Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
07/417482 METHOD FOR FORMING PATTERNS Oct 4, 1989 Abandoned
07/416453 PHOTOSENSITIVE COMPOSITION Oct 2, 1989 Abandoned
Array ( [id] => 2890281 [patent_doc_number] => 05176973 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-01-05 [patent_title] => 'Low optical dot gain pre-press proofs wherein the first down adhesive layer thickness is at least twice that of any additional thin adhesive layer' [patent_app_type] => 1 [patent_app_number] => 7/414130 [patent_app_country] => US [patent_app_date] => 1989-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4053 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/176/05176973.pdf [firstpage_image] =>[orig_patent_app_number] => 414130 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/414130
Low optical dot gain pre-press proofs wherein the first down adhesive layer thickness is at least twice that of any additional thin adhesive layer Sep 27, 1989 Issued
07/411670 PHOTORESIST PROCESSES, COMPOSITIONS AND COMPONENTS Sep 24, 1989 Abandoned
07/409675 LIGHT-SENSITIVE COMPOSITION Sep 19, 1989 Abandoned
07/406892 PATTERN FORMING METHOD AND COMPOSITION FOR PATTERN FORMATION TO BE USED THEREFOR Sep 12, 1989 Abandoned
07/404829 PROCESS FOR SELECTIVE REMOVAL OF DIMERIC SPECIES FROM PHENOLIC POLYMERS Sep 7, 1989 Abandoned
07/404060 RADIATION-SENSITIVE RESIN COMPOSITION Sep 7, 1989 Abandoned
Array ( [id] => 2705527 [patent_doc_number] => 05055374 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-10-08 [patent_title] => 'Electrodeposition coating composition containing an acrylic resin and a quinnone diazide group bearing resin' [patent_app_type] => 1 [patent_app_number] => 7/388471 [patent_app_country] => US [patent_app_date] => 1989-08-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9659 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 566 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/055/05055374.pdf [firstpage_image] =>[orig_patent_app_number] => 388471 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/388471
Electrodeposition coating composition containing an acrylic resin and a quinnone diazide group bearing resin Aug 1, 1989 Issued
07/387797 PATTERNING METHOD Jul 31, 1989 Abandoned
07/381876 AROMATIC DIAZONIUM SALT, RADIATION SENSITIVE COMPOSITION CONTAINING THE AROMATIC DIAZONIUM SALT AND METHOD FOR FORMATION OF PATTERN USING THE RADIATION SENSITIVE COMPOSITION Jul 18, 1989 Abandoned
Array ( [id] => 2799856 [patent_doc_number] => 05124228 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-06-23 [patent_title] => 'Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester' [patent_app_type] => 1 [patent_app_number] => 7/381298 [patent_app_country] => US [patent_app_date] => 1989-07-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 1755 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 177 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/124/05124228.pdf [firstpage_image] =>[orig_patent_app_number] => 381298 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/381298
Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester Jul 17, 1989 Issued
07/376517 PHOTOSENSITIVE COMPOSITION Jul 6, 1989 Abandoned
Array ( [id] => 2731866 [patent_doc_number] => 05039596 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-08-13 [patent_title] => 'Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione' [patent_app_type] => 1 [patent_app_number] => 7/373358 [patent_app_country] => US [patent_app_date] => 1989-06-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4122 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 229 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/039/05039596.pdf [firstpage_image] =>[orig_patent_app_number] => 373358 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/373358
Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione Jun 28, 1989 Issued
07/370283 PHOTOSENSITIVE RESIN COMPOSITION Jun 22, 1989 Abandoned
Array ( [id] => 2746393 [patent_doc_number] => 05037720 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-08-06 [patent_title] => 'Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use' [patent_app_type] => 1 [patent_app_number] => 7/363245 [patent_app_country] => US [patent_app_date] => 1989-06-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5712 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 229 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/037/05037720.pdf [firstpage_image] =>[orig_patent_app_number] => 363245 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/363245
Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use Jun 7, 1989 Issued
Array ( [id] => 2702954 [patent_doc_number] => 05068163 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-11-26 [patent_title] => 'Radiation-sensitive positive working composition and copying material' [patent_app_type] => 1 [patent_app_number] => 7/362688 [patent_app_country] => US [patent_app_date] => 1989-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5824 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 203 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/068/05068163.pdf [firstpage_image] =>[orig_patent_app_number] => 362688 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/362688
Radiation-sensitive positive working composition and copying material Jun 6, 1989 Issued
Array ( [id] => 2850072 [patent_doc_number] => 05089373 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-02-18 [patent_title] => 'Positive photoresist composition utilizing O-quinonediazide and novolak resin' [patent_app_type] => 1 [patent_app_number] => 7/363568 [patent_app_country] => US [patent_app_date] => 1989-06-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 4920 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 318 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/089/05089373.pdf [firstpage_image] =>[orig_patent_app_number] => 363568 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/363568
Positive photoresist composition utilizing O-quinonediazide and novolak resin Jun 6, 1989 Issued
Array ( [id] => 2667096 [patent_doc_number] => 05047309 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1991-09-10 [patent_title] => 'Photosensitive diazonium recording material with sulfur compound containing undercoat layer' [patent_app_type] => 1 [patent_app_number] => 7/362255 [patent_app_country] => US [patent_app_date] => 1989-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6542 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 137 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/047/05047309.pdf [firstpage_image] =>[orig_patent_app_number] => 362255 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/362255
Photosensitive diazonium recording material with sulfur compound containing undercoat layer Jun 5, 1989 Issued
07/358232 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE May 29, 1989 Abandoned
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