Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3044613 [patent_doc_number] => 05304452 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-19 [patent_title] => 'Heat sensitive diazo type recording material utilizing microencapsulated diazo compound and a coupling component' [patent_app_type] => 1 [patent_app_number] => 7/958751 [patent_app_country] => US [patent_app_date] => 1992-10-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4157 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 110 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/304/05304452.pdf [firstpage_image] =>[orig_patent_app_number] => 958751 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/958751
Heat sensitive diazo type recording material utilizing microencapsulated diazo compound and a coupling component Oct 8, 1992 Issued
07/953762 LITHOGRAPHIC PRINTING PLATES Sep 28, 1992 Abandoned
Array ( [id] => 3025589 [patent_doc_number] => 05348833 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-20 [patent_title] => 'Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester' [patent_app_type] => 1 [patent_app_number] => 7/939909 [patent_app_country] => US [patent_app_date] => 1992-09-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4847 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 214 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/348/05348833.pdf [firstpage_image] =>[orig_patent_app_number] => 939909 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/939909
Colored positive-working quinone diazide photosensitive recording material for the production of a color test image utilizing adhesive layer containing alkali-insoluble organic polymer and alkali-soluble polyester Sep 3, 1992 Issued
Array ( [id] => 3008660 [patent_doc_number] => 05281508 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-25 [patent_title] => 'Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol' [patent_app_type] => 1 [patent_app_number] => 7/935131 [patent_app_country] => US [patent_app_date] => 1992-08-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 4059 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 99 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/281/05281508.pdf [firstpage_image] =>[orig_patent_app_number] => 935131 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/935131
Positive-working photoresist containing o-naphthoquinone diazide sulfonic acid ester and novolak resin consisting of 35 to 43% m-cresol and 65 to 57% p-cresol with substantial absence of o-cresol Aug 20, 1992 Issued
Array ( [id] => 3072393 [patent_doc_number] => 05296330 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-03-22 [patent_title] => 'Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive' [patent_app_type] => 1 [patent_app_number] => 7/932128 [patent_app_country] => US [patent_app_date] => 1992-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6104 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 164 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/296/05296330.pdf [firstpage_image] =>[orig_patent_app_number] => 932128 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/932128
Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive Aug 14, 1992 Issued
Array ( [id] => 2992686 [patent_doc_number] => 05362606 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-11-08 [patent_title] => 'Positive resist pattern formation through focused ion beam exposure and surface barrier silylation' [patent_app_type] => 1 [patent_app_number] => 7/926971 [patent_app_country] => US [patent_app_date] => 1992-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 5068 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 160 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/362/05362606.pdf [firstpage_image] =>[orig_patent_app_number] => 926971 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/926971
Positive resist pattern formation through focused ion beam exposure and surface barrier silylation Aug 6, 1992 Issued
Array ( [id] => 3094265 [patent_doc_number] => 05318870 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-06-07 [patent_title] => 'Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article' [patent_app_type] => 1 [patent_app_number] => 7/923864 [patent_app_country] => US [patent_app_date] => 1992-07-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 11 [patent_no_of_words] => 3560 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/318/05318870.pdf [firstpage_image] =>[orig_patent_app_number] => 923864 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/923864
Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article Jul 30, 1992 Issued
Array ( [id] => 3006270 [patent_doc_number] => 05275907 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-04 [patent_title] => 'Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding' [patent_app_type] => 1 [patent_app_number] => 7/918868 [patent_app_country] => US [patent_app_date] => 1992-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7819 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/275/05275907.pdf [firstpage_image] =>[orig_patent_app_number] => 918868 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/918868
Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding Jul 22, 1992 Issued
Array ( [id] => 2931581 [patent_doc_number] => 05229244 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-07-20 [patent_title] => 'Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation' [patent_app_type] => 1 [patent_app_number] => 7/906078 [patent_app_country] => US [patent_app_date] => 1992-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5397 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/229/05229244.pdf [firstpage_image] =>[orig_patent_app_number] => 906078 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/906078
Dry processible photosensitive composition including photo-acid generator and optically clear polymer (co-polymer) blend that becomes tacky upon exposure to actinic radiation Jun 28, 1992 Issued
Array ( [id] => 3042018 [patent_doc_number] => 05286594 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-02-15 [patent_title] => 'Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles' [patent_app_type] => 1 [patent_app_number] => 7/897319 [patent_app_country] => US [patent_app_date] => 1992-06-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6178 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 176 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/286/05286594.pdf [firstpage_image] =>[orig_patent_app_number] => 897319 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/897319
Photographic elements utilizing a single photosensitive layer containing a photopolymerizable compound, photoinitiator, diazonium compound and barrier material encapsulated pigment particles Jun 10, 1992 Issued
Array ( [id] => 2885612 [patent_doc_number] => 05238773 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-24 [patent_title] => 'Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups' [patent_app_type] => 1 [patent_app_number] => 7/895245 [patent_app_country] => US [patent_app_date] => 1992-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3699 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 180 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/238/05238773.pdf [firstpage_image] =>[orig_patent_app_number] => 895245 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/895245
Alkaline developable photoresist composition containing radiation sensitive organosilicon compound with quinone diazide terminal groups Jun 7, 1992 Issued
Array ( [id] => 2959924 [patent_doc_number] => 05264319 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-11-23 [patent_title] => 'Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor' [patent_app_type] => 1 [patent_app_number] => 7/893946 [patent_app_country] => US [patent_app_date] => 1992-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7582 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 227 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/264/05264319.pdf [firstpage_image] =>[orig_patent_app_number] => 893946 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/893946
Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor Jun 3, 1992 Issued
07/894168 PEEL-DEVELOPABLE, SINGLE SHEET COLOR PROOFING SYSTEM WITH LAMINATED ADHESIVE LAYERS Jun 2, 1992 Abandoned
Array ( [id] => 3006305 [patent_doc_number] => 05275909 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-04 [patent_title] => 'Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye' [patent_app_type] => 1 [patent_app_number] => 7/891011 [patent_app_country] => US [patent_app_date] => 1992-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4668 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/275/05275909.pdf [firstpage_image] =>[orig_patent_app_number] => 891011 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/891011
Positive-working radiation sensitive mixtures and articles containing alkali-soluble binder, o-quinonediazide photoactive compound and BLANKOPHOR FBW acting dye May 31, 1992 Issued
Array ( [id] => 4026903 [patent_doc_number] => 05902718 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1999-05-11 [patent_title] => 'Methods and developer for developing a positive photoresist' [patent_app_type] => 1 [patent_app_number] => 7/891123 [patent_app_country] => US [patent_app_date] => 1992-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 15 [patent_no_of_words] => 3915 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 167 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/902/05902718.pdf [firstpage_image] =>[orig_patent_app_number] => 891123 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/891123
Methods and developer for developing a positive photoresist May 31, 1992 Issued
Array ( [id] => 3016247 [patent_doc_number] => 05302487 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-12 [patent_title] => 'Negative-working photosensitive coating solution containing photohardenable diazo compound, polymeric binder and four component solvent' [patent_app_type] => 1 [patent_app_number] => 7/898345 [patent_app_country] => US [patent_app_date] => 1992-05-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7859 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 366 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/302/05302487.pdf [firstpage_image] =>[orig_patent_app_number] => 898345 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/898345
Negative-working photosensitive coating solution containing photohardenable diazo compound, polymeric binder and four component solvent May 18, 1992 Issued
Array ( [id] => 2928817 [patent_doc_number] => 05219711 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-15 [patent_title] => 'Positive image formation utilizing resist material with carbazole diazonium salt acid generator' [patent_app_type] => 1 [patent_app_number] => 7/884021 [patent_app_country] => US [patent_app_date] => 1992-05-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5122 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 321 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/219/05219711.pdf [firstpage_image] =>[orig_patent_app_number] => 884021 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/884021
Positive image formation utilizing resist material with carbazole diazonium salt acid generator May 17, 1992 Issued
Array ( [id] => 3051261 [patent_doc_number] => 05344740 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-06 [patent_title] => 'Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same' [patent_app_type] => 1 [patent_app_number] => 7/879101 [patent_app_country] => US [patent_app_date] => 1992-05-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5317 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 324 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/344/05344740.pdf [firstpage_image] =>[orig_patent_app_number] => 879101 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/879101
Positive-type photosensitive electrodeposition coating composition containing quinonediazide resin having an anion-forming group and a nitrogen-containing compound and process for producing circuit plate using same May 3, 1992 Issued
07/873240 POSITIVE RESIST COMPOSITION Apr 23, 1992 Abandoned
07/873119 POSITIVE RESIST COMPOSITION Apr 23, 1992 Abandoned
Menu