| Application number | Title of the application | Filing Date | Status |
|---|
| 07/431257 | WATER DEVELOPABLE, NEGATIVE WORKING OVERLAY OR TRANSFER TYPE COLOR PROOFING SYSTEM | Feb 11, 1990 | Abandoned |
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[patent_issue_date] => 1992-09-01
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[patent_issue_date] => 1991-12-24
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[patent_doc_number] => 05173382
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[patent_issue_date] => 1992-12-22
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[id] => 2705635
[patent_doc_number] => 05055380
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[patent_kind] => NA
[patent_issue_date] => 1991-10-08
[patent_title] => 'Method of forming a color-differentiated image utilizing a metastable aggregated group Ib metal colloid material'
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[patent_app_number] => 7/452534
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| 07/445157 | METHOD FOR PRODUCING FINE PATTERNS UTILIZING SPECIFIC POLYMERIC DIAZONIUM SALT PHOTOBLEACHABLE AGENT | Dec 5, 1989 | Abandoned |
Array
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[id] => 2707302
[patent_doc_number] => 05017462
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[patent_kind] => NA
[patent_issue_date] => 1991-05-21
[patent_title] => 'Process of producing negative relief copies utilizing photosensitive copying material with thermal hardening triazine compound'
[patent_app_type] => 1
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| 07/441586 | IMAGE DEVELOPING METHOD AND THE RELATED DEVELOPER | Nov 26, 1989 | Abandoned |
Array
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[patent_doc_number] => 04994530
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[id] => 2850053
[patent_doc_number] => 05089372
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1992-02-18
[patent_title] => 'Transfer recording medium utilizing diazo or azide compounds wherein light energy is converted to heat energy'
[patent_app_type] => 1
[patent_app_number] => 7/439014
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Array
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[id] => 2753306
[patent_doc_number] => 05043243
[patent_country] => US
[patent_kind] => NA
[patent_issue_date] => 1991-08-27
[patent_title] => 'Positive-working quinone diazide photoresist composition containing a dye'
[patent_app_type] => 1
[patent_app_number] => 7/437929
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| 07/434374 | PHOTOSENSITIVE RESIN AND ELEMENT MADE THEREFROM | Nov 12, 1989 | Abandoned |
Array
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[patent_kind] => NA
[patent_issue_date] => 1992-04-14
[patent_title] => 'Positive photoresist composition containing radiation sensitive quinonediazide compound and completely esterified polyamic acid polymer'
[patent_app_type] => 1
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| 07/427398 | PATTERN FORMING CONTRAST ENHANCED MATERIAL AND PATTERN FORMING METHOD | Oct 26, 1989 | Abandoned |
Array
(
[id] => 2811614
[patent_doc_number] => 05085975
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[patent_kind] => NA
[patent_issue_date] => 1992-02-04
[patent_title] => 'Radiation sensitive composition utilizing ethylenically unsaturated perfluoroalkyl group-containing compounds and reproduction layers produced therefrom'
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| 07/424663 | PHOTORESISTS RESISTANT TO OXYGEN PLASMAS | Oct 19, 1989 | Abandoned |
| 07/423840 | DESENSITISED QUINONE DIAZIDE COMPOUNDS | Oct 18, 1989 | Abandoned |
Array
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[patent_doc_number] => 05139925
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[patent_issue_date] => 1992-08-18
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| 07/422351 | POSITIVE PHOTORESISTS WITH INCREASED HEAT STABILITY | Oct 15, 1989 | Abandoned |