| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 3044613
[patent_doc_number] => 05304452
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-04-19
[patent_title] => 'Heat sensitive diazo type recording material utilizing microencapsulated diazo compound and a coupling component'
[patent_app_type] => 1
[patent_app_number] => 7/958751
[patent_app_country] => US
[patent_app_date] => 1992-10-09
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/304/05304452.pdf
[firstpage_image] =>[orig_patent_app_number] => 958751
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/958751 | Heat sensitive diazo type recording material utilizing microencapsulated diazo compound and a coupling component | Oct 8, 1992 | Issued |
| 07/953762 | LITHOGRAPHIC PRINTING PLATES | Sep 28, 1992 | Abandoned |
Array
(
[id] => 3025589
[patent_doc_number] => 05348833
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-09-20
[patent_title] => 'Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester'
[patent_app_type] => 1
[patent_app_number] => 7/939909
[patent_app_country] => US
[patent_app_date] => 1992-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 4847
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[pdf_file] => patents/05/348/05348833.pdf
[firstpage_image] =>[orig_patent_app_number] => 939909
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/939909 | Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester | Sep 3, 1992 | Issued |
Array
(
[id] => 3008660
[patent_doc_number] => 05281508
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-25
[patent_title] => 'Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol'
[patent_app_type] => 1
[patent_app_number] => 7/935131
[patent_app_country] => US
[patent_app_date] => 1992-08-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[pdf_file] => patents/05/281/05281508.pdf
[firstpage_image] =>[orig_patent_app_number] => 935131
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/935131 | Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol | Aug 20, 1992 | Issued |
Array
(
[id] => 3072393
[patent_doc_number] => 05296330
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-03-22
[patent_title] => 'Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive'
[patent_app_type] => 1
[patent_app_number] => 7/932128
[patent_app_country] => US
[patent_app_date] => 1992-08-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/296/05296330.pdf
[firstpage_image] =>[orig_patent_app_number] => 932128
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/932128 | Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive | Aug 14, 1992 | Issued |
Array
(
[id] => 2992686
[patent_doc_number] => 05362606
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-11-08
[patent_title] => 'Positive resist pattern formation through focused ion beam exposure and surface barrier silylation'
[patent_app_type] => 1
[patent_app_number] => 7/926971
[patent_app_country] => US
[patent_app_date] => 1992-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[pdf_file] => patents/05/362/05362606.pdf
[firstpage_image] =>[orig_patent_app_number] => 926971
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/926971 | Positive resist pattern formation through focused ion beam exposure and surface barrier silylation | Aug 6, 1992 | Issued |
Array
(
[id] => 3094265
[patent_doc_number] => 05318870
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-06-07
[patent_title] => 'Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article'
[patent_app_type] => 1
[patent_app_number] => 7/923864
[patent_app_country] => US
[patent_app_date] => 1992-07-31
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[pdf_file] => patents/05/318/05318870.pdf
[firstpage_image] =>[orig_patent_app_number] => 923864
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/923864 | Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article | Jul 30, 1992 | Issued |
Array
(
[id] => 3006270
[patent_doc_number] => 05275907
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-04
[patent_title] => 'Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding'
[patent_app_type] => 1
[patent_app_number] => 7/918868
[patent_app_country] => US
[patent_app_date] => 1992-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[patent_no_of_words] => 7819
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/275/05275907.pdf
[firstpage_image] =>[orig_patent_app_number] => 918868
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/918868 | Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding | Jul 22, 1992 | Issued |
Array
(
[id] => 2931581
[patent_doc_number] => 05229244
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-20
[patent_title] => 'Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation'
[patent_app_type] => 1
[patent_app_number] => 7/906078
[patent_app_country] => US
[patent_app_date] => 1992-06-29
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/229/05229244.pdf
[firstpage_image] =>[orig_patent_app_number] => 906078
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/906078 | Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation | Jun 28, 1992 | Issued |
Array
(
[id] => 3042018
[patent_doc_number] => 05286594
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-02-15
[patent_title] => 'Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles'
[patent_app_type] => 1
[patent_app_number] => 7/897319
[patent_app_country] => US
[patent_app_date] => 1992-06-11
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/286/05286594.pdf
[firstpage_image] =>[orig_patent_app_number] => 897319
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/897319 | Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles | Jun 10, 1992 | Issued |
Array
(
[id] => 2885612
[patent_doc_number] => 05238773
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-08-24
[patent_title] => 'Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups'
[patent_app_type] => 1
[patent_app_number] => 7/895245
[patent_app_country] => US
[patent_app_date] => 1992-06-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/238/05238773.pdf
[firstpage_image] =>[orig_patent_app_number] => 895245
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/895245 | Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups | Jun 7, 1992 | Issued |
Array
(
[id] => 2959924
[patent_doc_number] => 05264319
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-11-23
[patent_title] => 'Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor'
[patent_app_type] => 1
[patent_app_number] => 7/893946
[patent_app_country] => US
[patent_app_date] => 1992-06-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/264/05264319.pdf
[firstpage_image] =>[orig_patent_app_number] => 893946
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/893946 | Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor | Jun 3, 1992 | Issued |
| 07/894168 | PEEL-DEVELOPABLE, SINGLE SHEET COLOR PROOFING SYSTEM WITH LAMINATED ADHESIVE LAYERS | Jun 2, 1992 | Abandoned |
Array
(
[id] => 3006305
[patent_doc_number] => 05275909
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-01-04
[patent_title] => 'Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye'
[patent_app_type] => 1
[patent_app_number] => 7/891011
[patent_app_country] => US
[patent_app_date] => 1992-06-01
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/275/05275909.pdf
[firstpage_image] =>[orig_patent_app_number] => 891011
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/891011 | Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye | May 31, 1992 | Issued |
Array
(
[id] => 4026903
[patent_doc_number] => 05902718
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1999-05-11
[patent_title] => 'Methods and developer for developing a positive photoresist'
[patent_app_type] => 1
[patent_app_number] => 7/891123
[patent_app_country] => US
[patent_app_date] => 1992-06-01
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[pdf_file] => patents/05/902/05902718.pdf
[firstpage_image] =>[orig_patent_app_number] => 891123
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/891123 | Methods and developer for developing a positive photoresist | May 31, 1992 | Issued |
Array
(
[id] => 3016247
[patent_doc_number] => 05302487
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-04-12
[patent_title] => 'Negative-working photosensitive coating solution containing photohardenable diazo compound, polymeric binder and four component solvent'
[patent_app_type] => 1
[patent_app_number] => 7/898345
[patent_app_country] => US
[patent_app_date] => 1992-05-19
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[pdf_file] => patents/05/302/05302487.pdf
[firstpage_image] =>[orig_patent_app_number] => 898345
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/898345 | Negative-working photosensitive coating solution containing photohardenable diazo compound, polymeric binder and four component solvent | May 18, 1992 | Issued |
Array
(
[id] => 2928817
[patent_doc_number] => 05219711
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-15
[patent_title] => 'Positive image formation utilizing resist material with carbazole diazonium salt acid generator'
[patent_app_type] => 1
[patent_app_number] => 7/884021
[patent_app_country] => US
[patent_app_date] => 1992-05-18
[patent_effective_date] => 0000-00-00
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[firstpage_image] =>[orig_patent_app_number] => 884021
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/884021 | Positive image formation utilizing resist material with carbazole diazonium salt acid generator | May 17, 1992 | Issued |
Array
(
[id] => 3051261
[patent_doc_number] => 05344740
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-09-06
[patent_title] => 'Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same'
[patent_app_type] => 1
[patent_app_number] => 7/879101
[patent_app_country] => US
[patent_app_date] => 1992-05-04
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/344/05344740.pdf
[firstpage_image] =>[orig_patent_app_number] => 879101
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/879101 | Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same | May 3, 1992 | Issued |
| 07/873240 | POSITIVE RESIST COMPOSITION | Apr 23, 1992 | Abandoned |
| 07/873119 | POSITIVE RESIST COMPOSITION | Apr 23, 1992 | Abandoned |