| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2903768
[patent_doc_number] => 05215865
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-01
[patent_title] => 'Image developing method utilizing sodium sulfide and ammonium polysulfide developer solution whereby exposed copper substrate surface changes color'
[patent_app_type] => 1
[patent_app_number] => 7/758411
[patent_app_country] => US
[patent_app_date] => 1991-08-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 1574
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 90
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/215/05215865.pdf
[firstpage_image] =>[orig_patent_app_number] => 758411
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/758411 | Image developing method utilizing sodium sulfide and ammonium polysulfide developer solution whereby exposed copper substrate surface changes color | Aug 2, 1991 | Issued |
Array
(
[id] => 2972799
[patent_doc_number] => 05225312
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-07-06
[patent_title] => 'Positive photoresist containing dyes'
[patent_app_type] => 1
[patent_app_number] => 7/739646
[patent_app_country] => US
[patent_app_date] => 1991-08-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4293
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/225/05225312.pdf
[firstpage_image] =>[orig_patent_app_number] => 739646
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/739646 | Positive photoresist containing dyes | Aug 1, 1991 | Issued |
Array
(
[id] => 2865398
[patent_doc_number] => 05153095
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-10-06
[patent_title] => 'Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain'
[patent_app_type] => 1
[patent_app_number] => 7/729898
[patent_app_country] => US
[patent_app_date] => 1991-07-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3655
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 115
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/153/05153095.pdf
[firstpage_image] =>[orig_patent_app_number] => 729898
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/729898 | Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain | Jul 14, 1991 | Issued |
| 07/729881 | METHOD FOR PREPARING RESIST PATTERNS UTILIZING SOLVENT DEVELOPMENT WITH SUBSEQUENT RESIST PATTERN TRANSFER, VIA A PHOTO-HARDENABLE ORGANIC LIQUID ADHESIVE, TO A RECEIVER SUBSTRATE AND OXYGEN REACTIVE ION ETCHING | Jul 10, 1991 | Abandoned |
Array
(
[id] => 2903625
[patent_doc_number] => 05215857
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-01
[patent_title] => '1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent'
[patent_app_type] => 1
[patent_app_number] => 7/726140
[patent_app_country] => US
[patent_app_date] => 1991-07-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6466
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 64
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/215/05215857.pdf
[firstpage_image] =>[orig_patent_app_number] => 726140
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/726140 | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent | Jul 2, 1991 | Issued |
Array
(
[id] => 3090573
[patent_doc_number] => 05290666
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-03-01
[patent_title] => 'Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt'
[patent_app_type] => 1
[patent_app_number] => 7/715694
[patent_app_country] => US
[patent_app_date] => 1991-06-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6640
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 183
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/290/05290666.pdf
[firstpage_image] =>[orig_patent_app_number] => 715694
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/715694 | Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt | Jun 16, 1991 | Issued |
Array
(
[id] => 2930369
[patent_doc_number] => 05188920
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-02-23
[patent_title] => 'Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound'
[patent_app_type] => 1
[patent_app_number] => 7/712729
[patent_app_country] => US
[patent_app_date] => 1991-06-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3072
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/188/05188920.pdf
[firstpage_image] =>[orig_patent_app_number] => 712729
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/712729 | Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound | Jun 9, 1991 | Issued |
Array
(
[id] => 2885632
[patent_doc_number] => 05238774
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-08-24
[patent_title] => 'Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent'
[patent_app_type] => 1
[patent_app_number] => 7/710113
[patent_app_country] => US
[patent_app_date] => 1991-06-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6403
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 132
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/238/05238774.pdf
[firstpage_image] =>[orig_patent_app_number] => 710113
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/710113 | Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent | Jun 3, 1991 | Issued |
Array
(
[id] => 2815373
[patent_doc_number] => 05080999
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-01-14
[patent_title] => 'Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide'
[patent_app_type] => 1
[patent_app_number] => 7/707190
[patent_app_country] => US
[patent_app_date] => 1991-05-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4579
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 178
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/080/05080999.pdf
[firstpage_image] =>[orig_patent_app_number] => 707190
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/707190 | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide | May 27, 1991 | Issued |
Array
(
[id] => 3060204
[patent_doc_number] => 05310618
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-05-10
[patent_title] => 'Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators'
[patent_app_type] => 1
[patent_app_number] => 7/705360
[patent_app_country] => US
[patent_app_date] => 1991-05-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4790
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/310/05310618.pdf
[firstpage_image] =>[orig_patent_app_number] => 705360
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/705360 | Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators | May 23, 1991 | Issued |
Array
(
[id] => 2775347
[patent_doc_number] => 05151339
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-09-29
[patent_title] => 'Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin'
[patent_app_type] => 1
[patent_app_number] => 7/702155
[patent_app_country] => US
[patent_app_date] => 1991-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2118
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 280
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/151/05151339.pdf
[firstpage_image] =>[orig_patent_app_number] => 702155
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/702155 | Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin | May 14, 1991 | Issued |
Array
(
[id] => 2892246
[patent_doc_number] => 05272035
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-12-21
[patent_title] => 'Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive'
[patent_app_type] => 1
[patent_app_number] => 7/700435
[patent_app_country] => US
[patent_app_date] => 1991-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5965
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 187
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/272/05272035.pdf
[firstpage_image] =>[orig_patent_app_number] => 700435
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/700435 | Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive | May 14, 1991 | Issued |
Array
(
[id] => 2821896
[patent_doc_number] => 05169741
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-12-08
[patent_title] => 'Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent'
[patent_app_type] => 1
[patent_app_number] => 7/696994
[patent_app_country] => US
[patent_app_date] => 1991-05-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3107
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 151
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/169/05169741.pdf
[firstpage_image] =>[orig_patent_app_number] => 696994
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/696994 | Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent | May 2, 1991 | Issued |
Array
(
[id] => 2973573
[patent_doc_number] => 05256517
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-10-26
[patent_title] => 'Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units'
[patent_app_type] => 1
[patent_app_number] => 7/694353
[patent_app_country] => US
[patent_app_date] => 1991-05-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11548
[patent_no_of_claims] => 59
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 26
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/256/05256517.pdf
[firstpage_image] =>[orig_patent_app_number] => 694353
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/694353 | Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units | Apr 30, 1991 | Issued |
Array
(
[id] => 2957008
[patent_doc_number] => 05198323
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-03-30
[patent_title] => 'Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component'
[patent_app_type] => 1
[patent_app_number] => 7/694372
[patent_app_country] => US
[patent_app_date] => 1991-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 3330
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 212
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/198/05198323.pdf
[firstpage_image] =>[orig_patent_app_number] => 694372
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/694372 | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Apr 29, 1991 | Issued |
Array
(
[id] => 2973248
[patent_doc_number] => 05182185
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-01-26
[patent_title] => 'Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions'
[patent_app_type] => 1
[patent_app_number] => 7/693513
[patent_app_country] => US
[patent_app_date] => 1991-04-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4044
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/182/05182185.pdf
[firstpage_image] =>[orig_patent_app_number] => 693513
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/693513 | Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions | Apr 29, 1991 | Issued |
Array
(
[id] => 3042555
[patent_doc_number] => 05334481
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-08-02
[patent_title] => 'Positive diazo quinone photoresist compositions containing antihalation compound'
[patent_app_type] => 1
[patent_app_number] => 7/692811
[patent_app_country] => US
[patent_app_date] => 1991-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2370
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 88
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/334/05334481.pdf
[firstpage_image] =>[orig_patent_app_number] => 692811
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/692811 | Positive diazo quinone photoresist compositions containing antihalation compound | Apr 24, 1991 | Issued |
Array
(
[id] => 2919710
[patent_doc_number] => 05200291
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-04-06
[patent_title] => 'Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin'
[patent_app_type] => 1
[patent_app_number] => 7/684547
[patent_app_country] => US
[patent_app_date] => 1991-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3849
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 127
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/200/05200291.pdf
[firstpage_image] =>[orig_patent_app_number] => 684547
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/684547 | Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin | Apr 10, 1991 | Issued |
| 07/681556 | PHOTOIMAGING PROCESS USING WATER REMOVABLE COATINGS | Apr 4, 1991 | Abandoned |
Array
(
[id] => 2984727
[patent_doc_number] => 05212041
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-05-18
[patent_title] => 'Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound and water insoluble, water swellable, binder resin'
[patent_app_type] => 1
[patent_app_number] => 7/679361
[patent_app_country] => US
[patent_app_date] => 1991-04-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 4389
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 153
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/212/05212041.pdf
[firstpage_image] =>[orig_patent_app_number] => 679361
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/679361 | Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound and water insoluble, water swellable, binder resin | Apr 1, 1991 | Issued |