
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 13185137
[patent_doc_number] => 10108085
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-10-23
[patent_title] => Method for localizing defects on substrates
[patent_app_type] => utility
[patent_app_number] => 15/400221
[patent_app_country] => US
[patent_app_date] => 2017-01-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 30
[patent_no_of_words] => 12327
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 192
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15400221
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/400221 | Method for localizing defects on substrates | Jan 5, 2017 | Issued |
Array
(
[id] => 14554475
[patent_doc_number] => 10345692
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2019-07-09
[patent_title] => Photomask and a fabrication method therefor
[patent_app_type] => utility
[patent_app_number] => 15/399205
[patent_app_country] => US
[patent_app_date] => 2017-01-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 9
[patent_no_of_words] => 4874
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 41
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15399205
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/399205 | Photomask and a fabrication method therefor | Jan 4, 2017 | Issued |
Array
(
[id] => 11570124
[patent_doc_number] => 20170108768
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-04-20
[patent_title] => 'Treating A Capping Layer of a Mask'
[patent_app_type] => utility
[patent_app_number] => 15/395784
[patent_app_country] => US
[patent_app_date] => 2016-12-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4762
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15395784
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/395784 | Treating a capping layer of a mask | Dec 29, 2016 | Issued |
Array
(
[id] => 11556378
[patent_doc_number] => 20170102624
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-04-13
[patent_title] => 'GRID REFINEMENT METHOD'
[patent_app_type] => utility
[patent_app_number] => 15/389145
[patent_app_country] => US
[patent_app_date] => 2016-12-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 11192
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15389145
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/389145 | Grid refinement method | Dec 21, 2016 | Issued |
Array
(
[id] => 13626021
[patent_doc_number] => 20180364562
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-12-20
[patent_title] => PROCESS FOR OBTAINING THICK ORDERED FILMS WITH INCREASED PERIODS COMPRISING A BLOCK COPOLYMER
[patent_app_type] => utility
[patent_app_number] => 16/062513
[patent_app_country] => US
[patent_app_date] => 2016-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6723
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -20
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16062513
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/062513 | PROCESS FOR OBTAINING THICK ORDERED FILMS WITH INCREASED PERIODS COMPRISING A BLOCK COPOLYMER | Dec 15, 2016 | Abandoned |
Array
(
[id] => 13142837
[patent_doc_number] => 10088745
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-10-02
[patent_title] => Pellicle for EUV exposure
[patent_app_type] => utility
[patent_app_number] => 15/379731
[patent_app_country] => US
[patent_app_date] => 2016-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 5243
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 173
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15379731
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/379731 | Pellicle for EUV exposure | Dec 14, 2016 | Issued |
Array
(
[id] => 12843757
[patent_doc_number] => 20180173092
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-06-21
[patent_title] => PELLICLE FABRICATION METHODS AND STRUCTURES THEREOF
[patent_app_type] => utility
[patent_app_number] => 15/381033
[patent_app_country] => US
[patent_app_date] => 2016-12-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 12047
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 52
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15381033
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/381033 | Pellicle fabrication methods and structures thereof | Dec 14, 2016 | Issued |
Array
(
[id] => 12818548
[patent_doc_number] => 20180164688
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-06-14
[patent_title] => Lithography System and Lithography Method for Improving Image Contrast
[patent_app_type] => utility
[patent_app_number] => 15/378442
[patent_app_country] => US
[patent_app_date] => 2016-12-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11194
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 2
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15378442
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/378442 | Lithography system and lithography method for improving image contrast | Dec 13, 2016 | Issued |
Array
(
[id] => 11515845
[patent_doc_number] => 20170082919
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-03-23
[patent_title] => 'METHOD FOR MANUFACTURING PHOTO MASK AND PHOTO MASK MANUFACTURED WITH SAME'
[patent_app_type] => utility
[patent_app_number] => 15/370204
[patent_app_country] => US
[patent_app_date] => 2016-12-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3012
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15370204
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/370204 | Method for manufacturing photo mask and photo mask manufactured with same | Dec 5, 2016 | Issued |
Array
(
[id] => 16651550
[patent_doc_number] => 10928722
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-02-23
[patent_title] => Method of manufacturing a membrane assembly for EUV lithography, a membrane assembly, a lithographic apparatus, and a device manufacturing method
[patent_app_type] => utility
[patent_app_number] => 16/062919
[patent_app_country] => US
[patent_app_date] => 2016-12-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 73
[patent_no_of_words] => 19683
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 164
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16062919
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/062919 | Method of manufacturing a membrane assembly for EUV lithography, a membrane assembly, a lithographic apparatus, and a device manufacturing method | Dec 1, 2016 | Issued |
Array
(
[id] => 13626077
[patent_doc_number] => 20180364590
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-12-20
[patent_title] => POLARIZATION TUNING IN SCATTEROMETRY
[patent_app_type] => utility
[patent_app_number] => 16/061236
[patent_app_country] => US
[patent_app_date] => 2016-11-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9235
[patent_no_of_claims] => 0
[patent_no_of_ind_claims] => -17
[patent_words_short_claim] => 61
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 16061236
[rel_patent_id] =>[rel_patent_doc_number] =>) 16/061236 | POLARIZATION TUNING IN SCATTEROMETRY | Nov 29, 2016 | Abandoned |
Array
(
[id] => 11989063
[patent_doc_number] => 20170293218
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-10-12
[patent_title] => 'PHOTOMASK HAVING A PLURALITY OF SHIELDING LAYERS'
[patent_app_type] => utility
[patent_app_number] => 15/362089
[patent_app_country] => US
[patent_app_date] => 2016-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 6344
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15362089
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/362089 | Photomask having a plurality of shielding layers | Nov 27, 2016 | Issued |
Array
(
[id] => 12531000
[patent_doc_number] => 10007185
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-06-26
[patent_title] => Electron beam lithography method and apparatus
[patent_app_type] => utility
[patent_app_number] => 15/361679
[patent_app_country] => US
[patent_app_date] => 2016-11-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 12
[patent_no_of_words] => 7742
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 102
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15361679
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/361679 | Electron beam lithography method and apparatus | Nov 27, 2016 | Issued |
Array
(
[id] => 12221174
[patent_doc_number] => 20180059534
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-03-01
[patent_title] => 'Graphene Pellicle for Extreme Ultraviolet Lithography'
[patent_app_type] => utility
[patent_app_number] => 15/356204
[patent_app_country] => US
[patent_app_date] => 2016-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5351
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15356204
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/356204 | Graphene pellicle for extreme ultraviolet lithography | Nov 17, 2016 | Issued |
Array
(
[id] => 12221175
[patent_doc_number] => 20180059535
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2018-03-01
[patent_title] => 'Graphene Pellicle For Extreme Ultraviolet Lithography'
[patent_app_type] => utility
[patent_app_number] => 15/356386
[patent_app_country] => US
[patent_app_date] => 2016-11-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5144
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15356386
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/356386 | Graphene pellicle for extreme ultraviolet lithography | Nov 17, 2016 | Issued |
Array
(
[id] => 16643852
[patent_doc_number] => 10921705
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2021-02-16
[patent_title] => Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device
[patent_app_type] => utility
[patent_app_number] => 15/778363
[patent_app_country] => US
[patent_app_date] => 2016-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 16
[patent_no_of_words] => 15376
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 98
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15778363
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/778363 | Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device | Nov 14, 2016 | Issued |
Array
(
[id] => 11458536
[patent_doc_number] => 20170052441
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2017-02-23
[patent_title] => 'EXTREME ULTRAVIOLET LITHOGRAPHY PROCESS AND MASK WITH REDUCED SHADOW EFFECT AND ENHANCED INTENSITY'
[patent_app_type] => utility
[patent_app_number] => 15/345218
[patent_app_country] => US
[patent_app_date] => 2016-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 8001
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15345218
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/345218 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Nov 6, 2016 | Issued |
Array
(
[id] => 16171093
[patent_doc_number] => 10712652
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2020-07-14
[patent_title] => Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask
[patent_app_type] => utility
[patent_app_number] => 15/776862
[patent_app_country] => US
[patent_app_date] => 2016-11-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 9366
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15776862
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/776862 | Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask | Nov 6, 2016 | Issued |
Array
(
[id] => 13198745
[patent_doc_number] => 10114290
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-10-30
[patent_title] => Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
[patent_app_type] => utility
[patent_app_number] => 15/342234
[patent_app_country] => US
[patent_app_date] => 2016-11-03
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 35
[patent_no_of_words] => 13668
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 303
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15342234
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/342234 | Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus | Nov 2, 2016 | Issued |
Array
(
[id] => 13040259
[patent_doc_number] => 10042261
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2018-08-07
[patent_title] => Method of aperture alignment and multi charged particle beam writing apparatus
[patent_app_type] => utility
[patent_app_number] => 15/341297
[patent_app_country] => US
[patent_app_date] => 2016-11-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 20
[patent_no_of_words] => 4571
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 199
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 15341297
[rel_patent_id] =>[rel_patent_doc_number] =>) 15/341297 | Method of aperture alignment and multi charged particle beam writing apparatus | Nov 1, 2016 | Issued |