
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4566591
[patent_doc_number] => 07858276
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2010-12-28
[patent_title] => 'Method for determining suitability of a resist in semiconductor wafer fabrication'
[patent_app_type] => utility
[patent_app_number] => 11/825448
[patent_app_country] => US
[patent_app_date] => 2007-07-06
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[pdf_file] => patents/07/858/07858276.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/825448 | Method for determining suitability of a resist in semiconductor wafer fabrication | Jul 5, 2007 | Issued |
Array
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[patent_doc_number] => 20070254219
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[patent_kind] => A1
[patent_issue_date] => 2007-11-01
[patent_title] => 'Photomask, method for producing the same, and method for forming pattern using the photomask'
[patent_app_type] => utility
[patent_app_number] => 11/819367
[patent_app_country] => US
[patent_app_date] => 2007-06-27
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Array
(
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[patent_doc_number] => 20090004572
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[patent_kind] => A1
[patent_issue_date] => 2009-01-01
[patent_title] => 'METHOD OF MONITORING FOCUS IN LITHOGRAPHIC PROCESSES'
[patent_app_type] => utility
[patent_app_number] => 11/769436
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/769436 | Method of monitoring focus in lithographic processes | Jun 26, 2007 | Issued |
Array
(
[id] => 5313182
[patent_doc_number] => 20090277780
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[patent_issue_date] => 2009-11-12
[patent_title] => 'SPUTTERING DEVICE'
[patent_app_type] => utility
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[patent_app_country] => US
[patent_app_date] => 2007-06-26
[patent_effective_date] => 0000-00-00
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/306671 | SPUTTERING DEVICE | Jun 25, 2007 | Abandoned |
Array
(
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[patent_title] => 'Space tolerance with stitching'
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Array
(
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[patent_title] => 'Method for making a relief printing form'
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Array
(
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[patent_title] => 'Methods of measuring critical dimensions and related devices'
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[pdf_file] => patents/07/803/07803506.pdf
[firstpage_image] =>[orig_patent_app_number] => 11811979
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/811979 | Methods of measuring critical dimensions and related devices | Jun 12, 2007 | Issued |
Array
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[id] => 5165492
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[patent_issue_date] => 2007-12-13
[patent_title] => 'Reticle, semiconductor die and method of manufacturing semiconductor device'
[patent_app_type] => utility
[patent_app_number] => 11/808269
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Array
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[id] => 5352643
[patent_doc_number] => 20090183987
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[patent_issue_date] => 2009-07-23
[patent_title] => 'Sputter Target Having a Sputter Material Based on TiO2 and Production Method'
[patent_app_type] => utility
[patent_app_number] => 12/302302
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[rel_patent_id] =>[rel_patent_doc_number] =>) 12/302302 | Sputter Target Having a Sputter Material Based on TiO2 and Production Method | Jun 5, 2007 | Abandoned |
Array
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[patent_title] => 'APERTURE MASK, MANUFACTURING METHOD THEREOF, CHARGE BEAM LITHOGRAPHY APPARATUS, AND CHARGE BEAM LITHOGRAPHY METHOD'
[patent_app_type] => utility
[patent_app_number] => 11/758898
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Array
(
[id] => 5088654
[patent_doc_number] => 20070228293
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[patent_issue_date] => 2007-10-04
[patent_title] => 'PATTERN WRITING AND FORMING METHOD'
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Array
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Array
(
[id] => 5010742
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[patent_title] => 'STENCIL MASK'
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[firstpage_image] =>[orig_patent_app_number] => 11755707
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/755707 | STENCIL MASK | May 29, 2007 | Abandoned |
Array
(
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Array
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Array
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