Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 3037241 [patent_doc_number] => 05376497 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-12-27 [patent_title] => 'Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive' [patent_app_type] => 1 [patent_app_number] => 7/872245 [patent_app_country] => US [patent_app_date] => 1992-04-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7377 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 762 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/376/05376497.pdf [firstpage_image] =>[orig_patent_app_number] => 872245 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/872245
Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive Apr 21, 1992 Issued
Array ( [id] => 3033017 [patent_doc_number] => 05300404 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-05 [patent_title] => 'Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion' [patent_app_type] => 1 [patent_app_number] => 7/864131 [patent_app_country] => US [patent_app_date] => 1992-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 10 [patent_no_of_words] => 3761 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 118 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/300/05300404.pdf [firstpage_image] =>[orig_patent_app_number] => 864131 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/864131
Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion Apr 5, 1992 Issued
Array ( [id] => 2995337 [patent_doc_number] => 05358823 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-10-25 [patent_title] => 'Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4\'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone' [patent_app_type] => 1 [patent_app_number] => 7/863681 [patent_app_country] => US [patent_app_date] => 1992-04-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3194 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 244 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/358/05358823.pdf [firstpage_image] =>[orig_patent_app_number] => 863681 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/863681
Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone Mar 31, 1992 Issued
Array ( [id] => 2892264 [patent_doc_number] => 05272036 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-12-21 [patent_title] => 'Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method' [patent_app_type] => 1 [patent_app_number] => 7/860209 [patent_app_country] => US [patent_app_date] => 1992-03-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 8050 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/272/05272036.pdf [firstpage_image] =>[orig_patent_app_number] => 860209 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/860209
Pattern forming contrast enhanced material utilizing water soluble photosensitive diazo compound and pattern forming method Mar 26, 1992 Issued
Array ( [id] => 3094341 [patent_doc_number] => 05318874 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-06-07 [patent_title] => 'O-naphthoquinone diazide photosensitive coating composition containing a polyvinyl pyrrolidone compound and a stannic halide' [patent_app_type] => 1 [patent_app_number] => 7/857415 [patent_app_country] => US [patent_app_date] => 1992-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2357 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/318/05318874.pdf [firstpage_image] =>[orig_patent_app_number] => 857415 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/857415
O-naphthoquinone diazide photosensitive coating composition containing a polyvinyl pyrrolidone compound and a stannic halide Mar 24, 1992 Issued
Array ( [id] => 3047938 [patent_doc_number] => 05324619 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-06-28 [patent_title] => 'Positive quinone diazide photoresist composition containing select polyhydroxy additive' [patent_app_type] => 1 [patent_app_number] => 7/857497 [patent_app_country] => US [patent_app_date] => 1992-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4647 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/324/05324619.pdf [firstpage_image] =>[orig_patent_app_number] => 857497 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/857497
Positive quinone diazide photoresist composition containing select polyhydroxy additive Mar 24, 1992 Issued
Array ( [id] => 2928595 [patent_doc_number] => 05219700 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-15 [patent_title] => 'Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye' [patent_app_type] => 1 [patent_app_number] => 7/858441 [patent_app_country] => US [patent_app_date] => 1992-03-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7982 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/219/05219700.pdf [firstpage_image] =>[orig_patent_app_number] => 858441 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/858441
Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye Mar 23, 1992 Issued
07/858446 PHOTORESIST COMPOSITION Mar 23, 1992 Abandoned
Array ( [id] => 2972742 [patent_doc_number] => 05225309 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-07-06 [patent_title] => 'Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer' [patent_app_type] => 1 [patent_app_number] => 7/853852 [patent_app_country] => US [patent_app_date] => 1992-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7084 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 274 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/225/05225309.pdf [firstpage_image] =>[orig_patent_app_number] => 853852 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/853852
Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer Mar 18, 1992 Issued
Array ( [id] => 2917083 [patent_doc_number] => 05234789 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-10 [patent_title] => 'Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds' [patent_app_type] => 1 [patent_app_number] => 7/854101 [patent_app_country] => US [patent_app_date] => 1992-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5149 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 80 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/234/05234789.pdf [firstpage_image] =>[orig_patent_app_number] => 854101 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/854101
Polylactide compounds as sensitivity enhancers for radiation sensitive mixtures containing o-quinonediazide photoactive compounds Mar 18, 1992 Issued
Array ( [id] => 3012328 [patent_doc_number] => 05308743 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-05-03 [patent_title] => 'Positive image-forming process utilizing glass substrate with oxide film of indium-tin alloy, coated with o-quinonediazide photoresist, with etching of the oxide film in the imagewise exposed areas' [patent_app_type] => 1 [patent_app_number] => 7/845833 [patent_app_country] => US [patent_app_date] => 1992-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 2705 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 261 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/308/05308743.pdf [firstpage_image] =>[orig_patent_app_number] => 845833 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/845833
Positive image-forming process utilizing glass substrate with oxide film of indium-tin alloy, coated with o-quinonediazide photoresist, with etching of the oxide film in the imagewise exposed areas Mar 5, 1992 Issued
Array ( [id] => 2949733 [patent_doc_number] => 05221592 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-22 [patent_title] => 'Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester' [patent_app_type] => 1 [patent_app_number] => 7/847527 [patent_app_country] => US [patent_app_date] => 1992-03-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5225 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/221/05221592.pdf [firstpage_image] =>[orig_patent_app_number] => 847527 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/847527
Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester Mar 5, 1992 Issued
Array ( [id] => 3016266 [patent_doc_number] => 05302488 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-12 [patent_title] => 'Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material' [patent_app_type] => 1 [patent_app_number] => 7/841545 [patent_app_country] => US [patent_app_date] => 1992-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7663 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 172 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/302/05302488.pdf [firstpage_image] =>[orig_patent_app_number] => 841545 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/841545
Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material Feb 25, 1992 Issued
Array ( [id] => 3021606 [patent_doc_number] => 05326826 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-07-05 [patent_title] => 'Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation' [patent_app_type] => 1 [patent_app_number] => 7/841532 [patent_app_country] => US [patent_app_date] => 1992-02-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9727 [patent_no_of_claims] => 46 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/326/05326826.pdf [firstpage_image] =>[orig_patent_app_number] => 841532 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/841532
Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation Feb 25, 1992 Issued
Array ( [id] => 2892061 [patent_doc_number] => 05272026 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-12-21 [patent_title] => 'Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article' [patent_app_type] => 1 [patent_app_number] => 7/833724 [patent_app_country] => US [patent_app_date] => 1992-02-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7062 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 217 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/272/05272026.pdf [firstpage_image] =>[orig_patent_app_number] => 833724 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/833724
Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article Feb 10, 1992 Issued
Array ( [id] => 2888596 [patent_doc_number] => 05210000 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-05-11 [patent_title] => 'Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units' [patent_app_type] => 1 [patent_app_number] => 7/832004 [patent_app_country] => US [patent_app_date] => 1992-02-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 5495 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 123 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/210/05210000.pdf [firstpage_image] =>[orig_patent_app_number] => 832004 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/832004
Photoresist and method for forming a relief image utilizing composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units Feb 5, 1992 Issued
Array ( [id] => 2940593 [patent_doc_number] => 05254430 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-19 [patent_title] => 'Presensitized plate having anodized aluminum substrate, hydrophilic layer containing phosphonic or phosphinic compound and photosensitive layer containing O-quinone diazide compound' [patent_app_type] => 1 [patent_app_number] => 7/827452 [patent_app_country] => US [patent_app_date] => 1992-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10710 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 194 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/254/05254430.pdf [firstpage_image] =>[orig_patent_app_number] => 827452 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/827452
Presensitized plate having anodized aluminum substrate, hydrophilic layer containing phosphonic or phosphinic compound and photosensitive layer containing O-quinone diazide compound Jan 28, 1992 Issued
07/827189 NEGATIVE WORKING, PEEL DEVELOPABLE, SINGLE SHEET COLOR PROOFING SYSTEM HAVING TWO PHOTOSENSITIVE LAYERS Jan 27, 1992 Abandoned
07/825284 PATTERNING METHOD Jan 26, 1992 Abandoned
Array ( [id] => 2885594 [patent_doc_number] => 05238772 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-24 [patent_title] => 'Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units' [patent_app_type] => 1 [patent_app_number] => 7/826633 [patent_app_country] => US [patent_app_date] => 1992-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7747 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 227 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/238/05238772.pdf [firstpage_image] =>[orig_patent_app_number] => 826633 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/826633
Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units Jan 22, 1992 Issued
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