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Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 2827720 [patent_doc_number] => 05128232 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1992-07-07 [patent_title] => 'Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units' [patent_app_type] => 1 [patent_app_number] => 7/354800 [patent_app_country] => US [patent_app_date] => 1989-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 5 [patent_no_of_words] => 5496 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 109 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/128/05128232.pdf [firstpage_image] =>[orig_patent_app_number] => 354800 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/354800
Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units May 21, 1989 Issued
Array ( [id] => 2903643 [patent_doc_number] => 05215858 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-06-01 [patent_title] => 'Photosensitive resin composition and pattern formation using the same' [patent_app_type] => 1 [patent_app_number] => 7/326740 [patent_app_country] => US [patent_app_date] => 1989-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 2337 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 139 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/215/05215858.pdf [firstpage_image] =>[orig_patent_app_number] => 326740 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/326740
Photosensitive resin composition and pattern formation using the same Mar 20, 1989 Issued
07/325827 POSITIVE PHOTORESISTS WITH HIGH RESOLUTION IN THE NEAR UV Mar 19, 1989 Abandoned
07/284058 PHOTOSENSITIVE COMPOSITIONS CONTAINING PHENOLIC RESINS AND DIAZOQUINONE COMPOUNDS Dec 11, 1988 Abandoned
07/264482 POSITIVE PHOTORESIST AND USE THEREOF Oct 27, 1988 Abandoned
07/237862 ORGANOMETALLIC TREATMENT OF CROSS-LINKED PHOTORESIST FORMULATIONS Aug 28, 1988 Abandoned
Array ( [id] => 2972761 [patent_doc_number] => 05225310 [patent_country] => US [patent_kind] => NA [patent_issue_date] => 1993-07-06 [patent_title] => 'Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound' [patent_app_type] => 1 [patent_app_number] => 7/202194 [patent_app_country] => US [patent_app_date] => 1988-06-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3538 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/05/225/05225310.pdf [firstpage_image] =>[orig_patent_app_number] => 202194 [rel_patent_id] =>[rel_patent_doc_number] =>)
07/202194
Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound Jun 1, 1988 Issued
06/872389 LIGHT-SENSITIVE COMPOSITION Jun 9, 1986 Abandoned
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