
Christopher G. Young
Examiner (ID: 3572, Phone: (571)272-1394 , Office: P/1721 )
| Most Active Art Unit | 1756 |
| Art Unit(s) | 1721, 1737, 1752, 1113, 1506, 1756, 1795 |
| Total Applications | 2931 |
| Issued Applications | 2607 |
| Pending Applications | 32 |
| Abandoned Applications | 298 |
Applications
| Application number | Title of the application | Filing Date | Status |
|---|---|---|---|
Array
(
[id] => 373192
[patent_doc_number] => 07473495
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-06
[patent_title] => 'Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product'
[patent_app_type] => utility
[patent_app_number] => 10/927218
[patent_app_country] => US
[patent_app_date] => 2004-08-27
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 16
[patent_figures_cnt] => 32
[patent_no_of_words] => 9695
[patent_no_of_claims] => 24
[patent_no_of_ind_claims] => 7
[patent_words_short_claim] => 38
[patent_maintenance] => 1
[patent_no_of_assignments] => 0
[patent_current_assignee] =>[type] => patent
[pdf_file] => patents/07/473/07473495.pdf
[firstpage_image] =>[orig_patent_app_number] => 10927218
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/927218 | Method of creating predictive model, method of managing process steps, method of manufacturing semiconductor device, method of manufacturing photo mask, and computer program product | Aug 26, 2004 | Issued |
Array
(
[id] => 7151178
[patent_doc_number] => 20050025279
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-02-03
[patent_title] => 'Non absorbing reticle and method of making same'
[patent_app_type] => utility
[patent_app_number] => 10/924874
[patent_app_country] => US
[patent_app_date] => 2004-08-25
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 2
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[patent_no_of_words] => 2410
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[pdf_file] => publications/A1/0025/20050025279.pdf
[firstpage_image] =>[orig_patent_app_number] => 10924874
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/924874 | Non absorbing reticle and method of making same | Aug 24, 2004 | Issued |
Array
(
[id] => 411298
[patent_doc_number] => 07282311
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2007-10-16
[patent_title] => 'Method of forming an integrated optical circuit'
[patent_app_type] => utility
[patent_app_number] => 10/921645
[patent_app_country] => US
[patent_app_date] => 2004-08-19
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 12
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[patent_no_of_words] => 4337
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[pdf_file] => patents/07/282/07282311.pdf
[firstpage_image] =>[orig_patent_app_number] => 10921645
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/921645 | Method of forming an integrated optical circuit | Aug 18, 2004 | Issued |
Array
(
[id] => 7085132
[patent_doc_number] => 20050050512
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-03-03
[patent_title] => 'Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer'
[patent_app_type] => utility
[patent_app_number] => 10/917426
[patent_app_country] => US
[patent_app_date] => 2004-08-13
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 4518
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[firstpage_image] =>[orig_patent_app_number] => 10917426
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/917426 | Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer | Aug 12, 2004 | Issued |
Array
(
[id] => 5799907
[patent_doc_number] => 20060035159
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-02-16
[patent_title] => 'Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device'
[patent_app_type] => utility
[patent_app_number] => 10/914604
[patent_app_country] => US
[patent_app_date] => 2004-08-10
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[patent_no_of_words] => 5087
[patent_no_of_claims] => 25
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[pdf_file] => publications/A1/0035/20060035159.pdf
[firstpage_image] =>[orig_patent_app_number] => 10914604
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/914604 | Method of providing alignment marks, method of aligning a substrate, device manufacturing method, computer program, and device | Aug 9, 2004 | Abandoned |
Array
(
[id] => 5661564
[patent_doc_number] => 20060252160
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2006-11-09
[patent_title] => 'Electron beam exposure device and exposure method'
[patent_app_type] => utility
[patent_app_number] => 10/567828
[patent_app_country] => US
[patent_app_date] => 2004-08-09
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 4
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/567828 | Electron beam exposure device and exposure method | Aug 8, 2004 | Abandoned |
Array
(
[id] => 609308
[patent_doc_number] => 07150949
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[patent_kind] => B2
[patent_issue_date] => 2006-12-19
[patent_title] => 'Further method to pattern a substrate'
[patent_app_type] => utility
[patent_app_number] => 10/911412
[patent_app_country] => US
[patent_app_date] => 2004-08-04
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 9
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[firstpage_image] =>[orig_patent_app_number] => 10911412
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/911412 | Further method to pattern a substrate | Aug 3, 2004 | Issued |
Array
(
[id] => 373191
[patent_doc_number] => 07473494
[patent_country] => US
[patent_kind] => B2
[patent_issue_date] => 2009-01-06
[patent_title] => 'Exposure mask and mask pattern production method'
[patent_app_type] => utility
[patent_app_number] => 10/898809
[patent_app_country] => US
[patent_app_date] => 2004-07-26
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 18
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[patent_no_of_words] => 8314
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[pdf_file] => patents/07/473/07473494.pdf
[firstpage_image] =>[orig_patent_app_number] => 10898809
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/898809 | Exposure mask and mask pattern production method | Jul 25, 2004 | Issued |
Array
(
[id] => 7025284
[patent_doc_number] => 20050019678
[patent_country] => US
[patent_kind] => A1
[patent_issue_date] => 2005-01-27
[patent_title] => 'Method of selecting photomask blank substrates'
[patent_app_type] => utility
[patent_app_number] => 10/897078
[patent_app_country] => US
[patent_app_date] => 2004-07-23
[patent_effective_date] => 0000-00-00
[patent_drawing_sheets_cnt] => 6
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[firstpage_image] =>[orig_patent_app_number] => 10897078
[rel_patent_id] =>[rel_patent_doc_number] =>) 10/897078 | Method of selecting photomask blank substrates | Jul 22, 2004 | Issued |
Array
(
[id] => 352458
[patent_doc_number] => 07491478
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[patent_kind] => B2
[patent_issue_date] => 2009-02-17
[patent_title] => 'Lithographic apparatus and device manufacturing method'
[patent_app_type] => utility
[patent_app_number] => 10/897398
[patent_app_country] => US
[patent_app_date] => 2004-07-23
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[patent_drawing_sheets_cnt] => 2
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/897398 | Lithographic apparatus and device manufacturing method | Jul 22, 2004 | Issued |
Array
(
[id] => 7060920
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[patent_title] => 'Pattern mask with features to minimize the effect of aberrations'
[patent_app_type] => utility
[patent_app_number] => 10/896985
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[patent_app_date] => 2004-07-23
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Array
(
[id] => 7127169
[patent_doc_number] => 20050058913
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[patent_issue_date] => 2005-03-17
[patent_title] => 'Stencil mask, charged particle irradiation apparatus and the method'
[patent_app_type] => utility
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Array
(
[id] => 978742
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Array
(
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[patent_title] => 'Method for measuring overlay shift'
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Array
(
[id] => 529143
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Array
(
[id] => 7263980
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[patent_title] => 'Method for exposing a peripheral area of a wafer and apparatus for performing the same'
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Array
(
[id] => 879233
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[patent_title] => 'Scattering bar OPC application method for sub-half wavelength lithography patterning'
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Array
(
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Array
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[patent_title] => 'PHOTOMASK FOR FOCUS MONITORING, METHOD OF FOCUS MONITORING, UNIT FOR FOCUS MONITORING AND MANUFACTURING METHOD FOR A UNIT'
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[rel_patent_id] =>[rel_patent_doc_number] =>) 10/860244 | Method of focus monitoring and manufacturing method for an electronic device | Jun 3, 2004 | Issued |
Array
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