
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 10939251
[patent_doc_number] => 20140342272
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-11-20
[patent_title] => 'Method to Define Multiple Layer Patterns With a Single Exposure by E-Beam Lithography'
[patent_app_type] => utility
[patent_app_number] => 14/030875
[patent_app_country] => US
[patent_app_date] => 2013-09-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 35
[patent_figures_cnt] => 35
[patent_no_of_words] => 12022
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14030875
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/030875 | Method to define multiple layer patterns with a single exposure by E-beam lithography | Sep 17, 2013 | Issued |
Array
(
[id] => 9869020
[patent_doc_number] => 08956791
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-17
[patent_title] => 'Exposure tolerance estimation method and method for manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 14/027353
[patent_app_country] => US
[patent_app_date] => 2013-09-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 15
[patent_figures_cnt] => 27
[patent_no_of_words] => 7512
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 152
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14027353
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/027353 | Exposure tolerance estimation method and method for manufacturing semiconductor device | Sep 15, 2013 | Issued |
Array
(
[id] => 9370168
[patent_doc_number] => 20140080041
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-03-20
[patent_title] => 'METHOD FOR CREATING MASK DATA, PROGRAM, INFORMATION PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING MASK'
[patent_app_type] => utility
[patent_app_number] => 14/023845
[patent_app_country] => US
[patent_app_date] => 2013-09-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 4811
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14023845
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/023845 | Method for creating mask data, program, information processing apparatus, and method for manufacturing mask | Sep 10, 2013 | Issued |
Array
(
[id] => 9849987
[patent_doc_number] => 08951712
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-10
[patent_title] => 'Resist protective film-forming composition and patterning process'
[patent_app_type] => utility
[patent_app_number] => 14/022445
[patent_app_country] => US
[patent_app_date] => 2013-09-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 11744
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14022445
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/022445 | Resist protective film-forming composition and patterning process | Sep 9, 2013 | Issued |
Array
(
[id] => 9211946
[patent_doc_number] => 20140011123
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-09
[patent_title] => 'MULTILAYER SUBSTRATE, MANUFACTURING METHOD FOR MULTILAYER SUBSTRATE, AND QUALITY CONTROL METHOD FOR MULTILAYER SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 14/021392
[patent_app_country] => US
[patent_app_date] => 2013-09-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 11758
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14021392
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/021392 | Multilayer substrate, manufacturing method for multilayer substrate, and quality control method for multilayer substrate | Sep 8, 2013 | Issued |
Array
(
[id] => 12949492
[patent_doc_number] => 09835949
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2017-12-05
[patent_title] => Lithographic pattern development process for amorphous fluoropolymer
[patent_app_type] => utility
[patent_app_number] => 14/017323
[patent_app_country] => US
[patent_app_date] => 2013-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 22
[patent_no_of_words] => 4581
[patent_no_of_claims] => 2
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 76
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14017323
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/017323 | Lithographic pattern development process for amorphous fluoropolymer | Sep 3, 2013 | Issued |
Array
(
[id] => 9205291
[patent_doc_number] => 20140004468
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-01-02
[patent_title] => 'MULTIPLE-GRID EXPOSURE METHOD'
[patent_app_type] => utility
[patent_app_number] => 14/017749
[patent_app_country] => US
[patent_app_date] => 2013-09-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 6357
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14017749
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/017749 | Multiple-grid exposure method | Sep 3, 2013 | Issued |
Array
(
[id] => 9363031
[patent_doc_number] => 20140072904
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-03-13
[patent_title] => 'PHOTOMASK, PHOTOMASK SET, EXPOSURE APPARATUS AND EXPOSURE METHOD'
[patent_app_type] => utility
[patent_app_number] => 14/015279
[patent_app_country] => US
[patent_app_date] => 2013-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 10214
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14015279
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/015279 | Photomask, photomask set, exposure apparatus and exposure method | Aug 29, 2013 | Issued |
Array
(
[id] => 9909410
[patent_doc_number] => 20150064611
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-03-05
[patent_title] => 'Extreme Ultraviolet (Euv) Mask And Method Of Fabricating The Euv Mask'
[patent_app_type] => utility
[patent_app_number] => 14/015885
[patent_app_country] => US
[patent_app_date] => 2013-08-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 5440
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14015885
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/015885 | Extreme ultraviolet (EUV) mask and method of fabricating the EUV mask | Aug 29, 2013 | Issued |
Array
(
[id] => 9685734
[patent_doc_number] => 20140242498
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-08-28
[patent_title] => 'PRODUCTION METHOD AND EVALUATION APPARATUS FOR MASK LAYOUT'
[patent_app_type] => utility
[patent_app_number] => 14/013213
[patent_app_country] => US
[patent_app_date] => 2013-08-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 5779
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14013213
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/013213 | Production method and evaluation apparatus for mask layout | Aug 28, 2013 | Issued |
Array
(
[id] => 9188647
[patent_doc_number] => 20130327962
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-12-12
[patent_title] => 'Electron Beam Lithography System and Method For Improving Throughput'
[patent_app_type] => utility
[patent_app_number] => 13/971702
[patent_app_country] => US
[patent_app_date] => 2013-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6261
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13971702
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/971702 | Electron beam lithography system and method for improving throughput | Aug 19, 2013 | Issued |
Array
(
[id] => 9191355
[patent_doc_number] => 20130330670
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-12-12
[patent_title] => 'Electron Beam Lithography System and Method for Improving Throughput'
[patent_app_type] => utility
[patent_app_number] => 13/971629
[patent_app_country] => US
[patent_app_date] => 2013-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 6261
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13971629
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/971629 | Electron beam lithography system and method for improving throughput | Aug 19, 2013 | Issued |
Array
(
[id] => 10091562
[patent_doc_number] => 09128385
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-09-08
[patent_title] => 'Adaptive photomasks and methods for using the same'
[patent_app_type] => utility
[patent_app_number] => 13/970534
[patent_app_country] => US
[patent_app_date] => 2013-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 18
[patent_no_of_words] => 6171
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 113
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13970534
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/970534 | Adaptive photomasks and methods for using the same | Aug 18, 2013 | Issued |
Array
(
[id] => 9703567
[patent_doc_number] => 08828628
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-09-09
[patent_title] => 'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/970465
[patent_app_country] => US
[patent_app_date] => 2013-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 48
[patent_no_of_words] => 10481
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13970465
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/970465 | Method and system for design of a reticle to be manufactured using variable shaped beam lithography | Aug 18, 2013 | Issued |
Array
(
[id] => 9843886
[patent_doc_number] => 08945800
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-02-03
[patent_title] => 'Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program'
[patent_app_type] => utility
[patent_app_number] => 13/965103
[patent_app_country] => US
[patent_app_date] => 2013-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 26
[patent_no_of_words] => 13098
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 126
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13965103
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/965103 | Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program | Aug 11, 2013 | Issued |
Array
(
[id] => 9174304
[patent_doc_number] => 20130316289
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-11-28
[patent_title] => 'Electron Beam Data Storage System and Method for High Volume Manufacturing'
[patent_app_type] => utility
[patent_app_number] => 13/964974
[patent_app_country] => US
[patent_app_date] => 2013-08-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6229
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13964974
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/964974 | Electron beam data storage system and method for high volume manufacturing | Aug 11, 2013 | Issued |
Array
(
[id] => 10892703
[patent_doc_number] => 08916315
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-12-23
[patent_title] => 'Method for fracturing and forming a pattern using shaped beam charged particle beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/959530
[patent_app_country] => US
[patent_app_date] => 2013-08-05
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 22
[patent_no_of_words] => 9851
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 72
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13959530
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/959530 | Method for fracturing and forming a pattern using shaped beam charged particle beam lithography | Aug 4, 2013 | Issued |
Array
(
[id] => 10327400
[patent_doc_number] => 20150212404
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-07-30
[patent_title] => 'PELLICLE'
[patent_app_type] => utility
[patent_app_number] => 14/417948
[patent_app_country] => US
[patent_app_date] => 2013-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 6883
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14417948
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/417948 | Pellicle | Jul 30, 2013 | Issued |
Array
(
[id] => 10416431
[patent_doc_number] => 20150301441
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2015-10-22
[patent_title] => 'REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING SAME, METHOD FOR MANUFACTURING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 14/418629
[patent_app_country] => US
[patent_app_date] => 2013-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 15725
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 14418629
[rel_patent_id] =>[rel_patent_doc_number] =>) 14/418629 | Reflective mask blank and method for manufacturing same, method for manufacturing reflective mask, and method for manufacturing semiconductor device | Jul 26, 2013 | Issued |
Array
(
[id] => 9970897
[patent_doc_number] => 09017903
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-04-28
[patent_title] => 'Mask overlay control'
[patent_app_type] => utility
[patent_app_number] => 13/947180
[patent_app_country] => US
[patent_app_date] => 2013-07-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 11
[patent_no_of_words] => 4770
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13947180
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/947180 | Mask overlay control | Jul 21, 2013 | Issued |