide photoresist composition containing select hydroxyphenol additive Feb 9, 1993 Issued
Array ( [id] => 3025606 [patent_doc_number] => 05348834 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-20 [patent_title] => 'Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound; water insoluble, water swellable binder resin; and a colorant' [patent_app_type] => 1 [patent_app_number] => 8/012198 [patent_app_country] => US [patent_app_date] => 1993-02-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4388 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 111 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/348/05348834.pdf [firstpage_image] =>[orig_patent_app_number] => 012198 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/012198
Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound; water insoluble, water swellable binder resin; and a colorant Feb 1, 1993 Issued
Array ( [id] => 3006341 [patent_doc_number] => 05275911 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-04 [patent_title] => 'Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures' [patent_app_type] => 1 [patent_app_number] => 8/011565 [patent_app_country] => US [patent_app_date] => 1993-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5578 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/275/05275911.pdf [firstpage_image] =>[orig_patent_app_number] => 011565 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/011565
Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures Jan 31, 1993 Issued
Array ( [id] => 2973677 [patent_doc_number] => 05256521 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-26 [patent_title] => 'Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer' [patent_app_type] => 1 [patent_app_number] => 8/011572 [patent_app_country] => US [patent_app_date] => 1993-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4022 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/256/05256521.pdf [firstpage_image] =>[orig_patent_app_number] => 011572 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/011572
Process of developing a positive pattern in an O-quinone diazide photoresist containing a tris-(hydroxyphenyl) lower alkane compound sensitivity enhancer Jan 31, 1993 Issued
Array ( [id] => 3013593 [patent_doc_number] => 05340696 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-23 [patent_title] => 'Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent' [patent_app_type] => 1 [patent_app_number] => 8/010815 [patent_app_country] => US [patent_app_date] => 1993-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3480 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/340/05340696.pdf [firstpage_image] =>[orig_patent_app_number] => 010815 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/010815
Photoresist compositions with copolymer binder having phenolic and nonaromatic cyclic alcohol units where the distribution of the cyclic alcohol concentration is less than 8 mole percent Jan 28, 1993 Issued
08/009400 COLORED IMAGE FORMING MATERIAL AND METHOD FOR FORMING COLORED IMAGE Jan 26, 1993 Abandoned
Array ( [id] => 2980979 [patent_doc_number] => 05250392 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-05 [patent_title] => 'Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye' [patent_app_type] => 1 [patent_app_number] => 8/009194 [patent_app_country] => US [patent_app_date] => 1993-01-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3707 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/250/05250392.pdf [firstpage_image] =>[orig_patent_app_number] => 009194 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/009194
Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye Jan 24, 1993 Issued
Array ( [id] => 3052525 [patent_doc_number] => 05356739 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-10-18 [patent_title] => 'Stainproof protector made from fluorine-containing aliphatic cyclic polymer for preventing staining of lithographic masks' [patent_app_type] => 1 [patent_app_number] => 8/007818 [patent_app_country] => US [patent_app_date] => 1993-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3429 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 33 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/356/05356739.pdf [firstpage_image] =>[orig_patent_app_number] => 007818 [rel_patent_id] =>[rel_patent_doc_number] =>)
08/007818
Stainproof protector made from fluorine-containing aliphatic cyclic polymer for preventing staining of lithographic masks Jan 21, 1993 Issued
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