Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 4938726 [patent_doc_number] => 20080076045 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-03-27 [patent_title] => 'METHODS AND APPARATUS FOR CHANGING THE OPTICAL PROPERTIES OF RESISTS' [patent_app_type] => utility [patent_app_number] => 11/535247 [patent_app_country] => US [patent_app_date] => 2006-09-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 35018 [patent_no_of_claims] => 44 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20080076045.pdf [firstpage_image] =>[orig_patent_app_number] => 11535247 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/535247
Methods and apparatus for changing the optical properties of resists Sep 25, 2006 Issued
Array ( [id] => 797873 [patent_doc_number] => 07427459 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-09-23 [patent_title] => 'Recticle pattern applied to mix-and-match lithography process and alignment method of thereof' [patent_app_type] => utility [patent_app_number] => 11/533770 [patent_app_country] => US [patent_app_date] => 2006-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 8 [patent_no_of_words] => 4611 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 304 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/427/07427459.pdf [firstpage_image] =>[orig_patent_app_number] => 11533770 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/533770
Recticle pattern applied to mix-and-match lithography process and alignment method of thereof Sep 20, 2006 Issued
Array ( [id] => 4938718 [patent_doc_number] => 20080076037 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-03-27 [patent_title] => 'PHOTOMASK WITH ALIGNMENT MARKS FOR THE CURRENT LAYER' [patent_app_type] => utility [patent_app_number] => 11/533944 [patent_app_country] => US [patent_app_date] => 2006-09-21 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 3069 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20080076037.pdf [firstpage_image] =>[orig_patent_app_number] => 11533944 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/533944
Photomask with alignment marks for the current layer Sep 20, 2006 Issued
Array ( [id] => 5446360 [patent_doc_number] => 20090047586 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-02-19 [patent_title] => 'SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM' [patent_app_type] => utility [patent_app_number] => 12/065809 [patent_app_country] => US [patent_app_date] => 2006-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 7611 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0047/20090047586.pdf [firstpage_image] =>[orig_patent_app_number] => 12065809 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/065809
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Sep 12, 2006 Issued
Array ( [id] => 5585346 [patent_doc_number] => 20090104548 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-04-23 [patent_title] => 'SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM' [patent_app_type] => utility [patent_app_number] => 12/065829 [patent_app_country] => US [patent_app_date] => 2006-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 6731 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0104/20090104548.pdf [firstpage_image] =>[orig_patent_app_number] => 12065829 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/065829
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Sep 12, 2006 Issued
Array ( [id] => 5502071 [patent_doc_number] => 20090162759 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2009-06-25 [patent_title] => 'SUBSTRATE-PROCESSING APPARATUS, SUBSTRATE-PROCESSING METHOD, SUBSTRATE-PROCESSING PROGRAM, AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH SUCH PROGRAM' [patent_app_type] => utility [patent_app_number] => 12/065782 [patent_app_country] => US [patent_app_date] => 2006-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 8918 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0162/20090162759.pdf [firstpage_image] =>[orig_patent_app_number] => 12065782 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/065782
Substrate-processing apparatus, substrate-processing method, substrate-processing program, and computer-readable recording medium recorded with such program Sep 12, 2006 Issued
Array ( [id] => 5141658 [patent_doc_number] => 20070003874 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-01-04 [patent_title] => 'Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system' [patent_app_type] => utility [patent_app_number] => 11/516192 [patent_app_country] => US [patent_app_date] => 2006-09-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 5364 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20070003874.pdf [firstpage_image] =>[orig_patent_app_number] => 11516192 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/516192
Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system Sep 5, 2006 Issued
Array ( [id] => 250639 [patent_doc_number] => 07582395 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-09-01 [patent_title] => 'Overlay mark' [patent_app_type] => utility [patent_app_number] => 11/513288 [patent_app_country] => US [patent_app_date] => 2006-08-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 9 [patent_no_of_words] => 2148 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 115 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/582/07582395.pdf [firstpage_image] =>[orig_patent_app_number] => 11513288 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/513288
Overlay mark Aug 30, 2006 Issued
Array ( [id] => 132236 [patent_doc_number] => 07695876 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-04-13 [patent_title] => 'Method for identifying and using process window signature patterns for lithography process control' [patent_app_type] => utility [patent_app_number] => 11/466978 [patent_app_country] => US [patent_app_date] => 2006-08-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 13 [patent_no_of_words] => 15095 [patent_no_of_claims] => 26 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/695/07695876.pdf [firstpage_image] =>[orig_patent_app_number] => 11466978 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/466978
Method for identifying and using process window signature patterns for lithography process control Aug 23, 2006 Issued
Array ( [id] => 5236392 [patent_doc_number] => 20070128549 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-06-07 [patent_title] => 'Method of fabricating nanoimprint mold' [patent_app_type] => utility [patent_app_number] => 11/505395 [patent_app_country] => US [patent_app_date] => 2006-08-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3645 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0128/20070128549.pdf [firstpage_image] =>[orig_patent_app_number] => 11505395 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/505395
Method of fabricating nanoimprint mold Aug 16, 2006 Issued
Array ( [id] => 184830 [patent_doc_number] => 07648809 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-01-19 [patent_title] => 'Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product' [patent_app_type] => utility [patent_app_number] => 11/504666 [patent_app_country] => US [patent_app_date] => 2006-08-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 29 [patent_no_of_words] => 9927 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 168 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/648/07648809.pdf [firstpage_image] =>[orig_patent_app_number] => 11504666 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/504666
Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program product Aug 15, 2006 Issued
Array ( [id] => 4669681 [patent_doc_number] => 20080044741 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2008-02-21 [patent_title] => 'Metrology systems and methods for lithography processes' [patent_app_type] => utility [patent_app_number] => 11/504388 [patent_app_country] => US [patent_app_date] => 2006-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 8574 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0044/20080044741.pdf [firstpage_image] =>[orig_patent_app_number] => 11504388 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/504388
Metrology systems and methods for lithography processes Aug 14, 2006 Issued
Array ( [id] => 5105336 [patent_doc_number] => 20070064211 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-22 [patent_title] => 'Exposure operation evaluation method for exposure apparatus and manufacturing method for semiconductor device' [patent_app_type] => utility [patent_app_number] => 11/502771 [patent_app_country] => US [patent_app_date] => 2006-08-11 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 13139 [patent_no_of_claims] => 30 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0064/20070064211.pdf [firstpage_image] =>[orig_patent_app_number] => 11502771 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/502771
Exposure operation evaluation method for exposure apparatus and manufacturing method for semiconductor device Aug 10, 2006 Issued
Array ( [id] => 5608337 [patent_doc_number] => 20060269853 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-30 [patent_title] => 'Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect' [patent_app_type] => utility [patent_app_number] => 11/499212 [patent_app_country] => US [patent_app_date] => 2006-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4185 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 16 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20060269853.pdf [firstpage_image] =>[orig_patent_app_number] => 11499212 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/499212
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Aug 3, 2006 Issued
Array ( [id] => 5608336 [patent_doc_number] => 20060269852 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-30 [patent_title] => 'Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect' [patent_app_type] => utility [patent_app_number] => 11/498376 [patent_app_country] => US [patent_app_date] => 2006-08-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 4186 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 10 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0269/20060269852.pdf [firstpage_image] =>[orig_patent_app_number] => 11498376 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/498376
Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect Aug 2, 2006 Issued
Array ( [id] => 574705 [patent_doc_number] => 07455939 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-11-25 [patent_title] => 'Method of improving grating test pattern for lithography monitoring and controlling' [patent_app_type] => utility [patent_app_number] => 11/461217 [patent_app_country] => US [patent_app_date] => 2006-07-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 15 [patent_figures_cnt] => 15 [patent_no_of_words] => 7092 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 90 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/455/07455939.pdf [firstpage_image] =>[orig_patent_app_number] => 11461217 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/461217
Method of improving grating test pattern for lithography monitoring and controlling Jul 30, 2006 Issued
Array ( [id] => 5152834 [patent_doc_number] => 20070035716 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-02-15 [patent_title] => 'EXPOSURE METHOD' [patent_app_type] => utility [patent_app_number] => 11/460663 [patent_app_country] => US [patent_app_date] => 2006-07-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 14 [patent_no_of_words] => 5840 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20070035716.pdf [firstpage_image] =>[orig_patent_app_number] => 11460663 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/460663
EXPOSURE METHOD Jul 27, 2006 Abandoned
Array ( [id] => 4999642 [patent_doc_number] => 20070042276 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-02-22 [patent_title] => 'Lithography apparatus and method for using the same' [patent_app_type] => utility [patent_app_number] => 11/481638 [patent_app_country] => US [patent_app_date] => 2006-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 2630 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0042/20070042276.pdf [firstpage_image] =>[orig_patent_app_number] => 11481638 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/481638
Lithography apparatus and method for using the same Jul 4, 2006 Abandoned
Array ( [id] => 4994470 [patent_doc_number] => 20070009815 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-01-11 [patent_title] => 'METHOD OF WAFER EDGE EXPOSURE' [patent_app_type] => utility [patent_app_number] => 11/428797 [patent_app_country] => US [patent_app_date] => 2006-07-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 3013 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0009/20070009815.pdf [firstpage_image] =>[orig_patent_app_number] => 11428797 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/428797
METHOD OF WAFER EDGE EXPOSURE Jul 4, 2006 Abandoned
Array ( [id] => 852820 [patent_doc_number] => 07378201 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-05-27 [patent_title] => 'Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device' [patent_app_type] => utility [patent_app_number] => 11/478650 [patent_app_country] => US [patent_app_date] => 2006-07-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 26 [patent_no_of_words] => 9009 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 96 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/378/07378201.pdf [firstpage_image] =>[orig_patent_app_number] => 11478650 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/478650
Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device Jul 2, 2006 Issued
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