
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 830007
[patent_doc_number] => 07399559
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-07-15
[patent_title] => 'Optical proximity correction method utilizing phase-edges as sub-resolution assist features'
[patent_app_type] => utility
[patent_app_number] => 11/188858
[patent_app_country] => US
[patent_app_date] => 2005-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 23
[patent_figures_cnt] => 24
[patent_no_of_words] => 8056
[patent_no_of_claims] => 18
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/399/07399559.pdf
[firstpage_image] =>[orig_patent_app_number] => 11188858
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/188858 | Optical proximity correction method utilizing phase-edges as sub-resolution assist features | Jul 25, 2005 | Issued |
Array
(
[id] => 472080
[patent_doc_number] => 07229743
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-06-12
[patent_title] => 'Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media'
[patent_app_type] => utility
[patent_app_number] => 11/170141
[patent_app_country] => US
[patent_app_date] => 2005-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
[patent_figures_cnt] => 19
[patent_no_of_words] => 15019
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 8
[patent_words_short_claim] => 183
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/229/07229743.pdf
[firstpage_image] =>[orig_patent_app_number] => 11170141
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/170141 | Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media | Jun 29, 2005 | Issued |
Array
(
[id] => 5893455
[patent_doc_number] => 20060001993
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-05
[patent_title] => 'Electron beam lithography method'
[patent_app_type] => utility
[patent_app_number] => 11/169575
[patent_app_country] => US
[patent_app_date] => 2005-06-30
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 5746
[patent_no_of_claims] => 11
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0001/20060001993.pdf
[firstpage_image] =>[orig_patent_app_number] => 11169575
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/169575 | Electron beam lithography method | Jun 29, 2005 | Issued |
Array
(
[id] => 5602118
[patent_doc_number] => 20060292463
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-28
[patent_title] => 'Device manufacturing method and a calibration substrate'
[patent_app_type] => utility
[patent_app_number] => 11/167578
[patent_app_country] => US
[patent_app_date] => 2005-06-28
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 8
[patent_figures_cnt] => 8
[patent_no_of_words] => 5576
[patent_no_of_claims] => 9
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0292/20060292463.pdf
[firstpage_image] =>[orig_patent_app_number] => 11167578
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/167578 | Device manufacturing method and a calibration substrate | Jun 27, 2005 | Issued |
Array
(
[id] => 459427
[patent_doc_number] => 07241542
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-07-10
[patent_title] => 'Process for controlling the proximity effect correction'
[patent_app_type] => utility
[patent_app_number] => 11/165312
[patent_app_country] => US
[patent_app_date] => 2005-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 24
[patent_figures_cnt] => 34
[patent_no_of_words] => 9265
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 158
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/241/07241542.pdf
[firstpage_image] =>[orig_patent_app_number] => 11165312
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/165312 | Process for controlling the proximity effect correction | Jun 22, 2005 | Issued |
Array
(
[id] => 587988
[patent_doc_number] => 07435517
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-14
[patent_title] => 'Method for reducing the fogging effect'
[patent_app_type] => utility
[patent_app_number] => 11/165500
[patent_app_country] => US
[patent_app_date] => 2005-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 25
[patent_figures_cnt] => 32
[patent_no_of_words] => 9094
[patent_no_of_claims] => 8
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 258
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/435/07435517.pdf
[firstpage_image] =>[orig_patent_app_number] => 11165500
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/165500 | Method for reducing the fogging effect | Jun 22, 2005 | Issued |
Array
(
[id] => 5602110
[patent_doc_number] => 20060292455
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-12-28
[patent_title] => 'METHOD FOR CHECKING PHASE SHIFT ANGLE OF PHASE SHIFT MASK, LITHOGRAPHY PROCESS AND PHASE SHIFT MASK'
[patent_app_type] => utility
[patent_app_number] => 11/160420
[patent_app_country] => US
[patent_app_date] => 2005-06-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 6
[patent_no_of_words] => 4218
[patent_no_of_claims] => 28
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0292/20060292455.pdf
[firstpage_image] =>[orig_patent_app_number] => 11160420
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/160420 | Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask | Jun 22, 2005 | Issued |
Array
(
[id] => 5894701
[patent_doc_number] => 20060003240
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-01-05
[patent_title] => 'Methods for adjusting light intensity for photolithography and related systems'
[patent_app_type] => utility
[patent_app_number] => 11/153787
[patent_app_country] => US
[patent_app_date] => 2005-06-15
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 7
[patent_no_of_words] => 5394
[patent_no_of_claims] => 20
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0003/20060003240.pdf
[firstpage_image] =>[orig_patent_app_number] => 11153787
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/153787 | Methods for adjusting light intensity for photolithography and related systems | Jun 14, 2005 | Abandoned |
| 11/141202 | Application of 2-dimensional photonic crystals in alignment devices | May 31, 2005 | Abandoned |
Array
(
[id] => 551426
[patent_doc_number] => 07160655
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-01-09
[patent_title] => 'Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same'
[patent_app_type] => utility
[patent_app_number] => 11/129868
[patent_app_country] => US
[patent_app_date] => 2005-05-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 20
[patent_no_of_words] => 7410
[patent_no_of_claims] => 5
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 128
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/160/07160655.pdf
[firstpage_image] =>[orig_patent_app_number] => 11129868
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/129868 | Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same | May 15, 2005 | Issued |
Array
(
[id] => 563483
[patent_doc_number] => 07465525
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-12-16
[patent_title] => 'Reticle alignment and overlay for multiple reticle process'
[patent_app_type] => utility
[patent_app_number] => 11/126466
[patent_app_country] => US
[patent_app_date] => 2005-05-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 32
[patent_no_of_words] => 7412
[patent_no_of_claims] => 17
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 25
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/465/07465525.pdf
[firstpage_image] =>[orig_patent_app_number] => 11126466
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/126466 | Reticle alignment and overlay for multiple reticle process | May 9, 2005 | Issued |
Array
(
[id] => 583631
[patent_doc_number] => 07442474
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2008-10-28
[patent_title] => 'Reticle for determining rotational error'
[patent_app_type] => utility
[patent_app_number] => 11/118132
[patent_app_country] => US
[patent_app_date] => 2005-04-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 16
[patent_no_of_words] => 14079
[patent_no_of_claims] => 14
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 80
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/442/07442474.pdf
[firstpage_image] =>[orig_patent_app_number] => 11118132
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/118132 | Reticle for determining rotational error | Apr 28, 2005 | Issued |
Array
(
[id] => 5776610
[patent_doc_number] => 20060105250
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-05-18
[patent_title] => 'Test photomask and compensation method using the same'
[patent_app_type] => utility
[patent_app_number] => 11/114448
[patent_app_country] => US
[patent_app_date] => 2005-04-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 3
[patent_figures_cnt] => 3
[patent_no_of_words] => 1945
[patent_no_of_claims] => 6
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0105/20060105250.pdf
[firstpage_image] =>[orig_patent_app_number] => 11114448
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/114448 | Test photomask and compensation method using the same | Apr 25, 2005 | Abandoned |
Array
(
[id] => 7751072
[patent_doc_number] => 08110322
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2012-02-07
[patent_title] => 'Method of mask forming and method of three-dimensional microfabrication'
[patent_app_type] => utility
[patent_app_number] => 11/912503
[patent_app_country] => US
[patent_app_date] => 2005-04-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 8
[patent_no_of_words] => 6178
[patent_no_of_claims] => 15
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 120
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/08/110/08110322.pdf
[firstpage_image] =>[orig_patent_app_number] => 11912503
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/912503 | Method of mask forming and method of three-dimensional microfabrication | Apr 24, 2005 | Issued |
Array
(
[id] => 299670
[patent_doc_number] => 07537869
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-05-26
[patent_title] => 'Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process'
[patent_app_type] => utility
[patent_app_number] => 11/108862
[patent_app_country] => US
[patent_app_date] => 2005-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 7
[patent_figures_cnt] => 29
[patent_no_of_words] => 8795
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 5
[patent_words_short_claim] => 135
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/537/07537869.pdf
[firstpage_image] =>[orig_patent_app_number] => 11108862
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/108862 | Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process | Apr 18, 2005 | Issued |
Array
(
[id] => 4498514
[patent_doc_number] => 07919218
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2011-04-05
[patent_title] => 'Method for a multiple exposure beams lithography tool'
[patent_app_type] => utility
[patent_app_number] => 11/918576
[patent_app_country] => US
[patent_app_date] => 2005-04-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
[patent_figures_cnt] => 9
[patent_no_of_words] => 6448
[patent_no_of_claims] => 13
[patent_no_of_ind_claims] => 3
[patent_words_short_claim] => 67
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/919/07919218.pdf
[firstpage_image] =>[orig_patent_app_number] => 11918576
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/918576 | Method for a multiple exposure beams lithography tool | Apr 18, 2005 | Issued |
Array
(
[id] => 415032
[patent_doc_number] => 07279259
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-09
[patent_title] => 'Method for correcting pattern data and method for manufacturing semiconductor device using same'
[patent_app_type] => utility
[patent_app_number] => 11/102689
[patent_app_country] => US
[patent_app_date] => 2005-04-11
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 22
[patent_figures_cnt] => 22
[patent_no_of_words] => 7726
[patent_no_of_claims] => 16
[patent_no_of_ind_claims] => 4
[patent_words_short_claim] => 133
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/279/07279259.pdf
[firstpage_image] =>[orig_patent_app_number] => 11102689
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/102689 | Method for correcting pattern data and method for manufacturing semiconductor device using same | Apr 10, 2005 | Issued |
Array
(
[id] => 7019185
[patent_doc_number] => 20050221204
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-10-06
[patent_title] => 'Electron beam writing method and lithography mask manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 11/094306
[patent_app_country] => US
[patent_app_date] => 2005-03-31
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
[patent_figures_cnt] => 4
[patent_no_of_words] => 9100
[patent_no_of_claims] => 25
[patent_no_of_ind_claims] => 6
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0221/20050221204.pdf
[firstpage_image] =>[orig_patent_app_number] => 11094306
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/094306 | Electron beam writing method and lithography mask manufacturing method | Mar 30, 2005 | Issued |
Array
(
[id] => 7066572
[patent_doc_number] => 20050242059
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-11-03
[patent_title] => 'Producing a substrate having high surface-area texturing'
[patent_app_type] => utility
[patent_app_number] => 11/092540
[patent_app_country] => US
[patent_app_date] => 2005-03-29
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 13
[patent_figures_cnt] => 13
[patent_no_of_words] => 13019
[patent_no_of_claims] => 32
[patent_no_of_ind_claims] => 2
[patent_words_short_claim] => 0
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => publication
[pdf_file] => publications/A1/0242/20050242059.pdf
[firstpage_image] =>[orig_patent_app_number] => 11092540
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/092540 | Producing a substrate having high surface-area texturing | Mar 28, 2005 | Issued |
Array
(
[id] => 532529
[patent_doc_number] => 07175945
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-02-13
[patent_title] => 'Focus masking structures, focus patterns and measurements thereof'
[patent_app_type] => utility
[patent_app_number] => 11/084556
[patent_app_country] => US
[patent_app_date] => 2005-03-16
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 20
[patent_figures_cnt] => 35
[patent_no_of_words] => 16545
[patent_no_of_claims] => 4
[patent_no_of_ind_claims] => 1
[patent_words_short_claim] => 168
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/175/07175945.pdf
[firstpage_image] =>[orig_patent_app_number] => 11084556
[rel_patent_id] =>[rel_patent_doc_number] =>) 11/084556 | Focus masking structures, focus patterns and measurements thereof | Mar 15, 2005 | Issued |