Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
07/638021 COLORED IMAGE FORMING MATERIAL AND METHOD FOR FORMING COLORED IMAGE Jan 6, 1991 Abandoned
Array ( [id] => 2933871 [patent_doc_number] => 05260162 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-11-09 [patent_title] => 'Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers' [patent_app_type] => 1 [patent_app_number] => 7/628549 [patent_app_country] => US [patent_app_date] => 1990-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5078 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 70 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/260/05260162.pdf [firstpage_image] =>[orig_patent_app_number] => 628549 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/628549
Photosensitizer compositions containing diazo fluorinated esters of hexafluoro-bis-phenols or bis-hexafluoroethers Dec 16, 1990 Issued
Array ( [id] => 2815351 [patent_doc_number] => 05080998 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-01-14 [patent_title] => 'Process for the formation of positive images utilizing electrodeposition of o-quinone diazide compound containing photoresist on conductive surface' [patent_app_type] => 1 [patent_app_number] => 7/629099 [patent_app_country] => US [patent_app_date] => 1990-12-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7530 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/080/05080998.pdf [firstpage_image] =>[orig_patent_app_number] => 629099 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/629099
Process for the formation of positive images utilizing electrodeposition of o-quinone diazide compound containing photoresist on conductive surface Dec 16, 1990 Issued
Array ( [id] => 2786094 [patent_doc_number] => 05100758 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-03-31 [patent_title] => 'Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent' [patent_app_type] => 1 [patent_app_number] => 7/623014 [patent_app_country] => US [patent_app_date] => 1990-12-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4558 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/100/05100758.pdf [firstpage_image] =>[orig_patent_app_number] => 623014 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/623014
Positive-working photoresist composition containing quinone diazide compound, novolak resin and alkyl pyruvate solvent Dec 5, 1990 Issued
Array ( [id] => 2781300 [patent_doc_number] => 05164279 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-11-17 [patent_title] => 'Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol' [patent_app_type] => 1 [patent_app_number] => 7/621517 [patent_app_country] => US [patent_app_date] => 1990-12-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8122 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 22 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/164/05164279.pdf [firstpage_image] =>[orig_patent_app_number] => 621517 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/621517
Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol Dec 2, 1990 Issued
Array ( [id] => 2893645 [patent_doc_number] => 05183722 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-02-02 [patent_title] => 'Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition' [patent_app_type] => 1 [patent_app_number] => 7/620002 [patent_app_country] => US [patent_app_date] => 1990-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 7170 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/183/05183722.pdf [firstpage_image] =>[orig_patent_app_number] => 620002 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/620002
Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition Nov 29, 1990 Issued
07/619675 POSITIVE PHOTORESIST AND USE THEREOF Nov 28, 1990 Abandoned
Array ( [id] => 3032862 [patent_doc_number] => 05300396 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-04-05 [patent_title] => 'Process of making naphthoquinone diazide esters using lactone solvents' [patent_app_type] => 1 [patent_app_number] => 7/619154 [patent_app_country] => US [patent_app_date] => 1990-11-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6210 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 158 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/300/05300396.pdf [firstpage_image] =>[orig_patent_app_number] => 619154 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/619154
Process of making naphthoquinone diazide esters using lactone solvents Nov 27, 1990 Issued
Array ( [id] => 2919816 [patent_doc_number] => 05200297 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-04-06 [patent_title] => 'Laminar thermal imaging mediums, containing polymeric stress-absorbing layer, actuatable in response to intense image-forming radiation' [patent_app_type] => 1 [patent_app_number] => 7/616854 [patent_app_country] => US [patent_app_date] => 1990-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 10487 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 374 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/200/05200297.pdf [firstpage_image] =>[orig_patent_app_number] => 616854 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/616854
Laminar thermal imaging mediums, containing polymeric stress-absorbing layer, actuatable in response to intense image-forming radiation Nov 20, 1990 Issued
07/616940 PROCESS FOR PRODUCING A NEGATIVE-WORKING PHOTOSENSITIVE PRINTING FORM Nov 20, 1990 Abandoned
Array ( [id] => 3027941 [patent_doc_number] => 05342731 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1994-08-30 [patent_title] => 'Laminar thermal imaging medium actuatable in response to intense image-forming radiation utilizing polymeric hardenable adhesive layer that reduces tendency for delamination' [patent_app_type] => 1 [patent_app_number] => 7/616853 [patent_app_country] => US [patent_app_date] => 1990-11-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 2 [patent_no_of_words] => 10615 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 320 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/342/05342731.pdf [firstpage_image] =>[orig_patent_app_number] => 616853 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/616853
Laminar thermal imaging medium actuatable in response to intense image-forming radiation utilizing polymeric hardenable adhesive layer that reduces tendency for delamination Nov 20, 1990 Issued
07/615845 AQUEOUS DEVELOPER AND DEVELOPMENT OF PHOTORESISTS Nov 19, 1990 Abandoned
Array ( [id] => 2783929 [patent_doc_number] => 05155012 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-10-13 [patent_title] => 'Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers and a process for producing printing forms' [patent_app_type] => 1 [patent_app_number] => 7/613010 [patent_app_country] => US [patent_app_date] => 1990-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6109 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/155/05155012.pdf [firstpage_image] =>[orig_patent_app_number] => 613010 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/613010
Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers and a process for producing printing forms Nov 14, 1990 Issued
Array ( [id] => 2783912 [patent_doc_number] => 05155011 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-10-13 [patent_title] => 'Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms' [patent_app_type] => 1 [patent_app_number] => 7/613000 [patent_app_country] => US [patent_app_date] => 1990-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6615 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 147 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/155/05155011.pdf [firstpage_image] =>[orig_patent_app_number] => 613000 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/613000
Developer concentrate and developer prepared therefrom for exposed negative-working reproduction layers with top layer and a process for producing printing forms Nov 14, 1990 Issued
Array ( [id] => 2844955 [patent_doc_number] => 05110706 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-05-05 [patent_title] => 'I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive' [patent_app_type] => 1 [patent_app_number] => 7/611762 [patent_app_country] => US [patent_app_date] => 1990-11-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5581 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 104 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/110/05110706.pdf [firstpage_image] =>[orig_patent_app_number] => 611762 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/611762
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive Nov 12, 1990 Issued
07/607004 DEVELOPER METHOD FOR POSITIVE PHOTORESIST Oct 30, 1990 Abandoned
Array ( [id] => 2959282 [patent_doc_number] => 05273856 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-12-28 [patent_title] => 'Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation' [patent_app_type] => 1 [patent_app_number] => 7/606652 [patent_app_country] => US [patent_app_date] => 1990-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2208 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 64 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/273/05273856.pdf [firstpage_image] =>[orig_patent_app_number] => 606652 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/606652
Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation Oct 30, 1990 Issued
Array ( [id] => 2852363 [patent_doc_number] => 05112719 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-05-12 [patent_title] => 'Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer' [patent_app_type] => 1 [patent_app_number] => 7/603355 [patent_app_country] => US [patent_app_date] => 1990-10-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3502 [patent_no_of_claims] => 1 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 173 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/112/05112719.pdf [firstpage_image] =>[orig_patent_app_number] => 603355 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/603355
Positive resist composition containing alkali-soluble phenolic resin, quinonediazide sulfonic acid ester photosensitive agent and polyhydroxy sensitizer Oct 25, 1990 Issued
07/599033 SURFACE BARRIER SILYLATION MICROLITHOGRAPHY Oct 16, 1990 Abandoned
07/591124 POSITIVE IMAGE FORMATION UTILIZING RESIST MATERIAL WITH CARBAZOLE DIAZONIUM SALT ACID GENERATOR Sep 30, 1990 Abandoned
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