
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 13796607
[patent_doc_number] => 20190011842
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-01-10
[patent_title] => METHOD FOR CHARACTERIZING DISTORTIONS IN A LITHOGRAPHIC PROCESS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC CELL AND COMPUTER PROGRAM
[patent_app_type] => utility
[patent_app_number] => 16/079404
[patent_app_country] => US
[patent_app_date] => 2017-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 8011
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 144
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16079404
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/079404 | Method for characterizing distortions in a lithographic process, lithographic apparatus, lithographic cell and computer program | Feb 21, 2017 | Issued |
Array
(
[id] => 13991045
[patent_doc_number] => 20190064680
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-02-28
[patent_title] => MARK POSITION DETERMINATION METHOD
[patent_app_type] => utility
[patent_app_number] => 16/083076
[patent_app_country] => US
[patent_app_date] => 2017-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 7395
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16083076
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/083076 | Mark position determination method | Feb 21, 2017 | Issued |
Array
(
[id] => 16431032
[patent_doc_number] => 10831111
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-11-10
[patent_title] => Metrology method and lithographic method, lithographic cell and computer program
[patent_app_type] => utility
[patent_app_number] => 16/073362
[patent_app_country] => US
[patent_app_date] => 2017-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 7926
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16073362
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/073362 | Metrology method and lithographic method, lithographic cell and computer program | Feb 20, 2017 | Issued |
Array
(
[id] => 11671910
[patent_doc_number] => 20170160632
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-06-08
[patent_title] => 'Extreme Ultraviolet Mask Blank Production System With Thin Absorber And Manufacturing System Therefor'
[patent_app_type] => utility
[patent_app_number] => 15/438248
[patent_app_country] => US
[patent_app_date] => 2017-02-21
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4412
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15438248
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/438248 | Extreme ultraviolet mask blank production system with thin absorber and manufacturing system therefor | Feb 20, 2017 | Issued |
Array
(
[id] => 11671911
[patent_doc_number] => 20170160633
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-06-08
[patent_title] => 'PHOTOMASK AND METHOD FOR FABRICATING INTEGRATED CIRCUIT'
[patent_app_type] => utility
[patent_app_number] => 15/436729
[patent_app_country] => US
[patent_app_date] => 2017-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 4598
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15436729
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/436729 | Photomask and method for fabricating integrated circuit | Feb 16, 2017 | Issued |
Array
(
[id] => 14008475
[patent_doc_number] => 10222691
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-03-05
[patent_title] => Photomask and method for manufacturing semiconductor device using the same
[patent_app_type] => utility
[patent_app_number] => 15/430917
[patent_app_country] => US
[patent_app_date] => 2017-02-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 49
[patent_figures_cnt] => 59
[patent_no_of_words] => 11712
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15430917
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/430917 | Photomask and method for manufacturing semiconductor device using the same | Feb 12, 2017 | Issued |
Array
(
[id] => 11838199
[patent_doc_number] => 20170219920
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-08-03
[patent_title] => 'Mask for EUV Lithography, EUV Lithography Apparatus and Method for Determining a Contrast Proportion Caused by DUV Radiation'
[patent_app_type] => utility
[patent_app_number] => 15/431306
[patent_app_country] => US
[patent_app_date] => 2017-02-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 7322
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15431306
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/431306 | Mask for EUV lithography, EUV lithography apparatus and method for determining a contrast proportion caused by DUV radiation | Feb 12, 2017 | Issued |
Array
(
[id] => 11867933
[patent_doc_number] => 20170235218
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-08-17
[patent_title] => 'REFLECTIVE ELEMENT FOR MASK BLANK AND PROCESS FOR PRODUCING REFLECTIVE ELEMENT FOR MASK BLANK'
[patent_app_type] => utility
[patent_app_number] => 15/426602
[patent_app_country] => US
[patent_app_date] => 2017-02-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 7912
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15426602
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/426602 | Reflective element for mask blank and process for producing reflective element for mask blank | Feb 6, 2017 | Issued |
Array
(
[id] => 11938180
[patent_doc_number] => 20170242330
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-08-24
[patent_title] => 'REFLECTIVE MASK BLANK AND PROCESS FOR PRODUCING THE REFLECTIVE MASK BLANK'
[patent_app_type] => utility
[patent_app_number] => 15/424176
[patent_app_country] => US
[patent_app_date] => 2017-02-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 11566
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15424176
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/424176 | Reflective mask blank and process for producing the reflective mask blank | Feb 2, 2017 | Issued |
Array
(
[id] => 14008477
[patent_doc_number] => 10222692
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-03-05
[patent_title] => Photomask and manufacturing method of semiconductor device
[patent_app_type] => utility
[patent_app_number] => 15/422654
[patent_app_country] => US
[patent_app_date] => 2017-02-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 26
[patent_no_of_words] => 2174
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 101
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15422654
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/422654 | Photomask and manufacturing method of semiconductor device | Feb 1, 2017 | Issued |
Array
(
[id] => 13225743
[patent_doc_number] => 10126643
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-11-13
[patent_title] => Anti-ESD photomask and method of forming the same
[patent_app_type] => utility
[patent_app_number] => 15/419338
[patent_app_country] => US
[patent_app_date] => 2017-01-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 30
[patent_no_of_words] => 6748
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 39
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15419338
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/419338 | Anti-ESD photomask and method of forming the same | Jan 29, 2017 | Issued |
Array
(
[id] => 12248692
[patent_doc_number] => 09921466
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-03-20
[patent_title] => 'Method for monitoring focus in EUV lithography'
[patent_app_type] => utility
[patent_app_number] => 15/414889
[patent_app_country] => US
[patent_app_date] => 2017-01-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8787
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 148
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15414889
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/414889 | Method for monitoring focus in EUV lithography | Jan 24, 2017 | Issued |
Array
(
[id] => 14346343
[patent_doc_number] => 20190155144
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-05-23
[patent_title] => MASK, STITCHING EXPOSURE METHOD, AND DISPLAY PANEL HAVING THE MASK
[patent_app_type] => utility
[patent_app_number] => 16/313153
[patent_app_country] => US
[patent_app_date] => 2017-01-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 5635
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -18
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16313153
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/313153 | Mask, stitching exposure method, and display panel having the mask | Jan 23, 2017 | Issued |
Array
(
[id] => 11621450
[patent_doc_number] => 20170131637
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-05-11
[patent_title] => 'Extreme Ultraviolet Reflective Element With Multilayer Stack And Method Of Manufacturing Thereof'
[patent_app_type] => utility
[patent_app_number] => 15/410048
[patent_app_country] => US
[patent_app_date] => 2017-01-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8265
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15410048
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/410048 | Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof | Jan 18, 2017 | Issued |
Array
(
[id] => 12550050
[patent_doc_number] => 10012897
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-07-03
[patent_title] => Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor
[patent_app_type] => utility
[patent_app_number] => 15/405860
[patent_app_country] => US
[patent_app_date] => 2017-01-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 7
[patent_no_of_words] => 4423
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15405860
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/405860 | Planarized extreme ultraviolet lithography blank with absorber and manufacturing system therefor | Jan 12, 2017 | Issued |
Array
(
[id] => 11606002
[patent_doc_number] => 20170123306
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-05-04
[patent_title] => 'METHOD OF MANUFACTURING PHOTOMASK BLANK AND PHOTOMASK BLANK'
[patent_app_type] => utility
[patent_app_number] => 15/404755
[patent_app_country] => US
[patent_app_date] => 2017-01-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 6303
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15404755
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/404755 | Method of manufacturing photomask blank and photomask blank | Jan 11, 2017 | Issued |
Array
(
[id] => 13268081
[patent_doc_number] => 10146122
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-12-04
[patent_title] => Halftone phase shift photomask blank and making method
[patent_app_type] => utility
[patent_app_number] => 15/403436
[patent_app_country] => US
[patent_app_date] => 2017-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 7
[patent_no_of_words] => 15518
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 70
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15403436
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/403436 | Halftone phase shift photomask blank and making method | Jan 10, 2017 | Issued |
Array
(
[id] => 14106011
[patent_doc_number] => 20190094681
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2019-03-28
[patent_title] => PHOTOETCHING MASK PLATE, MANUFACTURE METHOD THEREOF, AND PHOTOETCHING METHOD
[patent_app_type] => utility
[patent_app_number] => 15/533456
[patent_app_country] => US
[patent_app_date] => 2017-01-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 3328
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -16
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15533456
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/533456 | Photoetching mask plate, manufacture method thereof, and photoetching method | Jan 10, 2017 | Issued |
Array
(
[id] => 11745379
[patent_doc_number] => 20170199452
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-07-13
[patent_title] => 'PELLICLE'
[patent_app_type] => utility
[patent_app_number] => 15/400060
[patent_app_country] => US
[patent_app_date] => 2017-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 5417
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15400060
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/400060 | Pellicle | Jan 5, 2017 | Issued |
Array
(
[id] => 11823486
[patent_doc_number] => 20170212423
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-07-27
[patent_title] => 'METHOD AND APPARATUS FOR DYNAMIC LITHOGRAPHIC EXPOSURE'
[patent_app_type] => utility
[patent_app_number] => 15/400015
[patent_app_country] => US
[patent_app_date] => 2017-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 7167
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15400015
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/400015 | Method and apparatus for dynamic lithographic exposure | Jan 5, 2017 | Issued |