| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2823501
[patent_doc_number] => 05116715
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-05-26
[patent_title] => 'Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid'
[patent_app_type] => 1
[patent_app_number] => 7/668810
[patent_app_country] => US
[patent_app_date] => 1991-03-08
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/116/05116715.pdf
[firstpage_image] =>[orig_patent_app_number] => 668810
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/668810 | Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid | Mar 7, 1991 | Issued |
| 07/664753 | COLORED POSITIVE-WORKING PHOTOSENSITIVE RECORDING MATERIAL AND A PROCESS FOR THE PRODUCTION OF A COLOR TEST IMAGE USING THIS MATERIAL | Mar 4, 1991 | Abandoned |
Array
(
[id] => 2770599
[patent_doc_number] => 05075193
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-12-24
[patent_title] => 'Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent'
[patent_app_type] => 1
[patent_app_number] => 7/662395
[patent_app_country] => US
[patent_app_date] => 1991-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 2780
[patent_no_of_claims] => 6
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[patent_words_short_claim] => 51
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/075/05075193.pdf
[firstpage_image] =>[orig_patent_app_number] => 662395
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/662395 | Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent | Feb 26, 1991 | Issued |
| 07/661328 | NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURE AND A RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM | Feb 26, 1991 | Abandoned |
Array
(
[id] => 2885670
[patent_doc_number] => 05238776
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-08-24
[patent_title] => 'Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound'
[patent_app_type] => 1
[patent_app_number] => 7/661125
[patent_app_country] => US
[patent_app_date] => 1991-02-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4349
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 119
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/238/05238776.pdf
[firstpage_image] =>[orig_patent_app_number] => 661125
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/661125 | Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound | Feb 26, 1991 | Issued |
| 07/661289 | AQUEOUS DEVELOPABLE PRECOLORED DIAZO IMAGING ELEMENT | Feb 25, 1991 | Abandoned |
| 07/655043 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | Feb 13, 1991 | Abandoned |
| 07/654510 | PRESENSITIZED PLATE FOR USE IN MAKING LITHOGRAPHIC PRINTING PLATE | Feb 12, 1991 | Abandoned |
Array
(
[id] => 2811886
[patent_doc_number] => 05079131
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-01-07
[patent_title] => 'Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations'
[patent_app_type] => 1
[patent_app_number] => 7/653992
[patent_app_country] => US
[patent_app_date] => 1991-02-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 3069
[patent_no_of_claims] => 31
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[patent_words_short_claim] => 153
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/079/05079131.pdf
[firstpage_image] =>[orig_patent_app_number] => 653992
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/653992 | Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations | Feb 10, 1991 | Issued |
| 07/651992 | LIGHT-SENSITIVE LITHO PRINTING PLATE | Feb 6, 1991 | Abandoned |
| 07/651210 | RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL AND A PROCESS FOR THE PRODUCTION OF RELIEF RECORDINGS | Feb 5, 1991 | Abandoned |
Array
(
[id] => 2915175
[patent_doc_number] => 05206110
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-04-27
[patent_title] => 'Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye'
[patent_app_type] => 1
[patent_app_number] => 7/650341
[patent_app_country] => US
[patent_app_date] => 1991-02-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/206/05206110.pdf
[firstpage_image] =>[orig_patent_app_number] => 650341
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/650341 | Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye | Feb 3, 1991 | Issued |
Array
(
[id] => 2843925
[patent_doc_number] => 05106718
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-04-21
[patent_title] => 'Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound'
[patent_app_type] => 1
[patent_app_number] => 7/648954
[patent_app_country] => US
[patent_app_date] => 1991-02-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4059
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 171
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/106/05106718.pdf
[firstpage_image] =>[orig_patent_app_number] => 648954
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/648954 | Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound | Jan 31, 1991 | Issued |
Array
(
[id] => 2733577
[patent_doc_number] => 05077173
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-12-31
[patent_title] => 'Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene'
[patent_app_type] => 1
[patent_app_number] => 7/649271
[patent_app_country] => US
[patent_app_date] => 1991-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4285
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 60
[patent_maintenance] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/077/05077173.pdf
[firstpage_image] =>[orig_patent_app_number] => 649271
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/649271 | Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene | Jan 29, 1991 | Issued |
Array
(
[id] => 3056353
[patent_doc_number] => 05350660
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1994-09-27
[patent_title] => 'Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere'
[patent_app_type] => 1
[patent_app_number] => 7/646026
[patent_app_country] => US
[patent_app_date] => 1991-01-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 4
[patent_no_of_words] => 9599
[patent_no_of_claims] => 19
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[patent_words_short_claim] => 152
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/350/05350660.pdf
[firstpage_image] =>[orig_patent_app_number] => 646026
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/646026 | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | Jan 27, 1991 | Issued |
| 07/646025 | PATTERN FORMING METHOD | Jan 27, 1991 | Abandoned |
Array
(
[id] => 2856504
[patent_doc_number] => 05084372
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-01-28
[patent_title] => 'Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound'
[patent_app_type] => 1
[patent_app_number] => 7/645085
[patent_app_country] => US
[patent_app_date] => 1991-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 4357
[patent_no_of_claims] => 20
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/084/05084372.pdf
[firstpage_image] =>[orig_patent_app_number] => 645085
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/645085 | Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound | Jan 22, 1991 | Issued |
Array
(
[id] => 2827684
[patent_doc_number] => 05128230
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-07-07
[patent_title] => 'Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate'
[patent_app_type] => 1
[patent_app_number] => 7/644752
[patent_app_country] => US
[patent_app_date] => 1991-01-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 18226
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[pdf_file] => patents/05/128/05128230.pdf
[firstpage_image] =>[orig_patent_app_number] => 644752
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/644752 | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate | Jan 22, 1991 | Issued |
Array
(
[id] => 2928394
[patent_doc_number] => 05232813
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-08-03
[patent_title] => 'PS plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer'
[patent_app_type] => 1
[patent_app_number] => 7/643893
[patent_app_country] => US
[patent_app_date] => 1991-01-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/232/05232813.pdf
[firstpage_image] =>[orig_patent_app_number] => 643893
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/643893 | PS plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer | Jan 21, 1991 | Issued |
Array
(
[id] => 2880510
[patent_doc_number] => 05108869
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-04-28
[patent_title] => 'Diazo reprographic paper with substantially transparent, flexible polymeric sheet protective layer'
[patent_app_type] => 1
[patent_app_number] => 7/642796
[patent_app_country] => US
[patent_app_date] => 1991-01-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/05/108/05108869.pdf
[firstpage_image] =>[orig_patent_app_number] => 642796
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/642796 | Diazo reprographic paper with substantially transparent, flexible polymeric sheet protective layer | Jan 17, 1991 | Issued |