Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2823501 [patent_doc_number] => 05116715 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-05-26 [patent_title] => 'Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid' [patent_app_type] => 1 [patent_app_number] => 7/668810 [patent_app_country] => US [patent_app_date] => 1991-03-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7069 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 135 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/116/05116715.pdf [firstpage_image] =>[orig_patent_app_number] => 668810 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/668810
Photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester of phenolic resin with diazoquinonesulfonic acid or diazoquinonecarboxylic acid Mar 7, 1991 Issued
07/664753 COLORED POSITIVE-WORKING PHOTOSENSITIVE RECORDING MATERIAL AND A PROCESS FOR THE PRODUCTION OF A COLOR TEST IMAGE USING THIS MATERIAL Mar 4, 1991 Abandoned
Array ( [id] => 2770599 [patent_doc_number] => 05075193 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-12-24 [patent_title] => 'Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent' [patent_app_type] => 1 [patent_app_number] => 7/662395 [patent_app_country] => US [patent_app_date] => 1991-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2780 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 51 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/075/05075193.pdf [firstpage_image] =>[orig_patent_app_number] => 662395 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/662395
Desensitized quinone diazide compounds utilizing microcrystalline cellulose as desensitizing agent Feb 26, 1991 Issued
07/661328 NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURE AND A RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREFROM Feb 26, 1991 Abandoned
Array ( [id] => 2885670 [patent_doc_number] => 05238776 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-24 [patent_title] => 'Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound' [patent_app_type] => 1 [patent_app_number] => 7/661125 [patent_app_country] => US [patent_app_date] => 1991-02-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4349 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 119 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/238/05238776.pdf [firstpage_image] =>[orig_patent_app_number] => 661125 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/661125
Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound Feb 26, 1991 Issued
07/661289 AQUEOUS DEVELOPABLE PRECOLORED DIAZO IMAGING ELEMENT Feb 25, 1991 Abandoned
07/655043 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE Feb 13, 1991 Abandoned
07/654510 PRESENSITIZED PLATE FOR USE IN MAKING LITHOGRAPHIC PRINTING PLATE Feb 12, 1991 Abandoned
Array ( [id] => 2811886 [patent_doc_number] => 05079131 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-01-07 [patent_title] => 'Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations' [patent_app_type] => 1 [patent_app_number] => 7/653992 [patent_app_country] => US [patent_app_date] => 1991-02-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3069 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/079/05079131.pdf [firstpage_image] =>[orig_patent_app_number] => 653992 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/653992
Method of forming positive images through organometallic treatment of negative acid hardening cross-linked photoresist formulations Feb 10, 1991 Issued
07/651992 LIGHT-SENSITIVE LITHO PRINTING PLATE Feb 6, 1991 Abandoned
07/651210 RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL AND A PROCESS FOR THE PRODUCTION OF RELIEF RECORDINGS Feb 5, 1991 Abandoned
Array ( [id] => 2915175 [patent_doc_number] => 05206110 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-04-27 [patent_title] => 'Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye' [patent_app_type] => 1 [patent_app_number] => 7/650341 [patent_app_country] => US [patent_app_date] => 1991-02-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3703 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 87 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/206/05206110.pdf [firstpage_image] =>[orig_patent_app_number] => 650341 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/650341
Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye Feb 3, 1991 Issued
Array ( [id] => 2843925 [patent_doc_number] => 05106718 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-04-21 [patent_title] => 'Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound' [patent_app_type] => 1 [patent_app_number] => 7/648954 [patent_app_country] => US [patent_app_date] => 1991-02-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4059 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 171 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/106/05106718.pdf [firstpage_image] =>[orig_patent_app_number] => 648954 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/648954
Positive photoresist composition containing alkali-soluble phenolic resin, photosensitive quinonediazide compound and sulfonyl containing compound Jan 31, 1991 Issued
Array ( [id] => 2733577 [patent_doc_number] => 05077173 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-12-31 [patent_title] => 'Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene' [patent_app_type] => 1 [patent_app_number] => 7/649271 [patent_app_country] => US [patent_app_date] => 1991-01-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4285 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 60 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/077/05077173.pdf [firstpage_image] =>[orig_patent_app_number] => 649271 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/649271
Positive photoresist containing 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone-diazide-5-sulfonyl trisester of 1,3,5-trihydroxybenzene Jan 29, 1991 Issued
Array ( [id] => 3056353 [patent_doc_number] => 05350660 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-09-27 [patent_title] => 'Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere' [patent_app_type] => 1 [patent_app_number] => 7/646026 [patent_app_country] => US [patent_app_date] => 1991-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 9599 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 152 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/350/05350660.pdf [firstpage_image] =>[orig_patent_app_number] => 646026 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/646026
Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere Jan 27, 1991 Issued
07/646025 PATTERN FORMING METHOD Jan 27, 1991 Abandoned
Array ( [id] => 2856504 [patent_doc_number] => 05084372 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-01-28 [patent_title] => 'Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound' [patent_app_type] => 1 [patent_app_number] => 7/645085 [patent_app_country] => US [patent_app_date] => 1991-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4357 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 252 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/084/05084372.pdf [firstpage_image] =>[orig_patent_app_number] => 645085 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/645085
Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound Jan 22, 1991 Issued
Array ( [id] => 2827684 [patent_doc_number] => 05128230 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-07-07 [patent_title] => 'Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate' [patent_app_type] => 1 [patent_app_number] => 7/644752 [patent_app_country] => US [patent_app_date] => 1991-01-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 18226 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/128/05128230.pdf [firstpage_image] =>[orig_patent_app_number] => 644752 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/644752
Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate Jan 22, 1991 Issued
Array ( [id] => 2928394 [patent_doc_number] => 05232813 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-08-03 [patent_title] => 'PS plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer' [patent_app_type] => 1 [patent_app_number] => 7/643893 [patent_app_country] => US [patent_app_date] => 1991-01-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7371 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/232/05232813.pdf [firstpage_image] =>[orig_patent_app_number] => 643893 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/643893
PS plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer Jan 21, 1991 Issued
Array ( [id] => 2880510 [patent_doc_number] => 05108869 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-04-28 [patent_title] => 'Diazo reprographic paper with substantially transparent, flexible polymeric sheet protective layer' [patent_app_type] => 1 [patent_app_number] => 7/642796 [patent_app_country] => US [patent_app_date] => 1991-01-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 3 [patent_no_of_words] => 1584 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 117 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/108/05108869.pdf [firstpage_image] =>[orig_patent_app_number] => 642796 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/642796
Diazo reprographic paper with substantially transparent, flexible polymeric sheet protective layer Jan 17, 1991 Issued
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