
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 7488305
[patent_doc_number] => 08029655
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-10-04
[patent_title] => 'Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film'
[patent_app_type] => utility
[patent_app_number] => 11/996550
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[pdf_file] => patents/08/029/08029655.pdf
[firstpage_image] =>[orig_patent_app_number] => 11996550
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/996550 | Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film | Jul 2, 2006 | Issued |
Array
(
[id] => 5199011
[patent_doc_number] => 20070298329
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[patent_kind] => A1
[patent_issue_date] => 2007-12-27
[patent_title] => 'PHOTOMASK AND METHOD FOR USING THE SAME'
[patent_app_type] => utility
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Array
(
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[patent_kind] => A1
[patent_issue_date] => 2007-12-20
[patent_title] => 'Method and apparatus for determining whether a sub-resolution assist feature will print'
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[patent_app_number] => 11/454439
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[patent_app_date] => 2006-06-15
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[rel_patent_id] =>[rel_patent_doc_number] =>) 11/454439 | Method and apparatus for determining whether a sub-resolution assist feature will print | Jun 14, 2006 | Issued |
Array
(
[id] => 809796
[patent_doc_number] => 07416819
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[patent_issue_date] => 2008-08-26
[patent_title] => 'Test mask for optical and electron optical systems'
[patent_app_type] => utility
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Array
(
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[patent_title] => 'Lithography process optimization and system'
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Array
(
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[patent_title] => 'Nanopastes for use as patterning compositions'
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Array
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[patent_title] => 'Phase difference specifying method'
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Array
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[patent_title] => 'Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout'
[patent_app_type] => utility
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Array
(
[id] => 864076
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[patent_title] => 'Measuring phase errors on phase shift masks'
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Array
(
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[patent_title] => 'Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers'
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[patent_app_number] => 11/420217
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Array
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[patent_title] => 'METHOD AND SYSTEM FOR AUTOMATICALLY DETECTING EXPOSED SUBSTRATES HAVING A HIGH PROBABILITY FOR DEFOCUSED EXPOSURE FIELDS'
[patent_app_type] => utility
[patent_app_number] => 11/419852
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Array
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Array
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Array
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Array
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