
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8853475
[patent_doc_number] => 20130143150
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-06-06
[patent_title] => 'METHOD FOR MANUFACTURING PHOTOMASK AND PHOTOMASK MANUFACTURED USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/571043
[patent_app_country] => US
[patent_app_date] => 2012-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 8171
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13571043
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/571043 | Method for manufacturing photomask and photomask manufactured using the same | Aug 8, 2012 | Issued |
Array
(
[id] => 9427296
[patent_doc_number] => 08703369
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-04-22
[patent_title] => 'Method of determining focus and dose of an apparatus of optical micro-lithography'
[patent_app_type] => utility
[patent_app_number] => 13/568996
[patent_app_country] => US
[patent_app_date] => 2012-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 16
[patent_no_of_words] => 4956
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 100
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13568996
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/568996 | Method of determining focus and dose of an apparatus of optical micro-lithography | Aug 6, 2012 | Issued |
Array
(
[id] => 10188502
[patent_doc_number] => 09217916
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2015-12-22
[patent_title] => 'Lithographic apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 13/568645
[patent_app_country] => US
[patent_app_date] => 2012-08-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 9
[patent_no_of_words] => 6547
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 117
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13568645
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/568645 | Lithographic apparatus and device manufacturing method | Aug 6, 2012 | Issued |
Array
(
[id] => 9523803
[patent_doc_number] => 08748063
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-06-10
[patent_title] => 'Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks'
[patent_app_type] => utility
[patent_app_number] => 13/564221
[patent_app_country] => US
[patent_app_date] => 2012-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 23
[patent_no_of_words] => 9558
[patent_no_of_claims] => 22
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13564221
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/564221 | Extreme ultraviolet (EUV) multilayer defect compensation and EUV masks | Jul 31, 2012 | Issued |
Array
(
[id] => 8684285
[patent_doc_number] => 20130052569
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-02-28
[patent_title] => 'EXPOSURE APPARATUS FOR FORMING A RETICLE AND METHOD OF FORMING A RETICLE USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/564196
[patent_app_country] => US
[patent_app_date] => 2012-08-01
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 5729
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13564196
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/564196 | Exposure apparatus for forming a reticle and method of forming a reticle using the same | Jul 31, 2012 | Issued |
Array
(
[id] => 9440575
[patent_doc_number] => 08709684
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-04-29
[patent_title] => 'Automatic misalignment balancing scheme for multi-patterning technology'
[patent_app_type] => utility
[patent_app_number] => 13/562436
[patent_app_country] => US
[patent_app_date] => 2012-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 12
[patent_no_of_words] => 6967
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 87
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13562436
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/562436 | Automatic misalignment balancing scheme for multi-patterning technology | Jul 30, 2012 | Issued |
Array
(
[id] => 9294473
[patent_doc_number] => 20140038107
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2014-02-06
[patent_title] => 'Method and System for E-Beam Lithography with Multi-Exposure'
[patent_app_type] => utility
[patent_app_number] => 13/562877
[patent_app_country] => US
[patent_app_date] => 2012-07-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6421
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13562877
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/562877 | Method and system for E-beam lithography with multi-exposure | Jul 30, 2012 | Issued |
Array
(
[id] => 9344733
[patent_doc_number] => 08663881
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-03-04
[patent_title] => 'Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device'
[patent_app_type] => utility
[patent_app_number] => 13/554725
[patent_app_country] => US
[patent_app_date] => 2012-07-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 6
[patent_no_of_words] => 8870
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 159
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13554725
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/554725 | Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device | Jul 19, 2012 | Issued |
Array
(
[id] => 9427295
[patent_doc_number] => 08703368
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-04-22
[patent_title] => 'Lithography process'
[patent_app_type] => utility
[patent_app_number] => 13/550036
[patent_app_country] => US
[patent_app_date] => 2012-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 3574
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13550036
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/550036 | Lithography process | Jul 15, 2012 | Issued |
Array
(
[id] => 9198056
[patent_doc_number] => 20130337371
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-12-19
[patent_title] => 'MASK AND REPAIRING METHOD THEREFOR'
[patent_app_type] => utility
[patent_app_number] => 13/638081
[patent_app_country] => US
[patent_app_date] => 2012-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 4226
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13638081
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/638081 | Mask and repairing method therefor | Jul 15, 2012 | Issued |
Array
(
[id] => 8932358
[patent_doc_number] => 08492055
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-07-23
[patent_title] => 'Method and system for fracturing a pattern using lithography with multiple exposure passes'
[patent_app_type] => utility
[patent_app_number] => 13/549400
[patent_app_country] => US
[patent_app_date] => 2012-07-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 27
[patent_no_of_words] => 11241
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 170
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13549400
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/549400 | Method and system for fracturing a pattern using lithography with multiple exposure passes | Jul 12, 2012 | Issued |
Array
(
[id] => 9413280
[patent_doc_number] => 08697316
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-04-15
[patent_title] => 'Hard mask spacer structure and fabrication method thereof'
[patent_app_type] => utility
[patent_app_number] => 13/492934
[patent_app_country] => US
[patent_app_date] => 2012-06-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 18
[patent_no_of_words] => 1667
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 92
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13492934
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/492934 | Hard mask spacer structure and fabrication method thereof | Jun 10, 2012 | Issued |
Array
(
[id] => 9099352
[patent_doc_number] => 08563224
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2013-10-22
[patent_title] => 'Data process for E-beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/487850
[patent_app_country] => US
[patent_app_date] => 2012-06-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 13
[patent_no_of_words] => 3740
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 57
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13487850
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/487850 | Data process for E-beam lithography | Jun 3, 2012 | Issued |
Array
(
[id] => 9245028
[patent_doc_number] => 08609308
[patent_country] => US
[patent_kind] => B1
[patent_issue_date] => 2013-12-17
[patent_title] => 'Smart subfield method for E-beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/484434
[patent_app_country] => US
[patent_app_date] => 2012-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 12
[patent_no_of_words] => 4427
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 89
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13484434
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/484434 | Smart subfield method for E-beam lithography | May 30, 2012 | Issued |
Array
(
[id] => 9468656
[patent_doc_number] => 08722286
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-05-13
[patent_title] => 'Devices and methods for improved reflective electron beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/484588
[patent_app_country] => US
[patent_app_date] => 2012-05-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 37
[patent_no_of_words] => 5189
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 65
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13484588
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/484588 | Devices and methods for improved reflective electron beam lithography | May 30, 2012 | Issued |
Array
(
[id] => 9245043
[patent_doc_number] => 08609323
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-12-17
[patent_title] => 'System for producing patterned silicon carbide structures'
[patent_app_type] => utility
[patent_app_number] => 13/483889
[patent_app_country] => US
[patent_app_date] => 2012-05-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 6
[patent_no_of_words] => 5398
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 93
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13483889
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/483889 | System for producing patterned silicon carbide structures | May 29, 2012 | Issued |
Array
(
[id] => 8509513
[patent_doc_number] => 20120308921
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-12-06
[patent_title] => 'METHOD OF OPTIMIZING A DIE SIZE, METHOD OF DESIGNING A PATTERN DEVICE MANUFACTURING METHOD, AND COMPUTER PROGRAM PRODUCT'
[patent_app_type] => utility
[patent_app_number] => 13/482419
[patent_app_country] => US
[patent_app_date] => 2012-05-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7827
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13482419
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/482419 | Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product | May 28, 2012 | Issued |
Array
(
[id] => 8393537
[patent_doc_number] => 20120231378
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-13
[patent_title] => 'REFLECTIVE LAYER-EQUIPPED SUBSTRATE FOR EUV LITHOGRAPHY, REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV LITHOGRAPHY, AND PROCESS FOR PRODUCTION OF THE REFLECTIVE LAYER-EQUIPPED SUBSTRATE'
[patent_app_type] => utility
[patent_app_number] => 13/478532
[patent_app_country] => US
[patent_app_date] => 2012-05-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 17367
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13478532
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/478532 | Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate | May 22, 2012 | Issued |
Array
(
[id] => 8381756
[patent_doc_number] => 20120225375
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-06
[patent_title] => 'OPTICAL MEMBER FOR EUV LITHOGRAPHY'
[patent_app_type] => utility
[patent_app_number] => 13/472002
[patent_app_country] => US
[patent_app_date] => 2012-05-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 11902
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13472002
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/472002 | Optical member for EUV lithography | May 14, 2012 | Issued |
Array
(
[id] => 9148201
[patent_doc_number] => 20130302724
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-11-14
[patent_title] => 'MASK AND METHOD OF FORMING PATTERN BY USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/471430
[patent_app_country] => US
[patent_app_date] => 2012-05-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4730
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13471430
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/471430 | Mask and method of forming pattern by using the same | May 13, 2012 | Issued |