Christopher G. Young

Array ( [id] => 10300617 [patent_doc_number] => 20150185617 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-07-02 [patent_title] => 'Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist' [patent_app_type] => utility [patent_app_number] => 14/244942 [patent_app_country] => US [patent_app_date] => 2014-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 39 [patent_figures_cnt] => 39 [patent_no_of_words] => 25739 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14244942 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10953770 [patent_doc_number] => 20140356791 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-12-04 [patent_title] => 'METHOD OF MAKING NANOSTRUCTURE' [patent_app_type] => utility [patent_app_number] => 14/242876 [patent_app_country] => US [patent_app_date] => 2014-04-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 3863 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14242876 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10233609 [patent_doc_number] => 20150118603 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-04-30 [patent_title] => 'PHOTO MASK AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING TRENCHES BY USING PHOTO MASK' [patent_app_type] => utility [patent_app_number] => 14/224112 [patent_app_country] => US [patent_app_date] => 2014-03-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4509 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14224112 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10536147 [patent_doc_number] => 09261774 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-02-16 [patent_title] => 'Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity' [patent_app_type] => utility [patent_app_number] => 14/221555 [patent_app_country] => US [patent_app_date] => 2014-03-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 7954 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 107 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14221555 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9597070 [patent_doc_number] => 20140193749 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-07-10 [patent_title] => 'PATTERN-FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THEM AND ELECTRONIC DEVICE' [patent_app_type] => utility [patent_app_number] => 14/207867 [patent_app_country] => US [patent_app_date] => 2014-03-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 36402 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14207867 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 11192881 [patent_doc_number] => 09423693 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2016-08-23 [patent_title] => 'In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate' [patent_app_type] => utility [patent_app_number] => 14/207088 [patent_app_country] => US [patent_app_date] => 2014-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2091 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 66 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14207088 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10130541 [patent_doc_number] => 09164373 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-10-20 [patent_title] => 'Method and device for writing photomasks with reduced mura errors' [patent_app_type] => utility [patent_app_number] => 14/207428 [patent_app_country] => US [patent_app_date] => 2014-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 13 [patent_no_of_words] => 3544 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14207428 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9909426 [patent_doc_number] => 20150064627 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-03-05 [patent_title] => 'PATTERNING METHOD USING ELECTRON BEAM AND EXPOSURE SYSTEM CONFIGURED TO PERFORM THE SAME' [patent_app_type] => utility [patent_app_number] => 14/197824 [patent_app_country] => US [patent_app_date] => 2014-03-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 8569 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14197824 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9950843 [patent_doc_number] => 08999627 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2015-04-07 [patent_title] => 'Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp' [patent_app_type] => utility [patent_app_number] => 14/198145 [patent_app_country] => US [patent_app_date] => 2014-03-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 18 [patent_no_of_words] => 7464 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 148 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14198145 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10892704 [patent_doc_number] => 08916316 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-12-23 [patent_title] => 'Reflecting mask blank, method for manufacturing reflective mask blank and method for quality control for reflective mask blank' [patent_app_type] => utility [patent_app_number] => 14/196572 [patent_app_country] => US [patent_app_date] => 2014-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 13 [patent_no_of_words] => 16237 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 97 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14196572 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10130561 [patent_doc_number] => 09164392 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-10-20 [patent_title] => 'Developer and patterning process' [patent_app_type] => utility [patent_app_number] => 14/193193 [patent_app_country] => US [patent_app_date] => 2014-02-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9195 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 42 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14193193 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10870022 [patent_doc_number] => 08895214 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-11-25 [patent_title] => 'Optical mask for forming pattern' [patent_app_type] => utility [patent_app_number] => 14/180234 [patent_app_country] => US [patent_app_date] => 2014-02-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 25 [patent_no_of_words] => 11928 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14180234 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10622996 [patent_doc_number] => 09341936 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-05-17 [patent_title] => 'Method and system for forming a pattern on a reticle using charged particle beam lithography' [patent_app_type] => utility [patent_app_number] => 14/177688 [patent_app_country] => US [patent_app_date] => 2014-02-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 27 [patent_no_of_words] => 12739 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 84 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14177688 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10602579 [patent_doc_number] => 09323140 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2016-04-26 [patent_title] => 'Method and system for forming a pattern on a reticle using charged particle beam lithography' [patent_app_type] => utility [patent_app_number] => 14/177679 [patent_app_country] => US [patent_app_date] => 2014-02-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 27 [patent_no_of_words] => 12769 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 127 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14177679 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10960604 [patent_doc_number] => 20140363633 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-12-11 [patent_title] => 'METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATED PHOTOMASKS AND METHODS OF MANUFACTURING AN INTEGRATED CIRCUIT' [patent_app_type] => utility [patent_app_number] => 14/176565 [patent_app_country] => US [patent_app_date] => 2014-02-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 13696 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14176565 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 9511281 [patent_doc_number] => 20140147773 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-29 [patent_title] => 'PELLICLE FOR LITHOGRAPHY, PELLICLE-MOUNTED PHOTOMASK, AND EXPOSURE TREATMENT METHOD' [patent_app_type] => utility [patent_app_number] => 14/167210 [patent_app_country] => US [patent_app_date] => 2014-01-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 11624 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14167210 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10334982 [patent_doc_number] => 20150219987 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-08-06 [patent_title] => 'Photomask, Method of Manufacturing Photomask and Exposure Apparatus' [patent_app_type] => utility [patent_app_number] => 14/420584 [patent_app_country] => US [patent_app_date] => 2014-01-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 9147 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14420584 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10098306 [patent_doc_number] => 09134615 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-09-15 [patent_title] => 'Exposure method for glass substrate of liquid crystal display' [patent_app_type] => utility [patent_app_number] => 14/346423 [patent_app_country] => US [patent_app_date] => 2014-01-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 9 [patent_no_of_words] => 2959 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 206 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14346423 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10824151 [patent_doc_number] => 20160170317 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2016-06-16 [patent_title] => 'METHOD OF ALIGNING QUADRATE WAFER IN FIRST PHOTOLITHOGRAPHY PROCESS' [patent_app_type] => utility [patent_app_number] => 14/901541 [patent_app_country] => US [patent_app_date] => 2014-01-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 2904 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14901541 [rel_patent_id] =>[rel_patent_doc_number] =>)

Array ( [id] => 10294533 [patent_doc_number] => 20150179532 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-06-25 [patent_title] => 'SYSTEM AND METHOD FOR DARK FIELD INSPECTION' [patent_app_type] => utility [patent_app_number] => 14/138743 [patent_app_country] => US [patent_app_date] => 2013-12-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 8302 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14138743 [rel_patent_id] =>[rel_patent_doc_number] =>)