| Application number | Title of the application | Filing Date | Status |
|---|
Array
(
[id] => 10875993
[patent_doc_number] => 08900778
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-12-02
[patent_title] => 'Method for forming circular patterns on a surface'
[patent_app_type] => utility
[patent_app_number] => 14/108135
[patent_app_country] => US
[patent_app_date] => 2013-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 13
[patent_no_of_words] => 5769
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 86
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14108135
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/108135 | Method for forming circular patterns on a surface | Dec 15, 2013 | Issued |
Array
(
[id] => 9408330
[patent_doc_number] => 20140099582
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-04-10
[patent_title] => 'Smart Subfield Method For E-Beam Lithographny'
[patent_app_type] => utility
[patent_app_number] => 14/107540
[patent_app_country] => US
[patent_app_date] => 2013-12-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 4459
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14107540
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/107540 | Smart subfield method for E-beam lithography | Dec 15, 2013 | Issued |
Array
(
[id] => 10283826
[patent_doc_number] => 20150168824
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-06-18
[patent_title] => 'EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING'
[patent_app_type] => utility
[patent_app_number] => 14/106219
[patent_app_country] => US
[patent_app_date] => 2013-12-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 2825
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14106219
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/106219 | EUV pellicle frame with holes and method of forming | Dec 12, 2013 | Issued |
Array
(
[id] => 10091565
[patent_doc_number] => 09128388
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-09-08
[patent_title] => 'Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 14/088773
[patent_app_country] => US
[patent_app_date] => 2013-11-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 25
[patent_no_of_words] => 9025
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 239
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14088773
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/088773 | Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor device | Nov 24, 2013 | Issued |
Array
(
[id] => 10111049
[patent_doc_number] => 09146459
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-09-29
[patent_title] => 'Extreme ultraviolet lithography process and mask'
[patent_app_type] => utility
[patent_app_number] => 14/087508
[patent_app_country] => US
[patent_app_date] => 2013-11-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 8
[patent_no_of_words] => 4908
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14087508
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/087508 | Extreme ultraviolet lithography process and mask | Nov 21, 2013 | Issued |
Array
(
[id] => 9490972
[patent_doc_number] => 20140141377
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-05-22
[patent_title] => 'DEVELOPER AND PATTERNING PROCESS'
[patent_app_type] => utility
[patent_app_number] => 14/084910
[patent_app_country] => US
[patent_app_date] => 2013-11-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 9172
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14084910
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/084910 | Developer and patterning process | Nov 19, 2013 | Issued |
Array
(
[id] => 10408432
[patent_doc_number] => 20150293441
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-10-15
[patent_title] => 'MASK BLANK, TRANSFER MASK, METHOD OF MANUFACTURING MASK BLANK, METHOD OF MANUFACTURING TRANSFER MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 14/443689
[patent_app_country] => US
[patent_app_date] => 2013-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 12477
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14443689
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/443689 | Mask blank, transfer mask, method of manufacturing a mask blank, method of manufacturing a transfer mask and method of manufacturing a semiconductor device | Nov 14, 2013 | Issued |
Array
(
[id] => 10033999
[patent_doc_number] => 09075316
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-07-07
[patent_title] => 'EUV mask for use during EUV photolithography processes'
[patent_app_type] => utility
[patent_app_number] => 14/080939
[patent_app_country] => US
[patent_app_date] => 2013-11-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 12
[patent_no_of_words] => 5762
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14080939
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/080939 | EUV mask for use during EUV photolithography processes | Nov 14, 2013 | Issued |
Array
(
[id] => 9856701
[patent_doc_number] => 20150036717
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-02-05
[patent_title] => 'OVERLAY DISPLACEMENT AMOUNT MEASURING METHOD, POSITIONAL\nDISPLACEMENT AMOUNT MEASURING METHOD AND POSITIONAL DISPLACEMENT AMOUNT MEASURING APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 14/075044
[patent_app_country] => US
[patent_app_date] => 2013-11-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 6392
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14075044
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/075044 | Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatus | Nov 7, 2013 | Issued |
Array
(
[id] => 10014933
[patent_doc_number] => 09057947
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-06-16
[patent_title] => 'Method for aligning substrate and mask and method for preparing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 14/073821
[patent_app_country] => US
[patent_app_date] => 2013-11-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 3
[patent_no_of_words] => 2994
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 142
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14073821
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/073821 | Method for aligning substrate and mask and method for preparing semiconductor device | Nov 5, 2013 | Issued |
Array
(
[id] => 10065265
[patent_doc_number] => 09104109
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-08-11
[patent_title] => 'Method and system for improving critical dimension uniformity using shaped beam lithography'
[patent_app_type] => utility
[patent_app_number] => 14/069376
[patent_app_country] => US
[patent_app_date] => 2013-11-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 23
[patent_no_of_words] => 11633
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 79
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14069376
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/069376 | Method and system for improving critical dimension uniformity using shaped beam lithography | Oct 31, 2013 | Issued |
Array
(
[id] => 11643625
[patent_doc_number] => 09664997
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2017-05-30
[patent_title] => 'Method of manufacturing mask blank and method of manufacturing transfer mask'
[patent_app_type] => utility
[patent_app_number] => 14/440661
[patent_app_country] => US
[patent_app_date] => 2013-10-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 1
[patent_figures_cnt] => 1
[patent_no_of_words] => 12961
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14440661
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/440661 | Method of manufacturing mask blank and method of manufacturing transfer mask | Oct 23, 2013 | Issued |
Array
(
[id] => 9306430
[patent_doc_number] => 20140045104
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-02-13
[patent_title] => 'LCD Panel Photolithography Process and Mask'
[patent_app_type] => utility
[patent_app_number] => 14/056492
[patent_app_country] => US
[patent_app_date] => 2013-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 4610
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14056492
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/056492 | LCD panel photolithography process and mask | Oct 16, 2013 | Issued |
Array
(
[id] => 9449306
[patent_doc_number] => 20140120475
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-05-01
[patent_title] => 'ELECTRON BEAM EXPOSURE METHOD'
[patent_app_type] => utility
[patent_app_number] => 14/056651
[patent_app_country] => US
[patent_app_date] => 2013-10-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 5213
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14056651
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/056651 | Electron beam exposure method | Oct 16, 2013 | Issued |
Array
(
[id] => 9785619
[patent_doc_number] => 20140302439
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-10-09
[patent_title] => 'METHOD OF MANUFACTURING GRAPHENE, CARBON NANOTUBES, FULLERENE, GRAPHITE OR A COMBINATION THEREOF HAVING A POSITION SPECIFICALLY REGULATED RESISTANCE'
[patent_app_type] => utility
[patent_app_number] => 14/050053
[patent_app_country] => US
[patent_app_date] => 2013-10-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 4711
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14050053
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/050053 | Method of manufacturing graphene, carbon nanotubes, fullerene, graphite or a combination thereof having a position specifically regulated resistance | Oct 8, 2013 | Issued |
Array
(
[id] => 9280688
[patent_doc_number] => 20140030657
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-30
[patent_title] => 'MANUFACTURING METHOD OF PHOTOMASK, METHOD FOR OPTICAL PROXIMITY CORRECTION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 14/044217
[patent_app_country] => US
[patent_app_date] => 2013-10-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 24
[patent_no_of_words] => 10983
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14044217
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/044217 | Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device | Oct 1, 2013 | Issued |
Array
(
[id] => 9269055
[patent_doc_number] => 20140023972
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-23
[patent_title] => 'Data Process for E-Beam Lithography'
[patent_app_type] => utility
[patent_app_number] => 14/043264
[patent_app_country] => US
[patent_app_date] => 2013-10-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3767
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14043264
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/043264 | Data process for E-beam lithography | Sep 30, 2013 | Issued |
Array
(
[id] => 9280689
[patent_doc_number] => 20140030656
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-30
[patent_title] => 'METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES'
[patent_app_type] => utility
[patent_app_number] => 14/040171
[patent_app_country] => US
[patent_app_date] => 2013-09-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 5578
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14040171
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/040171 | METHOD FOR FORMING RESIST PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES | Sep 26, 2013 | Abandoned |
Array
(
[id] => 9267610
[patent_doc_number] => 20140022526
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-23
[patent_title] => 'LITHOGRAPHIC APPARATUS, AND PATTERNING DEVICE FOR USE IN A LITHOGRAPHIC PROCESS'
[patent_app_type] => utility
[patent_app_number] => 14/038533
[patent_app_country] => US
[patent_app_date] => 2013-09-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 7433
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14038533
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/038533 | Lithographic apparatus, and patterning device for use in a lithographic process | Sep 25, 2013 | Issued |
Array
(
[id] => 9280672
[patent_doc_number] => 20140030640
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-30
[patent_title] => 'RESIST PATTERN FORMING METHOD, RESIST PATTERN, CROSSLINKABLE NEGATIVE CHEMICAL AMPLIFICATION RESIST COMPOSITION FOR ORGANIC SOLVENT DEVELOPMENT, RESIST FILM AND RESIST-COATED MASK BLANKS'
[patent_app_type] => utility
[patent_app_number] => 14/035484
[patent_app_country] => US
[patent_app_date] => 2013-09-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 15323
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14035484
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/035484 | Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks | Sep 23, 2013 | Issued |