
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8749254
[patent_doc_number] => 08415086
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-04-09
[patent_title] => 'Method of studying chirality controlled artificial kagome spin ice building blocks'
[patent_app_type] => utility
[patent_app_number] => 13/087747
[patent_app_country] => US
[patent_app_date] => 2011-04-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 24
[patent_no_of_words] => 10389
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 237
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13087747
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/087747 | Method of studying chirality controlled artificial kagome spin ice building blocks | Apr 14, 2011 | Issued |
Array
(
[id] => 8453115
[patent_doc_number] => 20120264062
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-10-18
[patent_title] => 'ELECTRON BEAM LITHOGRAPHY SYSTEM AND METHOD FOR IMPROVING THROUGHPUT'
[patent_app_type] => utility
[patent_app_number] => 13/087133
[patent_app_country] => US
[patent_app_date] => 2011-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6233
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13087133
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/087133 | Electron beam lithography system and method for improving throughput | Apr 13, 2011 | Issued |
Array
(
[id] => 8244752
[patent_doc_number] => 08202673
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-19
[patent_title] => 'Method for manufacturing a surface and integrated circuit using variable shaped beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/087336
[patent_app_country] => US
[patent_app_date] => 2011-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 48
[patent_no_of_words] => 10394
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 75
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/202/08202673.pdf
[firstpage_image] =>[orig_patent_app_number] => 13087336
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/087336 | Method for manufacturing a surface and integrated circuit using variable shaped beam lithography | Apr 13, 2011 | Issued |
Array
(
[id] => 8244748
[patent_doc_number] => 08202672
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-06-19
[patent_title] => 'Method and system for design of a reticle to be manufactured using variable shaped beam lithography'
[patent_app_type] => utility
[patent_app_number] => 13/087334
[patent_app_country] => US
[patent_app_date] => 2011-04-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 21
[patent_figures_cnt] => 48
[patent_no_of_words] => 10399
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 43
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/202/08202672.pdf
[firstpage_image] =>[orig_patent_app_number] => 13087334
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/087334 | Method and system for design of a reticle to be manufactured using variable shaped beam lithography | Apr 13, 2011 | Issued |
Array
(
[id] => 7500274
[patent_doc_number] => 20110262868
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-10-27
[patent_title] => 'METHOD OF DETECTING ALIGNMENT MARK AND METHOD OF MANUFACTURING PRINTED CIRCUIT BOARD'
[patent_app_type] => utility
[patent_app_number] => 13/085251
[patent_app_country] => US
[patent_app_date] => 2011-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 17
[patent_figures_cnt] => 17
[patent_no_of_words] => 7773
[patent_no_of_claims] => 7
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0262/20110262868.pdf
[firstpage_image] =>[orig_patent_app_number] => 13085251
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/085251 | Method of detecting alignment mark and method of manufacturing printed circuit board | Apr 11, 2011 | Issued |
Array
(
[id] => 8725296
[patent_doc_number] => 08404410
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-03-26
[patent_title] => 'Method of aligning photomask with base material and method of manufacturing printed circuit board'
[patent_app_type] => utility
[patent_app_number] => 13/085269
[patent_app_country] => US
[patent_app_date] => 2011-04-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 19
[patent_figures_cnt] => 19
[patent_no_of_words] => 10004
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 396
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13085269
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/085269 | Method of aligning photomask with base material and method of manufacturing printed circuit board | Apr 11, 2011 | Issued |
Array
(
[id] => 7485547
[patent_doc_number] => 20110250528
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-10-13
[patent_title] => 'METHOD FOR CORRECTING IMAGE PLACEMENT ERROR IN PHOTOMASK'
[patent_app_type] => utility
[patent_app_number] => 13/083729
[patent_app_country] => US
[patent_app_date] => 2011-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 2433
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0250/20110250528.pdf
[firstpage_image] =>[orig_patent_app_number] => 13083729
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/083729 | METHOD FOR CORRECTING IMAGE PLACEMENT ERROR IN PHOTOMASK | Apr 10, 2011 | Abandoned |
Array
(
[id] => 8310051
[patent_doc_number] => 20120187080
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-07-26
[patent_title] => 'Processing method of row bar for manufacturing slider and bar mask for row bar processing'
[patent_app_type] => utility
[patent_app_number] => 13/064693
[patent_app_country] => US
[patent_app_date] => 2011-04-08
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 4220
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13064693
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/064693 | Processing method of row bar for manufacturing slider and bar mask for row bar processing | Apr 7, 2011 | Issued |
Array
(
[id] => 8733009
[patent_doc_number] => 20130078578
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-03-28
[patent_title] => 'RESIST DEVELOPER, METHOD FOR FORMING A RESIST PATTERN AND METHOD FOR MANUFACTURING A MOLD'
[patent_app_type] => utility
[patent_app_number] => 13/638249
[patent_app_country] => US
[patent_app_date] => 2011-03-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 8041
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13638249
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/638249 | Resist developer, method for forming a resist pattern and method for manufacturing a mold | Mar 27, 2011 | Issued |
Array
(
[id] => 8416961
[patent_doc_number] => 20120244461
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-27
[patent_title] => 'OVERLAY CONTROL METHOD AND A SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS EMPLOYING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/071956
[patent_app_country] => US
[patent_app_date] => 2011-03-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 14
[patent_figures_cnt] => 14
[patent_no_of_words] => 6256
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13071956
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/071956 | OVERLAY CONTROL METHOD AND A SEMICONDUCTOR MANUFACTURING METHOD AND APPARATUS EMPLOYING THE SAME | Mar 24, 2011 | Abandoned |
Array
(
[id] => 8416959
[patent_doc_number] => 20120244459
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-27
[patent_title] => 'METHOD FOR EVALUATING OVERLAY ERROR AND MASK FOR THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/071248
[patent_app_country] => US
[patent_app_date] => 2011-03-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
[patent_figures_cnt] => 12
[patent_no_of_words] => 3482
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13071248
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/071248 | METHOD FOR EVALUATING OVERLAY ERROR AND MASK FOR THE SAME | Mar 23, 2011 | Abandoned |
Array
(
[id] => 8301332
[patent_doc_number] => 20120183890
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-07-19
[patent_title] => 'Method for fabricating a mask'
[patent_app_type] => utility
[patent_app_number] => 13/071443
[patent_app_country] => US
[patent_app_date] => 2011-03-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 3257
[patent_no_of_claims] => 10
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13071443
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/071443 | Method for fabricating a mask | Mar 23, 2011 | Issued |
Array
(
[id] => 7567282
[patent_doc_number] => 20110287345
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-11-24
[patent_title] => 'ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 13/051935
[patent_app_country] => US
[patent_app_date] => 2011-03-18
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 4235
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0287/20110287345.pdf
[firstpage_image] =>[orig_patent_app_number] => 13051935
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/051935 | ELECTRON BEAM DRAWING APPARATUS, ELECTRON BEAM DRAWING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING TEMPLATE MANUFACTURING METHOD | Mar 17, 2011 | Abandoned |
Array
(
[id] => 8405793
[patent_doc_number] => 20120237857
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-20
[patent_title] => 'PHOTOMASK AND METHOD FOR FORMING OVERLAY MARK USING THE SAME'
[patent_app_type] => utility
[patent_app_number] => 13/049047
[patent_app_country] => US
[patent_app_date] => 2011-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 11
[patent_figures_cnt] => 11
[patent_no_of_words] => 3161
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13049047
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/049047 | PHOTOMASK AND METHOD FOR FORMING OVERLAY MARK USING THE SAME | Mar 15, 2011 | Abandoned |
Array
(
[id] => 8405818
[patent_doc_number] => 20120237877
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-09-20
[patent_title] => 'ELECTRON BEAM DATA STORAGE SYSTEM AND METHOD FOR HIGH VOLUME MANUFACTURING'
[patent_app_type] => utility
[patent_app_number] => 13/049123
[patent_app_country] => US
[patent_app_date] => 2011-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 6183
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13049123
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/049123 | Electron beam data storage system and method for high volume manufacturing | Mar 15, 2011 | Issued |
Array
(
[id] => 8955604
[patent_doc_number] => 08501376
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-08-06
[patent_title] => 'System and method for test pattern for lithography process'
[patent_app_type] => utility
[patent_app_number] => 13/046733
[patent_app_country] => US
[patent_app_date] => 2011-03-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 8
[patent_no_of_words] => 4436
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 73
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13046733
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/046733 | System and method for test pattern for lithography process | Mar 11, 2011 | Issued |
Array
(
[id] => 9020135
[patent_doc_number] => 08530120
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-09-10
[patent_title] => 'Method and apparatus for performing pattern reconnection after individual or multipart alignment'
[patent_app_type] => utility
[patent_app_number] => 12/929981
[patent_app_country] => US
[patent_app_date] => 2011-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 28
[patent_figures_cnt] => 33
[patent_no_of_words] => 20297
[patent_no_of_claims] => 63
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 227
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12929981
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/929981 | Method and apparatus for performing pattern reconnection after individual or multipart alignment | Feb 27, 2011 | Issued |
Array
(
[id] => 7732208
[patent_doc_number] => 20120015289
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-01-19
[patent_title] => 'ALIGNMENT METHOD AND METHOD FOR MANUFACTURING FLAT PANEL DISPLAY'
[patent_app_type] => utility
[patent_app_number] => 13/259246
[patent_app_country] => US
[patent_app_date] => 2011-02-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 6912
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0015/20120015289.pdf
[firstpage_image] =>[orig_patent_app_number] => 13259246
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/259246 | Alignment method and method for manufacturing flat panel display | Feb 27, 2011 | Issued |
Array
(
[id] => 6081080
[patent_doc_number] => 20110143268
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-06-16
[patent_title] => 'Scattering Bar OPC Application Method for Sub-Half Wavelength Lithography Patterning'
[patent_app_type] => utility
[patent_app_number] => 13/032590
[patent_app_country] => US
[patent_app_date] => 2011-02-22
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
[patent_figures_cnt] => 18
[patent_no_of_words] => 6763
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0143/20110143268.pdf
[firstpage_image] =>[orig_patent_app_number] => 13032590
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/032590 | Scattering bar OPC application method for sub-half wavelength lithography patterning | Feb 21, 2011 | Issued |
Array
(
[id] => 7489518
[patent_doc_number] => 08029953
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-10-04
[patent_title] => 'Lithographic apparatus and device manufacturing method with double exposure overlay control'
[patent_app_type] => utility
[patent_app_number] => 13/029749
[patent_app_country] => US
[patent_app_date] => 2011-02-17
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 4
[patent_no_of_words] => 5235
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 104
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/029/08029953.pdf
[firstpage_image] =>[orig_patent_app_number] => 13029749
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/029749 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Feb 16, 2011 | Issued |