Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 8720559 [patent_doc_number] => 20130071776 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2013-03-21 [patent_title] => 'Generalization Of Shot Definitions For Mask And Wafer Writing Tools' [patent_app_type] => utility [patent_app_number] => 13/501446 [patent_app_country] => US [patent_app_date] => 2010-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5231 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13501446 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/501446
Generalization of shot definitions for mask and wafer writing tools Oct 11, 2010 Issued
Array ( [id] => 5991510 [patent_doc_number] => 20110013163 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-01-20 [patent_title] => 'DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM AND LITHOGRAPHIC APPARATUS' [patent_app_type] => utility [patent_app_number] => 12/892733 [patent_app_country] => US [patent_app_date] => 2010-09-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5026 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0013/20110013163.pdf [firstpage_image] =>[orig_patent_app_number] => 12892733 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/892733
Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements Sep 27, 2010 Issued
Array ( [id] => 8577482 [patent_doc_number] => 08343692 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-01-01 [patent_title] => 'Exposure apparatus inspection mask and exposure apparatus inspection method' [patent_app_type] => utility [patent_app_number] => 12/886157 [patent_app_country] => US [patent_app_date] => 2010-09-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 18 [patent_no_of_words] => 9165 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 140 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12886157 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/886157
Exposure apparatus inspection mask and exposure apparatus inspection method Sep 19, 2010 Issued
Array ( [id] => 9254364 [patent_doc_number] => 08617775 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-12-31 [patent_title] => 'Optimized mask design for fabricating periodic and quasi-periodic patterns' [patent_app_type] => utility [patent_app_number] => 13/509642 [patent_app_country] => US [patent_app_date] => 2010-09-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 24 [patent_no_of_words] => 7763 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13509642 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/509642
Optimized mask design for fabricating periodic and quasi-periodic patterns Sep 13, 2010 Issued
Array ( [id] => 6202244 [patent_doc_number] => 20110065030 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-17 [patent_title] => 'MASK PATTERN DETERMINING METHOD, MASK MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD' [patent_app_type] => utility [patent_app_number] => 12/880507 [patent_app_country] => US [patent_app_date] => 2010-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 6287 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20110065030.pdf [firstpage_image] =>[orig_patent_app_number] => 12880507 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/880507
MASK PATTERN DETERMINING METHOD, MASK MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD Sep 12, 2010 Abandoned
Array ( [id] => 6118984 [patent_doc_number] => 20110076599 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-31 [patent_title] => 'APPARATUS AND METHOD FOR ALIGNING MASK' [patent_app_type] => utility [patent_app_number] => 12/880226 [patent_app_country] => US [patent_app_date] => 2010-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 4940 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20110076599.pdf [firstpage_image] =>[orig_patent_app_number] => 12880226 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/880226
Apparatus and method for aligning mask Sep 12, 2010 Issued
Array ( [id] => 6346144 [patent_doc_number] => 20100330469 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-30 [patent_title] => 'Overlay Target for Polarized Light Lithography' [patent_app_type] => utility [patent_app_number] => 12/876526 [patent_app_country] => US [patent_app_date] => 2010-09-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4817 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0330/20100330469.pdf [firstpage_image] =>[orig_patent_app_number] => 12876526 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/876526
Overlay target for polarized light lithography Sep 6, 2010 Issued
Array ( [id] => 6202242 [patent_doc_number] => 20110065028 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-17 [patent_title] => 'PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE' [patent_app_type] => utility [patent_app_number] => 12/874756 [patent_app_country] => US [patent_app_date] => 2010-09-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 8277 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20110065028.pdf [firstpage_image] =>[orig_patent_app_number] => 12874756 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/874756
PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE Sep 1, 2010 Abandoned
Array ( [id] => 7790862 [patent_doc_number] => 20120052418 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-03-01 [patent_title] => 'METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNESS AND IMAGE LOG SLOPE' [patent_app_type] => utility [patent_app_number] => 12/872312 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 11843 [patent_no_of_claims] => 48 [patent_no_of_ind_claims] => 8 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0052/20120052418.pdf [firstpage_image] =>[orig_patent_app_number] => 12872312 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/872312
Method for optimizing source and mask to control line width roughness and image log slope Aug 30, 2010 Issued
Array ( [id] => 7790866 [patent_doc_number] => 20120052422 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-03-01 [patent_title] => 'MASK-SHIFT-AWARE RC EXTRACTION FOR DOUBLE PATTERNING DESIGN' [patent_app_type] => utility [patent_app_number] => 12/872938 [patent_app_country] => US [patent_app_date] => 2010-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3871 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0052/20120052422.pdf [firstpage_image] =>[orig_patent_app_number] => 12872938 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/872938
Mask-shift-aware RC extraction for double patterning design Aug 30, 2010 Issued
Array ( [id] => 6024762 [patent_doc_number] => 20110053088 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2011-03-03 [patent_title] => 'ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD' [patent_app_type] => utility [patent_app_number] => 12/868215 [patent_app_country] => US [patent_app_date] => 2010-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 6125 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0053/20110053088.pdf [firstpage_image] =>[orig_patent_app_number] => 12868215 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/868215
ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD Aug 24, 2010 Abandoned
Array ( [id] => 6381511 [patent_doc_number] => 20100316802 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-12-16 [patent_title] => 'OVER-COATING AGENT FOR FORMING FINE PATTERNS AND A METHOD OF FORMING FINE PATTERNS USING SUCH AGENT' [patent_app_type] => utility [patent_app_number] => 12/862130 [patent_app_country] => US [patent_app_date] => 2010-08-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6247 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0316/20100316802.pdf [firstpage_image] =>[orig_patent_app_number] => 12862130 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/862130
Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent Aug 23, 2010 Issued
Array ( [id] => 8725290 [patent_doc_number] => 08404404 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-03-26 [patent_title] => 'Method and system for manufacturing a surface using character projection lithography with variable magnification' [patent_app_type] => utility [patent_app_number] => 12/860814 [patent_app_country] => US [patent_app_date] => 2010-08-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 12 [patent_no_of_words] => 6345 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12860814 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/860814
Method and system for manufacturing a surface using character projection lithography with variable magnification Aug 19, 2010 Issued
Array ( [id] => 7777073 [patent_doc_number] => 20120040280 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-02-16 [patent_title] => 'Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography' [patent_app_type] => utility [patent_app_number] => 12/856208 [patent_app_country] => US [patent_app_date] => 2010-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 6765 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0040/20120040280.pdf [firstpage_image] =>[orig_patent_app_number] => 12856208 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/856208
Simultaneous optical proximity correction and decomposition for double exposure lithography Aug 12, 2010 Issued
Array ( [id] => 9299572 [patent_doc_number] => 08647797 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2014-02-11 [patent_title] => 'Methos and device for keeping mask dimensions constant' [patent_app_type] => utility [patent_app_number] => 13/261175 [patent_app_country] => US [patent_app_date] => 2010-08-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 3076 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13261175 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/261175
Methos and device for keeping mask dimensions constant Aug 5, 2010 Issued
Array ( [id] => 8114199 [patent_doc_number] => 08158312 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-04-17 [patent_title] => 'Exposure method using charged particle beam' [patent_app_type] => utility [patent_app_number] => 12/846243 [patent_app_country] => US [patent_app_date] => 2010-07-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 40 [patent_figures_cnt] => 50 [patent_no_of_words] => 11502 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 177 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/158/08158312.pdf [firstpage_image] =>[orig_patent_app_number] => 12846243 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/846243
Exposure method using charged particle beam Jul 28, 2010 Issued
Array ( [id] => 8446014 [patent_doc_number] => 08288063 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-10-16 [patent_title] => 'Defense system in advanced process control' [patent_app_type] => utility [patent_app_number] => 12/844507 [patent_app_country] => US [patent_app_date] => 2010-07-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 5 [patent_no_of_words] => 3206 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12844507 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/844507
Defense system in advanced process control Jul 26, 2010 Issued
Array ( [id] => 6444750 [patent_doc_number] => 20100283052 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2010-11-11 [patent_title] => 'Metrology Systems and Methods for Lithography Processes' [patent_app_type] => utility [patent_app_number] => 12/842630 [patent_app_country] => US [patent_app_date] => 2010-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 8606 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0283/20100283052.pdf [firstpage_image] =>[orig_patent_app_number] => 12842630 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/842630
Metrology systems and methods for lithography processes Jul 22, 2010 Issued
Array ( [id] => 8277722 [patent_doc_number] => 20120171600 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2012-07-05 [patent_title] => 'Time Differential Reticle Inspection' [patent_app_type] => utility [patent_app_number] => 13/378811 [patent_app_country] => US [patent_app_date] => 2010-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7408 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13378811 [rel_patent_id] =>[rel_patent_doc_number] =>)
13/378811
Time differential reticle inspection Jul 15, 2010 Issued
Array ( [id] => 8642304 [patent_doc_number] => 08367284 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2013-02-05 [patent_title] => 'Exposure device, exposure method, and method for manufacturing semiconductor device' [patent_app_type] => utility [patent_app_number] => 12/834443 [patent_app_country] => US [patent_app_date] => 2010-07-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 18 [patent_no_of_words] => 12049 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 197 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12834443 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/834443
Exposure device, exposure method, and method for manufacturing semiconductor device Jul 11, 2010 Issued
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