
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 8720559
[patent_doc_number] => 20130071776
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2013-03-21
[patent_title] => 'Generalization Of Shot Definitions For Mask And Wafer Writing Tools'
[patent_app_type] => utility
[patent_app_number] => 13/501446
[patent_app_country] => US
[patent_app_date] => 2010-10-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 5231
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13501446
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/501446 | Generalization of shot definitions for mask and wafer writing tools | Oct 11, 2010 | Issued |
Array
(
[id] => 5991510
[patent_doc_number] => 20110013163
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-01-20
[patent_title] => 'DEVICE MANUFACTURING METHOD, COMPUTER PROGRAM AND LITHOGRAPHIC APPARATUS'
[patent_app_type] => utility
[patent_app_number] => 12/892733
[patent_app_country] => US
[patent_app_date] => 2010-09-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5026
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0013/20110013163.pdf
[firstpage_image] =>[orig_patent_app_number] => 12892733
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/892733 | Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements | Sep 27, 2010 | Issued |
Array
(
[id] => 8577482
[patent_doc_number] => 08343692
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-01-01
[patent_title] => 'Exposure apparatus inspection mask and exposure apparatus inspection method'
[patent_app_type] => utility
[patent_app_number] => 12/886157
[patent_app_country] => US
[patent_app_date] => 2010-09-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 18
[patent_no_of_words] => 9165
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 140
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12886157
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/886157 | Exposure apparatus inspection mask and exposure apparatus inspection method | Sep 19, 2010 | Issued |
Array
(
[id] => 9254364
[patent_doc_number] => 08617775
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-12-31
[patent_title] => 'Optimized mask design for fabricating periodic and quasi-periodic patterns'
[patent_app_type] => utility
[patent_app_number] => 13/509642
[patent_app_country] => US
[patent_app_date] => 2010-09-14
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 24
[patent_no_of_words] => 7763
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 125
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13509642
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/509642 | Optimized mask design for fabricating periodic and quasi-periodic patterns | Sep 13, 2010 | Issued |
Array
(
[id] => 6202244
[patent_doc_number] => 20110065030
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-17
[patent_title] => 'MASK PATTERN DETERMINING METHOD, MASK MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD'
[patent_app_type] => utility
[patent_app_number] => 12/880507
[patent_app_country] => US
[patent_app_date] => 2010-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 6287
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0065/20110065030.pdf
[firstpage_image] =>[orig_patent_app_number] => 12880507
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/880507 | MASK PATTERN DETERMINING METHOD, MASK MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD | Sep 12, 2010 | Abandoned |
Array
(
[id] => 6118984
[patent_doc_number] => 20110076599
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-31
[patent_title] => 'APPARATUS AND METHOD FOR ALIGNING MASK'
[patent_app_type] => utility
[patent_app_number] => 12/880226
[patent_app_country] => US
[patent_app_date] => 2010-09-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 4940
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0076/20110076599.pdf
[firstpage_image] =>[orig_patent_app_number] => 12880226
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/880226 | Apparatus and method for aligning mask | Sep 12, 2010 | Issued |
Array
(
[id] => 6346144
[patent_doc_number] => 20100330469
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-30
[patent_title] => 'Overlay Target for Polarized Light Lithography'
[patent_app_type] => utility
[patent_app_number] => 12/876526
[patent_app_country] => US
[patent_app_date] => 2010-09-07
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4817
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0330/20100330469.pdf
[firstpage_image] =>[orig_patent_app_number] => 12876526
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/876526 | Overlay target for polarized light lithography | Sep 6, 2010 | Issued |
Array
(
[id] => 6202242
[patent_doc_number] => 20110065028
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-17
[patent_title] => 'PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE'
[patent_app_type] => utility
[patent_app_number] => 12/874756
[patent_app_country] => US
[patent_app_date] => 2010-09-02
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 8277
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0065/20110065028.pdf
[firstpage_image] =>[orig_patent_app_number] => 12874756
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/874756 | PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | Sep 1, 2010 | Abandoned |
Array
(
[id] => 7790862
[patent_doc_number] => 20120052418
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-01
[patent_title] => 'METHOD FOR OPTIMIZING SOURCE AND MASK TO CONTROL LINE WIDTH ROUGHNESS AND IMAGE LOG SLOPE'
[patent_app_type] => utility
[patent_app_number] => 12/872312
[patent_app_country] => US
[patent_app_date] => 2010-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 9
[patent_no_of_words] => 11843
[patent_no_of_claims] => 48
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0052/20120052418.pdf
[firstpage_image] =>[orig_patent_app_number] => 12872312
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/872312 | Method for optimizing source and mask to control line width roughness and image log slope | Aug 30, 2010 | Issued |
Array
(
[id] => 7790866
[patent_doc_number] => 20120052422
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-03-01
[patent_title] => 'MASK-SHIFT-AWARE RC EXTRACTION FOR DOUBLE PATTERNING DESIGN'
[patent_app_type] => utility
[patent_app_number] => 12/872938
[patent_app_country] => US
[patent_app_date] => 2010-08-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 3871
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0052/20120052422.pdf
[firstpage_image] =>[orig_patent_app_number] => 12872938
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/872938 | Mask-shift-aware RC extraction for double patterning design | Aug 30, 2010 | Issued |
Array
(
[id] => 6024762
[patent_doc_number] => 20110053088
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2011-03-03
[patent_title] => 'ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD'
[patent_app_type] => utility
[patent_app_number] => 12/868215
[patent_app_country] => US
[patent_app_date] => 2010-08-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 6125
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0053/20110053088.pdf
[firstpage_image] =>[orig_patent_app_number] => 12868215
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/868215 | ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD | Aug 24, 2010 | Abandoned |
Array
(
[id] => 6381511
[patent_doc_number] => 20100316802
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-12-16
[patent_title] => 'OVER-COATING AGENT FOR FORMING FINE PATTERNS AND A METHOD OF FORMING FINE PATTERNS USING SUCH AGENT'
[patent_app_type] => utility
[patent_app_number] => 12/862130
[patent_app_country] => US
[patent_app_date] => 2010-08-24
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 0
[patent_figures_cnt] => 0
[patent_no_of_words] => 6247
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0316/20100316802.pdf
[firstpage_image] =>[orig_patent_app_number] => 12862130
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/862130 | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent | Aug 23, 2010 | Issued |
Array
(
[id] => 8725290
[patent_doc_number] => 08404404
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-03-26
[patent_title] => 'Method and system for manufacturing a surface using character projection lithography with variable magnification'
[patent_app_type] => utility
[patent_app_number] => 12/860814
[patent_app_country] => US
[patent_app_date] => 2010-08-20
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 12
[patent_no_of_words] => 6345
[patent_no_of_claims] => 12
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 55
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12860814
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/860814 | Method and system for manufacturing a surface using character projection lithography with variable magnification | Aug 19, 2010 | Issued |
Array
(
[id] => 7777073
[patent_doc_number] => 20120040280
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-02-16
[patent_title] => 'Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography'
[patent_app_type] => utility
[patent_app_number] => 12/856208
[patent_app_country] => US
[patent_app_date] => 2010-08-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 10
[patent_no_of_words] => 6765
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0040/20120040280.pdf
[firstpage_image] =>[orig_patent_app_number] => 12856208
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/856208 | Simultaneous optical proximity correction and decomposition for double exposure lithography | Aug 12, 2010 | Issued |
Array
(
[id] => 9299572
[patent_doc_number] => 08647797
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2014-02-11
[patent_title] => 'Methos and device for keeping mask dimensions constant'
[patent_app_type] => utility
[patent_app_number] => 13/261175
[patent_app_country] => US
[patent_app_date] => 2010-08-06
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
[patent_figures_cnt] => 2
[patent_no_of_words] => 3076
[patent_no_of_claims] => 29
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 82
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13261175
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/261175 | Methos and device for keeping mask dimensions constant | Aug 5, 2010 | Issued |
Array
(
[id] => 8114199
[patent_doc_number] => 08158312
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-04-17
[patent_title] => 'Exposure method using charged particle beam'
[patent_app_type] => utility
[patent_app_number] => 12/846243
[patent_app_country] => US
[patent_app_date] => 2010-07-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 40
[patent_figures_cnt] => 50
[patent_no_of_words] => 11502
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 177
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/158/08158312.pdf
[firstpage_image] =>[orig_patent_app_number] => 12846243
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/846243 | Exposure method using charged particle beam | Jul 28, 2010 | Issued |
Array
(
[id] => 8446014
[patent_doc_number] => 08288063
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-10-16
[patent_title] => 'Defense system in advanced process control'
[patent_app_type] => utility
[patent_app_number] => 12/844507
[patent_app_country] => US
[patent_app_date] => 2010-07-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 5
[patent_no_of_words] => 3206
[patent_no_of_claims] => 19
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 81
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12844507
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/844507 | Defense system in advanced process control | Jul 26, 2010 | Issued |
Array
(
[id] => 6444750
[patent_doc_number] => 20100283052
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2010-11-11
[patent_title] => 'Metrology Systems and Methods for Lithography Processes'
[patent_app_type] => utility
[patent_app_number] => 12/842630
[patent_app_country] => US
[patent_app_date] => 2010-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 5
[patent_figures_cnt] => 5
[patent_no_of_words] => 8606
[patent_no_of_claims] => 23
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0283/20100283052.pdf
[firstpage_image] =>[orig_patent_app_number] => 12842630
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/842630 | Metrology systems and methods for lithography processes | Jul 22, 2010 | Issued |
Array
(
[id] => 8277722
[patent_doc_number] => 20120171600
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2012-07-05
[patent_title] => 'Time Differential Reticle Inspection'
[patent_app_type] => utility
[patent_app_number] => 13/378811
[patent_app_country] => US
[patent_app_date] => 2010-07-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 7408
[patent_no_of_claims] => 21
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 13378811
[rel_patent_id] =>[rel_patent_doc_number] =>) 13/378811 | Time differential reticle inspection | Jul 15, 2010 | Issued |
Array
(
[id] => 8642304
[patent_doc_number] => 08367284
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2013-02-05
[patent_title] => 'Exposure device, exposure method, and method for manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 12/834443
[patent_app_country] => US
[patent_app_date] => 2010-07-12
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 10
[patent_figures_cnt] => 18
[patent_no_of_words] => 12049
[patent_no_of_claims] => 3
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 197
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 12834443
[rel_patent_id] =>[rel_patent_doc_number] =>) 12/834443 | Exposure device, exposure method, and method for manufacturing semiconductor device | Jul 11, 2010 | Issued |