
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 4682177
[patent_doc_number] => 20080248403
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2008-10-09
[patent_title] => 'METHOD AND SYSTEM FOR IMPROVING CRITICAL DIMENSION UNIFORMITY'
[patent_app_type] => utility
[patent_app_number] => 11/696602
[patent_app_country] => US
[patent_app_date] => 2007-04-04
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[pdf_file] => publications/A1/0248/20080248403.pdf
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/696602 | Method and system for improving critical dimension uniformity | Apr 3, 2007 | Issued |
Array
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[patent_doc_number] => 07323278
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[patent_kind] => B2
[patent_issue_date] => 2008-01-29
[patent_title] => 'Method of adding fabrication monitors to integrated circuit chips'
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Array
(
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[patent_issue_date] => 2007-09-20
[patent_title] => 'Manufacturing method of semiconductor device, reticle correcting method, and reticle pattern data correcting method'
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Array
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[patent_title] => 'Test pattern and method of evaluating the transfer properties of a test pattern'
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Array
(
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Array
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[patent_title] => 'Photomask formation method, photomask, and semiconductor device fabrication method'
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Array
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/709856 | Exposure apparatus and method for producing device | Feb 22, 2007 | Issued |
Array
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[patent_title] => 'Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves'
[patent_app_type] => utility
[patent_app_number] => 11/676959
[patent_app_country] => US
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/676959 | Systems and methods for determination of focus and telecentricity, amelioration of metrology induced effects and application to determination of precision bossung curves | Feb 19, 2007 | Issued |
Array
(
[id] => 141550
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[patent_title] => 'Multiple exposure lithography technique and method'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/675529 | Multiple exposure lithography technique and method | Feb 14, 2007 | Issued |
Array
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[patent_title] => 'METHOD AND APPARATUS FOR CONTROLLING LIGHT INTENSITY AND FOR EXPOSING A SEMICONDUCTOR SUBSTRATE'
[patent_app_type] => utility
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/675016 | METHOD AND APPARATUS FOR CONTROLLING LIGHT INTENSITY AND FOR EXPOSING A SEMICONDUCTOR SUBSTRATE | Feb 13, 2007 | Abandoned |
Array
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[patent_title] => 'Exposure mask, method of forming resist pattern and method of forming thin film pattern'
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Array
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Array
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Array
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Array
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Array
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Array
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