Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 10875993 [patent_doc_number] => 08900778 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-12-02 [patent_title] => 'Method for forming circular patterns on a surface' [patent_app_type] => utility [patent_app_number] => 14/108135 [patent_app_country] => US [patent_app_date] => 2013-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 13 [patent_no_of_words] => 5769 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 86 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14108135 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/108135
Method for forming circular patterns on a surface Dec 15, 2013 Issued
Array ( [id] => 9408330 [patent_doc_number] => 20140099582 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-04-10 [patent_title] => 'Smart Subfield Method For E-Beam Lithographny' [patent_app_type] => utility [patent_app_number] => 14/107540 [patent_app_country] => US [patent_app_date] => 2013-12-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4459 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14107540 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/107540
Smart subfield method for E-beam lithography Dec 15, 2013 Issued
Array ( [id] => 10283826 [patent_doc_number] => 20150168824 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-06-18 [patent_title] => 'EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING' [patent_app_type] => utility [patent_app_number] => 14/106219 [patent_app_country] => US [patent_app_date] => 2013-12-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 2825 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14106219 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/106219
EUV pellicle frame with holes and method of forming Dec 12, 2013 Issued
Array ( [id] => 10091565 [patent_doc_number] => 09128388 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-09-08 [patent_title] => 'Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device' [patent_app_type] => utility [patent_app_number] => 14/088773 [patent_app_country] => US [patent_app_date] => 2013-11-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 25 [patent_no_of_words] => 9025 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 239 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14088773 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/088773
Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device Nov 24, 2013 Issued
Array ( [id] => 10111049 [patent_doc_number] => 09146459 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-09-29 [patent_title] => 'Extreme ultraviolet lithography process and mask' [patent_app_type] => utility [patent_app_number] => 14/087508 [patent_app_country] => US [patent_app_date] => 2013-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 8 [patent_no_of_words] => 4908 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 57 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14087508 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/087508
Extreme ultraviolet lithography process and mask Nov 21, 2013 Issued
Array ( [id] => 9490972 [patent_doc_number] => 20140141377 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-22 [patent_title] => 'DEVELOPER AND PATTERNING PROCESS' [patent_app_type] => utility [patent_app_number] => 14/084910 [patent_app_country] => US [patent_app_date] => 2013-11-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9172 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14084910 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/084910
Developer and patterning process Nov 19, 2013 Issued
Array ( [id] => 10408432 [patent_doc_number] => 20150293441 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-10-15 [patent_title] => 'MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING MASK BLANK, METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 14/443689 [patent_app_country] => US [patent_app_date] => 2013-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 12477 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14443689 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/443689
Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device Nov 14, 2013 Issued
Array ( [id] => 10033999 [patent_doc_number] => 09075316 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-07-07 [patent_title] => 'EUV mask for use during EUV photolithography processes' [patent_app_type] => utility [patent_app_number] => 14/080939 [patent_app_country] => US [patent_app_date] => 2013-11-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 12 [patent_no_of_words] => 5762 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14080939 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/080939
EUV mask for use during EUV photolithography processes Nov 14, 2013 Issued
Array ( [id] => 9856701 [patent_doc_number] => 20150036717 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2015-02-05 [patent_title] => 'OVERLAY DISPLACEMENT AMOUNT MEASURING METHOD, POSITIONAL\nDISPLACEMENT AMOUNT MEASURING METHOD AND POSITIONAL DISPLACEMENT AMOUNT MEASURING APPARATUS' [patent_app_type] => utility [patent_app_number] => 14/075044 [patent_app_country] => US [patent_app_date] => 2013-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 6392 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14075044 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/075044
Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatus Nov 7, 2013 Issued
Array ( [id] => 10014933 [patent_doc_number] => 09057947 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-06-16 [patent_title] => 'Method for aligning substrate and mask and method for preparing semiconductor device' [patent_app_type] => utility [patent_app_number] => 14/073821 [patent_app_country] => US [patent_app_date] => 2013-11-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 2994 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 142 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14073821 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/073821
Method for aligning substrate and mask and method for preparing semiconductor device Nov 5, 2013 Issued
Array ( [id] => 10065265 [patent_doc_number] => 09104109 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2015-08-11 [patent_title] => 'Method and system for improving critical dimension uniformity using shaped beam lithography' [patent_app_type] => utility [patent_app_number] => 14/069376 [patent_app_country] => US [patent_app_date] => 2013-11-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 23 [patent_no_of_words] => 11633 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 79 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14069376 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/069376
Method and system for improving critical dimension uniformity using shaped beam lithography Oct 31, 2013 Issued
Array ( [id] => 11643625 [patent_doc_number] => 09664997 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2017-05-30 [patent_title] => 'Method of manufacturing mask blank and method of manufacturing transfer mask' [patent_app_type] => utility [patent_app_number] => 14/440661 [patent_app_country] => US [patent_app_date] => 2013-10-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 12961 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 170 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14440661 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/440661
Method of manufacturing mask blank and method of manufacturing transfer mask Oct 23, 2013 Issued
Array ( [id] => 9306430 [patent_doc_number] => 20140045104 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-02-13 [patent_title] => 'LCD Panel Photolithography Process and Mask' [patent_app_type] => utility [patent_app_number] => 14/056492 [patent_app_country] => US [patent_app_date] => 2013-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 4610 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14056492 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/056492
LCD panel photolithography process and mask Oct 16, 2013 Issued
Array ( [id] => 9449306 [patent_doc_number] => 20140120475 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-05-01 [patent_title] => 'ELECTRON BEAM EXPOSURE METHOD' [patent_app_type] => utility [patent_app_number] => 14/056651 [patent_app_country] => US [patent_app_date] => 2013-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 5213 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14056651 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/056651
Electron beam exposure method Oct 16, 2013 Issued
Array ( [id] => 9785619 [patent_doc_number] => 20140302439 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-10-09 [patent_title] => 'METHOD OF MANUFACTURING GRAPHENE, CARBON NANOTUBES, FULLERENE, GRAPHITE OR A COMBINATION THEREOF HAVING A POSITION SPECIFICALLY REGULATED RESISTANCE' [patent_app_type] => utility [patent_app_number] => 14/050053 [patent_app_country] => US [patent_app_date] => 2013-10-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4711 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14050053 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/050053
Method of manufacturing graphene, carbon nanotubes, fullerene, graphite or a combination thereof having a position specifically regulated resistance Oct 8, 2013 Issued
Array ( [id] => 9280688 [patent_doc_number] => 20140030657 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-30 [patent_title] => 'MANUFACTURING METHOD OF PHOTOMASK, METHOD FOR OPTICAL PROXIMITY CORRECTION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 14/044217 [patent_app_country] => US [patent_app_date] => 2013-10-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 24 [patent_figures_cnt] => 24 [patent_no_of_words] => 10983 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14044217 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/044217
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device Oct 1, 2013 Issued
Array ( [id] => 9269055 [patent_doc_number] => 20140023972 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-23 [patent_title] => 'Data Process for E-Beam Lithography' [patent_app_type] => utility [patent_app_number] => 14/043264 [patent_app_country] => US [patent_app_date] => 2013-10-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3767 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14043264 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/043264
Data process for E-beam lithography Sep 30, 2013 Issued
Array ( [id] => 9280689 [patent_doc_number] => 20140030656 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-30 [patent_title] => 'METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES' [patent_app_type] => utility [patent_app_number] => 14/040171 [patent_app_country] => US [patent_app_date] => 2013-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5578 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14040171 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/040171
METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES Sep 26, 2013 Abandoned
Array ( [id] => 9267610 [patent_doc_number] => 20140022526 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-23 [patent_title] => 'LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS' [patent_app_type] => utility [patent_app_number] => 14/038533 [patent_app_country] => US [patent_app_date] => 2013-09-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7433 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14038533 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/038533
Lithographic apparatus, and patterning device for use in a lithographic process Sep 25, 2013 Issued
Array ( [id] => 9280672 [patent_doc_number] => 20140030640 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2014-01-30 [patent_title] => 'RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS' [patent_app_type] => utility [patent_app_number] => 14/035484 [patent_app_country] => US [patent_app_date] => 2013-09-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 15323 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14035484 [rel_patent_id] =>[rel_patent_doc_number] =>)
14/035484
Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks Sep 23, 2013 Issued
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