Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 5834529 [patent_doc_number] => 20060246359 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-02 [patent_title] => 'Semiconductor device, fabricating method thereof, and photomask' [patent_app_type] => utility [patent_app_number] => 11/291318 [patent_app_country] => US [patent_app_date] => 2005-11-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 17 [patent_no_of_words] => 6679 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0246/20060246359.pdf [firstpage_image] =>[orig_patent_app_number] => 11291318 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/291318
Semiconductor device, fabricating method thereof, and photomask Nov 29, 2005 Issued
Array ( [id] => 5720641 [patent_doc_number] => 20060073416 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-04-06 [patent_title] => 'Mechanically robust interconnect for low-k dielectric material using post treatment' [patent_app_type] => utility [patent_app_number] => 11/286783 [patent_app_country] => US [patent_app_date] => 2005-11-22 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 12 [patent_no_of_words] => 4404 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0073/20060073416.pdf [firstpage_image] =>[orig_patent_app_number] => 11286783 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/286783
Mechanically robust interconnect for low-k dielectric material using post treatment Nov 21, 2005 Issued
Array ( [id] => 292160 [patent_doc_number] => 07544449 [patent_country] => US [patent_kind] => B1 [patent_issue_date] => 2009-06-09 [patent_title] => 'Method and apparatus for measurement of crossfield chromatic response of projection imaging systems' [patent_app_type] => utility [patent_app_number] => 11/280531 [patent_app_country] => US [patent_app_date] => 2005-11-14 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 23 [patent_no_of_words] => 9055 [patent_no_of_claims] => 31 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 67 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/544/07544449.pdf [firstpage_image] =>[orig_patent_app_number] => 11280531 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/280531
Method and apparatus for measurement of crossfield chromatic response of projection imaging systems Nov 13, 2005 Issued
Array ( [id] => 432136 [patent_doc_number] => 07264909 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-09-04 [patent_title] => 'Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same' [patent_app_type] => utility [patent_app_number] => 11/268526 [patent_app_country] => US [patent_app_date] => 2005-11-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 36 [patent_no_of_words] => 8910 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 186 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/264/07264909.pdf [firstpage_image] =>[orig_patent_app_number] => 11268526 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/268526
Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same Nov 7, 2005 Issued
Array ( [id] => 5707793 [patent_doc_number] => 20060049137 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-09 [patent_title] => 'Multi-step process for etching photomasks' [patent_app_type] => utility [patent_app_number] => 11/264189 [patent_app_country] => US [patent_app_date] => 2005-10-31 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 7414 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0049/20060049137.pdf [firstpage_image] =>[orig_patent_app_number] => 11264189 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/264189
Multi-step process for etching photomasks Oct 30, 2005 Issued
Array ( [id] => 612580 [patent_doc_number] => 07147976 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-12-12 [patent_title] => 'Binary OPC for assist feature layout optimization' [patent_app_type] => utility [patent_app_number] => 11/251981 [patent_app_country] => US [patent_app_date] => 2005-10-17 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 17 [patent_no_of_words] => 11736 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 153 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/147/07147976.pdf [firstpage_image] =>[orig_patent_app_number] => 11251981 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/251981
Binary OPC for assist feature layout optimization Oct 16, 2005 Issued
Array ( [id] => 5193796 [patent_doc_number] => 20070082280 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-04-12 [patent_title] => 'Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate' [patent_app_type] => utility [patent_app_number] => 11/247594 [patent_app_country] => US [patent_app_date] => 2005-10-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 7573 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0082/20070082280.pdf [firstpage_image] =>[orig_patent_app_number] => 11247594 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/247594
Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate Oct 11, 2005 Issued
Array ( [id] => 5193797 [patent_doc_number] => 20070082281 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-04-12 [patent_title] => 'Compensating for effects of topography variation by using a variable intensity-threshold' [patent_app_type] => utility [patent_app_number] => 11/254124 [patent_app_country] => US [patent_app_date] => 2005-10-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4206 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0082/20070082281.pdf [firstpage_image] =>[orig_patent_app_number] => 11254124 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/254124
Compensating for effects of topography variation by using a variable intensity-threshold Oct 6, 2005 Issued
Array ( [id] => 5637332 [patent_doc_number] => 20060068305 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-30 [patent_title] => 'Method for aligning exposure mask and method for manufacturing thin film device substrate' [patent_app_type] => utility [patent_app_number] => 11/235262 [patent_app_country] => US [patent_app_date] => 2005-09-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 5853 [patent_no_of_claims] => 5 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20060068305.pdf [firstpage_image] =>[orig_patent_app_number] => 11235262 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/235262
Method for aligning exposure mask and method for manufacturing thin film device substrate Sep 26, 2005 Issued
Array ( [id] => 210170 [patent_doc_number] => 07625679 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-12-01 [patent_title] => 'Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate' [patent_app_type] => utility [patent_app_number] => 11/233616 [patent_app_country] => US [patent_app_date] => 2005-09-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 5329 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 81 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/625/07625679.pdf [firstpage_image] =>[orig_patent_app_number] => 11233616 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/233616
Method of aligning a particle-beam-generated pattern to a pattern on a pre-patterned substrate Sep 22, 2005 Issued
Array ( [id] => 5106878 [patent_doc_number] => 20070065756 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-22 [patent_title] => 'HIGH SENSITIVITY ELECTRON BEAM RESIST PROCESSING' [patent_app_type] => utility [patent_app_number] => 11/229353 [patent_app_country] => US [patent_app_date] => 2005-09-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 4400 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0065/20070065756.pdf [firstpage_image] =>[orig_patent_app_number] => 11229353 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/229353
HIGH SENSITIVITY ELECTRON BEAM RESIST PROCESSING Sep 15, 2005 Abandoned
Array ( [id] => 5637331 [patent_doc_number] => 20060068304 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-30 [patent_title] => 'Alignment method of exposure mask and manufacturing method of thin film element substrate' [patent_app_type] => utility [patent_app_number] => 11/223956 [patent_app_country] => US [patent_app_date] => 2005-09-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 8 [patent_figures_cnt] => 8 [patent_no_of_words] => 6239 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0068/20060068304.pdf [firstpage_image] =>[orig_patent_app_number] => 11223956 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/223956
Alignment method of exposure mask and manufacturing method of thin film element substrate Sep 12, 2005 Issued
Array ( [id] => 800255 [patent_doc_number] => 07425397 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-09-16 [patent_title] => 'Method of determining an illumination profile and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 11/223154 [patent_app_country] => US [patent_app_date] => 2005-09-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 7 [patent_no_of_words] => 4581 [patent_no_of_claims] => 18 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 114 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/425/07425397.pdf [firstpage_image] =>[orig_patent_app_number] => 11223154 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/223154
Method of determining an illumination profile and device manufacturing method Sep 11, 2005 Issued
Array ( [id] => 5655661 [patent_doc_number] => 20060141396 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-06-29 [patent_title] => 'Electron beam lithography method using new material' [patent_app_type] => utility [patent_app_number] => 11/220697 [patent_app_country] => US [patent_app_date] => 2005-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 2581 [patent_no_of_claims] => 20 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0141/20060141396.pdf [firstpage_image] =>[orig_patent_app_number] => 11220697 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/220697
Electron beam lithography method using new material Sep 7, 2005 Issued
Array ( [id] => 314626 [patent_doc_number] => 07524595 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-04-28 [patent_title] => 'Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment' [patent_app_type] => utility [patent_app_number] => 11/223497 [patent_app_country] => US [patent_app_date] => 2005-09-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 4 [patent_no_of_words] => 1456 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 75 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/524/07524595.pdf [firstpage_image] =>[orig_patent_app_number] => 11223497 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/223497
Process for forming anti-reflection coating and method for improving accuracy of overlay measurement and alignment Sep 7, 2005 Issued
Array ( [id] => 5148570 [patent_doc_number] => 20070048629 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2007-03-01 [patent_title] => 'Overlay target for polarized light lithography' [patent_app_type] => utility [patent_app_number] => 11/218417 [patent_app_country] => US [patent_app_date] => 2005-09-01 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 4752 [patent_no_of_claims] => 23 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0048/20070048629.pdf [firstpage_image] =>[orig_patent_app_number] => 11218417 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/218417
Overlay target for polarized light lithography Aug 31, 2005 Issued
Array ( [id] => 585620 [patent_doc_number] => 07439001 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-10-21 [patent_title] => 'Focus blur measurement and control method' [patent_app_type] => utility [patent_app_number] => 11/206326 [patent_app_country] => US [patent_app_date] => 2005-08-18 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 14 [patent_no_of_words] => 5506 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 206 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/439/07439001.pdf [firstpage_image] =>[orig_patent_app_number] => 11206326 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/206326
Focus blur measurement and control method Aug 17, 2005 Issued
Array ( [id] => 5710364 [patent_doc_number] => 20060051709 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-03-09 [patent_title] => 'Exposure system and pattern formation method' [patent_app_type] => utility [patent_app_number] => 11/203161 [patent_app_country] => US [patent_app_date] => 2005-08-15 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 10 [patent_figures_cnt] => 10 [patent_no_of_words] => 4829 [patent_no_of_claims] => 27 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0051/20060051709.pdf [firstpage_image] =>[orig_patent_app_number] => 11203161 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/203161
Pattern formation method through liquid immersion lithography Aug 14, 2005 Issued
Array ( [id] => 369700 [patent_doc_number] => 07476473 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-13 [patent_title] => 'Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method' [patent_app_type] => utility [patent_app_number] => 11/198368 [patent_app_country] => US [patent_app_date] => 2005-08-08 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 21 [patent_no_of_words] => 6375 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 103 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/476/07476473.pdf [firstpage_image] =>[orig_patent_app_number] => 11198368 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/198368
Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method Aug 7, 2005 Issued
Array ( [id] => 141431 [patent_doc_number] => 07687211 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2010-03-30 [patent_title] => 'System and method for photolithography in semiconductor manufacturing' [patent_app_type] => utility [patent_app_number] => 11/193126 [patent_app_country] => US [patent_app_date] => 2005-07-29 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 3 [patent_no_of_words] => 1597 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 63 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/687/07687211.pdf [firstpage_image] =>[orig_patent_app_number] => 11193126 [rel_patent_id] =>[rel_patent_doc_number] =>)
11/193126
System and method for photolithography in semiconductor manufacturing Jul 28, 2005 Issued
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