Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3414667 [patent_doc_number] => 05393642 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-02-28 [patent_title] => 'Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions' [patent_app_type] => 1 [patent_app_number] => 7/999208 [patent_app_country] => US [patent_app_date] => 1992-12-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3247 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 170 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/393/05393642.pdf [firstpage_image] =>[orig_patent_app_number] => 999208 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/999208
Ionic modification of organic resins and photoresists to produce photoactive etch resistant compositions Dec 30, 1992 Issued
07/998743 METHOD OF DETERMINING CONDITION FOR ANTI-REFLECTIVE LAYER, A METHOD OF FORMING AN ANTI-REFLECTIVE LAYER AND A METHOD OF FORMING A RESIST PATTERN BY USING A NOVEL ANTI-REFLECTIVE LAYER Dec 29, 1992 Abandoned
Array ( [id] => 3055745 [patent_doc_number] => 05338643 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-16 [patent_title] => 'O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye' [patent_app_type] => 1 [patent_app_number] => 7/995708 [patent_app_country] => US [patent_app_date] => 1992-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8404 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 171 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/338/05338643.pdf [firstpage_image] =>[orig_patent_app_number] => 995708 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/995708
O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye Dec 22, 1992 Issued
Array ( [id] => 3031297 [patent_doc_number] => 05328797 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-07-12 [patent_title] => 'Process for producing a negative-working lithographic printing form utilizing solvent mixture of mono-(C.sub.1 -C.sub.4) alkyl ether of diethylene glycol and a solvent having boiling point between 50.degree. and 150.degree. C.' [patent_app_type] => 1 [patent_app_number] => 7/994445 [patent_app_country] => US [patent_app_date] => 1992-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5589 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 395 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/328/05328797.pdf [firstpage_image] =>[orig_patent_app_number] => 994445 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/994445
Process for producing a negative-working lithographic printing form utilizing solvent mixture of mono-(C.sub.1 -C.sub.4) alkyl ether of diethylene glycol and a solvent having boiling point between 50.degree. and 150.degree. C. Dec 22, 1992 Issued
Array ( [id] => 3446846 [patent_doc_number] => 05424165 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-06-13 [patent_title] => 'Diazo resin light-sensitive composition containing organic compound having at least 3 carboxyl groups' [patent_app_type] => 1 [patent_app_number] => 7/990188 [patent_app_country] => US [patent_app_date] => 1992-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10226 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 92 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/424/05424165.pdf [firstpage_image] =>[orig_patent_app_number] => 990188 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/990188
Diazo resin light-sensitive composition containing organic compound having at least 3 carboxyl groups Dec 13, 1992 Issued
Array ( [id] => 3105836 [patent_doc_number] => 05407786 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-04-18 [patent_title] => 'Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation' [patent_app_type] => 1 [patent_app_number] => 7/990822 [patent_app_country] => US [patent_app_date] => 1992-12-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 14 [patent_no_of_words] => 3634 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 105 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/407/05407786.pdf [firstpage_image] =>[orig_patent_app_number] => 990822 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/990822
Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation Dec 13, 1992 Issued
Array ( [id] => 2998375 [patent_doc_number] => 05370965 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-12-06 [patent_title] => 'Positive-working light-sensitive composition containing diazonium salt and novolak resin' [patent_app_type] => 1 [patent_app_number] => 7/987781 [patent_app_country] => US [patent_app_date] => 1992-12-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7090 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 188 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/370/05370965.pdf [firstpage_image] =>[orig_patent_app_number] => 987781 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/987781
Positive-working light-sensitive composition containing diazonium salt and novolak resin Dec 8, 1992 Issued
Array ( [id] => 3047917 [patent_doc_number] => 05324618 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-06-28 [patent_title] => 'Positive type quinonediazide photoresist composition containing select tetraphenolic additive' [patent_app_type] => 1 [patent_app_number] => 7/985259 [patent_app_country] => US [patent_app_date] => 1992-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5355 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 207 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/324/05324618.pdf [firstpage_image] =>[orig_patent_app_number] => 985259 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/985259
Positive type quinonediazide photoresist composition containing select tetraphenolic additive Dec 2, 1992 Issued
Array ( [id] => 3048649 [patent_doc_number] => 05283140 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-02-01 [patent_title] => 'Halftone image screening array of parallel lines with effective maximum and minimum optical density and method of generating a halftone image utilizing the screening array' [patent_app_type] => 1 [patent_app_number] => 7/981891 [patent_app_country] => US [patent_app_date] => 1992-11-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 15 [patent_no_of_words] => 4092 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/283/05283140.pdf [firstpage_image] =>[orig_patent_app_number] => 981891 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/981891
Halftone image screening array of parallel lines with effective maximum and minimum optical density and method of generating a halftone image utilizing the screening array Nov 22, 1992 Issued
Array ( [id] => 3477275 [patent_doc_number] => 05399456 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1995-03-21 [patent_title] => 'Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound' [patent_app_type] => 1 [patent_app_number] => 7/978099 [patent_app_country] => US [patent_app_date] => 1992-11-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11071 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 335 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/399/05399456.pdf [firstpage_image] =>[orig_patent_app_number] => 978099 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/978099
Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound Nov 18, 1992 Issued
Array ( [id] => 2992115 [patent_doc_number] => 05366849 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-11-22 [patent_title] => 'Photoresist pattern formation through etching where the imaging exposure changes in a given direction in the desired pattern and inclined vapor deposition is utilized to deposit a film' [patent_app_type] => 1 [patent_app_number] => 7/978263 [patent_app_country] => US [patent_app_date] => 1992-11-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 17 [patent_no_of_words] => 3028 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 166 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/366/05366849.pdf [firstpage_image] =>[orig_patent_app_number] => 978263 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/978263
Photoresist pattern formation through etching where the imaging exposure changes in a given direction in the desired pattern and inclined vapor deposition is utilized to deposit a film Nov 17, 1992 Issued
Array ( [id] => 2974848 [patent_doc_number] => 05252436 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-12 [patent_title] => 'Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds' [patent_app_type] => 1 [patent_app_number] => 7/976004 [patent_app_country] => US [patent_app_date] => 1992-11-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3438 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 204 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/252/05252436.pdf [firstpage_image] =>[orig_patent_app_number] => 976004 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/976004
Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds Nov 12, 1992 Issued
07/974477 PHOTOSENSITIVE COMPOSITION Nov 11, 1992 Abandoned
07/973651 PHOTOSENSITIVE MATERIAL Nov 8, 1992 Abandoned
Array ( [id] => 3097052 [patent_doc_number] => 05314783 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-05-24 [patent_title] => 'Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound' [patent_app_type] => 1 [patent_app_number] => 7/970031 [patent_app_country] => US [patent_app_date] => 1992-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2337 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 165 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/314/05314783.pdf [firstpage_image] =>[orig_patent_app_number] => 970031 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/970031
Photosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compound Nov 1, 1992 Issued
Array ( [id] => 3051243 [patent_doc_number] => 05344739 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-06 [patent_title] => 'Photosensitive diazo resin composition for lithographic printing utilizing a xanthene dye having an anion group as the counter ion of the diazonium group' [patent_app_type] => 1 [patent_app_number] => 7/969962 [patent_app_country] => US [patent_app_date] => 1992-11-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7354 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 36 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/344/05344739.pdf [firstpage_image] =>[orig_patent_app_number] => 969962 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/969962
Photosensitive diazo resin composition for lithographic printing utilizing a xanthene dye having an anion group as the counter ion of the diazonium group Nov 1, 1992 Issued
Array ( [id] => 3680585 [patent_doc_number] => 05633111 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1997-05-27 [patent_title] => 'Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound' [patent_app_type] => 1 [patent_app_number] => 7/969565 [patent_app_country] => US [patent_app_date] => 1992-10-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8779 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 181 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/633/05633111.pdf [firstpage_image] =>[orig_patent_app_number] => 969565 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/969565
Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound Oct 29, 1992 Issued
Array ( [id] => 3012173 [patent_doc_number] => 05308735 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-05-03 [patent_title] => 'Photosensitive diazo resins and resin compositions for lithographic printing having a quaternary ammonium salt-containing group' [patent_app_type] => 1 [patent_app_number] => 7/968310 [patent_app_country] => US [patent_app_date] => 1992-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6969 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 218 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/308/05308735.pdf [firstpage_image] =>[orig_patent_app_number] => 968310 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/968310
Photosensitive diazo resins and resin compositions for lithographic printing having a quaternary ammonium salt-containing group Oct 28, 1992 Issued
Array ( [id] => 3028063 [patent_doc_number] => 05342739 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-30 [patent_title] => 'Method of preparing a negative pattern utilizing photosensitive polymer composition containing quinonediazide compound and a poly(amido)imide precursor' [patent_app_type] => 1 [patent_app_number] => 7/938139 [patent_app_country] => US [patent_app_date] => 1992-10-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6540 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 327 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/342/05342739.pdf [firstpage_image] =>[orig_patent_app_number] => 938139 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/938139
Method of preparing a negative pattern utilizing photosensitive polymer composition containing quinonediazide compound and a poly(amido)imide precursor Oct 21, 1992 Issued
Array ( [id] => 2885577 [patent_doc_number] => 05238771 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-24 [patent_title] => 'Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive' [patent_app_type] => 1 [patent_app_number] => 7/963001 [patent_app_country] => US [patent_app_date] => 1992-10-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11280 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 264 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/238/05238771.pdf [firstpage_image] =>[orig_patent_app_number] => 963001 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/963001
Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive Oct 18, 1992 Issued
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