Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 16477689 [patent_doc_number] => 10852634 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-12-01 [patent_title] => Phase shifter mask [patent_app_type] => utility [patent_app_number] => 16/504831 [patent_app_country] => US [patent_app_date] => 2019-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 9 [patent_no_of_words] => 5335 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 41 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16504831 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/504831
Phase shifter mask Jul 7, 2019 Issued
Array ( [id] => 15041999 [patent_doc_number] => 20190332004 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-10-31 [patent_title] => EXTREME ULTRAVIOLET ALIGNMENT MARKS [patent_app_type] => utility [patent_app_number] => 16/504809 [patent_app_country] => US [patent_app_date] => 2019-07-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5171 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 150 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16504809 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/504809
Extreme ultraviolet alignment marks Jul 7, 2019 Issued
Array ( [id] => 15853741 [patent_doc_number] => 10642149 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-05-05 [patent_title] => Reflective mask blank, reflective mask and method of manufacturing semiconductor device [patent_app_type] => utility [patent_app_number] => 16/504151 [patent_app_country] => US [patent_app_date] => 2019-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 16195 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16504151 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/504151
Reflective mask blank, reflective mask and method of manufacturing semiconductor device Jul 4, 2019 Issued
Array ( [id] => 15348583 [patent_doc_number] => 20200012183 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-01-09 [patent_title] => Extreme Ultraviolet Mask Blank Defect Reduction [patent_app_type] => utility [patent_app_number] => 16/502749 [patent_app_country] => US [patent_app_date] => 2019-07-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6007 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16502749 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/502749
Extreme ultraviolet mask blank defect reduction Jul 2, 2019 Issued
Array ( [id] => 14933943 [patent_doc_number] => 20190302609 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-10-03 [patent_title] => MULTI-TONE AMPLITUDE PHOTOMASK [patent_app_type] => utility [patent_app_number] => 16/442244 [patent_app_country] => US [patent_app_date] => 2019-06-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 7317 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 53 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16442244 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/442244
Multi-tone amplitude photomask Jun 13, 2019 Issued
Array ( [id] => 14900591 [patent_doc_number] => 20190294061 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-09-26 [patent_title] => CONTROL METHOD OF MOVABLE BODY, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MOVABLE BODY APPARATUS, AND EXPOSURE APPARATUS [patent_app_type] => utility [patent_app_number] => 16/440157 [patent_app_country] => US [patent_app_date] => 2019-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13345 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -10 [patent_words_short_claim] => 189 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16440157 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/440157
Control method of movable body, exposure method, device manufacturing method, movable body apparatus, and exposure apparatus Jun 12, 2019 Issued
Array ( [id] => 18118825 [patent_doc_number] => 11550215 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2023-01-10 [patent_title] => Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device [patent_app_type] => utility [patent_app_number] => 17/056676 [patent_app_country] => US [patent_app_date] => 2019-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 7 [patent_no_of_words] => 23719 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17056676 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/056676
Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device May 23, 2019 Issued
Array ( [id] => 16949807 [patent_doc_number] => 20210208498 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2021-07-08 [patent_title] => REFLECTIVE MASK BLANK, REFLECTIVE MASK, PRODUCTION METHOD THEREFOR, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD [patent_app_type] => utility [patent_app_number] => 17/056713 [patent_app_country] => US [patent_app_date] => 2019-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 27061 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -16 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17056713 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/056713
Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing method May 23, 2019 Issued
Array ( [id] => 14839577 [patent_doc_number] => 20190278189 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-09-12 [patent_title] => PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOSURE TOOL [patent_app_type] => utility [patent_app_number] => 16/417210 [patent_app_country] => US [patent_app_date] => 2019-05-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 13076 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -25 [patent_words_short_claim] => 108 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16417210 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/417210
Pattern-edge placement predictor and monitor for lithographic exposure tool May 19, 2019 Issued
Array ( [id] => 16270560 [patent_doc_number] => 20200272047 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-08-27 [patent_title] => METHOD OF FORMING CNT-BNNT NANOCOMPOSITE PELLICLE [patent_app_type] => utility [patent_app_number] => 16/405330 [patent_app_country] => US [patent_app_date] => 2019-05-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5165 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16405330 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/405330
METHOD OF FORMING CNT-BNNT NANOCOMPOSITE PELLICLE May 6, 2019 Abandoned
Array ( [id] => 16910050 [patent_doc_number] => 11042084 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2021-06-22 [patent_title] => Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask [patent_app_type] => utility [patent_app_number] => 16/399843 [patent_app_country] => US [patent_app_date] => 2019-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8780 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 56 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16399843 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/399843
Photomask including fiducial mark, method of patterning the photomask and method of making semiconductor device using the photomask Apr 29, 2019 Issued
Array ( [id] => 17008909 [patent_doc_number] => 20210240070 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2021-08-05 [patent_title] => PELLICLE FOR EUV LITHOGRAPHY [patent_app_type] => utility [patent_app_number] => 17/048875 [patent_app_country] => US [patent_app_date] => 2019-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8863 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -15 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 17048875 [rel_patent_id] =>[rel_patent_doc_number] =>)
17/048875
Pellicle for EUV lithography Apr 11, 2019 Issued
Array ( [id] => 16737228 [patent_doc_number] => 10962874 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2021-03-30 [patent_title] => Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction [patent_app_type] => utility [patent_app_number] => 16/382351 [patent_app_country] => US [patent_app_date] => 2019-04-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 17 [patent_no_of_words] => 7171 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 83 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16382351 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/382351
Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction Apr 11, 2019 Issued
Array ( [id] => 15593443 [patent_doc_number] => 20200073256 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-03-05 [patent_title] => LIGHT-EXPOSURE METHOD, LIGHT-EXPOSURE CONTROL UNIT, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD [patent_app_type] => utility [patent_app_number] => 16/288326 [patent_app_country] => US [patent_app_date] => 2019-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8090 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 496 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16288326 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/288326
Light-exposure method, light-exposure control unit, and semiconductor device manufacturing method Feb 27, 2019 Issued
Array ( [id] => 14750005 [patent_doc_number] => 20190258176 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-08-22 [patent_title] => METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LITHOGRPAHY MASK TO A FLUCTUATION OF THE LINEWIDTH [patent_app_type] => utility [patent_app_number] => 16/280469 [patent_app_country] => US [patent_app_date] => 2019-02-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6482 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 203 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16280469 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/280469
Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth Feb 19, 2019 Issued
Array ( [id] => 16539831 [patent_doc_number] => 20200406244 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-12-31 [patent_title] => GRAPHENE PELLICLE LITHOGRAPHIC APPARATUS [patent_app_type] => utility [patent_app_number] => 16/969211 [patent_app_country] => US [patent_app_date] => 2019-02-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6055 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16969211 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/969211
Graphene pellicle lithographic apparatus Feb 6, 2019 Issued
Array ( [id] => 14378309 [patent_doc_number] => 20190163067 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-05-30 [patent_title] => METHOD AND DEVICE FOR LITHOGRAPHICALLY PRODUCING A TARGET STRUCTURE ON A NON-PLANAR INITIAL STRUCTURE [patent_app_type] => utility [patent_app_number] => 16/263461 [patent_app_country] => US [patent_app_date] => 2019-01-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 20761 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -17 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16263461 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/263461
Method and device for lithographically producing a target structure on a non-planar initial structure Jan 30, 2019 Issued
Array ( [id] => 16171094 [patent_doc_number] => 10712653 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2020-07-14 [patent_title] => Etch variation tolerant optimization [patent_app_type] => utility [patent_app_number] => 16/258884 [patent_app_country] => US [patent_app_date] => 2019-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 15832 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 154 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16258884 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/258884
Etch variation tolerant optimization Jan 27, 2019 Issued
Array ( [id] => 14313257 [patent_doc_number] => 20190146332 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2019-05-16 [patent_title] => MEMBRANES FOR USE WITHIN A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS COMPRISING SUCH A MEMBRANE [patent_app_type] => utility [patent_app_number] => 16/247179 [patent_app_country] => US [patent_app_date] => 2019-01-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 17303 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -18 [patent_words_short_claim] => 2 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16247179 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/247179
Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane Jan 13, 2019 Issued
Array ( [id] => 16454298 [patent_doc_number] => 20200363724 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2020-11-19 [patent_title] => DEVELOPER COMPOSITION, FOR EUV LIGHT SOURCE, FOR FORMING PHOTOSENSITIVE PHOTORESIST MICROPATTERN [patent_app_type] => utility [patent_app_number] => 16/961407 [patent_app_country] => US [patent_app_date] => 2019-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 3877 [patent_no_of_claims] => 0 [patent_no_of_ind_claims] => -3 [patent_words_short_claim] => 37 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16961407 [rel_patent_id] =>[rel_patent_doc_number] =>)
16/961407
Developer composition, for EUV light source, for forming photosensitive photoresist micropattern Jan 8, 2019 Issued
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