Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 7488305 [patent_doc_number] => 08029655 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-10-04 [patent_title] => 'Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film' [patent_app_type] => utility [patent_app_number] => 11/996550 [patent_app_country] => US [patent_app_date] => 2006-07-03 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 6702 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 30 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/08/029/08029655.pdf [firstpage_image] =>[orig_patent_app_number] => 11996550 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/996550
Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film Jul 2, 2006 Issued
Array ( [id] => 5199011 [patent_doc_number] => 20070298329 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-12-27 [patent_title] => 'PHOTOMASK AND METHOD FOR USING THE SAME' [patent_app_type] => utility [patent_app_number] => 11/309096 [patent_app_country] => US [patent_app_date] => 2006-06-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 3236 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0298/20070298329.pdf [firstpage_image] =>[orig_patent_app_number] => 11309096 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/309096
PHOTOMASK AND METHOD FOR USING THE SAME Jun 21, 2006 Abandoned
Array ( [id] => 5230670 [patent_doc_number] => 20070292777 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-12-20 [patent_title] => 'Method and apparatus for determining whether a sub-resolution assist feature will print' [patent_app_type] => utility [patent_app_number] => 11/454439 [patent_app_country] => US [patent_app_date] => 2006-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 4104 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0292/20070292777.pdf [firstpage_image] =>[orig_patent_app_number] => 11454439 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/454439
Method and apparatus for determining whether a sub-resolution assist feature will print Jun 14, 2006 Issued
Array ( [id] => 809796 [patent_doc_number] => 07416819 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-08-26 [patent_title] => 'Test mask for optical and electron optical systems' [patent_app_type] => utility [patent_app_number] => 11/424500 [patent_app_country] => US [patent_app_date] => 2006-06-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 14 [patent_figures_cnt] => 25 [patent_no_of_words] => 3545 [patent_no_of_claims] => 32 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 61 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/416/07416819.pdf [firstpage_image] =>[orig_patent_app_number] => 11424500 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/424500
Test mask for optical and electron optical systems Jun 14, 2006 Issued
Array ( [id] => 299671 [patent_doc_number] => 07537870 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-05-26 [patent_title] => 'Lithography process optimization and system' [patent_app_type] => utility [patent_app_number] => 11/452865 [patent_app_country] => US [patent_app_date] => 2006-06-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 18 [patent_no_of_words] => 7763 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 98 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/537/07537870.pdf [firstpage_image] =>[orig_patent_app_number] => 11452865 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/452865
Lithography process optimization and system Jun 12, 2006 Issued
Array ( [id] => 5699964 [patent_doc_number] => 20060216648 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-09-28 [patent_title] => 'Nanopastes for use as patterning compositions' [patent_app_type] => utility [patent_app_number] => 11/444740 [patent_app_country] => US [patent_app_date] => 2006-06-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6379 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0216/20060216648.pdf [firstpage_image] =>[orig_patent_app_number] => 11444740 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/444740
Nanopastes for use as patterning compositions May 31, 2006 Issued
Array ( [id] => 523849 [patent_doc_number] => 07183025 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-02-27 [patent_title] => 'Phase difference specifying method' [patent_app_type] => utility [patent_app_number] => 11/420809 [patent_app_country] => US [patent_app_date] => 2006-05-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 19 [patent_figures_cnt] => 42 [patent_no_of_words] => 25975 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 236 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/183/07183025.pdf [firstpage_image] =>[orig_patent_app_number] => 11420809 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/420809
Phase difference specifying method May 29, 2006 Issued
Array ( [id] => 71218 [patent_doc_number] => 07754400 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-07-13 [patent_title] => 'Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout' [patent_app_type] => utility [patent_app_number] => 11/442036 [patent_app_country] => US [patent_app_date] => 2006-05-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 2989 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 19 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/754/07754400.pdf [firstpage_image] =>[orig_patent_app_number] => 11442036 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/442036
Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout May 25, 2006 Issued
Array ( [id] => 864076 [patent_doc_number] => 07368208 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2008-05-06 [patent_title] => 'Measuring phase errors on phase shift masks' [patent_app_type] => utility [patent_app_number] => 11/440562 [patent_app_country] => US [patent_app_date] => 2006-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 11 [patent_no_of_words] => 9143 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/368/07368208.pdf [firstpage_image] =>[orig_patent_app_number] => 11440562 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/440562
Measuring phase errors on phase shift masks May 23, 2006 Issued
Array ( [id] => 5085258 [patent_doc_number] => 20070275309 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-11-29 [patent_title] => 'Patterning A Single Integrated Circuit Layer Using Multiple Masks And Multiple Masking Layers' [patent_app_type] => utility [patent_app_number] => 11/420217 [patent_app_country] => US [patent_app_date] => 2006-05-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 9 [patent_no_of_words] => 5798 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0275/20070275309.pdf [firstpage_image] =>[orig_patent_app_number] => 11420217 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/420217
Patterning a single integrated circuit layer using multiple masks and multiple masking layers May 23, 2006 Issued
Array ( [id] => 5148576 [patent_doc_number] => 20070048635 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-01 [patent_title] => 'METHOD AND SYSTEM FOR AUTOMATICALLY DETECTING EXPOSED SUBSTRATES HAVING A HIGH PROBABILITY FOR DEFOCUSED EXPOSURE FIELDS' [patent_app_type] => utility [patent_app_number] => 11/419852 [patent_app_country] => US [patent_app_date] => 2006-05-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6544 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20070048635.pdf [firstpage_image] =>[orig_patent_app_number] => 11419852 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/419852
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields May 22, 2006 Issued
Array ( [id] => 860023 [patent_doc_number] => 07371489 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-05-13 [patent_title] => 'Photomask, method for detecting pattern defect of the same, and method for making pattern using the same' [patent_app_type] => utility [patent_app_number] => 11/437628 [patent_app_country] => US [patent_app_date] => 2006-05-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 22 [patent_no_of_words] => 5554 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 207 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/371/07371489.pdf [firstpage_image] =>[orig_patent_app_number] => 11437628 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/437628
Photomask, method for detecting pattern defect of the same, and method for making pattern using the same May 21, 2006 Issued
Array ( [id] => 894430 [patent_doc_number] => 07341809 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-03-11 [patent_title] => 'Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation' [patent_app_type] => utility [patent_app_number] => 11/432963 [patent_app_country] => US [patent_app_date] => 2006-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 13 [patent_no_of_words] => 4776 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/341/07341809.pdf [firstpage_image] =>[orig_patent_app_number] => 11432963 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/432963
Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation May 11, 2006 Issued
Array ( [id] => 4432263 [patent_doc_number] => 07897308 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2011-03-01 [patent_title] => 'Method for transferring a predetermined pattern reducing proximity effects' [patent_app_type] => utility [patent_app_number] => 12/226973 [patent_app_country] => US [patent_app_date] => 2006-05-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 20 [patent_no_of_words] => 5303 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/897/07897308.pdf [firstpage_image] =>[orig_patent_app_number] => 12226973 [rel_patent_id] =>[rel_patent_doc_number] =>)
12/226973
Method for transferring a predetermined pattern reducing proximity effects May 4, 2006 Issued
Array ( [id] => 8328378 [patent_doc_number] => 08236467 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2012-08-07 [patent_title] => 'Exposure method, exposure apparatus, and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 11/919352 [patent_app_country] => US [patent_app_date] => 2006-04-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 20 [patent_figures_cnt] => 24 [patent_no_of_words] => 27036 [patent_no_of_claims] => 34 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] =>[firstpage_image] =>[orig_patent_app_number] => 11919352 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/919352
Exposure method, exposure apparatus, and device manufacturing method Apr 27, 2006 Issued
Array ( [id] => 393758 [patent_doc_number] => 07297450 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-11-20 [patent_title] => 'Optical proximity correction method' [patent_app_type] => utility [patent_app_number] => 11/380192 [patent_app_country] => US [patent_app_date] => 2006-04-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2089 [patent_no_of_claims] => 28 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 112 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/297/07297450.pdf [firstpage_image] =>[orig_patent_app_number] => 11380192 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/380192
Optical proximity correction method Apr 24, 2006 Issued
Array ( [id] => 816929 [patent_doc_number] => 07410737 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-08-12 [patent_title] => 'System and method for process variation monitor' [patent_app_type] => utility [patent_app_number] => 11/279920 [patent_app_country] => US [patent_app_date] => 2006-04-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 4 [patent_no_of_words] => 5157 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 48 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/410/07410737.pdf [firstpage_image] =>[orig_patent_app_number] => 11279920 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/279920
System and method for process variation monitor Apr 16, 2006 Issued
Array ( [id] => 448248 [patent_doc_number] => 07250248 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-07-31 [patent_title] => 'Method for forming pattern using a photomask' [patent_app_type] => utility [patent_app_number] => 11/402947 [patent_app_country] => US [patent_app_date] => 2006-04-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 27 [patent_figures_cnt] => 129 [patent_no_of_words] => 29540 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 264 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/250/07250248.pdf [firstpage_image] =>[orig_patent_app_number] => 11402947 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/402947
Method for forming pattern using a photomask Apr 12, 2006 Issued
Array ( [id] => 5125756 [patent_doc_number] => 20070238027 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-10-11 [patent_title] => 'METHOD FOR GENERATING ALIGNMENT MARKS AND RELATED MASKS THEREOF' [patent_app_type] => utility [patent_app_number] => 11/278957 [patent_app_country] => US [patent_app_date] => 2006-04-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2062 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0238/20070238027.pdf [firstpage_image] =>[orig_patent_app_number] => 11278957 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/278957
METHOD FOR GENERATING ALIGNMENT MARKS AND RELATED MASKS THEREOF Apr 5, 2006 Abandoned
Array ( [id] => 5922001 [patent_doc_number] => 20060240336 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-10-26 [patent_title] => 'Systems and methods for mitigating variances on a patterned wafer using a prediction model' [patent_app_type] => utility [patent_app_number] => 11/394900 [patent_app_country] => US [patent_app_date] => 2006-03-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 7158 [patent_no_of_claims] => 10 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0240/20060240336.pdf [firstpage_image] =>[orig_patent_app_number] => 11394900 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/394900
Systems and methods for mitigating variances on a patterned wafer using a prediction model Mar 30, 2006 Issued
Menu