
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | |
| Art Unit(s) | |
| Total Applications | |
| Issued Applications | |
| Pending Applications | |
| Abandoned Applications |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
| 07/417482 | METHOD FOR FORMING PATTERNS | Oct 4, 1989 | Abandoned |
| 07/416453 | PHOTOSENSITIVE COMPOSITION | Oct 2, 1989 | Abandoned |
| 07/414130 | Low optical dot gain pre-press proofs wherein the first down adhesive layer thickness is at least twice that of any additional thin adhesive layer | Sep 27, 1989 | Issued |
| 07/411670 | PHOTORESIST PROCESSES, COMPOSITIONS AND COMPONENTS | Sep 24, 1989 | Abandoned |
| 07/409675 | LIGHT-SENSITIVE COMPOSITION | Sep 19, 1989 | Abandoned |
| 07/406892 | PATTERN FORMING METHOD AND COMPOSITION FOR PATTERN FORMATION TO BE USED THEREFOR | Sep 12, 1989 | Abandoned |
| 07/404829 | PROCESS FOR SELECTIVE REMOVAL OF DIMERIC SPECIES FROM PHENOLIC POLYMERS | Sep 7, 1989 | Abandoned |
| 07/404060 | RADIATION-SENSITIVE RESIN COMPOSITION | Sep 7, 1989 | Abandoned |
| 07/388471 | Electrodeposition coating composition containing an acrylic resin and a quinnone diazide group bearing resin | Aug 1, 1989 | Issued |
| 07/387797 | PATTERNING METHOD | Jul 31, 1989 | Abandoned |
| 07/381876 | AROMATIC DIAZONIUM SALT, RADIATION SENSITIVE COMPOSITION CONTAINING THE AROMATIC DIAZONIUM SALT AND METHOD FOR FORMATION OF PATTERN USING THE RADIATION SENSITIVE COMPOSITION | Jul 18, 1989 | Abandoned |
| 07/381298 | Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester | Jul 17, 1989 | Issued |
| 07/376517 | PHOTOSENSITIVE COMPOSITION | Jul 6, 1989 | Abandoned |
| 07/373358 | Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione | Jun 28, 1989 | Issued |
| 07/370283 | PHOTOSENSITIVE RESIN COMPOSITION | Jun 22, 1989 | Abandoned |
| 07/363245 | Hydroxylated aromatic polyamide polymer containing bound naphthoquinone diazide photosensitizer, method of making and use | Jun 7, 1989 | Issued |
| 07/362688 | Radiation-sensitive positive working composition and copying material | Jun 6, 1989 | Issued |
| 07/363568 | Positive photoresist composition utilizing O-quinonediazide and novolak resin | Jun 6, 1989 | Issued |
| 07/362255 | Photosensitive diazonium recording material with sulfur compound containing undercoat layer | Jun 5, 1989 | Issued |
| 07/358232 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE | May 29, 1989 | Abandoned |