| Application number | Title of the application | Filing Date | Status |
|---|
Array
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[patent_kind] => NA
[patent_issue_date] => 1995-02-28
[patent_title] => 'Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions'
[patent_app_type] => 1
[patent_app_number] => 7/999208
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[patent_app_date] => 1992-12-31
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| 07/998743 | METHOD OF DETERMINING CONDITION FOR ANTI-REFLECTIVE LAYER, A METHOD OF FORMING AN ANTI-REFLECTIVE LAYER AND A METHOD OF FORMING A RESIST PATTERN BY USING A NOVEL ANTI-REFLECTIVE LAYER | Dec 29, 1992 | Abandoned |
Array
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[patent_kind] => NA
[patent_issue_date] => 1994-08-16
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Array
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[patent_kind] => NA
[patent_issue_date] => 1994-07-12
[patent_title] => 'Process for producing a negative-working lithographic printing form utilizing solvent mixture of mono-(C.sub.1 -C.sub.4) alkyl ether of diethylene glycol and a solvent having boiling point between 50.degree. and 150.degree. C.'
[patent_app_type] => 1
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Array
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[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1995-06-13
[patent_title] => 'Diazo resin light-sensitive composition containing organic compound having at least 3 carboxyl groups'
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Array
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[patent_kind] => NA
[patent_issue_date] => 1995-04-18
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Array
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Array
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[patent_issue_date] => 1994-06-28
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[rel_patent_id] =>[rel_patent_doc_number] =>) 07/985259 | Positive type quinonediazide photoresist composition containing select tetraphenolic additive | Dec 2, 1992 | Issued |
Array
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[id] => 3048649
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[patent_kind] => NA
[patent_issue_date] => 1994-02-01
[patent_title] => 'Halftone image screening array of parallel lines with effective maximum and minimum optical density and method of generating a halftone image utilizing the screening array'
[patent_app_type] => 1
[patent_app_number] => 7/981891
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Array
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[patent_issue_date] => 1994-11-22
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Array
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[patent_issue_date] => 1993-10-12
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| 07/974477 | PHOTOSENSITIVE COMPOSITION | Nov 11, 1992 | Abandoned |
| 07/973651 | PHOTOSENSITIVE MATERIAL | Nov 8, 1992 | Abandoned |
Array
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Array
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