| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 2897462
[patent_doc_number] => 05217840
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1993-06-08
[patent_title] => 'Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom'
[patent_app_type] => 1
[patent_app_number] => 7/530545
[patent_app_country] => US
[patent_app_date] => 1990-05-25
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[firstpage_image] =>[orig_patent_app_number] => 530545
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/530545 | Image reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefrom | May 24, 1990 | Issued |
| 07/530544 | IMAGE REVERSAL NEGATIVE WORKING PHOTORESIST | May 24, 1990 | Abandoned |
| 07/528676 | POSITIVE PHOTORESIST CONTAINING DYE | May 23, 1990 | Abandoned |
Array
(
[id] => 2737488
[patent_doc_number] => 05077378
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-12-31
[patent_title] => 'Polyamide containing the hexafluoroisopropylidene group'
[patent_app_type] => 1
[patent_app_number] => 7/526583
[patent_app_country] => US
[patent_app_date] => 1990-05-21
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[pdf_file] => patents/05/077/05077378.pdf
[firstpage_image] =>[orig_patent_app_number] => 526583
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/526583 | Polyamide containing the hexafluoroisopropylidene group | May 20, 1990 | Issued |
Array
(
[id] => 2852835
[patent_doc_number] => 05112743
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-05-12
[patent_title] => 'Light-sensitive composition and presensitized plate for use in making lithographic printing plates'
[patent_app_type] => 1
[patent_app_number] => 7/523997
[patent_app_country] => US
[patent_app_date] => 1990-05-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/112/05112743.pdf
[firstpage_image] =>[orig_patent_app_number] => 523997
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/523997 | Light-sensitive composition and presensitized plate for use in making lithographic printing plates | May 15, 1990 | Issued |
| 07/520184 | METHOD OF PREPARATION OF FINE PATTERNS | May 7, 1990 | Abandoned |
Array
(
[id] => 2783624
[patent_doc_number] => 05130229
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-07-14
[patent_title] => 'Multi layer thin film wiring process featuring self-alignment of vias'
[patent_app_type] => 1
[patent_app_number] => 7/514982
[patent_app_country] => US
[patent_app_date] => 1990-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
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[patent_no_of_words] => 3235
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[pdf_file] => patents/05/130/05130229.pdf
[firstpage_image] =>[orig_patent_app_number] => 514982
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/514982 | Multi layer thin film wiring process featuring self-alignment of vias | Apr 25, 1990 | Issued |
| 07/514285 | LIGHT-SENSITIVE COMPOSITIONS | Apr 24, 1990 | Abandoned |
| 07/513865 | DRY-DEVELOPABLE RESIST SYSTEM | Apr 23, 1990 | Abandoned |
| 07/508531 | POSITIVE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | Apr 11, 1990 | Abandoned |
Array
(
[id] => 2769049
[patent_doc_number] => 04985332
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-01-15
[patent_title] => 'Resist material with carbazole diazonium salt acid generator and process for use'
[patent_app_type] => 1
[patent_app_number] => 7/508134
[patent_app_country] => US
[patent_app_date] => 1990-04-10
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/04/985/04985332.pdf
[firstpage_image] =>[orig_patent_app_number] => 508134
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/508134 | Resist material with carbazole diazonium salt acid generator and process for use | Apr 9, 1990 | Issued |
| 07/505699 | PHOTORESIST COMPOSITION | Apr 5, 1990 | Abandoned |
Array
(
[id] => 2678916
[patent_doc_number] => 05066561
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-11-19
[patent_title] => 'Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate'
[patent_app_type] => 1
[patent_app_number] => 7/501970
[patent_app_country] => US
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[pdf_file] => patents/05/066/05066561.pdf
[firstpage_image] =>[orig_patent_app_number] => 501970
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/501970 | Method for producing and using a positive photoresist with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate | Mar 27, 1990 | Issued |
Array
(
[id] => 2679025
[patent_doc_number] => 05066567
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-11-19
[patent_title] => 'Image reversal process utilizing a positive-working photosensitive composition containing a dye'
[patent_app_type] => 1
[patent_app_number] => 7/500201
[patent_app_country] => US
[patent_app_date] => 1990-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
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[pdf_file] => patents/05/066/05066567.pdf
[firstpage_image] =>[orig_patent_app_number] => 500201
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/500201 | Image reversal process utilizing a positive-working photosensitive composition containing a dye | Mar 27, 1990 | Issued |
Array
(
[id] => 2783515
[patent_doc_number] => 05130223
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-07-14
[patent_title] => 'Postive working image-forming material with surface roughened plastic film substrate, transparent resin layer, colored resin layer and photosensitive resin layer'
[patent_app_type] => 1
[patent_app_number] => 7/493445
[patent_app_country] => US
[patent_app_date] => 1990-03-14
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/130/05130223.pdf
[firstpage_image] =>[orig_patent_app_number] => 493445
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/493445 | Postive working image-forming material with surface roughened plastic film substrate, transparent resin layer, colored resin layer and photosensitive resin layer | Mar 13, 1990 | Issued |
| 07/489974 | ANTISTATIC PHOTO-RESIST | Mar 6, 1990 | Abandoned |
Array
(
[id] => 2780689
[patent_doc_number] => 05087547
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-02-11
[patent_title] => 'Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer'
[patent_app_type] => 1
[patent_app_number] => 7/487657
[patent_app_country] => US
[patent_app_date] => 1990-03-02
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/087/05087547.pdf
[firstpage_image] =>[orig_patent_app_number] => 487657
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/487657 | Dual-tone photoresist utilizing diazonaphthoquinone resin and carbodiimide stabilizer | Mar 1, 1990 | Issued |
Array
(
[id] => 2783535
[patent_doc_number] => 05130224
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-07-14
[patent_title] => 'Positive-working photoresist composition'
[patent_app_type] => 1
[patent_app_number] => 7/486327
[patent_app_country] => US
[patent_app_date] => 1990-02-28
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/130/05130224.pdf
[firstpage_image] =>[orig_patent_app_number] => 486327
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/486327 | Positive-working photoresist composition | Feb 27, 1990 | Issued |
Array
(
[id] => 2713698
[patent_doc_number] => 05008175
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-04-16
[patent_title] => 'Copying materials'
[patent_app_type] => 1
[patent_app_number] => 7/480775
[patent_app_country] => US
[patent_app_date] => 1990-02-16
[patent_effective_date] => 0000-00-00
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[pdf_file] => patents/05/008/05008175.pdf
[firstpage_image] =>[orig_patent_app_number] => 480775
[rel_patent_id] =>[rel_patent_doc_number] =>) 07/480775 | Copying materials | Feb 15, 1990 | Issued |
| 07/481728 | MULTI-COLOR TRANSFER IMAGE FORMING METHOD | Feb 15, 1990 | Abandoned |