Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2903768 [patent_doc_number] => 05215865 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-01 [patent_title] => 'Image developing method utilizing sodium sulfide and ammonium polysulfide developer solution whereby exposed copper substrate surface changes color' [patent_app_type] => 1 [patent_app_number] => 7/758411 [patent_app_country] => US [patent_app_date] => 1991-08-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1574 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/215/05215865.pdf [firstpage_image] =>[orig_patent_app_number] => 758411 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/758411
Image developing method utilizing sodium sulfide and ammonium polysulfide developer solution whereby exposed copper substrate surface changes color Aug 2, 1991 Issued
Array ( [id] => 2972799 [patent_doc_number] => 05225312 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-07-06 [patent_title] => 'Positive photoresist containing dyes' [patent_app_type] => 1 [patent_app_number] => 7/739646 [patent_app_country] => US [patent_app_date] => 1991-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4293 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 102 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/225/05225312.pdf [firstpage_image] =>[orig_patent_app_number] => 739646 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/739646
Positive photoresist containing dyes Aug 1, 1991 Issued
Array ( [id] => 2865398 [patent_doc_number] => 05153095 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-10-06 [patent_title] => 'Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain' [patent_app_type] => 1 [patent_app_number] => 7/729898 [patent_app_country] => US [patent_app_date] => 1991-07-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3655 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/153/05153095.pdf [firstpage_image] =>[orig_patent_app_number] => 729898 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/729898
Light-sensitive photopolymerizable composition containing polymer with ethylenic unsaturation in the side chain Jul 14, 1991 Issued
07/729881 METHOD FOR PREPARING RESIST PATTERNS UTILIZING SOLVENT DEVELOPMENT WITH SUBSEQUENT RESIST PATTERN TRANSFER, VIA A PHOTO-HARDENABLE ORGANIC LIQUID ADHESIVE, TO A RECEIVER SUBSTRATE AND OXYGEN REACTIVE ION ETCHING Jul 10, 1991 Abandoned
Array ( [id] => 2903625 [patent_doc_number] => 05215857 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-01 [patent_title] => '1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent' [patent_app_type] => 1 [patent_app_number] => 7/726140 [patent_app_country] => US [patent_app_date] => 1991-07-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6466 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/215/05215857.pdf [firstpage_image] =>[orig_patent_app_number] => 726140 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/726140
1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent Jul 2, 1991 Issued
Array ( [id] => 3090573 [patent_doc_number] => 05290666 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-03-01 [patent_title] => 'Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt' [patent_app_type] => 1 [patent_app_number] => 7/715694 [patent_app_country] => US [patent_app_date] => 1991-06-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6640 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 183 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/290/05290666.pdf [firstpage_image] =>[orig_patent_app_number] => 715694 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/715694
Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt Jun 16, 1991 Issued
Array ( [id] => 2930369 [patent_doc_number] => 05188920 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-02-23 [patent_title] => 'Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound' [patent_app_type] => 1 [patent_app_number] => 7/712729 [patent_app_country] => US [patent_app_date] => 1991-06-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3072 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/188/05188920.pdf [firstpage_image] =>[orig_patent_app_number] => 712729 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/712729
Positive resist composition containing 1,2-quinone diazide compound, alkali-soluble resin and polyhydroxy phenol additive compound Jun 9, 1991 Issued
Array ( [id] => 2885632 [patent_doc_number] => 05238774 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-24 [patent_title] => 'Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent' [patent_app_type] => 1 [patent_app_number] => 7/710113 [patent_app_country] => US [patent_app_date] => 1991-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6403 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 132 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/238/05238774.pdf [firstpage_image] =>[orig_patent_app_number] => 710113 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/710113
Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent Jun 3, 1991 Issued
Array ( [id] => 2815373 [patent_doc_number] => 05080999 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-01-14 [patent_title] => 'Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide' [patent_app_type] => 1 [patent_app_number] => 7/707190 [patent_app_country] => US [patent_app_date] => 1991-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4579 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 178 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/080/05080999.pdf [firstpage_image] =>[orig_patent_app_number] => 707190 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/707190
Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide May 27, 1991 Issued
Array ( [id] => 3060204 [patent_doc_number] => 05310618 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-05-10 [patent_title] => 'Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators' [patent_app_type] => 1 [patent_app_number] => 7/705360 [patent_app_country] => US [patent_app_date] => 1991-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4790 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/310/05310618.pdf [firstpage_image] =>[orig_patent_app_number] => 705360 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/705360
Light-sensitive compositions and articles utilizing a compound or polymer containing an aromatic diazonium salt group and a light-absorbing residue of a sensitizing dye for trichloromethyl-s-triazine or azinium salt photopolymerization initiators May 23, 1991 Issued
Array ( [id] => 2775347 [patent_doc_number] => 05151339 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-09-29 [patent_title] => 'Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin' [patent_app_type] => 1 [patent_app_number] => 7/702155 [patent_app_country] => US [patent_app_date] => 1991-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2118 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 280 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/151/05151339.pdf [firstpage_image] =>[orig_patent_app_number] => 702155 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/702155
Photoresist composition containing diazoquinone photosensitizer and novalak resin characterized by the complete and selective removal of dimeric species from the novolak resin May 14, 1991 Issued
Array ( [id] => 2892246 [patent_doc_number] => 05272035 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-12-21 [patent_title] => 'Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive' [patent_app_type] => 1 [patent_app_number] => 7/700435 [patent_app_country] => US [patent_app_date] => 1991-05-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5965 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 187 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/272/05272035.pdf [firstpage_image] =>[orig_patent_app_number] => 700435 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/700435
Photosensitive lithographic printing plate having treated aluminum support with diazonium light-sensitive layer containing polyurethane resin and phosphorous additive May 14, 1991 Issued
Array ( [id] => 2821896 [patent_doc_number] => 05169741 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-12-08 [patent_title] => 'Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent' [patent_app_type] => 1 [patent_app_number] => 7/696994 [patent_app_country] => US [patent_app_date] => 1991-05-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3107 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/169/05169741.pdf [firstpage_image] =>[orig_patent_app_number] => 696994 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/696994
Method for forming high sensitivity positive patterns employing a material containing a photosensitive compound having a diazo group, an alkaline-soluble polymer, a compound capable of adjusting the pH to 4 or less and a solvent May 2, 1991 Issued
Array ( [id] => 2973573 [patent_doc_number] => 05256517 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-10-26 [patent_title] => 'Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units' [patent_app_type] => 1 [patent_app_number] => 7/694353 [patent_app_country] => US [patent_app_date] => 1991-05-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 11548 [patent_no_of_claims] => 59 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 26 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/256/05256517.pdf [firstpage_image] =>[orig_patent_app_number] => 694353 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/694353
Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units Apr 30, 1991 Issued
Array ( [id] => 2957008 [patent_doc_number] => 05198323 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-03-30 [patent_title] => 'Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component' [patent_app_type] => 1 [patent_app_number] => 7/694372 [patent_app_country] => US [patent_app_date] => 1991-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 3330 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 212 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/198/05198323.pdf [firstpage_image] =>[orig_patent_app_number] => 694372 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/694372
Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component Apr 29, 1991 Issued
Array ( [id] => 2973248 [patent_doc_number] => 05182185 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-01-26 [patent_title] => 'Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions' [patent_app_type] => 1 [patent_app_number] => 7/693513 [patent_app_country] => US [patent_app_date] => 1991-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4044 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/182/05182185.pdf [firstpage_image] =>[orig_patent_app_number] => 693513 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/693513
Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions Apr 29, 1991 Issued
Array ( [id] => 3042555 [patent_doc_number] => 05334481 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-02 [patent_title] => 'Positive diazo quinone photoresist compositions containing antihalation compound' [patent_app_type] => 1 [patent_app_number] => 7/692811 [patent_app_country] => US [patent_app_date] => 1991-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2370 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/334/05334481.pdf [firstpage_image] =>[orig_patent_app_number] => 692811 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/692811
Positive diazo quinone photoresist compositions containing antihalation compound Apr 24, 1991 Issued
Array ( [id] => 2919710 [patent_doc_number] => 05200291 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-04-06 [patent_title] => 'Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin' [patent_app_type] => 1 [patent_app_number] => 7/684547 [patent_app_country] => US [patent_app_date] => 1991-04-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3849 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/200/05200291.pdf [firstpage_image] =>[orig_patent_app_number] => 684547 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/684547
Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin Apr 10, 1991 Issued
07/681556 PHOTOIMAGING PROCESS USING WATER REMOVABLE COATINGS Apr 4, 1991 Abandoned
Array ( [id] => 2984727 [patent_doc_number] => 05212041 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-05-18 [patent_title] => 'Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound and water insoluble, water swellable, binder resin' [patent_app_type] => 1 [patent_app_number] => 7/679361 [patent_app_country] => US [patent_app_date] => 1991-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 4389 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/212/05212041.pdf [firstpage_image] =>[orig_patent_app_number] => 679361 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/679361
Water developable, negative working overlay color proofing system utilizing water soluble polymeric diazonium compound and water insoluble, water swellable, binder resin Apr 1, 1991 Issued
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