Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2950933 [patent_doc_number] => 05242779 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-09-07 [patent_title] => 'Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units' [patent_app_type] => 1 [patent_app_number] => 7/825424 [patent_app_country] => US [patent_app_date] => 1992-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9231 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/242/05242779.pdf [firstpage_image] =>[orig_patent_app_number] => 825424 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/825424
Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units Jan 22, 1992 Issued
Array ( [id] => 2892042 [patent_doc_number] => 05240808 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-31 [patent_title] => 'Light-sensitive compositions containing photosensitive polymeric compound having both photocross-linkable groups capable of cycloaddition, and functional groups carrying P--OH bonds' [patent_app_type] => 1 [patent_app_number] => 7/819581 [patent_app_country] => US [patent_app_date] => 1992-01-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6304 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 315 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/240/05240808.pdf [firstpage_image] =>[orig_patent_app_number] => 819581 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/819581
Light-sensitive compositions containing photosensitive polymeric compound having both photocross-linkable groups capable of cycloaddition, and functional groups carrying P--OH bonds Jan 7, 1992 Issued
Array ( [id] => 2939616 [patent_doc_number] => 05223376 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-29 [patent_title] => 'Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent' [patent_app_type] => 1 [patent_app_number] => 7/815885 [patent_app_country] => US [patent_app_date] => 1992-01-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4399 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 236 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/223/05223376.pdf [firstpage_image] =>[orig_patent_app_number] => 815885 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/815885
Method for producing fine patterns utilizing specific polymeric diazonium salt, or diazonium salt/sulfone group containing polymer, as photobleachable agent Jan 5, 1992 Issued
Array ( [id] => 2973694 [patent_doc_number] => 05256522 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-26 [patent_title] => 'Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing' [patent_app_type] => 1 [patent_app_number] => 7/815645 [patent_app_country] => US [patent_app_date] => 1991-12-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10552 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 27 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/256/05256522.pdf [firstpage_image] =>[orig_patent_app_number] => 815645 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/815645
Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing Dec 29, 1991 Issued
Array ( [id] => 2893662 [patent_doc_number] => 05183723 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-02-02 [patent_title] => 'Colored image on a degradable sheet material and method of formation' [patent_app_type] => 1 [patent_app_number] => 7/807290 [patent_app_country] => US [patent_app_date] => 1991-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5458 [patent_no_of_claims] => 22 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 594 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/183/05183723.pdf [firstpage_image] =>[orig_patent_app_number] => 807290 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/807290
Colored image on a degradable sheet material and method of formation Dec 12, 1991 Issued
07/805669 AQUEOUS-PROCESSABLE TONABLE IMAGING ELEMENT Dec 11, 1991 Abandoned
Array ( [id] => 2931638 [patent_doc_number] => 05229247 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-07-20 [patent_title] => 'Method of preparing a laminar thermal imaging medium capable of converting brief and intense radiation into heat' [patent_app_type] => 1 [patent_app_number] => 7/798899 [patent_app_country] => US [patent_app_date] => 1991-11-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 10178 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 278 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/229/05229247.pdf [firstpage_image] =>[orig_patent_app_number] => 798899 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/798899
Method of preparing a laminar thermal imaging medium capable of converting brief and intense radiation into heat Nov 26, 1991 Issued
Array ( [id] => 2973208 [patent_doc_number] => 05182183 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-01-26 [patent_title] => 'Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone' [patent_app_type] => 1 [patent_app_number] => 7/789550 [patent_app_country] => US [patent_app_date] => 1991-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 12534 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 47 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/182/05182183.pdf [firstpage_image] =>[orig_patent_app_number] => 789550 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/789550
Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone Nov 7, 1991 Issued
Array ( [id] => 3016287 [patent_doc_number] => 05302489 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-12 [patent_title] => 'Positive photoresist compositions containing base polymer which is substantially insoluble at pH between 7 and 10, quinonediazide acid generator and silanol solubility enhancer' [patent_app_type] => 1 [patent_app_number] => 7/784355 [patent_app_country] => US [patent_app_date] => 1991-10-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8032 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/302/05302489.pdf [firstpage_image] =>[orig_patent_app_number] => 784355 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/784355
Positive photoresist compositions containing base polymer which is substantially insoluble at pH between 7 and 10, quinonediazide acid generator and silanol solubility enhancer Oct 28, 1991 Issued
Array ( [id] => 2930453 [patent_doc_number] => 05188924 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-02-23 [patent_title] => 'Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt' [patent_app_type] => 1 [patent_app_number] => 7/777449 [patent_app_country] => US [patent_app_date] => 1991-10-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 12170 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 285 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/188/05188924.pdf [firstpage_image] =>[orig_patent_app_number] => 777449 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/777449
Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt Oct 15, 1991 Issued
07/777572 POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE COMPOSITION Oct 15, 1991 Abandoned
Array ( [id] => 2792291 [patent_doc_number] => 05143814 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-09-01 [patent_title] => 'Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate' [patent_app_type] => 1 [patent_app_number] => 7/772976 [patent_app_country] => US [patent_app_date] => 1991-10-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4316 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/143/05143814.pdf [firstpage_image] =>[orig_patent_app_number] => 772976 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/772976
Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate Oct 7, 1991 Issued
07/771088 POSITIVE PHOTORESIST CONTAINING 1,2-NAPHTHOQUINONE-DIAZIDE-5-SULFONYL TRIS ESTER OF 1,3,5-TRIHYDROXYBENZENE AND AROMATIC HYDROXY COMPOUND SENSITIZER Oct 1, 1991 Issued
07/769437 RADIATION-SENSITIVE MIXTURE WITH ACID-LABILE GROUPS AND PRODUCTION OF RELIEF PATTERNS AND IMAGES Sep 30, 1991 Abandoned
Array ( [id] => 3006500 [patent_doc_number] => 05275920 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-01-04 [patent_title] => 'Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water' [patent_app_type] => 1 [patent_app_number] => 7/762071 [patent_app_country] => US [patent_app_date] => 1991-09-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 6 [patent_no_of_words] => 5500 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 279 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/275/05275920.pdf [firstpage_image] =>[orig_patent_app_number] => 762071 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/762071
Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water Sep 17, 1991 Issued
07/759654 MULTI-COLOR TRANSFER IMAGE FORMING METHOD Sep 12, 1991 Abandoned
Array ( [id] => 3097013 [patent_doc_number] => 05314781 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-05-24 [patent_title] => 'Process for developing blueprints utilizing ammonia developer containing sodium chlorite to reduce ammonia odor in the developed blueprint paper' [patent_app_type] => 1 [patent_app_number] => 7/757556 [patent_app_country] => US [patent_app_date] => 1991-09-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 5 [patent_no_of_words] => 2362 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 45 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/314/05314781.pdf [firstpage_image] =>[orig_patent_app_number] => 757556 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/757556
Process for developing blueprints utilizing ammonia developer containing sodium chlorite to reduce ammonia odor in the developed blueprint paper Sep 10, 1991 Issued
Array ( [id] => 3090405 [patent_doc_number] => 05290657 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-03-01 [patent_title] => 'Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound' [patent_app_type] => 1 [patent_app_number] => 7/743299 [patent_app_country] => US [patent_app_date] => 1991-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2771 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 145 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/290/05290657.pdf [firstpage_image] =>[orig_patent_app_number] => 743299 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/743299
Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound Aug 14, 1991 Issued
07/744655 COLORED IMAGE FORMING MATERIAL AND METHOD FOR FORMING COLORED IMAGE Aug 8, 1991 Abandoned
Array ( [id] => 2821838 [patent_doc_number] => 05168030 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-12-01 [patent_title] => 'Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene' [patent_app_type] => 1 [patent_app_number] => 7/742513 [patent_app_country] => US [patent_app_date] => 1991-08-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 2669 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/168/05168030.pdf [firstpage_image] =>[orig_patent_app_number] => 742513 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/742513
Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene Aug 4, 1991 Issued
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