Search

Christopher G. Young

Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )

Most Active Art Unit
1756
Art Unit(s)
1721, 1737, 1752, 1113, 1506, 1756, 1795
Total Applications
2931
Issued Applications
2607
Pending Applications
32
Abandoned Applications
298

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 373192 [patent_doc_number] => 07473495 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-06 [patent_title] => 'Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product' [patent_app_type] => utility [patent_app_number] => 10/927218 [patent_app_country] => US [patent_app_date] => 2004-08-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 32 [patent_no_of_words] => 9695 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 7 [patent_words_short_claim] => 38 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/473/07473495.pdf [firstpage_image] =>[orig_patent_app_number] => 10927218 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/927218
Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product Aug 26, 2004 Issued
Array ( [id] => 7151178 [patent_doc_number] => 20050025279 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-03 [patent_title] => 'Non absorbing reticle and method of making same' [patent_app_type] => utility [patent_app_number] => 10/924874 [patent_app_country] => US [patent_app_date] => 2004-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 2410 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0025/20050025279.pdf [firstpage_image] =>[orig_patent_app_number] => 10924874 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/924874
Non absorbing reticle and method of making same Aug 24, 2004 Issued
Array ( [id] => 411298 [patent_doc_number] => 07282311 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-10-16 [patent_title] => 'Method of forming an integrated optical circuit' [patent_app_type] => utility [patent_app_number] => 10/921645 [patent_app_country] => US [patent_app_date] => 2004-08-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 12 [patent_figures_cnt] => 20 [patent_no_of_words] => 4337 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 143 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/282/07282311.pdf [firstpage_image] =>[orig_patent_app_number] => 10921645 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/921645
Method of forming an integrated optical circuit Aug 18, 2004 Issued
Array ( [id] => 7085132 [patent_doc_number] => 20050050512 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-03 [patent_title] => 'Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer' [patent_app_type] => utility [patent_app_number] => 10/917426 [patent_app_country] => US [patent_app_date] => 2004-08-13 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4518 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0050/20050050512.pdf [firstpage_image] =>[orig_patent_app_number] => 10917426 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/917426
Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer Aug 12, 2004 Issued
Array ( [id] => 5799907 [patent_doc_number] => 20060035159 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-02-16 [patent_title] => 'Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device' [patent_app_type] => utility [patent_app_number] => 10/914604 [patent_app_country] => US [patent_app_date] => 2004-08-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 5087 [patent_no_of_claims] => 25 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0035/20060035159.pdf [firstpage_image] =>[orig_patent_app_number] => 10914604 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/914604
Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device Aug 9, 2004 Abandoned
Array ( [id] => 5661564 [patent_doc_number] => 20060252160 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-11-09 [patent_title] => 'Electron beam exposure device and exposure method' [patent_app_type] => utility [patent_app_number] => 10/567828 [patent_app_country] => US [patent_app_date] => 2004-08-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 1772 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0252/20060252160.pdf [firstpage_image] =>[orig_patent_app_number] => 10567828 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/567828
Electron beam exposure device and exposure method Aug 8, 2004 Abandoned
Array ( [id] => 609308 [patent_doc_number] => 07150949 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-12-19 [patent_title] => 'Further method to pattern a substrate' [patent_app_type] => utility [patent_app_number] => 10/911412 [patent_app_country] => US [patent_app_date] => 2004-08-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 9 [patent_figures_cnt] => 19 [patent_no_of_words] => 9585 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/150/07150949.pdf [firstpage_image] =>[orig_patent_app_number] => 10911412 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/911412
Further method to pattern a substrate Aug 3, 2004 Issued
Array ( [id] => 373191 [patent_doc_number] => 07473494 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-01-06 [patent_title] => 'Exposure mask and mask pattern production method' [patent_app_type] => utility [patent_app_number] => 10/898809 [patent_app_country] => US [patent_app_date] => 2004-07-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 18 [patent_figures_cnt] => 22 [patent_no_of_words] => 8314 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 68 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/473/07473494.pdf [firstpage_image] =>[orig_patent_app_number] => 10898809 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/898809
Exposure mask and mask pattern production method Jul 25, 2004 Issued
Array ( [id] => 7025284 [patent_doc_number] => 20050019678 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-27 [patent_title] => 'Method of selecting photomask blank substrates' [patent_app_type] => utility [patent_app_number] => 10/897078 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 7462 [patent_no_of_claims] => 2 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0019/20050019678.pdf [firstpage_image] =>[orig_patent_app_number] => 10897078 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/897078
Method of selecting photomask blank substrates Jul 22, 2004 Issued
Array ( [id] => 352458 [patent_doc_number] => 07491478 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2009-02-17 [patent_title] => 'Lithographic apparatus and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/897398 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 4314 [patent_no_of_claims] => 21 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 43 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/491/07491478.pdf [firstpage_image] =>[orig_patent_app_number] => 10897398 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/897398
Lithographic apparatus and device manufacturing method Jul 22, 2004 Issued
Array ( [id] => 7060920 [patent_doc_number] => 20050003281 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-01-06 [patent_title] => 'Pattern mask with features to minimize the effect of aberrations' [patent_app_type] => utility [patent_app_number] => 10/896985 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 2809 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0003/20050003281.pdf [firstpage_image] =>[orig_patent_app_number] => 10896985 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/896985
Pattern mask with features to minimize the effect of aberrations Jul 22, 2004 Issued
Array ( [id] => 7127169 [patent_doc_number] => 20050058913 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-03-17 [patent_title] => 'Stencil mask, charged particle irradiation apparatus and the method' [patent_app_type] => utility [patent_app_number] => 10/897696 [patent_app_country] => US [patent_app_date] => 2004-07-23 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 13 [patent_no_of_words] => 6395 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0058/20050058913.pdf [firstpage_image] =>[orig_patent_app_number] => 10897696 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/897696
Stencil mask, charged particle irradiation apparatus and the method Jul 22, 2004 Abandoned
Array ( [id] => 978742 [patent_doc_number] => 06929892 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-08-16 [patent_title] => 'Method of monitoring an exposure process' [patent_app_type] => utility [patent_app_number] => 10/894044 [patent_app_country] => US [patent_app_date] => 2004-07-20 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 13 [patent_figures_cnt] => 28 [patent_no_of_words] => 4655 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 6 [patent_words_short_claim] => 180 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/929/06929892.pdf [firstpage_image] =>[orig_patent_app_number] => 10894044 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/894044
Method of monitoring an exposure process Jul 19, 2004 Issued
Array ( [id] => 6971560 [patent_doc_number] => 20050037270 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2005-02-17 [patent_title] => 'Method for measuring overlay shift' [patent_app_type] => utility [patent_app_number] => 10/892119 [patent_app_country] => US [patent_app_date] => 2004-07-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 7 [patent_figures_cnt] => 7 [patent_no_of_words] => 3217 [patent_no_of_claims] => 17 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0037/20050037270.pdf [firstpage_image] =>[orig_patent_app_number] => 10892119 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/892119
Method for measuring overlay shift Jul 15, 2004 Issued
Array ( [id] => 529143 [patent_doc_number] => 07179569 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2007-02-20 [patent_title] => 'Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same' [patent_app_type] => utility [patent_app_number] => 10/886656 [patent_app_country] => US [patent_app_date] => 2004-07-09 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 25 [patent_figures_cnt] => 106 [patent_no_of_words] => 17300 [patent_no_of_claims] => 14 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/179/07179569.pdf [firstpage_image] =>[orig_patent_app_number] => 10886656 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/886656
Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same Jul 8, 2004 Issued
Array ( [id] => 7263980 [patent_doc_number] => 20040241886 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-02 [patent_title] => 'Method for exposing a peripheral area of a wafer and apparatus for performing the same' [patent_app_type] => new [patent_app_number] => 10/883712 [patent_app_country] => US [patent_app_date] => 2004-07-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 11 [patent_figures_cnt] => 11 [patent_no_of_words] => 5590 [patent_no_of_claims] => 11 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 3 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0241/20040241886.pdf [firstpage_image] =>[orig_patent_app_number] => 10883712 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/883712
Method for exposing a peripheral area of a wafer and apparatus for performing the same Jul 5, 2004 Issued
Array ( [id] => 879233 [patent_doc_number] => 07354681 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2008-04-08 [patent_title] => 'Scattering bar OPC application method for sub-half wavelength lithography patterning' [patent_app_type] => utility [patent_app_number] => 10/880376 [patent_app_country] => US [patent_app_date] => 2004-06-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 17 [patent_figures_cnt] => 25 [patent_no_of_words] => 6775 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 91 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/354/07354681.pdf [firstpage_image] =>[orig_patent_app_number] => 10880376 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/880376
Scattering bar OPC application method for sub-half wavelength lithography patterning Jun 29, 2004 Issued
Array ( [id] => 5738324 [patent_doc_number] => 20060008714 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2006-01-12 [patent_title] => 'Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method' [patent_app_type] => utility [patent_app_number] => 10/875605 [patent_app_country] => US [patent_app_date] => 2004-06-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 6583 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 4 [patent_words_short_claim] => 0 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0008/20060008714.pdf [firstpage_image] =>[orig_patent_app_number] => 10875605 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/875605
Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method Jun 24, 2004 Issued
Array ( [id] => 7373798 [patent_doc_number] => 20040219441 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-11-04 [patent_title] => 'PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FOR FOCUS MONITORING AND MANUFACTURING METHOD FOR A UNIT' [patent_app_type] => new [patent_app_number] => 10/860244 [patent_app_country] => US [patent_app_date] => 2004-06-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 42 [patent_figures_cnt] => 42 [patent_no_of_words] => 22613 [patent_no_of_claims] => 19 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 151 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0219/20040219441.pdf [firstpage_image] =>[orig_patent_app_number] => 10860244 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/860244
Method of focus monitoring and manufacturing method for an electronic device Jun 3, 2004 Issued
Array ( [id] => 7425902 [patent_doc_number] => 20040265713 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-12-30 [patent_title] => 'Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method semiconductor device' [patent_app_type] => new [patent_app_number] => 10/855380 [patent_app_country] => US [patent_app_date] => 2004-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 16 [patent_figures_cnt] => 16 [patent_no_of_words] => 10825 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 82 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0265/20040265713.pdf [firstpage_image] =>[orig_patent_app_number] => 10855380 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/855380
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device May 27, 2004 Issued
Menu